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A Comparative Study of TiN Coatings Deposited by DC and Pulsed DC Asymmetric Bipolar Sputtering

DC 스퍼터법과 비대칭 바이폴라 펄스 DC 스퍼터법으로 증착된 TiN 코팅막의 물성 비교연구

  • Chun, Sung-Yong (Department of Advanced Materials Science and Engineering, Mokpo National University)
  • 전성용 (목포대학교 신소재공학과)
  • Received : 2011.09.20
  • Accepted : 2011.10.28
  • Published : 2011.10.31

Abstract

This work investigated the effect of duty cycle and pulse frequency on the microstructures and properties of titanium nitride thin films deposited by asymmetric bipolar pulsed DC sputtering system. Oscilloscope traces of the I-V waveforms indicate high power and high current density outputs during the asymmetric bipolar pulsed mode. The grain size decreases with decreasing duty cycle. The duty cycle has a strong influence not only on the microstructural properties but also on the mechanical properties of titanium nitride films. Comparing with the continuous DC sputtering, the titanium nitride films prepared by pulsed DC asymmetric bipolar process exhibit better properties.

Keywords

References

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