• 제목/요약/키워드: Titanium Nitride

검색결과 134건 처리시간 0.018초

Graphite 첨가에 따른 $Ti(C_xN_{1-x})$세라믹스의 물성 (Effect of Graphite Additions on the Properties of $Ti(C_xN_{1-x})$ Ceramics)

  • 고준;최영민;이재도;김종오
    • 한국세라믹학회지
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    • 제34권5호
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    • pp.443-448
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    • 1997
  • Titanium carbonitride (Ti(CxN1-x)) ceramics were prepared by hot pressing of the mixture of TiN and graphite. Hot pressing was performed in a graphite mold at 198$0^{\circ}C$ for 40 min under 44 MPa in N2 atmosphere. The effect of graphite addition on sinterability and the mechanical properties of titanium carbonitride were investigated. In this study, the solubility limit of graphite in Ti(CxN1-x) was slightly below 10 wt% based on the results of XRD analysis. Within the solubility limit, graphite dissolved completely into titanium nitride and formed the single phase Ti(CxN1-x) solid solution. Peak relative density of 99% and hardness of 16 GPa were observed for Ti(CxN1-x) ceramics with 7 wt% graphite while maximum flexural strength of 500 MPa and fracture toughness of 4.0 MPa.m1/2 were observed for Ti(CxN1-x) ceramics with 10 wt% graphite. The electrical resistivities of the ceramics with 7 wt% and 10 wt% graphite were observed 40 {{{{ mu OMEGA }}cm and 50 {{{{ mu OMEGA }}cm respectively.

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타이타늄 합금에 다양한 두께로 코팅된 TiN 피막의 기계적 성질 (MECHANICAL PROPERTIES OF TIN COATED FILM WITH VARIOUS COATING THICKNESS ON TITANIUM ALLOY)

  • 이재윤;오동준;김희중;정재헌
    • 대한치과보철학회지
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    • 제45권5호
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    • pp.675-686
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    • 2007
  • Statement of problem: Titanium nitride(TiN) coatings are the most general and popular coating method and used to improve the properties of metallic surface for industrial purposes. When TiN coating applied to the abutment screw, frictional resistance would be reduced, as a results, the greater preload and prevention of the screw loosening could be expected. Purpose: The purpose of this study was to investigate mechanical properties of TiN coated film of various coating thickness on the titanium alloy surface and to evaluate proper coating thickness. Material and method: 95 Titanium alloy (Ti-6Al-4V) discs of 15 mm in diameter and 3 mm in thickness were prepared for TiN coating and divided into 7 groups in this study. Acceding to coating deposition time (CDT) with TiN by using Arc ion plating, were divided into 7 groups : Group A (CDT 30min), Group B (CDT 60min), Group C (CDT 90min), Group D (CDT 120min), Group E (CDT 150min), Group F(CDT 180min) and Group G (no CDT) as a control group. TiN coating surface was observed with Atomic Force Microscope(AFM), field emission scanning electron microscopy(FE-SEM) and examined with scratch tester, wear tester. Result: 1. Coating thickness fir each coated group was increased in proportion to coating deposition time. 2. Surface of all coated groups except Group A was homogeneous and smooth. However, surface of none coated Group G had scratch. 3. Adhesion strength for each coated group was increased in proportion to coating deposition time. 4. Wear resistance for each coated group was increased in proportion to coating deposition time. 5. Surface roughness in Group A, B, C was increased in proportion to coating deposition time. But, surface roughness in Group D, E, F was showed decreased tendency in proportion to coating deposition time. Conclusion: According to coating deposition time, mechanical properties of TiN coated film were changed. It was considered that 120 minutes coating deposition time ($1.32{\mu}m$ in coating thickness) is necessary.

Ti-Al-N코팅층의 내산화 특성에 관한 연구 (Study on the Oxidation Resistance of Ti-Al-N Coating Layer)

  • 김충완;김광호
    • 한국세라믹학회지
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    • 제34권5호
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    • pp.512-518
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    • 1997
  • The high temperature oxidation behaviors of titanium nitride films prepared by PACVD technique were studied in the temperature range of from 50$0^{\circ}C$ to 80$0^{\circ}C$ under air atmosphere. Ti0.88Al0.12N film, which showed the excellent microhardness from the previous work, was investigated on its oxidation resistance compared with pure TiN film. Ti-Al-N film showed superior oxidation resistance up to $700^{\circ}C$, whereas TiN film was fast oxidized into rutile TiO2 crystallites from at 50$0^{\circ}C$. It was found that an amorphous layer having AlxTiyOz formula was formed on the surface region due to outward diffusion of Al ions at the initial stage of oxidation. The amorphous oxide layer played a role as a barrier against oxygen diffusion, protected the remained nitride layer from further oxidation, and thus, resulted in the high oxidation resistive characteristics of Ti-Al-N film.

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타이타늄-질소 코팅된 금속관에 대한 평가: 표면 경도, 부식 저항성, 색조 안정성 (Evaluation of Titanium-nitride Coated Crown: Surface Hardness, Corrosion Resistance and Color Sustainability)

  • 김효진;임수민;김진영
    • 대한소아치과학회지
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    • 제48권3호
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    • pp.344-351
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    • 2021
  • 이 연구의 목적은 타이타늄-질소 코팅된 금속관(TiNCs)의 표면 경도와 스테인리스 스틸 금속관(SSCs)의 표면 경도를 비교하고, TiNCs의 부식 저항성 및 물리적 자극에 대한 금색 코팅의 안정성을 평가하는 것이다. 표면 경도 시험을 위해 10개의 TiNCs와 10개의 SSCs를 사용하였다. 각 금속관 종류당 총 30번의 경도를 측정하여 평균값을 구하고 비교하였다. 부식 저항성 시험을 위해 직사각형 형태의 TiNC와 SSC의 원재료(금속관으로 가공되기 전 판상 형태)를 준비하였다. 각 금속관 종류 당 2회의 부식 시험을 시행하였다. 부식 용액에 용출된 금속 이온의 총 양을 유도결합 플라즈마 분광분석기로 측정하였다. 5개의 TiNCs로 반복적으로 가해지는 칫솔력에 대한 색조 안정성 시험을 시행하였다. TiNCs의 평균 경도는 SSCs의 평균 경도보다 유의미하게 높았다. TiNCs와 SSCs의 원재료로부터 용출된 금속 이온의 총 합은 ISO 22674(재료의 무결성에 관한 기준) 기준치를 넘지 않음을 확인했다. TiNCs의 금색 코팅은 반복적인 물리적 자극에 대하여 주어진 시간 동안 안정성을 가졌다.

INVESTIGATION OF MULTI-ARC PLASMA PLATING FILM EQUIPMENT BULAT-6 AND ITS TECHNICAL CHARACTERISTICS

  • Wen Xueya;Ma Te2ngcai;Hu Shejun
    • 한국진공학회지
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    • 제6권S1호
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    • pp.133-136
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    • 1997
  • In this paper multi-arc plasma plating film equipment Bulat-6 and its technical characteristics were analyzed in detail. This machine is the first of its kind in China. Influential factors and reducing methods on microdroplets of titanium were investigated. By method of electromagnetic field control and ion beam enhanced deposition excellent titanium nitride film could be obtained. Bicrohardness and adhesion were 250Mpa and 6.5Kg respectively.

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마그네슘 열환원에 의한 저응집 초미립 TiCN 분말합성 (Synthesis of Ultrafine and Less Agglomerated TiCN Powders by Magnesiothermic Reduction)

  • 이동원
    • 한국분말재료학회지
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    • 제19권5호
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    • pp.356-361
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    • 2012
  • The ultra-fine and less agglomerated titanium carbonitride particles were successfully synthesized by magnesiothermic reduction with low feeding rate of $TiCl_4+1/4C_2Cl_4$ solution. The sub-stoichiometric titanium carbide ($TiC_{0.5{\sim}0.6}$) particles were produced by reduction of chlorine component by liquid magnesium at $800^{\circ}C$ of gaseous $TiCl_4+1/4C_2Cl_4$ and the heat treatments in vacuum were performed for 5 hours to remove the residual magnesium and magnesium chloride mixed with produced $TiC_{{\sim}0.5}$. The final $TiC_{{\sim}0.5}N_{0{\sim}0.5}$ particle with near 100 nm in mean size and high specific surface area of $65m^2/g$ was obtained by nitrification under nitrogen gas at $1,150^{\circ}C$ for 2 hrs.

염화티타늄(III)으로부터 질화티타늄 미분체의 합성 (Preparation of Fine Titanium Nitride Powders from Titanium Trichloride)

  • 이진호;장윤식;박홍채;오기동
    • 한국세라믹학회지
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    • 제27권7호
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    • pp.916-924
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    • 1990
  • The preparatin of the fine TiN powders by reduction-nitridation of TiCl3-Al-N2 system was attempted in the temperature range from 350$^{\circ}$to 100$0^{\circ}C$. The formation mechanism and kinetics of TiN were examined, and the resultant TiN powder was characterized by means of XRD, PSA and SEM-EPMA methods. TiN was formed at temperatrue higher than $600^{\circ}C$. As an intermediate phase, AlTi was obtained. The apparent activation energy for the formation of TiN was approximately 4.2kcal/mole(600$^{\circ}$~90$0^{\circ}C$). The crystallite size and lattice constnat of TiN powder obtained in the temperature range from 600$^{\circ}$to 100$0^{\circ}C$ for 2h at the Al/TiCl3 molar ratio of 1.0 were 160~255A and 4.231~4.239A, respectively. According to PSA measurement, the mean particle size ranged from 14.0 to 14.8${\mu}{\textrm}{m}$.

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DC 반응성 스퍼터링된 TiN 박막의 구조적 및 전기적 특성 (Structural and Electrical Properties of Reactively Sputtered Titanium Nitride Films)

  • 류성용;오원욱;백수현;신두식;오재응;김영남;심태언;이종길
    • 전자공학회논문지A
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    • 제29A권8호
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    • pp.49-55
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    • 1992
  • We Have investigated the properties of the titanium nitrite films widely used in VLSI devices as diffusion barrier in Al-based metallization. TiN films were formed by reactive sputtering from Ti target in Ar-N$_2$ mixtures, varying deposition parameters such as N$_2$ partial pressure, substrate temperature, power, and total pressure. All the samples received the heat treatment at 45$0^{\circ}C$ for 30 min. The resulting films are characterized by mechanical stylus($\alpha$-step), x-ray diffraction(XRD), scanning electron microscopy(SEM), and four point probe method. The Tin film properties strongly depend on the deposition condition. The stoichiometry and Ti deposition rate are critically affected by nitrogen partial pressure, and the resistivity, in particular, is dependent on both the substrate temperature and sputtering power.

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표면개질의 트라이볼로지 특성에 관한 연구(제1보) (A Study on the Tribological Characteristics of Surface Modification (The 1st))

  • 오성모;채왕석;이봉구;김동현
    • 한국정밀공학회지
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    • 제16권5호통권98호
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    • pp.145-150
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    • 1999
  • We have studied on the tribological characteristics of surface modification by Arc Ion Implantation(AIP) coating method. Coating materials were deposited by the Titanium carbide(TiC) and Titanium nitride(TiN). An experimental process was established to determine the tribological characteristics of friction and wear behaviour with the variation of applied load, temperature and the time by the Falex friction and wear test machine. The results, It can be improved that when the surface modification of hard coatings(TiC, TiN) was deposited steel, the tribological characteristics become better. It is argued that improved because of excellence of the anti-wear, the extreme pressure properties and the heat stability.

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금속티타늄분말의 질화반응과 산화반응에 관한 연구 (A Study on Nitridation and Oxidation Reaction of Titanium Powder)

  • 이영기;손용운;조영수;김용석;김석윤
    • 열처리공학회지
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    • 제8권2호
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    • pp.137-148
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    • 1995
  • The nitridation kinetics of titanium powder were studied by isothermal and non-isothermal (dynamic) methods in high purity nitrogen under I atm pressure. For the comparison with nitridation, the oxidation kinetics of titanium powder were also studied in dry oxygen at I atm pressure. An automatic recording electrobalance was used to measure the weight gain as a function of time and temperature. For the reaction with nitrogen, the nitride was formed at over $700^{\circ}C$. The reaction with nitrogen followed the parabolic rate law, and the activation energy was calculated to be 31 kcal/mol in the isothermal method (above $900^{\circ}C$). The non-stoichiometric TiNx has been synthesized by the nitridation at a proper temperature and time, followed by the homogenizing treatment above $1100^{\circ}C$. In comparison with the stoichiometric $TiN_{1.0}$ and the non-stoichiometric TiNx ($TiN_{0.5}$ and $TiN_{0.65}$), the hot oxidation characteristics of the former is superior to that of the latter. However, both non-stoichiometric nitrides make little difference in the hot oxidation characteristics.

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