• Journal of the Korean Ceramic Society
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• v.34 no.5
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• pp.443-448
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• 1997

Titanium carbonitride (Ti(CxN1-x)) ceramics were prepared by hot pressing of the mixture of TiN and graphite. Hot pressing was performed in a graphite mold at 198$0^{\circ}C$ for 40 min under 44 MPa in N2 atmosphere. The effect of graphite addition on sinterability and the mechanical properties of titanium carbonitride were investigated. In this study, the solubility limit of graphite in Ti(CxN1-x) was slightly below 10 wt% based on the results of XRD analysis. Within the solubility limit, graphite dissolved completely into titanium nitride and formed the single phase Ti(CxN1-x) solid solution. Peak relative density of 99% and hardness of 16 GPa were observed for Ti(CxN1-x) ceramics with 7 wt% graphite while maximum flexural strength of 500 MPa and fracture toughness of 4.0 MPa.m1/2 were observed for Ti(CxN1-x) ceramics with 10 wt% graphite. The electrical resistivities of the ceramics with 7 wt% and 10 wt% graphite were observed 40 {{{{ mu OMEGA }}cm and 50 {{{{ mu OMEGA }}cm respectively.

• The Journal of Korean Academy of Prosthodontics
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• v.45 no.5
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• pp.675-686
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• 2007

Statement of problem: Titanium nitride(TiN) coatings are the most general and popular coating method and used to improve the properties of metallic surface for industrial purposes. When TiN coating applied to the abutment screw, frictional resistance would be reduced, as a results, the greater preload and prevention of the screw loosening could be expected. Purpose: The purpose of this study was to investigate mechanical properties of TiN coated film of various coating thickness on the titanium alloy surface and to evaluate proper coating thickness. Material and method: 95 Titanium alloy (Ti-6Al-4V) discs of 15 mm in diameter and 3 mm in thickness were prepared for TiN coating and divided into 7 groups in this study. Acceding to coating deposition time (CDT) with TiN by using Arc ion plating, were divided into 7 groups : Group A (CDT 30min), Group B (CDT 60min), Group C (CDT 90min), Group D (CDT 120min), Group E (CDT 150min), Group F(CDT 180min) and Group G (no CDT) as a control group. TiN coating surface was observed with Atomic Force Microscope(AFM), field emission scanning electron microscopy(FE-SEM) and examined with scratch tester, wear tester. Result: 1. Coating thickness fir each coated group was increased in proportion to coating deposition time. 2. Surface of all coated groups except Group A was homogeneous and smooth. However, surface of none coated Group G had scratch. 3. Adhesion strength for each coated group was increased in proportion to coating deposition time. 4. Wear resistance for each coated group was increased in proportion to coating deposition time. 5. Surface roughness in Group A, B, C was increased in proportion to coating deposition time. But, surface roughness in Group D, E, F was showed decreased tendency in proportion to coating deposition time. Conclusion: According to coating deposition time, mechanical properties of TiN coated film were changed. It was considered that 120 minutes coating deposition time ($1.32{\mu}m$ in coating thickness) is necessary.

• Journal of the Korean Ceramic Society
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• v.34 no.5
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• pp.512-518
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• 1997

The high temperature oxidation behaviors of titanium nitride films prepared by PACVD technique were studied in the temperature range of from 50$0^{\circ}C$ to 80$0^{\circ}C$ under air atmosphere. Ti0.88Al0.12N film, which showed the excellent microhardness from the previous work, was investigated on its oxidation resistance compared with pure TiN film. Ti-Al-N film showed superior oxidation resistance up to $700^{\circ}C$, whereas TiN film was fast oxidized into rutile TiO2 crystallites from at 50$0^{\circ}C$. It was found that an amorphous layer having AlxTiyOz formula was formed on the surface region due to outward diffusion of Al ions at the initial stage of oxidation. The amorphous oxide layer played a role as a barrier against oxygen diffusion, protected the remained nitride layer from further oxidation, and thus, resulted in the high oxidation resistive characteristics of Ti-Al-N film.

• Journal of the korean academy of Pediatric Dentistry
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• v.48 no.3
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• pp.344-351
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• 2021

The purpose of this study was to compare surface hardness between titanium-nitride coated crowns (TiNCs) and stainless steel crowns (SSCs), and to evaluate the corrosion resistance and color sustainability of TiNCs. Ten TiNCs and 10 SSCs were used for the hardness test. Measurement was performed 30 times for each type of crowns, and the mean values were compared. Metallic raw material plates (before being processed into crowns) of TiNCs and SSCs were prepared for the corrosion resistance test. The total amounts of metal ion releases in the test solution were detected by inductively coupled plasma-optical emission spectrometry. Five TiNCs were subjected to the color sustainability test by applying repetitive brushing forces. The mean hardness values of TiNC group and SSC group were 395.53 ± 105.90 Hv and 278.70 ± 31.45 Hv respectively. Hardness of TiNCs were significantly higher than that of SSCs. The total amounts of metal ion releases from the materials of TiNCs and SSCs satisfied the criterion in International Organization for Standardization 22674. The results mean that TiNCs and SSCs were not harmful in an acidic environment. The golden coating was stable against the repetitive physical stimulations for a given period time.

• Journal of the Korean Vacuum Society
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• v.6 no.S1
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• pp.133-136
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• 1997

In this paper multi-arc plasma plating film equipment Bulat-6 and its technical characteristics were analyzed in detail. This machine is the first of its kind in China. Influential factors and reducing methods on microdroplets of titanium were investigated. By method of electromagnetic field control and ion beam enhanced deposition excellent titanium nitride film could be obtained. Bicrohardness and adhesion were 250Mpa and 6.5Kg respectively.

• Journal of Powder Materials
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• v.19 no.5
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• pp.356-361
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• 2012

The ultra-fine and less agglomerated titanium carbonitride particles were successfully synthesized by magnesiothermic reduction with low feeding rate of $TiCl_4+1/4C_2Cl_4$ solution. The sub-stoichiometric titanium carbide ($TiC_{0.5{\sim}0.6}$) particles were produced by reduction of chlorine component by liquid magnesium at $800^{\circ}C$ of gaseous $TiCl_4+1/4C_2Cl_4$ and the heat treatments in vacuum were performed for 5 hours to remove the residual magnesium and magnesium chloride mixed with produced $TiC_{{\sim}0.5}$. The final $TiC_{{\sim}0.5}N_{0{\sim}0.5}$ particle with near 100 nm in mean size and high specific surface area of $65m^2/g$ was obtained by nitrification under nitrogen gas at $1,150^{\circ}C$ for 2 hrs.

• Journal of the Korean Ceramic Society
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• v.27 no.7
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• pp.916-924
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• 1990

The preparatin of the fine TiN powders by reduction-nitridation of TiCl3-Al-N2 system was attempted in the temperature range from 350$^{\circ}$to 100$0^{\circ}C$. The formation mechanism and kinetics of TiN were examined, and the resultant TiN powder was characterized by means of XRD, PSA and SEM-EPMA methods. TiN was formed at temperatrue higher than $600^{\circ}C$. As an intermediate phase, AlTi was obtained. The apparent activation energy for the formation of TiN was approximately 4.2kcal/mole(600$^{\circ}$~90$0^{\circ}C$). The crystallite size and lattice constnat of TiN powder obtained in the temperature range from 600$^{\circ}$to 100$0^{\circ}C$ for 2h at the Al/TiCl3 molar ratio of 1.0 were 160~255A and 4.231~4.239A, respectively. According to PSA measurement, the mean particle size ranged from 14.0 to 14.8${\mu}{\textrm}{m}$.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.29A no.8
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• pp.49-55
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• 1992

We Have investigated the properties of the titanium nitrite films widely used in VLSI devices as diffusion barrier in Al-based metallization. TiN films were formed by reactive sputtering from Ti target in Ar-N$_2$ mixtures, varying deposition parameters such as N$_2$ partial pressure, substrate temperature, power, and total pressure. All the samples received the heat treatment at 45$0^{\circ}C$ for 30 min. The resulting films are characterized by mechanical stylus($\alpha$-step), x-ray diffraction(XRD), scanning electron microscopy(SEM), and four point probe method. The Tin film properties strongly depend on the deposition condition. The stoichiometry and Ti deposition rate are critically affected by nitrogen partial pressure, and the resistivity, in particular, is dependent on both the substrate temperature and sputtering power.

• Journal of the Korean Society for Precision Engineering
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• v.16 no.5 s.98
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• pp.145-150
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• 1999

We have studied on the tribological characteristics of surface modification by Arc Ion Implantation(AIP) coating method. Coating materials were deposited by the Titanium carbide(TiC) and Titanium nitride(TiN). An experimental process was established to determine the tribological characteristics of friction and wear behaviour with the variation of applied load, temperature and the time by the Falex friction and wear test machine. The results, It can be improved that when the surface modification of hard coatings(TiC, TiN) was deposited steel, the tribological characteristics become better. It is argued that improved because of excellence of the anti-wear, the extreme pressure properties and the heat stability.

• Journal of the Korean Society for Heat Treatment
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• v.8 no.2
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• pp.137-148
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• 1995

The nitridation kinetics of titanium powder were studied by isothermal and non-isothermal (dynamic) methods in high purity nitrogen under I atm pressure. For the comparison with nitridation, the oxidation kinetics of titanium powder were also studied in dry oxygen at I atm pressure. An automatic recording electrobalance was used to measure the weight gain as a function of time and temperature. For the reaction with nitrogen, the nitride was formed at over $700^{\circ}C$. The reaction with nitrogen followed the parabolic rate law, and the activation energy was calculated to be 31 kcal/mol in the isothermal method (above $900^{\circ}C$). The non-stoichiometric TiNx has been synthesized by the nitridation at a proper temperature and time, followed by the homogenizing treatment above $1100^{\circ}C$. In comparison with the stoichiometric $TiN_{1.0}$ and the non-stoichiometric TiNx ($TiN_{0.5}$ and $TiN_{0.65}$), the hot oxidation characteristics of the former is superior to that of the latter. However, both non-stoichiometric nitrides make little difference in the hot oxidation characteristics.