• 한국진공학회지
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• 제7권s1호
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• pp.30-36
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• 1998

The plasma-spray technique is currently the most frequently used method to produce calcium phosphate coatings. Hydroxyapatite(HAp), one form of calcium phosphate, is preferred by its ability to form a direct bond with living bone, resulting in improvements of implant fixation and faster bone healing. Recently, concerns have been raised regarding the viable use and long-term stability of plasma-spray HAp coatings due to its nature of comparatively thick, porous, and poor bonding strength to metal implants. Thin layers (maximum of few microns) of calcium phosphate were formed by an e-beam evaporation with and without ion bombardments. The Ca/P ration of film was controlled by either using the evaporants having the different ration of Ca/P with addition of CaO, or adjusting the ion beam assist current. The Ca/P ration had great effects on the structure formation after heat treatment and the dissolution bahavior. The calcium phosphate films produced by IBAD exhibited high adhesion strength.

• Progress in Superconductivity
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• 제4권2호
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• pp.109-113
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• 2003

We have developed a planar-type single layer second-order $high-T_{c}$ SQUID gradiometer, which can detect the $d^2$$B_{z/}$dxdy of the second-order field gradient. This SQUID gradiometer consists of four-way 'clover-leaf' pick-up loops and is coupled directly to a 4-junction dc SQUID in such a way that the coupling polarity of the two diagonal loops is opposite to that of the other two loops. The pickup loops are intrinsically balanced for both uniform field and the 1 st-order field gradient. The $YBa_2$$Cu_3$$O_{7}$ thin film was made by pulsed laser deposition method on $SrTiO_3$ single crystal substrate and patterned by photolithography with Ar ion milling technique. Response of this gradiometer was tested for both uniform field and the 2nd-order field gradient. Details of the design, fabrication, and results will be discussed.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2003년도 추계종합학술대회
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• pp.537-541
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• 2003

강유전체(SrTiO$_3$) 박막을 게이트 절연층으로 하여 수소화 된 비정질 실리콘 박막 트랜지스터를 유리 기판위에 제조하였다. 강유전체는 기존의 SiO$_2$, SiN 등과 같은 게이트 절연체에 비하여 유전특성이 매우 뛰어나 TFT의 ON 전류를 증가시키고 문턱전압을 낮추며 항복특성을 개선하여 준다. PECVD 에 의하여 증착된 a-Si:H 는 FTIR 측정 결과 2,000 $cm^{-}$1 과 635 $cm^{-}$l 및 876 cm-1 에서 흡수 밴드가 나타났으며, 2,000 $cm^{-1}$ / 과 635 $cm^{-1}$ / 은 SiH$_1$ 의 stretching 과 rocking 모드에 기인 한 것이며 876 $cm^{-1}$ / 의 weak 밴드는 SiH$_2$ vibration 모드에 의한 것이다. a-SiN:H 는 optical bandgap 이 2.61 eV 이고 굴절률은 1.8 - 2.0, 저항률은 $10^{11}$ - $10^{15}$ $\Omega$-cm 정도로 실험 조건에 따라 약간 다르게 나타난다. 강유전체(SrTiO$_3$) 박막의 유전상수는 60 - 100 정도이고 항복전계는 1MV/cm 이상으로 우수한 절연특성을 갖고 있다. 강유전체를 이용한 TFT 의 채널 길이는 8 - 20 $\mu$m, 채널 넓이는 80 - 200 $\mu$m 로서 드레인 전류가 게이트 전압 20V에서 3 $\mu$A 이고 Ion/Ioff 비는 $10^{5}$ - $10^{6}$, Vth 는 4 - 5 volts 이다.

• Nuclear Engineering and Technology
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• 제52권10호
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• pp.2353-2360
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• 2020

An anodic electrophoretic deposition (EPD) technique is used to create a uniform TiO₂ thin film coating on boiling thin steel plates (1.1 mm by 90 mm). All of the effective parameters except time of the EPD method are kept constant. To investigate the effect of gamma irradiation on the critical heat flux (CHF), the test specimens were irradiated in a gamma cell to different doses ranging from 100 to 300 kGy, and then SEM and BET analysis were performed. For each coated specimen, the contact angle and capillary length were measured. The specimens were then tested in a boiling pool for CHF and boiling heat transfer coefficient. It was observed that irradiation significantly decreases the maximum pore diameter while it increases the porosity, pore surface area and pore volume. These surface modifications due to gamma irradiation increased the CHF of the nano-coated surfaces compared to that of the unirradiated surfaces. The heat transfer coefficient (HTC) of the nano-coated surfaces irradiated at 300 kGy increased from 83 to 160 kW/(㎡ K) at 885 kW/㎡ wall heat flux by 100%. The CHF of the irradiated (300 kGy) and unirradiated surfaces are 2035 kW/㎡ and 1583 kW/㎡, respectively, an increase of nearly 31%.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.151-151
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• 2012

A new plasma process, i.e., the combination of PIII&D and HIPIMS, was developed to implant non-gaseous ions into materials surface. HIPIMS is a special mode of operation of pulsed-DC magnetron sputtering, in which high pulsed DC power exceeding ~1 kW/$cm^2$ of its peak power density is applied to the magnetron sputtering target while the average power density remains manageable to the cooling capacity of the equipment by using a very small duty ratio of operation. Due to the high peak power density applied to the sputtering target, a large fraction of sputtered atoms is ionized. If the negative high voltage pulse applied to the sample stage in PIII&D system is synchronized with the pulsed plasma of sputtered target material by HIPIMS operation, the implantation of non-gaseous ions can be successfully accomplished. The new process has great advantage that thin film deposition and non-gaseous ion implantation along with in-situ film modification can be achieved in a single plasma chamber. Even broader application areas of PIII&D technology are believed to be envisaged by this newly developed process. In one application of non-gaseous plasma immersion ion implantation, Ge ions were implanted into SiO2 thin film at 60 keV to form Ge quantum dots embedded in SiO2 dielectric material. The crystalline Ge quantum dots were shown to be 5~10 nm in size and well dispersed in SiO2 matrix. In another application, Ag ions were implanted into SS-304 substrate to endow the anti-microbial property of the surface. Yet another bio-application was Mg ion implantation into Ti to improve its osteointegration property for bone implants. Catalyst is another promising application field of nongaseous plasma immersion ion implantation because ion implantation results in atomically dispersed catalytic agents with high surface to volume ratio. Pt ions were implanted into the surface of Al2O3 catalytic supporter and its H2 generation property was measured for DME reforming catalyst. In this talk, a newly developed, non-gaseous plasma immersion ion implantation technique and its applications would be shown and discussed.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제55권3호
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• pp.116-121
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• 2006

Most high-k materials are well known not to be etched easily, Some problems such as low etch rate poor sidewall angle, plasma damage, and process complexity were emerged from the high-density DRAM fabrication. Chemical mechanical polishing (CMP) by a damascene process was proposed to pattern this high-k material was polished with some commercial silica slurry as a function of pH variation. Sufficient removal rate with adequate selectivity to realize the pattern mask of tera-ethyl ortho-silicate (TEOS) film for the vertical sidewall angle were obtained. The changes of X-ray diffraction pattern and dielectric constant by CMP process were negligible. The planarization was also achieved for the subsequent multi-level processes. Our new CMP approach will provide a guideline for effective patterning of high-k material by CMP technique.

• 한국재료학회지
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• 제14권9호
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• pp.607-613
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• 2004

This study was to investigate the surface properties of electrochemically oxidized Ti-6Al-7Nb alloy by anodic spark discharge technique. Anodizing was performed at current density 30 $mA/cm^2$ up to 300 V in electrolyte solutions containing $DL-{\alpha}$-glycerophosphate disodium salt hydrate($DL-{\alpha}$-GP) and calcium acetate (CA). Hydrothermal treatment was done at $300^{\circ}C$ for 2 hrs to produce a thin outermost layer of hydroxyapatite (HA). The bioactivity was evaluated from HA formation on the surfaces in a Hanks' solution with pH 7.4 at $36.5^{\circ}C$ for 30 days. The size of micropores and the thickness of oxide film increased and complicated multilayer by increasing the spark forming voltage. Needle-like HA crystals were observed on anodic oxide film after the hydrothermal treatment at $300^{\circ}C$ for 2 hrs. When increasing $DL-{\alpha}$-GP in electrolyte composition, the precipitated HA crystals showed the shape of thick and shorter rod. However, when increasing CA, the more fine needle shape HA crystals were appeared. The bioactivity in Hanks' solution was accelerated when the oxide films composed with strong anatase peak with presence of rutile peak. The increase of amount of Ca and P was observed in groups having bioactivity in Hanks' solution. The Ca/P ratio of the precipitated HA layer was equivalent to that of HA crystal and it was closer to 1.67 as increasing the immersion time in Hanks' solution.

• Nano
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• 제13권10호
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• pp.1850124.1-1850124.12
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• 2018

$TiO_2$ films were deposited from oxygen/titanium tetraisopropoxide (TTIP) plasmas at low temperature by Helicon-PECVD at floating potential ($V_f$) or substrate self-bias of -50 V. The influence of titanium precursor partial pressure on the morphology, nanostructure and optical properties was investigated. Low titanium partial pressure ([TTIP] < 0.013 Pa) was applied by controlling the TTIP flow rate which is introduced by its own vapor pressure, whereas higher titanium partial pressure was formed through increasing the flow rate by using a carrier gas (CG). Then the precursor partial pressures [TTIP+CG] = 0:027 Pa and 0.093 Pa were obtained. At $V_f$, all the films exhibit a columnar structure, but the degree of inhomogeneity is decreased with the precursor partial pressure. Phase transformation from anatase ([TTIP] < 0.013 Pa) to amorphous ([TTIP+CG] = 0:093 Pa) has been evidenced since the $O^+_2$ ion to neutral flux ratio in the plasma was decreased and more carbon contained in the film. However, in the case of -50 V, the related growth rate for different precursor partial pressures is slightly (~15%) decreased. The columnar morphology at [TTIP] < 0.013 Pa has been changed into a granular structure, but still homogeneous columns are observed for [TTIP+CG] = 0:027 Pa and 0.093 Pa. Rutile phase has been generated at [TTIP] < 0:013 Pa. Ellipsometry measurements were performed on the films deposited at -50 V; results show that the precursor addition from low to high levels leads to a decrease in refractive index.

• 한국콘텐츠학회논문지
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• 제9권10호
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• pp.451-463
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• 2009

본 연구의 목적은 태양전지의 변환효율을 높이기 위한 박막형 소재 물질 개발과 전지의 조립과정을 개선 발달시키기 위한 것이다. 이 연구에 사용된 이산화티타니움은 물과 알콕사이드 몰비, 용액 pH의 변화, 분말의 묵힘조건 등 반응조건을 조절한 솔-겔 방법에 의하여 조제되었다. 준비된 이산화티타니움은 $300{\sim}750^{\circ}C$의 열처리조건 범위에서 소결하였다. $600^{\circ}C$의 열조건에서 만들어진 이산화티타니움은 XRD 패턴에서 강한 세기의 아나타제형이 나타났고, $750^{\circ}C$에서 소결되었을 때에는 아나타제형와 루틸형의 혼합물이 나타났다. 또한 소결온도와 묵힘시간 등에 따라 합성된 이산화티타니움의 특성은 묵힘시간이 증가함에 따라 아나타제형 결정으로 변환되는 것을 확인할 수 있었다. 한편 전류밀도는 묵힘시간과 온도에 따라 증가하였고, 변환효율은 전류밀도의 증가로 역시 증가함을 알 수 있었다. 산소분위기하에서 산소와 카드뮴텔루라이드의 화학결합이 생성됨을 관찰할 수 있었고, 카드뮴텔루라이드의 박막위의 산소가 크롬메이트와 하이드라진 처리에 의하여 감소되는 것을 알수 있었다. 결론적으로 공기분위기하에서 $550^{\circ}C$의 급속 소결조건에서 만들어진 카드뮴텔루라이드의 에너지변환효율은 $0.07cm^2$, $1.0cm^2$의 면적에 대해 각각 12.0%, 6.0%로 나타내었다.

• 한국재료학회지
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• 제11권3호
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• pp.215-220
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• 2001

본 실험에서는 반응성 스퍼터링법으로 $N_2$/Ar 유속비를 달리하여 약 200 과 650 두께의 비정질 Ti-Si-N막을 증착한 후 Cu (750 )와 Si사이의 barrier 특성을 면저항측정, XRD, SEM, RBS 그리고 Ti-Si-N막에서 질소 함량의 영향에 초점을 둔 ABS depth profiling 등의 분석방법을 통해 조사되었다. 질소 함량이 증가함에 따라 처음에는 불량 온도가 46%까지 증가하다가 그 이상에서는 감소하는 경향을 보였다. 650 의 Ti-Si-N barrier막을 80$0^{\circ}C$에서 열처리 후에는 Cu$_3$Si 피크만 관찰될 뿐 Cu피크는 거의 완전히 사라졌으므로 Barrier 불량기구는 Cu$_3$Si상을 형성하기 위해 Si 기판내로의 Cu의 확산에 의해 일어난 것으로 보인다. 본 실험에서 Ti-Si-N의 최적 조성은 $Ti_{29}$Si$_{25}$N$_{46}$이었다. 200 과 650 두께의 $Ti_{29}$Si$_{25}$N$_{46}$ barrier 층의 불량온도는 각각 $650^{\circ}C$와 $700^{\circ}C$이었다.이었다.