• 제목/요약/키워드: TiN-Layer

검색결과 536건 처리시간 0.024초

Ti glue layer, Boron dopant, N2plasma 처리들이 Cu와 low-k 접착력에 미치는 효과 (Adhesion Property of Cu on Low-k : Ti Glue Layer, Boron Dopant, N2plasma effects)

  • 이섭;이재갑
    • 한국재료학회지
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    • 제13권5호
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    • pp.338-342
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    • 2003
  • Adhesion between Cu and low-k films has been investigated. Low-k films deposited using a mixture of hexamethyldisilane(HMDS) and Para-xylene had a dielectric constant as low as 2.7, showing the thermally stable properties up to $400^{\circ}C$. In this study, Ti glue layer, boron dopant, and $N_2$plasma treatment were used to improve adhesion property of between Cu and low-k films. Ti glue layer slightly improved adhesion property. After $N_2$plasma treatment, the adhesion property was significantly improved due to the increased roughness and the formation of new binding states between Ti and plasma-treated PPpX : HMDS. However, $300^{\circ}C$ annealing of $N_2$plasma treated sample caused the diffusion of Cu into the PPpX : HMDS, degrading the low-k properties. In the case of Cu(B)/Ti/PPpX : HMDS, the adhesion was remarkably increased. This enhanced adhesion was attributed to formation of Ti-boride at the Cu-Ti interface. It is because the formed Ti-boride prevented the diffusion of Cu into the PPpX : HMDS and the Cu-Ti reaction at the Ti interface.

Effects of Ti and TiN Capping Layers on Cobalt-silicided MOS Device Characteristics in Embedded DRAM and Logic

  • Kim, Jong-Chae;Kim, Yeong-Cheol;Choy, Jun-Ho
    • 한국세라믹학회지
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    • 제38권9호
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    • pp.782-786
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    • 2001
  • Cobalt silicide has been employed to Embedded DRAM (Dynamic Random Access Memory) and Logic (EDL) as contact material to improve its speed. We have investigated the influences of Ti and TiN capping layers on cobalt-silicided Complementary Metal-Oxide-Semiconductor (CMOS) device characteristics. TiN capping layer is shown to be superior to Ti capping layer with respect to high thermal stability and the current driving capability of pMOSFETs. Secondary Ion Mass Spectrometry (SIMS) showed that the Ti capping layer could not prevent the out-diffusion of boron dopants. The resulting operating current of MOS devices with Ti capping layer was degraded by more than 10%, compared with those with TiN.

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TiC, TiN과 TiC/TiN 코팅의 트라이볼로지 특성 (Tribological Characteristics of TiC, TiN and TiC/TiN Coatings)

  • 전찬열
    • 한국산학기술학회논문지
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    • 제15권3호
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    • pp.1253-1258
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    • 2014
  • CA 이온도금기술에 의한 TiC와 TiN 그리고 TiC/TiN 코팅재를 비교하기 위하여 트라이볼로지 물성을 연구하였다. 실험은 Falex journal V block 시스템을 이용한 터보시험기에서 수행하였다. 코팅재의 마찰과 마모특성은 작용된 하중과 미끄럼 속도에 의하여 다양하게 결정되었다. TiC와 TiN 그리고 TiC/TiN 코팅재는 표면에서 트라이볼로지 특성이 현저하게 증가하였다. 단층코팅에서는 TiC보다 TiN이 좋은 결과를 얻었다. 그러나, TiC/TiN의 다층코팅은 다른 어떤 단층코팅보다 좋은 성능을 보였다. 다층코팅의 성능이 향상된 핵심요소는 TiN층 외부와 강 사이에서 부착이 증가하게된 TiC의 역할 때문이다.

CO2 레이저를 이용한 Ti-6Al-4V합금의 TiN 및 TiC 가스 합금화 (TiN and TiC Gas Alloying of Ti-6Al-4V Alloy by CO2 Laser)

  • 송기홍;이오연
    • 열처리공학회지
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    • 제9권3호
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    • pp.177-186
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    • 1996
  • Surface alloying of Ti alloy by $CO_2$ laser is able to produce few hundred micrometers thick TiN or TiC surface-alloyed layer with high hardness on the substrate by injecting reaction gas($N_2$ or $CH_4$). Laser surface alloying by means of process control is in many applications essential in order to obtain predictable hardening layer. This research has been investigated the effect of such parameters on TiN and TiC gas alloying of Ti-6Al-4V alloy by $CO_2$ laser. The maximum surface hardness of TiN layer was obtained 1750Hv on the conditions of 0.8kW laser power, 0.8m/min scanning speed and 100% $N_2$ atmosphere. However, the maximum hardness of TiC formation layer after laser treatment was about 630Hv. As scanning speed was increased, the hardness and depth of these layers were decreased at constant laser power.

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Ti/TiN Barrier 층을 갖는 Al 배선의 Electromigration 특성 (A study on Electromigration characteristics in Al line with Ti/TiN Barrier Layer)

  • 추교섭;신상우;주유진;성영권
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1995년도 추계학술대회 논문집 학회본부
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    • pp.364-366
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    • 1995
  • We investigated the Electromigration characteristics in Cu alloyed Al line and the effect of Ti/TiN barrier layer on the characteristics. Test structures were fabricated by wafer level and 50% failure times were tested in the condition of j= 2 MA/$cm^3$, T= 300$^{\circ}C$. The reliability of Al line was improved which was 0.5%Cu Alloyed, but Ti/TiN under layer deteriorated the reliability while TiN over layer improved the characteristics.

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미끄럼운동시 TiN코팅볼과 스틸디스크의 미끄럼접촉면에 형성되는 산화막의 영향을 고려한 마찰천이선도 작성에 대한 연구 (Friction Transition Diagram Considering the Effects of Oxide Layer Formed on Contact Parts of TiN Coated Ball and Steel Disk in Sliding)

  • 조정우;박동신;이영제
    • 대한기계학회논문집A
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    • 제27권3호
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    • pp.335-342
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    • 2003
  • In this study, the effects of oxide layer formed on the contact parts of TiN coated ball and steel disk in sliding are investigated. Also wear mechanism to from the oxide layer and the characteristics of the oxide layer formation are investigated. AISI 52100 steel ball is used for the substrate of coated ball specimens. Two types of coated ball specimens were prepared by depositing TiN coating with 1 and 4 ${\mu}{\textrm}{m}$ in coating thickness. AISI 1045 steel is used for the disk type counter-body. To investigate the effect of oxide layer on the contact parts of the two materials, the tests were performed both in air for forming oxide layer on the contact parts and in nitrogen environment to avoid oxidation. And to study the effects of surface roughness of counter-body, TiN coating thickness and contact load of sliding test on the characteristics of oxide layer formation on counter-body, various tests were carried out. From the results, the friction characteristics between the two materials was predominated by iron oxide layer that formed on wear track on counter-body and this layer caused the high friction. And the formation rate of the oxide layer on wear track increased as the real contact area between the two materials increased as the contact load increased, the TiN coating thickness decreased and the surface of counter-body smoothened.

Si3N4/SnZnO/AZO/Ag/Ti/ITO 다층 박막의 적층 횟수에 따른 광학적 특성 (The Optical Properties of Si3N4/SnZnO/AZO/Ag/Ti/ITO Multi-layer Thin Films with Laminating Times)

  • 이상윤;장건익
    • 한국전기전자재료학회논문지
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    • 제28권1호
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    • pp.7-11
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    • 2015
  • In this study, $Si_3N_4$/SnZnO/AZO/Ag/Ti/ITO multi-layer film were prepared on glass substrate by DC/RF magnetron sputtering method. To prevent interfacial reaction between Ag and ITO layer, Ti buffer layer was inserted. Optical properties and sheet resistance were studied depending on laminating times of each multi-layered film especially in visible ray. The simulation program, EMP (essential macleod program), was adopted and compared with experimental data to expect the experimental result. It was found out that the transmittance of the first stacked $Si_3N_4$/SnZnO/AZO/Ag/Ti/ITO multi-layer film was more than 90%. However, with increasing stacking times, the optical properties of $Si_3N_4$/SnZnO/AZO/Ag/Ti/ITO multi-layer film get worse. Consequently, Ti layer is good for oxidation barrier, but too many uses of this layer may have an adverse effect to optical properties of TCO film.

초경 볼 엔드밀의 TiAlN 코팅 처리조건이 건식가공환경에서 고경도 강재의 절삭 특성에 미치는 영향 (The Effect of TiAlN coated Ball End Mill on Cutting characteristic of High Hardness Steels in Dry Condition)

  • 박동순;원시태;이영주;허장회
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2005년도 추계학술대회 논문집
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    • pp.344-349
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    • 2005
  • This paper is studied on the effect of TiAlN coated ball end mill on cutting characteristic of high hardness steels in dry cutting condition without coolant. KP4 steels[HRC32] and STD11[HRC60] heat treated steels wert: used as the workpiece and WC-Co ball end mill and single and multi layer TiAlN coated ball end mill were utilized. Results showed that TiAlN coated ball end mill were increased the cutting length than WC-Co ball end mill in the cutting speed$[245\~320m/min]$ about $2\~5$ times for KP4 steels and about $2.7\~4.3$ times for STD11 heat treated steels. The multi layer TiAlN coated ball end mill is good about $1.2\~1.7$ times for KP4 steels and STD11 steels than single layer coated.

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나노복합체 nc-TiN/a-Si$_3$N$_4$ 코팅막의 합성 및 기계적 성질 (Synthesis and Mechanical Properties of nc-TiN/a-Si$_3$N$_4$ Nanocomposite Coating Layer)

  • 김광호;윤석영;김수현;이건환
    • 한국표면공학회지
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    • 제35권3호
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    • pp.133-140
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    • 2002
  • The Ti-Si-N coating layers were synthesized on SKD 11 steel substrate by a DC reactive magnetron co-sputtering technique with separate Ti and Si targets. The high resolution transmission electron microscopy (HRTEM) and X-ray photoelectron spectroscopy (XPS) analyses for the coating layers revealed that microstructure of Ti-Si-N layer was nanocomposite, consisting of nano-sized TiN crystallites surrounded by amorphous $Si_3$$N_4$ phase. The highest hardness value of about 39 GPa was obtained at the Si content of ~11at.%, where the microstructure had fine TiN crystallites (about 5nm in size) dispersed uniformly in amorphous matrix. As the Si content in Ti-Si-N films increased, the TiN crystallites became from aligned to randomly oriented microstructure, finer, and fully penetrated by amorphous phase. Free Si appeared in the layers due to the deficit of nitrogen source at higher Si content. Friction coefficient and wear rate of the Ti-Si-N coating layer significantly decreased with increase of relative humidity. The self-lubricating tribe-layers such as $SiO_2$ or (OH)$Si_2$ seemed to play an important role in the wear behavior of Ti-Si-N film against steel.

플라즈마 화학 증착법에 의한 $Al_2$ $O_3$ 단층피막과 $Al_2$ $O_3$/( $Ti_{0.5}$ $Al_{0.5}$)N 이중피막의 제조 및 특성에 관한 연구 (A Study on the Properties of $Al_2$ $O_3$ and $Al_2$ $O_3$/( $Ti_{0.5}$ $Al_{0.5}$)N Coatings Produced by Plasma Enhanced Chemical Vapor Deposition)

  • 손경석;이승훈;이동각;임주완;이후철;이정중
    • 한국표면공학회지
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    • 제34권2호
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    • pp.105-114
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    • 2001
  • $Al_2$$O_3$ coatings were deposited on M2 high speed steels by the plasma enhanced chemical vapor deposition (PECVD) process, using a gas mixture of AlC1$_3$, $H_2$, $CO_2$ and Ar $Al_2$$O_3$ coatings had interference color and showed amorphous phase. $A1_2$X$A1_3$/($Ti_{0.5}$ /$Al_{0.5}$ )N double layer coatings were produced in the sequence of substrate $NH_3$ plasma pretreatment, ($Ti_{0.5}$$Al_{0.5}$)N depoition process, $Al_2$$O_3$ deposition process. $Al_2$ $O_3$/( $Ti_{0.5}$A $l_{0.5}$)N double layer coatings showed NaCl structure in ( $Ti_{0.5}$A $l_{0.5}$)N layer and amorphous phase in A1$_2$ $O_3$ layer. It was shown that $Al_2$ $O_3$ columns continuously grew onto ( $Ti_{0.5}$A $l_{0.5}$)N columns. ( $Ti_{0.5}$A $l_{0.5}$)N single coating and $Al_2$ $O_3$/( $Ti_{0.5}$A $l_{0.5}$)N double layer coating were oxidized at $700^{\circ}C$, 80$0^{\circ}C$, 90$0^{\circ}C$ for 1hr, 3hr in atmosphere. At 80$0^{\circ}C$, single layer coatings were oxidized, which were examined substrate oxide particle. But $Al_2$ $O_3$/ ( $Ti_{0.5}$A $l_{0.5}$)N double layer coatings maintained the asdeposited state. Therefore, $Al_2$ $O_3$/ ( $Ti_{0.5}$A $l_{0.5}$)N double layer coatings have moreexcellent oxidation resistance than ( $Ti_{0.5}$A $l_{0.5}$)N single layer coatings.X> 0.5/)N single layer coatings.s.

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