• Title/Summary/Keyword: TiN/Ti Multilayer

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Electrochemical Characteristics of TiN/Ti and ZrN/Ti Multilayer Coated Dental Ni-Ti Alloy Files (TiN/Ti 및 ZrN/Ti 다층막 코팅된 Ni-Ti합금파일의 전기화학적 특성)

  • Park, Jun-Mo;Hwang, Ho-Gil;Jang, Seung-Hyeon;Choe, Han-Cheol
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2008.11a
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    • pp.66-67
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    • 2008
  • 본 연구에서는 코팅된 Ni-Ti파일의 이온용출을 조사하기 위하여 표면에 형성된 TiN/Ti 및 ZrN/Ti다층막의 구강유사액에서 표면의 부식특성을 조사하였다.

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Mechanical Properties and Thermal Stability of Ti0.5Al0.5N/CrN Nano-multilayered Coatings (Ti0.5Al0.5N/CrN 나노 다층 박막의 기계적 성질과 열적 안정성)

  • Ahn, Seung-Su;Park, Jong-Keuk;Oh, Kyung-Sik;Chung, Tai-Joo
    • Journal of Powder Materials
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    • v.27 no.5
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    • pp.406-413
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    • 2020
  • Ti0.5Al0.5N/CrN nano-multilayers, which are known to exhibit excellent wear resistances, were prepared using the unbalanced magnetron sputter for various periods of 2-7 nm. Ti0.5Al0.5N and CrN comprised a cubic structure in a single layer with different lattice parameters; however, Ti0.5Al0.5N/CrN exhibited a cubic structure with the same lattice parameters that formed the superlattice in the nano-multilayers. The Ti0.5Al0.5/CrN multilayer with a period of 5.0 nm exceeded the hardness of the Ti0.5Al0.5N/CrN single layer, attaining a value of 36 GPa. According to the low-angle X-ray diffraction, the Ti0.5Al0.5N/CrN multilayer maintained its as-coated structure up to 700℃ and exhibited a hardness of 32 GPa. The thickness of the oxidation layer of the Ti0.5Al0.5N/CrN multilayered coating was less than 25% of that of the single layers. Thus, the Ti0.5Al0.5N/CrN multilayered coating was superior in terms of hardness and oxidation resistance as compared to its constituent single layers.

A Study on the Friction and Wear Characteristics of TiAlN+WC/C Multilayer Coating of SCM415 Steel (TiAlN+WC/C 다층코팅 SCM415강의 마찰•마모 특성에 관한 연구)

  • Jang, Jeong-Hwan;Kim, Nam-Kyung;Kim, Hae-Ji;Zang, Qi;Xu, Zhezhu;Lyu, SungKi
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.9 no.2
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    • pp.40-46
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    • 2010
  • The purpose of this study is to show the friction and wear characteristics on the vapor deposited coating layers on the SCM415 steel. In this research, frictional wear characteristic of coating materials such as TiAlN+WC/C Multilayer Coating was investigated under room temperature, normal air pressure and nothing lubricating condition. Therefore this study carried out research on the friction coefficient, micro hardness(Hv), roughness, EPMA on the vapor deposited coating layers on the SCM415 steel. As the wear experimental result, the coefficient of friction decreased according to experimental load increases.

Wear Characteristics of Coated $Si_3N_4$-TiC Ceramic Tool (Coated $Si_3N_4$-TiC Ceramic 공구의 마모 특성)

  • 김동원;권오관;이준근;천성순
    • Tribology and Lubricants
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    • v.4 no.2
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    • pp.44-51
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    • 1988
  • Titanium carbide(TiC), Titanium nitride(TiN), and Titanium carbonnitride(Ti(C,N)) films were deposited on $Si_3N_4$-TiC composite cutting tools by chemical vapor deposition(CVD) using $TiCl_4-CH_4-H_2$, $TiCl_4-N_2-H_2$, and $TiCl_4-CH_4-N_2-H_2$ gas mixtures, respectively. The experimental results indicate that TiC coatings compared with TiN coatings on $Si_3N_4$ -TiC ceramic have an improved microstructural property, good thermal shock resistance, and good interfacial bonding. However TiN coatings compared with TiC coatings have a low friction coefficient with steel and good chemical stability. It is found by cutting test that coated insert compared with $Si_3N_4$-TiC ceramic have a superior flank and crater wear resistance. And multilayer coating compared with monolayer coating shows a improved wear resistance.

A Study on the Chemically Vapor Deposited TiC, TiN, and TiC(C, N) on $Si_3N_4$-TiC Ceramic Tools. ($Si_3N_4-TiC$ Ceramic 공구에 화학증착된 TiC, TiN 및 Ti(C, N)에 관한 연구)

  • 김동원;김시범;이준근;천성순
    • Tribology and Lubricants
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    • v.4 no.2
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    • pp.36-43
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    • 1988
  • Titanium carbide(TiC) and titanium nitride(TiN) flims were deposited on $Si_3N_4$-TiC composite cutting tools by chemical vapor deposition(CVD) using $TiCl_4-CH_4-H_2$ and $TiCl_4-H_2-N_2$ gas mixtures, respectively. The nonmetal to metal ratio of deposit increases with increasing $m_{C/Ti}$(mole ratio of CH$_4$ to TiCl$_4$ in the input) for TiC coatings and $m_{N/Ti}$(mole ratio of N$_2$ to TiCl$_4$ in the input) for TiN coatings. The nearly stoiahiometric films could be obtained under the deposition condition of $m_{C/Ti}$ between 1.15 and 1.61 for TiC, and that of $m_{N/Ti}$ between 25 and 28 for TiN. Also maximum microhardness of the coatings can be obtained in these ranges. The interfacial region of TiC coatings on $Si_3N_4$-TiC ceramics is wider than that of TiN coatings according to Auger depth profile analysis, which indicates good interfacial bonding for TiC. Experimental results show that TiC coatings have an randomly equiaxed structure and Columnar structure with(220) preferred orientation can be obtained for TiN coatings. And, multilayer coatings have a dense and equiaxed structure.

Hardness of AlTiN/TiAlN multilayer coatings deposited by Cathodic Vacuum Arc Deposition (음극 진공 아크 증착법에 의한 AlTiN/TiAlN 다층막의 경도)

  • Gwon, O-Jin;Kim, Mi-Seon
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2018.06a
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    • pp.35-35
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    • 2018
  • 물리적 증착법에 의해 제조되는 초고경도 박막은 나노다층과 나노복합 구조가 대표적이며, 본 연구에서는 음극 아크 증착법으로 TiAlN과 AlTiiN 층 조합을 이용하여 나노다층구조를 포함하는 다층막 시편을 제작하였다. 초격자 두께 주기 12.1 ~ 15.6 nm에서 35 ~ 55 GPa의 경도값을 가졌으며, 절삭공구 코팅분야에 적용할 예정이다.

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Structure & Fatigue Behavior of TiCN and TiN/TiCN Thin Films (TiCN 및 TiN/TiCN 박막의 구조와 피로거동)

  • Baeg, C.H.;Hong, J.W.;Wey, M.Y.;Kang, H.J.
    • Journal of the Korean Society for Heat Treatment
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    • v.13 no.5
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    • pp.324-329
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    • 2000
  • Microstructure, mechanical and fatigue behaviors of TiCN and TiN/TiCN thin films, deposited on quenched and tempered STD61 tool steel, were investigated by using XRD, XPS, hardness, adhesion and fatigue tests. The TiCN thin film is grown along the (100), (111) orientation, whereas the TiN/TiCN thin film is grown along the (111) orientation. The preferred orientation of TiN/TiCN thin film strongly depends on the TiN buffer layer whose orientation is (111), as is well-known. The TiN/TiCN thin film showed the higher adhesion compared with TiCN single layer because the TiN buffer layer, having good toughness, reduces the effects of the lower hardness of substrate. In the high cycle tension-tension fatigue test, the fatigue life of the TiCN and the TiN/TiCN coated steel increased approximately two to four times and five to nine times respectively compared with uncoated specimens. The TiN buffer layer in multilayer thin films plays an important role in reducing residual stress and fatigue crack initiation, and then in restraining the fatigue propagation.

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Properties of TiN Films Fabricated by Oblique Angle Deposition (빗각 증착으로 제조된 TiN 박막의 특성)

  • Jung, Jae-Hun;Yang, Ji-Hoon;Park, Hye-Sun;Song, Min-A;Jeong, Jae-In
    • Journal of the Korean institute of surface engineering
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    • v.45 no.3
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    • pp.106-110
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    • 2012
  • Oblique angle deposition (OAD) is a physical vapor deposition where incident vapor flux arrives at non-normal angles. It has been known that tilting the substrate changes the properties of the film, which is thought to be a result of morphological change of the film. In this study, OAD has been applied to prepare single and multilayer TiN films by cathodic arc deposition. TiN films have been deposited on cold-rolled steel sheets and stainless steel sheet. The deposition angle as well as substrate temperature and substrate bias was changed to investigate their effects on the properties of TiN films. TiN films were analyzed by color difference meter, scanning electron microscopy, nanoindenter and x-ray diffraction. The color of TiN films was not much changed according to the deposition conditions. The slanted and zigzag structures were observed from the single and multilayer films. The relation between substrate tilting angle (${\alpha}$) and the growth column angle (${\beta}$) followed the equation of $tan{\alpha}=2tan{\beta}$. The indentation hardness of TiN films deposited by OAD was low compared with the ones prepared at normal angle. However, it has been found that $H^3/E^2$ ratio of 3-layer TiN films prepared at OAD condition was a little higher than the ones prepared at normal angle, which can confirm the robustness of prepared films.