• 제목/요약/키워드: Ti deposited glass

검색결과 135건 처리시간 0.026초

Rf Magnetron Sputtering 방법에 의하여 제조된 $(BaSr)TiO_3$ 박막의 구조적, 광학적 특성 고찰 (The Characterization of Structural and Optical Properties for rf Magnetron Sputtered $(BaSr)TiO_3$ Thin Film)

  • 김태송;오명환;김종희
    • 분석과학
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    • 제6권2호
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    • pp.239-246
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    • 1993
  • ITO coated glass, bare glass, 그리고 (100)Si 기판 위에 증착된 $(BaSr)TiO_3$ 박막의 구조는 기판의 종류에 관계없이 변하지 않았으나 결정성은 다결정 ITO층과 (100)Si 기판에 있어서 증대되었다. ITO coated glass 기판 위에 증착된 $(BaSr)TiO_3$ 박막의 조성은 거의 화학양론적으로 일치하였으며 ((Ba+Sr)/Ti=1.08~1.09) 증착 중 상당히 치밀하고 균질하였다. 그러나 증착온도가 증가함에 따라 성장한 박막과 ITO층 사이에, 그리고 ITO층과 base glass 사이에 확산이 보다 심화되었다. ITO coated glass 기판 위에 증착된 $(BaSr)TiO_3$ 박막은 상당히 투명하였으며(투과율 약 80%) 굴절률($n_f$)은 기판온도의 증가에 따라 2.138~2.286이었다.

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반응성 RF 마그네트론 스퍼터링법을 이용하여 MgO 기판위에 증착한 TiO2 박막의 구조와 광촉매 특성 (Structure and Photo-catalytic Activity of TiO2 Films Deposited by Reactive RF Magnetron Sputtering)

  • 이정철;송풍근
    • 한국표면공학회지
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    • 제40권3호
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    • pp.113-116
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    • 2007
  • Titanium dioxide ($TiO_2$) films were deposited by RF reactive magnetron sputtering on non-alkali glass and single crystal MgO (100) substrate at substrate temperature of $400^{\circ}C$. Micro structures of $TiO_2$ films were investigated by XRD, FE-SEM, and Pole figure measurements. $TiO_2$ films deposited on glass substrate showed preferred orientation of anatase (101), whereas $TiO_2$ films deposited on the MgO single crystal substrate showed hetero-epitaxial anatase (100). $TiO_2$ film grown on MgO substrate showed higher photoctalytic activity than that of glass substrate.

화학증착법에 의한 $PbTiO_3$ 박막의 재료 (Fabrication of $PbTiO_3$ Thin Film by Chemical Vapor Deposition Technique)

  • 윤순길;김호기
    • 한국세라믹학회지
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    • 제23권6호
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    • pp.33-36
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    • 1986
  • The $PbTiO_3$is well known materials having remarkable ferroelectric piezoelectric and pyro-electric properties. Thin films of the lead titanite has been successfully fabricated by Chemical Vapor Deposition on the borosilicate glass and titanium substrate. The $PbTiO_3$ thin film deposited on the borosilicate glass using the $PbCl_2$, $TiCl_4$ dry oxygen and wet oxygen at different temperatures (50$0^{\circ}C$-$700^{\circ}C$) grows along the (001) preferred orientation. On the other hand the $PbTiO_3$ thin film deposited on the titanium substrate using the PbO grows along the (101) preferred orientation. Growth orientation of deposited $PbTiO_3$ depends on the reaction species irrespective of substrate materials. Maximum dielectic constant and loss tangent of the $PbTiO_3$ thin film deposited on the titanium substrate are about 90 and 0.02 respectively, . Deposition rates of $PbTiO_3$ deposited on the borosilicate glass and titanium substrate are 10-15 ${\mu}{\textrm}{m}$/hr. Titanium dioxide interlayer formed be-tween $PbTiO_3$ film and titanium substrate material, It improved the adhesion of the film.

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Rf Magnetron Sputtering 방법으로 제조된 $Ba_{1-x}Sr_xTiO_3$ 박막의 구조적 특성에 대한 연구 (A Study on the Structural Properties of rf Magnetron Sputtered $Ba_{1-x}Sr_xTiO_3$ Thin Film)

  • 김태송;오명환;김종희
    • 한국세라믹학회지
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    • 제30권6호
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    • pp.441-448
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    • 1993
  • The Ba1-xSrxTiO3 thin films deposited on ITO-coated glass substrate at 55$0^{\circ}C$ by rf magnetron sputtering method have individual preferential orientations as a function of composition (X=0, 0.25, 0.5, 0.75, 1) due to the stress relief interactions among the intrinsic compressive stress, thermal tensile stress adn extrinsic compressive stress (compressive stress in case of BaTiO3(Tc=12$0^{\circ}C$) and Ba0.75Sr0.25TiO3(Tc=57$^{\circ}C$)). This behavior also appears on the (BaSr)TiO3 thin films (X=0.5) deposited on ITO-coated glass substrate at deposition temperature between 35$0^{\circ}C$ and 55$0^{\circ}C$. The composition of Ba1-xSrxTiO3 thin films deposited on ITO-coated glass substrate at 55$0^{\circ}C$ is close to stoichiometry (1.009~1.089 in A/B ratio), but the compositional deviation from a stoichiometry is larger as SrTiO3 is added. The morphology of Ba1-xSrxTiO3 thin films is very similar for over all substrate temperatures, and the roughness due to the differences of cluster size is the smallest at X=0.25.

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Enhanced Hydrophilic Property of TiO2 Thin Film Deposited on Glass Etched with O2 Plasma

  • Kim, Hwa-Min;Seo, Sung Bo;Kim, Dong Young;Bae, Kang;Sohn, Sun Young
    • Transactions on Electrical and Electronic Materials
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    • 제14권3호
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    • pp.152-155
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    • 2013
  • $TiO_2$ films were deposited on glass substrates with and without $O_2$ plasma etching by using the RF-magnetron sputtering method. We focused on the effect of surface structure on the photoinduced hydrophilic properties of $TiO_2$ films, fabricated on different surface conditions according to the presence or absence of the $O_2$ plasma treatment on glass substrates. The wettability and photoinduced hydrophilic properties of the $TiO_2$ films were investigated according to the changes in water contact angles under UV light irradiations with a very low intensity of 0.1 $mW/cm^2$. The photoinduced hydrophilic properties on the $TiO_2$ formed above the plasma treated glass were also superior to those on the $TiO_2$ formed above the bare glass. This enhanced $TiO_2$ film has been used practically for self cleaning and anti-fogging glasses.

티타늄이 증착된 유리를 사용한 FTO-less 염료감응형 태양전지에 관한 연구 (A Study on FTO-less Dye Sensitized Solar Cell with Ti Deposited Glass)

  • 박송이;서현웅;손민규;김수경;홍나영;송정윤;프라바카르;김희제
    • 전기학회논문지
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    • 제62권2호
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    • pp.208-212
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    • 2013
  • Dye-sensitized solar cells (DSCs) have taken much attention due to their low cost and easy fabrication method compare to silicon solar cells. But research on cost effective DSC is prerequisite for commercialization. Fluorine doped tin oxide (FTO) which have been commonly used for electrode substrate as electron collector occupied most percentage of manufacturing cost. Therefore we studied FTO-less DSC using sputtered Ti deposited glass as photoelectrode instead of FTO to reduce manufacturing cost. Ti films sputtered on the glass for different time, 5 to 20 minutes with decreasing sheet resistance as deposition time increases. A light source illuminated to counter electrode in order to overcome opaque Ti films. The efficiency of DSC (Ti20) made Ti sputtered glass for 20 min as photoelectrode was 5.87%. There are no significant difference with conventional cell despite lower manufacturing cost.

Effect of a TiO2 Buffer Layer on the Properties of ITO Films Prepared by RF Magnetron Sputtering

  • Kim, Daeil
    • Transactions on Electrical and Electronic Materials
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    • 제14권5호
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    • pp.242-245
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    • 2013
  • Sn-doped $In_2O_3$ (ITO) thin films were prepared by radio frequency magnetron sputtering without intentional substrate heating on bare glass and $TiO_2$-deposited glass substrates to investigate the effect of a $TiO_2$ buffer layer on the electrical and optical properties of ITO films. The thicknesses of $TiO_2$ and ITO films were kept constant at 5 and 100 nm, respectively. As-deposited ITO single layer films show an optical transmittance of 75.9%, while $ITO/TiO_2$ bi-layered films show a lower transmittance of 76.1%. However, as-deposited $ITO/TiO_2$ films show a lower resistivity ($9.87{\times}10^{-4}{\Omega}cm$) than that of ITO single layer films. In addition, the work function of the ITO film is affected by the $TiO_2$ buffer layer, with the $ITO/TiO_2$ films having a higher work-function (5.0 eV) than that of the ITO single layer films. The experimental results indicate that a 5-nm-thick $TiO_2$ buffer layer on the $ITO/TiO_2$ films results in better performance than conventional ITO single layer films.

Blocking Layers Deposited on TCO Substrate and Their Effects on Photovoltaic Properties in Dye-Sensitized Solar Cells

  • Yoo, Beom-Hin;Kim, Kyung-Kon;Lee, Doh-Kwon;Kim, Hong-Gon;Kim, Bong-Soo;Park, Nam-Gyu;Ko, Min-Jae
    • Journal of Electrochemical Science and Technology
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    • 제2권2호
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    • pp.68-75
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    • 2011
  • In this review, we have investigated the effect of $TiO_2$-based blocking layers (t-BLs), deposited on a transparent conductive oxide (TCO)-coated glass substrate, on the photovoltaic performance of dye-sensitized solar cells (DSSCs). The t-BL was deposited using spin-coating or sputtering technique, and its thicknesses were varied to study the influence of the thin $TiO_2$ layer in between transparent conducting glass and nanocrystalline $TiO_2$ (nc-$TiO_2$). The DSSC with the t-BL showed the improved adhesion and the suppressed charge recombination at a TCO glass substrate than those without the t-BL, which led to the higher conversion efficiency.

초음파 분무 MOCVD법에 의한 PbTiO$_3$박막의 제조 및 특성 (Preparation and properties of PbTiO$_3$thin films by MOCVD using ultrasonic spraying)

  • 이진홍;김용환;이상희;박병옥
    • 한국결정성장학회지
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    • 제10권3호
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    • pp.205-210
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    • 2000
  • 초음파분무를 이용한 MOCVD법으로 강유전체 $PbTiO_3$박막을 Si(100) wafer와 ITO-coated glass위에 제조하였다 Si 기판 위에 증착된 박막으로부터, 출발원료의 농도비(Ti/Pb)가 1.2일 때, 단일 perovskite 상을 얻을 수 있었다. ITO-coated glass 위에 증착된 박막은 Si기판 위에 제조된 박막보다 박막의 성장속도가 더 빠르며, 기판온도를 $530^{\circ}C$부터 $570^{\circ}C$까지 증가시켰을 때, 결절성과 입자 크기의 증가에 의해 유전상수는 증가하였다. $570^{\circ}C$에서의 유전상수 및 유전손실 값은 각각 205, 0.016을 나타내었다. 기판온도가 $600^{\circ}C$ 이상인 경우, 유전상수가 감소되는 경향을 보였다.

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Adhesion of Human Osteoblasts Cell on TiN Thin Film Deposited by Cathodic Arc Plasma Deposition

  • Pham, Vuong Hung;Kim, Sun-Kyu;Le, Vinh Van;Kwon, Byoung-Se
    • 한국표면공학회지
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    • 제41권6호
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    • pp.264-268
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    • 2008
  • Interaction between human osteoblast and TiN films was conducted in vitro. TiN films were produced by cathodic arc plasma deposition. The surface was characterized by atomic force microscopy (AFM). TiN films, glass substrates and Ti films were cultured with human osteoblasts for 48 and 72 h hours. Actin stress fiber patterns and microtubules of osteoblasts were found slightly more organized and distributed on TiN films compared to those on the Ti films and the glass substrates. Human osteoblasts also showed slightly higher cell attachment, proliferation, and focal contact adhesion on TiN films compared to those on Ti films and glass substrates. Our results demonstrated that TiN films showed slightly better cellular adhesion of osteoblasts than Ti films and glass substrates in a short-time culture period.