Browse > Article
http://dx.doi.org/10.4313/TEEM.2013.14.3.152

Enhanced Hydrophilic Property of TiO2 Thin Film Deposited on Glass Etched with O2 Plasma  

Kim, Hwa-Min (Department of Advanced Energy Material Science & Engineering, Catholic University of Daegu)
Seo, Sung Bo (Department of Electronics Engineering, Catholic University of Daegu)
Kim, Dong Young (Department of Electronics Engineering, Catholic University of Daegu)
Bae, Kang (Department of Electronics Engineering, Catholic University of Daegu)
Sohn, Sun Young (Department of Electronics Engineering, Catholic University of Daegu)
Publication Information
Transactions on Electrical and Electronic Materials / v.14, no.3, 2013 , pp. 152-155 More about this Journal
Abstract
$TiO_2$ films were deposited on glass substrates with and without $O_2$ plasma etching by using the RF-magnetron sputtering method. We focused on the effect of surface structure on the photoinduced hydrophilic properties of $TiO_2$ films, fabricated on different surface conditions according to the presence or absence of the $O_2$ plasma treatment on glass substrates. The wettability and photoinduced hydrophilic properties of the $TiO_2$ films were investigated according to the changes in water contact angles under UV light irradiations with a very low intensity of 0.1 $mW/cm^2$. The photoinduced hydrophilic properties on the $TiO_2$ formed above the plasma treated glass were also superior to those on the $TiO_2$ formed above the bare glass. This enhanced $TiO_2$ film has been used practically for self cleaning and anti-fogging glasses.
Keywords
$TiO_2$; Self cleaning; Hydrophilic; Plasma etching; RF-magnetron sputtering;
Citations & Related Records
연도 인용수 순위
  • Reference
1 Rosenberg I, Brock, Heller AJ, Phys. Chem. 96, 3423 (1997) [DOI:http://dx.doi.org/10.1021/j100187a046]   DOI
2 Mills A, Hunte SLJ, Photochem. Photobiol. A: Chem. 108, 1 (1997) [DOI: http://dx.doi.org/10.1016/S1010-6030(97)00118-4]   DOI   ScienceOn
3 Wang R, Hashimoto K, Fujishima A, Chikuni M, Kojima E, Kitamura A, Shimohigoshi M, Watanabe T, Nature 388, 431 (1997) [DOI: http://dx.doi.org/10.1038/41233]   DOI   ScienceOn
4 Wang R, Hashimoto K, Fujishima A, Chikuni M, Kojima E, Kitamura A, Shimohigoshi M, Watanabe T, Adv Mater. 10, 135 (1998) [DOI: http://dx.doi.org/10.1002/(SICI)1521-4095(199801) 10:2<135::AID-ADMA135>3.0.CO;2-M]   DOI   ScienceOn
5 Sakai N, Wang R, Fujishima A, Watanabe T, Hashimoto K, Langmuir. 14, 5918 (1998) [DOI: http://dx.doi.org/10.1021/la980623e]   DOI   ScienceOn
6 Wang R, Sakai N, Fujishima A, Watanabe T, Hashimoto K, J. Phys. Chem. B. 103, 2188 (1999) [DOI: http://dx.doi.org/10.1021/jp983386x]   DOI   ScienceOn
7 Watanabe T, Nakajima A, Wang R, Minabe, Koizumi S, Fujishima A, Hashimoto K, Thin Solid Films. 351, 260 (1999) [DOI:http://dx.doi.org/10.1016/S0040-6090(99)00205-9]   DOI   ScienceOn
8 Miyauchi M, Nakajima A, Fujishima A, Hashimoto K, Watanabe T, Chem. Mater. 12, 3 (2000) [DOI: http://dx.doi.org/10.1021/cm 990556p]   DOI   ScienceOn
9 Hata S, Kai Y, Yamanaka I, Oosaki H, Hirota K, Yamazaki S, JSAE Rev. 21, 97 (2000) [DOI: http://dx.doi.org/10.1016/S0389-4304(99)00075-2]   DOI   ScienceOn
10 Fujishima A, Hashimoto K, Watanabe T, $TiO_2$ Photo catalyst, Fundamental and Application BKC. 66 (1999)
11 Jiang L, Wang R, Yang B, Li T. J, Tryk D. A, Fujishima A, Hashimoto K, Zhu D. B, Pute Appl. Chem. 72, 73 (2000) [DOI: http://dx.doi.org/10.1351/pac200072010073]   DOI   ScienceOn
12 Montero-Moreno J. M, Sarret M, Muller C, Surrf. Coat. Technol. 201, 6352 (2007) [DOI: http://dx.doi.org/10.1016/j.surfcoat.2006.12.003]   DOI   ScienceOn
13 Honda K, Fujishim A, Nature. 37, 238 (1972) [DOI: http://dx.doi. org/10.1038/238037a0]   DOI   ScienceOn
14 Heller A. Acc. Chem. Res. 28, 141 (1995) [DOI: http://dx.doi.org 0.1021/ar00060a006]   DOI   ScienceOn
15 Linsebigler AL, Lu GQ, Yates JT, Chem. Rev. 95, 735 (1995) DOI:http://dx.doi.org/10.1021/cr00035a013]   DOI   ScienceOn
16 Fujishima A, Hashimoto K, Watanabe T, TiO Photocatalysis-Foundametals and Applications, Bkc. 18 (1999)
17 Kawai T, Sakata T, Nature. 286, 474 (1980) [DOI: http:// dx.doi.org/10.1038/286474a0]   DOI   ScienceOn