Structural Analyses and Properties of $Ti_{1-x}Al_xN$ Films Deposited by PACVD Using a $TiCl_4/AlCl_3/N_2/Ar/H_2$ Gas Mixture
($TiCl_4/AlCl_3/N_2/Ar/H_2$ 반응계를 사용하는 플라즈마화학증착법에 의한 $Ti_{1-x}Al_xN$ 박막의 구조분석 및 물성)
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- Journal of the Korean Ceramic Society
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- v.32 no.7
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- pp.809-816
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- 1995