• 제목/요약/키워드: Thin-film transmission line

검색결과 54건 처리시간 0.024초

Fully Integrated Electromagnetic Noise Suppressors Incorporated with a Magnetic Thin Film on an Oxidized Si Substrate

  • Sohn, Jae-Cheon;Han, S.H.;Yamaguchi, Masahiro;Lim, S.H.
    • Journal of Magnetics
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    • 제12권1호
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    • pp.21-26
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    • 2007
  • Si-based electromagnetic noise suppressors on coplanar waveguide transmission lines incorporated with a $SiO_2$ dielectric layer and a nanogranular Co-Fe-Al-O magnetic thin film are reported. Unlike glass-based devices, large signal attenuation is observed even in the bare structure without coating the magnetic thin film. Much larger signal attenuation is achieved in fully integrated devices. The transmission scattering parameter ($S_{21}$) is as small as -90 dB at 20 GHz at the following device dimensions; the thicknesses of the $SiO_2$ and Co-Fe-Al-O thin films are 0.1 $\mu$m and 1 $\mu$m, respectively, the length of the transmission line is 15 mm, and the width of the magnetic thin film is 2000 $\mu$m. In all cases, the reflection scattering parameter ($S_{11}$) is below -10 dB over the whole frequency band. Additional distributed capacitance formed by the Cu transmission line/$SiO_2$/Si substrate is responsible for these characteristics. It is considered that the present noise suppressors based on the Si substrate are a first important step to the realization of MMIC noise suppressors.

Prototype Electromagnetic-Noise Filters Incorporated with Nano-Granular Co41Fe38Al13O8 Soft Ferromagnetic Thin Films on Coplanar Transmission Lines

  • Sohn, Jae-Cheon;Byun, Dong-Jin
    • 한국세라믹학회지
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    • 제43권2호
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    • pp.74-78
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    • 2006
  • A non-integrated type noise filter on a Coplanar Waveguide (CPW) transmission line is demonstrated by using a highly resistive $Co_{41}Fe_{38}Al_{13}O_8$ nanogranular thin film with the dimensions of $4\;mm (\iota)\times4\;mm(\omega)\times0.1\;{\mu}m(t)$. The noise suppression characteristics are evaluated without placing an insulating layer between the CPW line and the magnetic thin film. The insertion loss is very low being less than 0.3 dB and this low value is maintained up to 2 GHz. At a ferromagnetic resonance frequency of 3.3 GHz, the power loss is very large and the degree of noise attenuation is measured to be 3 dB. This level of noise attenuation is still small for real applications; however, considering the small magnetic volume used in this work, further improvement is expected by simply increasing the magnetic volume and by integrating the magnetic thin film into the CPW transmission line.

실리콘 RFIC 상에서 무선 통신 시스템의 소형화를 위한 마이크로스트립/코프레너 복합구조를 가지는 박막필름 전송선로의 등가회로 및 대역폭에 관한 연구 (Study on Equivalent Circuit and Bandwidth of Short Wavelength Thin-film Transmission Line Employing ML/CPW composite structure for Miniaturization of wireless Communication System on RFIC)

  • 손기준;정장현;김동일;윤영
    • Journal of Advanced Marine Engineering and Technology
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    • 제39권1호
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    • pp.45-51
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    • 2015
  • 본 논문에서는 실리콘 RFIC 상에서 무선 통신 시스템의 소형화에의 응용을 위하여 마이크로스트립/코프레너 복합구조를 가지는 단파장 박막필름 전송선로의 RF특성에 관하여 연구하였다. 마이크로스트립/코프레너 복합구조를 가지는 박막필름 전송선로의 파장은 종래의 코프레너 선로에 비하여 단파장특성을 보여주고 있으며, 특히 10 GHz에서 파장이 6.26 mm로 종래의 코프레너 선로의 60.5 %이다. 또한 본 논문에서는 마이크로스트립/코프레너 복합구조를 가지는 박막필름 전송선로의 등가회로와 대역폭에 관하여 연구를 진행하였다. 등가회로는 단위 셀로 나타냈으며, 상기 등가회로의 각 소자들은 closed-form 수식을 통하여 이론적으로 계산하였다. 측정 결과 0 ~ 30 GHz 범위에서 계산수치와 측정수치가 유사하게 나온 것을 확인 할 수 있었다. 대역폭 계산결과 마이크로스트립/코프레너 복합구조를 가지는 박막필름 전송선로는 차단주파수가 377 GHz 이상의 광대역 특성을 보여주고 있다. 상기 결과들로부터 본 논문에서 제안한 전송선로를 이용하여 광대역 및 초소형 RF 수동소자로써 유용하게 사용될 수 있다는 것을 알 수 있었다.

Basic Study on RF Characteristics of Thin-Film Transmission Line Employing ML/CPW Composite Structure on Silicon Substrate and Its Application to a Highly Miniaturized Impedance Transformer

  • Jeong, Jang-Hyeon;Son, Ki-Jun;Yun, Young
    • Transactions on Electrical and Electronic Materials
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    • 제16권1호
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    • pp.10-15
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    • 2015
  • A thin-film transmission line (TFTL) employing a microstrip line/coplanar waveguide (ML/CPW) was fabricated on a silicon substrate for application to a miniaturized on-chip RF component, and the RF characteristics of the device with the proposed structure were investigated. The TFTL employing a ML/CPW composite structure exhibited a shorter wavelength than that of a conventional coplanar waveguide and that of a thin-film microstrip line. When the TFTL with the proposed structure was fabricated to have a length of ${\lambda}/8$, it showed a loss of less than 1.12 dB at up to 30 GHz. The improvement in the periodic capacitance of the TFTL caused for the propagation constant, ${\beta}$, and the effective permittivity, ${\varepsilon}_{eff}$, to have values higher than those of a device with only a conventional coplanar waveguide and a thin film microstrip line. The TFTL with the proposed structure showed a ${\beta}$ of 0.53~2.96 rad/mm and an ${\varepsilon}_{eff}$ of 22.3~25.3 when operating from 5 to 30 GHz. A highly miniaturized impedance transformer was fabricated on a silicon substrate using the proposed TFTL for application to a low-impedance transformation for broadband. The size of the impedance transformer was 0.01 mm2, which is only 1.04% of the size of a transformer fabricated using a conventional coplanar waveguide on a silicon substrate. The impedance transformer showed excellent RF performance for broadband.

Nano-granular Co-Fe-Al-Q Soft Ferromagnetic Thin Films for RF Electromagnetic-noise Filters

  • Sohn, Jae-Cheon;Byun, Dong-Jin
    • Transactions on Electrical and Electronic Materials
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    • 제7권1호
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    • pp.42-50
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    • 2006
  • Co-Fe-Al-O nano-granular thin films with high electrical resistivity, fabricated by radio frequency magnetron sputtering under an $Ar+O_2$ atmosphere, are found to show good soft magnetic properties in the GHz frequency range. The real part value of the relative permeability is 260 at low frequencies and this value is maintained up to the GHz frequency range. A non-integrated type noise filter on a coplanar waveguide transmission line is demonstrated by using the Co-Fe-Al-O nano-granular thin film with the dimensions of $4\;mm(l){\times}4\;mm(w){\times}0.1\;{\mu}m(t)$. The insertion loss is very low being less than 0.3 dB and this low value is maintained up to 2 GHz. At a ferromagnetic resonance frequency of 3.3 GHz, the degree of noise suppression is measured to be 3 dB. This level of noise attenuation is small for real applications, but there is much room for further improvement by increasing the magnetic volume and integrating the magnetic thin film into the CPW transmission line.

A Finite-element Method Analysis of Electromagnetic Noise Absorption in a Coplanar Transmission Line Integrated with a Magnetic Film

  • Sohn, Jae-Cheon;Han, Suk-Hee;Lim, Sang-Ho
    • Journal of Magnetics
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    • 제11권2호
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    • pp.90-94
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    • 2006
  • A finite-element method is used to analyze loss generation and electromagnetic noise absorption characteristics of a coplanar waveguide transmission line integrated with a magnetic thin film. Parameters used in the analysis are the electrical resistivity of the magnetic layer and the thickness of both magnetic and insulating layers. The results indicate that L-C resonance is the main loss mechanism of the electromagnetic noise absorption.

비정질 산화물 SiZnSnO 반도체 박막의 전기적 특성 분석 (Investigation on Electrical Property of Amorphous Oxide SiZnSnO Semiconducting Thin Films)

  • 변재민;이상렬
    • 한국전기전자재료학회논문지
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    • 제32권4호
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    • pp.272-275
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    • 2019
  • We investigated the electrical characteristics of amorphous silicon-zinc-tin-oxide (a-SZTO) thin films deposited by RF-magnetron sputtering at room temperature depending on the deposition time. We fabricated a thin film transistor (TFT) with a bottom gate structure and various channel thicknesses. With increasing channel thickness, the threshold voltage shifted negatively from -0.44 V to -2.18 V, the on current ($I_{on}$) and field effect mobility (${\mu}_{FE}$) increased because of increasing carrier concentration. The a-SZTO film was fabricated and analyzed in terms of the contact resistance and channel resistance. In this study, the transmission line method (TLM) was adopted and investigated. With increasing channel thickness, the contact resistance and sheet resistance both decreased.

Design of T/R Switch Using LTCC Technology

  • Sim, Sung-Hun;Kang, Chong-Yun;Park, Ji-Won;Yoon, Young-Joong;Kim, hyun-Jai;Park, Hyung-Wook;Yoon, Seok-Jin
    • 한국세라믹학회지
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    • 제40권4호
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    • pp.375-379
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    • 2003
  • In this paper, a novel design of multilayer ceramic-based Transmit/Receive (T/R) switch using Low Temperature Co-fired Ceramic (LTCC) technology have been presented. Compact T/R switch has been designed by transforming quarter-wave transmission line to its lumped equivalent circuit. Especially, high-Q three dimensional inductors with double strip have been proposed and incorporated. The proposed inductor has been modeled by multi-conductor coupled lines. A measured inductor quality factor (Q) of 80 and a Self-Resonance Frequency (SRF) of 6.6 GHz have been demonstrated. The inductor library has been incorporated into the design of WCDMA T/R switch.

Investigation of contact resistance between metal electrodes and amorphous gallium indium zinc oxide (a-GIZO) thin-film transistors

  • Kim, Woong-Sun;Moon, Yeon-Keon;Lee, Sih;Kang, Byung-Woo;Kwon, Tae-Seok;Kim, Kyung-Taek;Park, Jong-Wan
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.546-549
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    • 2009
  • In this paper, we investigated the effects of different source/drain (S/D) electrode materials in thin film transistors (TFTs) based on indium-gallium-zinc oxide (IGZO) semiconductor. A transfer length and effective resistances between S/D electrodes and amorphous IGZO thin-film transistors were examined. Intrinsic TFT parameters were extracted by the transmission line method (TLM) using a series of TFTs with different channel lengths measured at a low drain voltage. The TFTs fabricated with Cu S/D electrodes showed the lowest contact resistance and transfer length indicating good ohmic characteristics, and good transfer characteristics with a field-effect mobility (${\mu}_{FE}$) of 10.0 $cm^2$/Vs.

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Investigation on Contact Resistance of Amorphous Indium Gallium Zinc Oxide Thin Film Transistors with Various Electrodes by Transmission Line Method

  • Lee, Sang Yeol
    • Transactions on Electrical and Electronic Materials
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    • 제16권3호
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    • pp.139-141
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    • 2015
  • Contact resistance of interface between the channel layers and various S/D electrodes was investigated by transmission line method. Different electrodes such as Ti/Au, a-IZO, and multilayer of a-IGZO/Ag/a-IGZO were compared in terms of contact resistance, using the transmission line model. The a-IGZO TFTs with a-IGZO/Ag/a-IGZO of S/D electrodes showed good performance and low contact resistance due to the homo-junction with channel layer.