• Title/Summary/Keyword: Thin/thick film

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A Study on the Dielectric Properties and Electrical Conduction of PVDF Thin Films by Physical Vapor Deposition (진공 증착법으로 제작한 PVDF 박막의 유전 특성과 전기전도도에 대한 연구)

  • Gang, Seong-Jun;Lee, Won-Jae;Jang, Dong-Hun;Yun, Yeong-Seop
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.37 no.5
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    • pp.9-15
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    • 2000
  • The 3 ${\mu}{\textrm}{m}$-thick PVDF (polyvinylidene fluoride) thin film have been prepared using physical vapor deposition with electric field, and its FT-IR spectrum, dielectric property and electric conduction phenomenon have been investigated. Since the characteristic peaks are detected at 509.45 [$cm^{-1}$ /] and 1273.6 [$cm^{-1}$ /]in the FT-IR spectrum, we are confirmed that the $\beta$ -phase is dominant in the PVDF thin film. In the results of dielectric properties, the PVDF thin film shows anomalous dispersion, i.e. gradual decrease of dielectric constant with increase of frequency, and also that the dielectric absorption point changes from 200 Hz to 7000 Hz with increasing temperature of thin film, which is consistent with the Debye's theory. The activation energy ( $\Delta$H) obtained from temperature dependence of dielectric loss is 21.64 ㎉/mole. We confirm that the electric conduction mechanism of PVDF thin film is dominated by ionic conduction by investigating the dependence of the leakage current of the thin film on the temperature and the electric field.

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Li-free Thin-Film Batteries with Structural Configuration of Pt/LiCoO2/LiPON/Cu and Pt/LiCoO2/LiPON/LiCoO2/Cu (Pt/LiCoO2/LiPON/Cu와 Pt/LiCoO2/LiPON/LiCoO2/Cu 구조를 갖는 Li-free 박막전지)

  • Shin, Min-Seon;Kim, Tae-Yeon;Lee, Sung-Man
    • Journal of Surface Science and Engineering
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    • v.51 no.4
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    • pp.243-248
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    • 2018
  • All solid state thin film batteries with two types of cell structure, Pt / $LiCoO_2$ / LiPON / Cu and Pt / $LiCoO_2$ / LiPON / $LiCoO_2$ / Cu, are prepared and their electrochemical performances are investigated to evaluate the effect of $LiCoO_2$ interlayer at the interface of LiPON / Cu. The crystallinity of the deposited $LiCoO_2$ thin films is confirmed by XRD and Raman analysis. The crystalline $LiCoO_2$ cathode thin film is obtained and $LiCoO_2$ as the interlayer appears to be amorphous. The surface morphology of Cu current collector after cycling of the batteries is observed by AFM. The presence of a 10 nm-thick layer of $LiCoO_2$ at the interface of LiPON / Cu enhances the interfacial adhesion and reduces the interfacial resistance. As a result, Li plating / stripping at the interface of LiPON / Cu during charge/discharge reaction takes place more uniformly on Cu current collector, while without the interlayer of $LiCoO_2$ at the interface of LiPON / Cu, the Li plating / stripping is localized on current collector. The thin film batteries with the interlayer of $LiCoO_2$ at the interface of LiPON / Cu exhibits enhanced initial coulombic efficiency, reversible capacity and cycling stability. The thickness of the anode current collector Cu also appears to be crucial for electrochemical performances of all solid state thin film batteries.

Low-temperature Epitaxial Growth of a Uniform Polycrystalline Si Film with Large Grains on SiO2 Substrate by Al-assisted Crystal Growth

  • Ahn, Kyung Min;Kang, Seung Mo;Moon, Seon Hong;Kwon, HyukSang;Ahn, Byung Tae
    • Current Photovoltaic Research
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    • v.1 no.2
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    • pp.103-108
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    • 2013
  • Epitaxial growth of a high-quality thin Si film is essential for the application to low-cost thin-film Si solar cells. A polycrystalline Si film was grown on a $SiO_2$ substrate at $450^{\circ}C$ by a Al-assisted crystal growth process. For the purpose, a thin Al layer was deposited on the $SiO_2$ substrate for Al-assisted crystal growth. However, the epitaxial growth of Si film resulted in a rough surface with humps. Then, we introduced a thin amorphous Si seed layer on the Al film to minimize the initial roughness of Si film. With the help of the Si seed layer, the surface of the epitaxial Si film was smooth and the crystallinity of the Si film was much improved. The grain size of the $1.5-{\mu}m$-thick Si film was as large as 1 mm. The Al content in the Si film was 3.7% and the hole concentration was estimated to be $3{\times}10^{17}/cm^3$, which was one order of magnitude higher than desirable value for Si base layer. The results suggest that Al-doped Si layer could be use as a seed layer for additional epitaxial growth of intrinsic or boron-doped Si layer because the Al-doped Si layer has large grains.

Lubrication Effect of Journal Bearing according to its Eccentricity and Attitude Angle (베어링 편심도와 자세각에 따른 저어널 베어링의 윤활효과)

  • Kim, Jong-Do;Wang, Yi-Jun;Yoon, Moon-Chul
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.14 no.5
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    • pp.88-95
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    • 2015
  • The thickness of adsorbed molecular layers is the most critical factor in studying thin-film lubrication, and it is the most essential parameter that distinguishes thin-film from thick-film lubrication analysis. The thin film between the shaft and bearing surface within a very narrow gap was considered. The general Reynolds equation has been derived for calculating thin-film lubrication parameters affecting the performance of the circular journal bearing. Investigation of the load-carrying capacity and pressure distribution for the journal bearing considering the adsorbed layer thickness has been carried out. A Reynolds equation appropriate for the journal bearing is used in this paper for the analysis, and it is discussed using the finite difference method of the central difference scheme. The parameters, such as eccentricity and attitude angle, are used for discussing the load-carrying capacity of the journal bearing. The results reported in this paper should be applied to analysis of the journal bearing with different lubrication factors. The steady-state analysis of the journal bearing is conducted using the Reynolds model under thin-film lubrication conditions. For a journal bearing, several parameters, such as a pressure, load capacity, and pressure components of the bearing can be obtained, and these results can be stored in a sequential data file for later analysis. Finally, their distribution can be displayed and analyzed easily by using the MATLAB GUI technique. The load-carrying capability of the journal bearing is observed for the specified operating conditions. This work could be helpful for the understanding and research of the mechanism of thin-film lubrication.

Sapphire orientation dependence of the crystallization of ZnO thin films (사파이어 기판의 방향에 따른 ZnO 박막의 결정화 거동)

  • 조태식
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.1036-1038
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    • 2001
  • The sapphire orientation dependence of the crystallization of ZnO thin films has been studied using real-time synchrotron x-ray scattering. The amorphous ZnO thin films with a 2400-${\AA}$-thick were grown on sapphire(110) and sapphire(001) substrates by radio frequency magnetron sputtering at room temperature. The amorphous ZnO films were crystallization into epitaxial ZnO(002) grains both on the sapphire(110) and on the sapphire(001) substrates. The epitaxial quality, such as mosaic distribution and crystal domain size, of the ZnO grains on the sapphire(110) is high, similar to that of the ZnO grains on the sapphire(001). With increasing the annealing temperature to 600$^{\circ}C$, the mosaic distribution and the crystal domain size of ZnO(002) grains in the film normal direction was improved and decreased, respectively.

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Deposition and Electrical Properties of Silicon Nitride Thin Film MIM Capacitors for MMIC Applications (MMIC에 적용되는 MIM 커패시터의 실리콘 질화막 증착과 전기적 특성)

  • 성호근;소순진;박춘배
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.3
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    • pp.283-288
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    • 2004
  • We have fabricated MIM capacitors for MMIC applications, with capacitances as high as 600pF/$\textrm{mm}^2$ and excellent electrical properties of the insulator layer. Silicon nitride thin film is the desirable material for MMIC capacitor fabrication. Standard MIM capacitance in MMIC is 300pF/$\textrm{mm}^2$ with an insulator layer thickness of more than 2000$\AA$. However, capacitors with thin insulator layers have breakdown voltages as low as 20V. We have deposited insulator layers by PECVD in our MIM structure with an air bridge between the top metal and the contact pad. The PECVD process was optimized for fabricating the desired capacitors to be used in MMIC. Silicon nitride(Si$_{x}$N$_{y}$) thin films of about 1000$\AA$ thick show capacitances of about 600pF/$\textrm{mm}^2$, and breakdown voltages above 70V at 100nA.A.A.

Anisotropy Coupling in Patterned Thin Films with Mixed Uniaxial Anisotropies

  • Nam, Yoon Jae;Lee, Tae Young;Lim, Sang Ho
    • Journal of Magnetics
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    • v.19 no.3
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    • pp.232-236
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    • 2014
  • Anisotropy coupling in thin films with mixed induced and shape anisotropies is investigated. A 200-nm-thick Co-Fe-Pd-B thin film with a large induced anisotropy of 57 Oe is fabricated and then patterned into micron-sized cells to provide shape anisotropy, whose strength has a similar magnitude to that of the induced anisotropy for enhancing the anisotropy coupling. The angles between the two mixed anisotropies considered are $0^{\circ}$, $90^{\circ}$, and $110^{\circ}$. Hysteresis loops measured under in-plane magnetic fields along various directions indicate no anisotropy coupling behaviour for all the three angles examined in this study.

안정화 층에 따른 YBCO 박막형 선재의 통전 특성에 관한 연구

  • Du, Ho-Ik;Kim, Min-Ju;Kim, Yong-Jin;Lee, Dong-Hyeok;Han, Byeong-Seong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.214-214
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    • 2009
  • While critical properties of BSCCO wires rely considerably on grid direction upon BSCCO and have very complicated mechanism of generating a superconducting phase, making it difficult to improve properties of wires, YBCO thin-film wires which can be formed in a superconducting phase upon metal board through vapor deposition processing can get excellent direction and reduce manufacturing costs with more flexibility in improving critical properties; thus, they will be suitable for instrument application in the future. Contrary to BSCCO wires for which thick silver alloy covering materials should inevitably be used, moreover, YBCO thin-film wires have an advantage of making thickness and quality of covering materials different by usage. Such a property can be an important element to widen application of wires by presenting possibility of using thin-film wires as superconducting material for fault current limiter as well as for high power current application. In this study we intend to prepare YBCO thin-film wires with different stabilizer layers to analyze current application and current restriction properties by stabilizer layers on the basis of detailed researches on changes in current classification properties below critical value.

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Propagation of Bulk Longitudinal Waves in Thin Films Using Laser Ultrasonics (레이저 초음파를 이용한 체적종파의 박막 내 전파특성 연구)

  • Kim, Yun Young
    • Journal of the Korean Society for Nondestructive Testing
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    • v.36 no.4
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    • pp.266-272
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    • 2016
  • This paper presents the investigation of the propagation behavior of bulk longitudinal waves generated by an ultrafast laser system in thin films. A train of femtosecond laser pulses was focused onto the surface of a 150-nm thick metallic (chromium or aluminum) film on a silicon substrate to excite elastic waves, and the change in thermoreflectance at the spot was monitored to detect the arrival of echoes from the film/substrate interface. The experimental results show that the film material characteristics such as the wave velocity and Young's modulus can be evaluated through curve-fitting in numerical solutions. The material properties of nanoscale thin films are difficult to measure using conventional techniques. Therefore, this research provides an effective method for the nondestructive characterization of nanomaterials.

Ytterbium Test for Water Vapor Transmission Rate Measurement of Passivation Film for Organic Electronics (유기 전자 소자의 봉지막 투습도 분석을 위한 Ytterbium Test)

  • Lim, Young-Ji;Lee, Jae-Hyun
    • Applied Chemistry for Engineering
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    • v.29 no.4
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    • pp.484-487
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    • 2018
  • In this paper, the optical and electrical properties of ytterbium films were studied for water vapor transmission rate (WVTR) analysis of encapsulation films used in organic electronic devices. Ytterbium thin films show a wide range of light transmittance (70-10%) and resistivity ($6.0-0.16m{\Omega}{\cdot}cm$) depending on various film thicknesses (20-100 nm). The Yb thin films were oxidized with moisture and its transmittance and resistance changed in real time. As a result, the WVTR of parylene and aluminum nitride (AlN) laminated thin encapsulation film was measured to be $4.3{\times}10^{-3}g/m^2{\cdot}day$ with the 25 nm thick ytterbium thin film.