• Journal of Korean Ophthalmic Optics Society
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• v.11 no.3
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• pp.173-179
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• 2006

We investigated the change of the blink rate by wearing soft contact lens(SCL). Eight types of soft contact lenses were worn by twelve asymptomatic contact lens wearers. When wearers were worn SCLs for 15 min, the average blink rate was 20.0 blinks/min, which was a statistically significant increase compared to 13.3 blinks/min, the average blink rate of non-SCL-worn eye. After 8 hr of lens wear, the average blink rate was 24.3 blinks/min, and it was 11 blinks/min more than that of non-SCL-worn eye and 4 blinks/min more than that of 15 min SCL-worn eye. There were a little difference of the blink rate in types of lens, which the blink rate range of all lens after 15 min of lens wear was 18.1~20.9 blinks/min and that after 8 hr of lens wear was 22.9~24.9 blinks/min. When wearing A lens(vifilcon, 0.06 mm) having thin center thickness, wearers showing difference of 10.0~11.9 blinks/min between non-SCL-worn eye and 15 min SCL-worn eye reached 16.7% and it was more than that of relatively thick B lens(0.17 mm) and C lens(0.14 mm). This result suggest that the center thickness was not unique factor of the blink rate change and other factors would have synthetically influence on the blink rate change. In the case of B lens and C lens of hilafilcon material but having different center thickness and water content, wearers increasing more than 4.0 blinks/min after 8 hr of lens wear was 58.3% and 41.7%, respectively. This result have provided information that the lenses of similar materials but different center thickness and water content could cause individually the different change of the blink rate.

• Journal of Korean Ophthalmic Optics Society
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• v.4 no.2
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• pp.65-71
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• 1999

The optical absorption spectrum was measured of the tinted powder, tinted solution and tinted lens in the visible regions. The tinted powder was very different with color of tinted lens that the optical absorptions was so higher, composed of the thick-gray color. The optical absorptions of tinted solution were just a little appeared by the energy split of a transition metal ion, so constructed with each color space. The optical absorptions of the tinted lens were appeared with the energy split peaks to a transition metal ion, so its were affected by the color constructions. The optical absorption peaks of each lens were depend on the tinted time. Blue color lens had a lot of absorption in the short wavelength regions than 500nm, and had a little appeared in the high wavelength regions than 500nm. In case of a yellow color, the optical absorptions were appeared quite contrary to the blue color, so these colors had the opponent-colors each other. In case of green color, the optical absorptions had a high in the both edges, had a low in the middle regions. In the pink color, by the optical absorptions form of quite contrary to the green color it, these colors had the opponent-colors each other. In the brown color, the optical absorptions had a maximum values in the short wavelength regions, and it gradually decreased goes by the long wavelength regions.

• Journal of the Korean Society of Radiology
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• v.18 no.3
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• pp.283-292
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• 2024

Radiation side effects and complications on the ocular adnexa during electron beam therapy for orbital lymphoma can increase the incidence of posterior subcapsular cataracts. This study simulated a medical linear accelerator and a mathematical model of the eye using monte carlo simulations to evaluate the dose to the ocular adnexa and compare the shielding effectiveness on different parts of the ocular adnexa based on lens shield thickness. The dose assessment results of the ocular adnexa showed that the lens's sensitive area had the highest absorbed dose distribution when no shield was used, followed by the lens's non-sensitive area, the anterior chamber, vitreous humor, cornea, and eyelid in descending order. With the use of a shield, a 2 mm thick shield demonstrated a dose reduction effect of over 90% in the lens's sensitive area, over 83% in the non-sensitive area and anterior chamber, and a dose reduction effect of 30 to 62% in the vitreous body, cornea, and eyelid. For dose reduction in the lens's sensitive area during electron beam therapy for orbital lymphoma, it is necessary to use a shield of at least 2 mm thickness. Additionally, shielding strategies considering the thickness and area of the shield for other ocular adnexa besides the lens are required.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.23 no.3
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• pp.245-249
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• 2010

Two dimensional(2D) pair-photonic crystals (pair-PCs) have been fabricated by a multiple-exposure nanosphere lithography (MENSL) method using the self-assembled nanospheres as lens-mask patterns and the collimated laser beam as a multiple-exposing source. The arrays of the 2D pair-PCs exhibited variable lattice structures and shape the control of rotating angle (${\Theta}$), tilting angle (${\gamma}$) and the exposure conditions. In addition, the base period or filling factor of pair-PCs as well as their shapes could be changed by experimental conditions and nanosphere size. A 1.18-${\mu}m$-thick resist was spincoated on Si substrate and the multiple exposure was carried out at change of ${\gamma}$ and ${\Theta}$. Images of prepared 2D pair-PCs were observed by SEM. We believe that the MENSL method is a suitable useful tool to realize the pair-periodic arrays of large area.

• Transactions of Materials Processing
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• v.20 no.5
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• pp.333-338
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• 2011

Rapidly developing IT technologies in recent years have raised the demands for high-precision optical lenses used for sensors, digital cameras, cell phones and optical storage media. Many techniques are required to manufacturing high-precision optical lenses, including multi-beam sensing lenses investigated in the current study. In the case of injection molding for thick lenses, a shrinkage phenomenon often occurs during the process. This shrinkage is known to be the main reason for the lower optical quality of the lenses. In the present work, a CAE analysis was conducted simultaneously with experiments to understand and minimize this phenomenon. In particular, the sectional area of a gate was varied in order to understand the effects of packing and cooling processes on the final shrinkage pattern. As a result of this study, it was demonstrated that a dramatic reduction of the shrinkage could be obtained by increasing the width of the gate.

• Journal of the Korean Society for Precision Engineering
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• v.21 no.8
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• pp.89-96
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• 2004

Micro-tensile testing system, consisting of a micro tensile loading system and micro-ESPI(Electronic Speckle Pattern Interferometry) system, has been developed for measurement of micro-tensile properties of thin micro-materials. Micro-tensile loading system had a load cell with the maximum capacity of 50N and micro actuator with resolution of 4.5nm in stroke. The system was used to apply a tensile load to the micro-sized specimen. During tensile loading, the micro-ESPI system acquired interferornetric speckle patterns in the deformed specimen and measured the in-plane tensile strain. The ESPI system consisted of a CCD-camera with a lens and the window-based program developed for this experiment. Using this system, stress-strain curves for 4 kinds of electrolytic copper foil 18$\square$m thick were obtained. From these curves, tensile properties, including the elastic modulus. yielding strength and tensile strength, were determined and also values of the plastic exponent and coefficient based on Ramberg-Osgood relationship were evaluated.

• Journal of the Optical Society of Korea
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• v.19 no.2
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• pp.144-148
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• 2015

An alternative description for the Gaussian image plane (GIP) of an optical system for a given object is presented, which applies to both aberration-free and non-aberration-free systems. We extend the definition of transverse magnification (TM) to the image plane (IP) displaced from the GIP and find that the TM depends linearly on the locations of both an aperture stop placed in front of the system and the IP. Hence, we redefine the GIP as the location at which the slope of the TM variance changes sign. The definition is deterministic and self-consistent and, therefore, no other parameters or measurements are needed. The derivation of this definition using a set of paraxial ray tracings and supporting experimental data for a thick bi-convex lens system is presented.

• Applied Microscopy
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• v.28 no.3
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• pp.363-377
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• 1998

After the investigation on the eye of Incilaria fruhstorieri with light and electron microscopes, the following results were obtained. The eye of Incilaria fruhstorferi comprises cornea, lens, vitreous body, retina, and optic nerve inward from the outside. Cornea is composed of squamous, cuboid, columnar and irregular cells, which appear to be light due to their low electron density. In their cytoplasms, glycogen granules, multivesicular body, and nucleus were observed. Vitreous body, located behind non-cellular transparent lens, is filled with long and short microvilli protruding from the retinal epithelia. Retinal epithelium, the organ to perceive objects, is divided into four parts; microvillar layer pigment layer, nuclear layer, and neutrophils layer, from the apical portion. Microvillar layer consists of the type-I photoreceptor cells and pigmented granule cells. In the apical portion of their cytoplasms, long microvilli (length, $19{\mu}m$) , short microvilli (length, $8{\mu}m$), and rolled microvilli grow thick in the irregular and mixed forms. Photoreceptor cells are classified into type-I and type-II, according to their structures. The type-I cell has the apical portion rising roundly like a fan and the lower part which looks like the helve of a fan. In the cytoplasm of the apical portion, there are clear vesicles, cored vesicles, ovoid mitochondria, and microfilaments, and in the cytoplasm of the lower part, photic vesicles with their diameters about 60nm aggregate densely. The type-II photoreceptor cell, located at the lower end of the type-I cells, has a very large ovoid nucleus 3nd no microvilli. In the cytoplasm of the type-II cell, the photic vesicles with sizes 60nm aggregate more densely than in the cytoplasm of the type-I cell. Pigmented cells are classified into type-A and type-B, according to their structures. The type-A is identified to be a large cell containing round granules (diameter, $0.5{\mu}m$) of very high electron density, while the type-B is identified as a small cell where the irregular granules (diameter, $0.6{\mu}m$) of a little lower electron density amalgamate. Nuclear layer ranges from the bottom of pigment layer to the top of the capsule, and contains three kinds of nuclei (nuclei of the type-II photoreceptor cell, pigmented granule cell, and accessory neuron). The capsules covering the outmost part of the eyeball are composed of collagenous fiber and three longitudinal muscle layers (the thickness of each longitudinal muscle layer, $0.4{\mu}m$) and thick circular muscle layer (thickness, $0.3{\mu}m$). Around the capsules, there is a neurophile layer consisting of neurons and nerve fibers. Each neuron has a relatively large ovoid nucleus for its cytoplasm, and in the karyosome, large lumps of keterochromatin form a wheel nucleus.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.380-381
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• 2012

Bioinspired sea urchin-like structures were fabricated on silicon by inductively coupled plasma (ICP) etching using lens-like shape hexagonally patterned photoresist (PR) patterns and subsequent metal-assisted chemical etching (MaCE) [1]. The lens-like shape PR patterns with a diameter of 2 ${\mu}m$ were formed by conventional lithography method followed by thermal reflow process of PR patterns on a hotplate at $170^{\circ}C$ for 40 s. ICP etching process was carried out in an SF6 plasma ambient using an optimum etching conditions such as radio-frequency power of 50 W, ICP power of 25 W, SF6 flow rate of 30 sccm, process pressure of 10 mTorr, and etching time of 150 s in order to produce micron structure with tapered etch profile. 15 nm thick Ag film was evaporated on the samples using e-beam evaporator with a deposition rate of 0.05 nm/s. To form Ag nanoparticles (NPs), the samples were thermally treated (thermally dewetted) in a rapid thermal annealing system at $500^{\circ}C$ for 1 min in a nitrogen environment. The Ag thickness and thermal dewetting conditions were carefully chosen to obtain isolated Ag NPs. To fabricate needle-like nanostructures on both the micron structure (i.e., sea urchin-like structures) and flat surface of silicon, MaCE process, which is based on the strong catalytic activity of metal, was performed in a chemical etchant (HNO3: HF: H2O = 4: 1: 20) using Ag NPs at room temperature for 1 min. Finally, the residual Ag NPs were removed by immersion in a HNO3 solution. The fabricated structures after each process steps are shown in figure 1. It is well-known that the hierarchical micro- and nanostructures have efficient light harvesting properties [2-3]. Therefore, this fabrication technique for production of sea urchin-like structures is applicable to improve the performance of light harvesting devices.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.3 s.180
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• pp.156-162
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• 2006

Direct fabrication of nano patterns has been studied employing a nano-stereolithography (NSL) process. The needs of nano patterning techniques have been intensively increased for diverse applications for nano/micro-devices; micro-fluidic channels, micro-molds. and other novel micro-objects. For fabrication of high-aspect-ratio (HAR) patterns, a thick spin coating of SU-8 process is generally used in the conventional photolithography, however, additional processes such as pre- and post-baking processes and expansive precise photomasks are inevitably required. In this work, direct fabrication of HAR patterns with a high spatial resolution is tried employing two-photon polymerization in the NSL process. The precision and aspect ratio of patterns can be controlled using process parameters of laser power, exposure time, and numerical aperture of objective lens. It is also feasible to control the aspect ratio of patterns by truncation amounts of patterns, and a layer-by-layer piling up technique is attempted to achieve HAR patterns. Through the fabrication of several patterns using the NSL process, the possibility of effective patterning technique fer various N/MEMS applications has been demonstrated.