• 한국진공학회지
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• 제10권4호
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• pp.396-402
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• 2001

전자빔 증착기를 이용하여 1000 $\AA$의 두께를 가진 MgO박막을 구리 기판위에 상온에서 증착하였다. 스퍼터링수율 측정시 MgO 층에 충전현상을 없애주기 위해서 1000 $\AA$ 두께의 Al을 증착하였다. 갈륨 액체금속을 집속이온빔 이온원으로 사용하였다. 두 개의 정전렌즈를 사용하여 이온빔을 집속하였고, MgO에 이온빔을 주사하기 위해 편향기를 사용하였다. 가속전압의 변화에 따라 시료대 전류와 이차입자 전류를 측정하였고, 이 전류값은 소스에 인가하는 가속전압에 따라 변화되었다 MgO 박막의 스퍼터링 수율은 분석된 시료대 전류, 이차입자 전류 및 순수빔 전류의 값을 사용하여 결정하였다. 집속이온빔 장치의 가속전압이 15 kV일 때 MgO 박막의 스퍼터링 수율은 0.30으로 나왔고 가속전압의 값이 증가할 때 스퍼터링 수율이 선형적으로 증가하였다. 이러한 결과를 볼 때 집속이온빔 장치를 이용하면 MgO 박막의 스퍼터링 수율을 측정할 패 매우 효과적임을 알 수 있다.

• 한국재료학회지
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• 제11권7호
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• pp.599-602
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• 2001

전도성 고분자인 poupyrrole과 polyaniline을 이용하여 센서를 제조하고 휘발성 유기화합물에 대한감응특성 및 감지막의 물성을 조사하여 지금까지 알려지지 않은 감응 기구를 설명하고자 하였다. Polypyrrole과 polyaniline은 두께가 얇은 경우가 두꺼운 경우보다 감도가 높았으며, 1분간 도펀트를 제거한 센서가 가장 높은 감도를 나타내었다. 또한 두 가지 센서 모두 극성이 강한 분자가 흡착될수록 감도가 증가하였는데, 이는 극성을 갖는 분자가 감지막 내부로 침투하여 polaron 및 자유 carrier를 고착시키거나 추가의 자유 carrier를 형성하여 전도도에 변화를 주기 때문인 것으로 판단된다.

• 한국재료학회지
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• 제4권6호
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• pp.662-668
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• 1994

실리콘 질화막을 습식 산화하여 제작한 산화막/질화막 복합층과 이 박막의 산화막을 식각하여 제작한 oxynitride 박막의 물리적, 전기적 특성을 기술하였다. $900^{\circ}C$에서 산화시간이 증가함에 따라 산화막/질화막의 경우에는 축전용량은 급격히 감소하였으나 절연 파괴전장은 증가하였다. Oxynitrite박막은 축전용량과 절연파괴 전장이 모두 증가하였다. Oxynitride박막의 경우 축전 용량의 증가와 절연 파괴 전장이 증가하였는데 이는 유효 주께 감소와 박막의 양질화에 기인하였다. 또한, 산화 시강의 증가에 따라 Oxynitride박막의 TDDB특성과 초기 불량율도 향상되었다. 결론적으로 Oxynitride박막은 dynamic기억소자의 유전체 박막으로 사용하기에 적합하였다.

• 한국전기전자재료학회논문지
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• 제24권7호
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• pp.589-593
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• 2011

[ $SnO_2$ ]nano powders were prepared by solution reduction method using tin chloride($SnCl_2{\cdot}2H_2O$), hydrazine($N_2H_4$) and NaOH. The $SnO_2$ thick films for gas sensors were fabricated by screen printing method on alumina substrates and annealed at $300^{\circ}C$ in air, respectively. XRD patterns of the $SnO_2$ nano powders showed the tetragonal structure with (110) dominant orientation. The particle size of $SnO_2$ nano powders at the ratio of $SnCl_2:N_2H_4$+NaOH= 1:6 was about 60 nm. The sensing characteristics were investigated by measuring the electrical resistance of each sensor in a test box. Sensitivity of $SnO_2$ gas sensor to 5 ppm $CH_4$gas and 5 ppm $CH_3CH_2CH_3$ gas was investigated for various $SnCl_2:N_2H_4$+NaOH proportion. The highest sensitivity to $CH_4$ gas and $CH_3CH_2CH_3$ gas of $SnO_2$ sensors was observed at the $SnCl_2:N_2H_4$+NaOH= 1:8 and $SnCl_2:N_2H_4$+NaOH= 1:6, respectively. Response and recovery times of $SnO_2$ gas sensors prepared by $SnCl_2:N_2H_4$+NaOH= 1:6 was about 40 s and 30 s, respectively.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 춘계학술대회 논문집 센서 박막재료연구회 및 광주 전남지부
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• pp.45-49
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• 2008

Polyethylene is widely used as the insulator for power cable. To investigate the conduction mechanism for power cable insulation under ac high field, it is very important to acquire the dissipation current under actual running field. Recently, we have developed the unique system, which make possible to observe the nonlinear dissipation current waveform. In this system, to observe the nonlinear properties with high accuracy, capacitive current component is canceled by using inverse capacitive current signal instead of using the bridge circuit for canceling it. We have already reported that the dissipation currents of $40\;{\mu}m$ thick LDPE film at 10 kV/mm and over 140 Hz, it starts to show nonlinearity and odd number's harmonics were getting large. To investigate the conduction mechanis ms in this region, especially space charge effect, various kinds of estimation, such as time variations of instantaneous resistivity for one cycle, FFT spectra of dissipation current waveforms and so on, has been examined. As the results of these estimations, it was found that the dissipation current will depend on not only the instantaneous value of electric field but also the time differential of applied electric field due to taking a balance between applied field and internal field. Furthermore, two large peaks of dissipation current for each half cycle were observed under certain condition. In this paper, to clarify the reason why it shows two peaks for each half cycle, the film thickness dependences of dissipation current waveforms were observed by using the three different thickness LDPE films.

• 한국초전도학회:학술대회논문집
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• 한국초전도학회 1999년도 High Temperature Superconductivity Vol.IX
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• pp.388-391
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• 1999

Well oriented Bi2212 superconductor thick films were formed successfully on a copper substrate by liquid reaction between a Cu-free precursor and Cu tape method in which Cu-free BSCO powder mixture was' printed on copper plate and heat-treated. And we examined the effect of heat-treatment atmosphere for the superconducting properties and microstructure of Bi2212. The composition of Cu-free BSCO powder mixture was Bi$_2O_3$ : SrCO$_3$ : CaCO$_3$ = 1.2~2 : 1 : 1 and the heat-treatment for the superconducting formation reaction was performed in air, oxygen, nitrogen and low oxygen pressure. At heat-treatment temperature, the printing layer partially melt by reacting with CuO of the oxidizing copper plate, and the nonsuperconducting phases present in the melt are typically Bi-free phases and Cu-free phases. Among the nonsuperconducting phases, it is known that the (Sr,Ca)CuO$_3$ phase restrain the formation of the Bi2212 superconducting phase. Because a kind of the nonsuperconducting phases is controled by the oxygen partial pressure, the optimum condition in which the remnants of the second phases don't leave in the fully processed conductor was determined by XRD and the critical tempera to re (Tc) analysis.

• 한국재료학회지
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• 제13권5호
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• pp.279-284
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• 2003

The $CoSi_2$ process is widely employed in a salicide as well as an ohmic layer process. In this experiment, we investigated the characteristics of $CoSi_2$ films by combinations of I-type (TiN 100$\AA$/Co 150$\AA$), II-type(TiN 100$\AA$/Co 150$\AA$/Ti 50$\AA$), III-type(Ti 100$\AA$/Co 150$\AA$/Ti 50$\AA$), and IV-type(Ti 100$\AA$/Co 150$\AA$/Ti 100$\AA$). Sheet resistances of $CoSi_2$ show the lowest resistance with 2.9 $\Omega$/sq. in a TiN/Co condition and much higher resistances in conditions simultaneously applying Ti capping layers and Ti interlayers. Though we couldn't observe a $CoSi_2$roughness dependence on the film stacks from RMS values, Ti capping layers turned into 78∼94$\AA$ thick TiN layers of (200) preferred orientation at $N_2$ambient. In addition, Ti interlayers helped to form the epitaxial $CoSi_2$with (200) preferred orientation and ternary compounds of Co-Ti-Si. We propose that film structures of II-type and III-type may be appropriate in the salicide process and the ohmic layer process from the viewpoint of Co diffusion kinetics and the CoSi$_2$epitaxy.

• 한국재료학회지
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• 제18권7호
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• pp.379-383
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• 2008

We report on the light-emitting diode (LED) characteristics of core-shell CdSe/ZnS nanocrystal quantum dots (QDs) embedded in $TiO_2$thin films on a Si substrate. A simple p-n junction could be formed when nanocrystal QDs on a p-type Si substrate were embedded in ${\sim}5\;nm$ thick $TiO_2$ thin film, which is inherently an n-type semiconductor. The $TiO_2$ thin film was deposited over QDs at $200^{\circ}C$ using plasma-enhanced metallorganic chemical vapor deposition. The LED structure of $TiO_2$/QDs/Si showed typical p-n diode currentvoltage and electroluminescence characteristics. The colloidal core-shell CdSe/ZnS QDs were synthesized via pyrolysis in the range of $220-280^{\circ}C$. Pyrolysis conditions were optimized through systematic studies as functions of synthesis temperature, reaction time, and surfactant amount.

• ETRI Journal
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• 제26권4호
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• pp.315-320
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• 2004

This paper proposes a 10-${\mu}m$ thick oxide layer structure that can be used as a substrate for RF circuits. The structure has been fabricated using an anodic reaction and complex oxidation, which is a combined process of low-temperature thermal oxidation (500 $^{\circ}C$ for 1 hr at $H_2O/O_2$) and a rapid thermal oxidation (RTO) process (1050 ${\circ}C$, for 1 min). The electrical characteristics of the oxidized porous silicon layer (OPSL) were almost the same as those of standard thermal silicon dioxide. The leakage current density through the OPSL of 10 ${\mu}m$ was about 10 to 50 $nA/cm^2$ in the range of 0 to 50 V. The average value of the breakdown field was about 3.9 MV/cm. From the X-ray photo-electron spectroscopy (XPS) analysis, surface and internal oxide films of OPSL prepared by a complex process were confirmed to be completely oxidized. The role of the RTO process was also important for the densification of the porous silicon layer (PSL) oxidized at a lower temperature. The measured working frequency of the coplanar waveguide (CPW) type short stub on an OPSL prepared by the complex oxidation process was 27.5 GHz, and the return loss was 4.2 dB, similar to that of the CPW-type short stub on an OPSL prepared at a temperature of 1050 $^{\circ}C$ (1 hr at $H_2O/O_2$). Also, the measured working frequency of the CPW-type open stub on an OPSL prepared by the complex oxidation process was 30.5 GHz, and the return was 15 dB at midband, similar to that of the CPW-type open stub on an OPSL prepared at a temperature of $1050^{\circ}C$ (1 hr at $H_2O/O_2$).

• 한국식품과학회지
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• 제31권5호
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• pp.1171-1177
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• 1999

쌀전분으로부터 분리한 아밀로오스와 아밀로펙틴이겔을 형성할 수 있는 최저농도로 아밀로오스와 아밀로펙틴 혼합겔을 제조하여 주사전자현미경과 X-선 회절기를 이용하여 겔 구조를 관찰하였다. 겔을 형성할 수 있는 최저농도인 용해성 아밀로오스 1.08% 농도에 아밀로펙틴을 $1.5%{\sim}7%$ 첨가하면 겔 그물망구조가 잘 형성되었고, 아밀로펙틴을 2%와 3% 첨가한 겔은 저장에 따라 $2{\theta}\;=\;17.0^{\circ}$에서 피크가 커졌다. 15% 아밀로오스/아밀로펙틴 혼합겔을 저장했을 때 아밀로오스 함량이 높을수록 단단하고 안정된 그물망구조를 이루었으며 생전분에서의 겔형성 양상과는 달리 아밀로오스와 아밀로펙틴이 함께 겔메트릭스를 이루는데 참여하는 것으로 생각되었고, 아밀로오스 함량이 증가할수록 $2{\theta}\;=\;17.0^{\circ}$에서 피크의 크기와 결정강도는 커졌다.