• 제목/요약/키워드: Thermal threshold

검색결과 294건 처리시간 0.025초

미세 팁 기판 위에 전기영동법으로 성장시킨 탄소 나노튜브의 전계방출 특성 (Field emission properties of carbon nanotubes grown on micro-tip substrates using an electrophoretic deposition method)

  • 장한빛;노영록;김종필;박진석
    • 반도체디스플레이기술학회지
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    • 제9권4호
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    • pp.7-12
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    • 2010
  • Field-emission characteristics of carbon nanotubes(CNTs), which were grown on conical-type tungsten micro-tips by using an electrophoretic deposition(EPD) method, were examined. The EPD method proved to be convenient to manipulate and arrange CNTs from well dispersed suspensions onto such tip-type substrates. The growth rate of CNTs was proportional to the applied d.c. bias voltage and the process time. It was observed from the Raman study that the EPDproduced CNTs showed better crystal qualities with the Raman intensity ratio( $I_D$/$I_G$) of 0.41-0.42 than the CVD-produced CNTs and their crystal qualities could be further improved by thermal annealing. The electron emitters based on the EPDCNTs showed excellent field emission properties, such as the threshold voltage for electron emission of about 620 V and the maximum emission current of about 345 ${\mu}A$. In addition, the EPD-CNTs exhibited the stable long-term(up to 40 h) emission capability and the emission stability was enhanced by thermal annealing.

A Clustering-Based Fault Detection Method for Steam Boiler Tube in Thermal Power Plant

  • Yu, Jungwon;Jang, Jaeyel;Yoo, Jaeyeong;Park, June Ho;Kim, Sungshin
    • Journal of Electrical Engineering and Technology
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    • 제11권4호
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    • pp.848-859
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    • 2016
  • System failures in thermal power plants (TPPs) can lead to serious losses because the equipment is operated under very high pressure and temperature. Therefore, it is indispensable for alarm systems to inform field workers in advance of any abnormal operating conditions in the equipment. In this paper, we propose a clustering-based fault detection method for steam boiler tubes in TPPs. For data clustering, k-means algorithm is employed and the number of clusters are systematically determined by slope statistic. In the clustering-based method, it is assumed that normal data samples are close to the centers of clusters and those of abnormal are far from the centers. After partitioning training samples collected from normal target systems, fault scores (FSs) are assigned to unseen samples according to the distances between the samples and their closest cluster centroids. Alarm signals are generated if the FSs exceed predefined threshold values. The validity of exponentially weighted moving average to reduce false alarms is also investigated. To verify the performance, the proposed method is applied to failure cases due to boiler tube leakage. The experiment results show that the proposed method can detect the abnormal conditions of the target system successfully.

반도체형 열중성자 선량 측정센서 개발 (The development of a thermal neutron dosimetry using a semiconductor)

  • 이남호;김양모
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2003년도 학술회의 논문집 정보 및 제어부문 B
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    • pp.789-792
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    • 2003
  • pMOSFET having 10 ${\mu}um$ thickness Gd layer has been tested to be used as a slow neutron sensor. The total thermal neutron cross section for the Gd is 47,000 barns and the cross section value drops rapidly with increasing neutron energy. When slow neutrons are incident to the Gd layer, the conversion electrons are emitted by the neutron absorption process. The conversion electrons generate electron-hole pairs in the $SiO_2$ layer of the pMOSFET. The holes are easily trapped in Oxide and act as positive charge centers in the $SiO_2$ layer. Due to the induced positive charges, the threshold turn-on voltage of the pMOSFET is changed. We have found that the voltage change is proportional to the accumulated slow neutron dose, therefore the pMOSFET having a Gd nuclear reaction layer can be used for a slow neutron dosimeter. The Gd-pMOSFET were tested at HANARO neutron beam port and $^{60}CO$ irradiation facility to investigate slow neutron response and gamma response respectively. Also the pMOSFET without Gd layer were tested at same conditions to compare the characteristics to the Gd-pMOSFET. From the result, we have concluded that the Gd-pMOSFET is very sensitive to the slow neutron and can be used as a slow neutron dosimeter. It can also be used in a mixed radiation field by subtracting the voltage change value of a pMOSFET without Gd from the value of the Gd-pMOSFET.

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레이저를 이용한 폴리머 탄화현상 해석 및 LCD 제조공정에서의 응용 (Analysis of Polymer Carbonization using Lasers and its Applications for LCD Manufacturing Process)

  • 안대환;박병구;김동언;김동식
    • 한국정밀공학회지
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    • 제27권6호
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    • pp.24-31
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    • 2010
  • Laser carbonization of a polymer layer can be employed in various applications in the microelectronics industry, e.g repairing brightness pixels of an LCD panel. In this work, the process of thermal degradation of LCD color filter polymer by various laser sources with pulsewidths from CW to fs is studied. LCD pixels are irradiated by the lasers and the threshold irradiance of LCD color filter polymer carbonization is experimentally measured. In the numerical analysis, the transient temperature distribution is calculated and the number density of carbonization in the polymer layer is also estimated. It is shown that all the lasers can carbonize the polymer layers if the output power is adjusted to meet the thermal conditions for polymerization and that pulsed lasers can result in more uniform distribution of temperature and carbonization than the CW laser.

Bi2O3-Al2O3-SiO2 유리의 열물성과 내플라즈마 특성 연구 (A Study on the Thermal Properties and Plasma Resistance of Bi2O3-Al2O3-SiO2 Glass)

  • 변영민;최재호;임원빈;김형준
    • 반도체디스플레이기술학회지
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    • 제22권1호
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    • pp.64-71
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    • 2023
  • In this study, we investigated the effects of BiAlSiO glass composition on its glass forming range, thermal properties, and plasma resistance. The results showed that increasing the Al2O3 content suppressed the tendency for crystallization and hindered glass formation beyond a certain threshold. Bi2O3 was found to increase the content of non-bridging oxygen, resulting in a decrease in glass transition temperature and an increase in thermal expansion coefficient. Furthermore, the etching rate was found to improve with increasing Al2O3 content but decrease with increasing SiO2 content. It was concluded that the boiling point of fluorinated compounds should be considered to 900℃. Therefore, this study is expected to contribute to the understanding of the properties of BiAlSiO glass and its application to low temperature melting PRG compositions.

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저온 중수소 어닐링을 활용한 Enclosed-Layout Transistors (ELTs) 소자의 제작 및 전기적 특성분석 (Fabrication of Enclosed-Layout Transistors (ELTs) Through Low-Temperature Deuterium Annealing and Their Electrical Characterizations)

  • 왕동현;김동호;길태현;연지영;김용식;박준영
    • 한국전기전자재료학회논문지
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    • 제37권1호
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    • pp.43-47
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    • 2024
  • The size of semiconductor devices has been scaled down to improve packing density and output performance. However, there is uncontrollable spreading of the dopants that comprise the well, punch-stop, and channel-stop when using high-temperature annealing processes, such as rapid thermal annealing (RTA). In this context, low-temperature deuterium annealing (LTDA) performed at a low temperature of 300℃ is proposed to reduce the thermal budget during CMOS fabrication. The LTDA effectively eliminates the interface trap in the gate dielectric layer, thereby improving the electrical characteristics of devices, such as threshold voltage (VTH), subthreshold swing (SS), on-state current (ION), and off-state current (IOFF). Moreover, the LTDA is perfectly compatible with CMOS processes.

Pseudo-MOSFET을 이용한 SiGe-on-SOI의 Ge 농도에 따른 기판의 특성 평가 및 열처리를 이용한 전기적 특성 개선 효과 (Evaluation of SGOI wafer with different concentrations of Ge using pseudo-MOSFET)

  • 박군호;정종완;조원주
    • 한국진공학회지
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    • 제17권2호
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    • pp.156-159
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    • 2008
  • Pseudo-MOSFET 방법을 이용하여 Ge농도에 따른 SiGe-on-Insulator(SGOI) 기판의 특성을 평가하였다. SGOI 기판은 compressive-SiGe / Relaxed-Si / Buried oxide / Si-substrate 구조로 SOI 기판 위에 에피택셜 성장법으로 SiGe층을 형성하였으며 compressive SiGe층의 Ge 농도는 각각 16.2%, 29.7%, 34.3%, 56.5% 이다. 실험결과 Ge 농도가 증가함에 따라 누설전류가 증가하는 특성을 보였으며 threshold voltage는 nMOSFET의 경우 3V에서 7V로 이동하였으며 pMOSFET의 경우도 -7 V에서 -6 V로 이동하는 특성을 보였다. 급속 열처리 공정 (rapid thermal anneal) 후에 매몰 산화층과 기판 계면간의 스트레스에 의한 포획준위가 발생하여 소자특성이 열화되었지만, $H_2/N_2$ 분위기에서 후속 열처리 공정 (post RTA anneal) 을 통하여 계면 간의 포획준위를 감소시켜 SGOI Pseudo-MOSFET의 전기적 특성이 개선되었다.

Evaluation of Flexible Complementary Inverters Based on Pentacene and IGZO Thin Film Transistors

  • Kim, D.I.;Hwang, B.U.;Jeon, H.S.;Bae, B.S.;Lee, H.J.;Lee, N.E.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.154-154
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    • 2012
  • Flexible complementary inverters based on thin-film transistors (TFTs) are important because they have low power consumption and high voltage gain compared to single type circuits. We have manufactured flexible complementary inverters using pentacene and amorphous indium gallium zinc oxide (IGZO) for the p-channel and n-channel, respectively. The circuits were fabricated on polyimide (PI) substrate. Firstly, a thin poly-4-vinyl phenol (PVP) layer was spin coated on PI substrate to make a smooth surface with rms surface roughness of 0.3 nm, which was required to grow high quality IGZO layers. Then, Ni gate electrode was deposited on the PVP layer by e-beam evaporator. 400-nm-thick PVP and 20-nm-thick ALD Al2O3 dielectric was deposited in sequence as a double gate dielectric layer for high flexibility and low leakage current. Then, IGZO and pentacene semiconductor layers were deposited by rf sputter and thermal evaporator, respectively, using shadow masks. Finally, Al and Au source/drain electrodes of 70 nm were respectively deposited on each semiconductor layer using shadow masks by thermal evaporator. The characteristics of TFTs and inverters were evaluated at different bending radii. The applied strain led to change in voltage transfer characteristics of complementary inverters as well as source-drain saturation current, field effect mobility and threshold voltage of TFTs. The switching threshold voltage of fabricated inverters was decreased with increasing bending radius, which is related to change in parameters of TFTs. Throughout the bending experiments, relationship between circuit performance and TFT characteristics under mechanical deformation could be elucidated.

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Allyl Isothiocyanate 유발 피부염에 의한 척수후각세포의 활동성 변동 (Modification in the Responsiveness of Dorsal Horn Cells during Allyl Isothiocyanate-Induced Inflammation in the Cat)

  • 윤영복;김진혁;신홍기;김기순
    • The Korean Journal of Physiology
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    • 제24권2호
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    • pp.305-317
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    • 1990
  • The present study was performed to investigate modification in the electrophysiological characteristics of cat dorsal horn cells during neurogenic inflammation induced by mustard oil. The results obtained were summarized as follows: 1) Following subcutaneous injection of mustard oil the majority of wide dynamic range (WDR) cells (10/15 units) showed enhanced responses (80%) to brush, while the responses to all types of mechanical stiumli were enhanced in 3/15 units. One cell was further activated by pinch and the another was not affected at all after induction of inflammation. 2) The sensitization of WDR cell was resulted from subcutaneous injection of mustard oil either inside or outside of the receptive field (RF), whereas the spontaneous activity increased only after mustard oil was injected inside of the RF. 3) In the animal with inflammation the responses of high threshold (HT) cell to noxious stimulus were not altered, while HT cell responded to such mechanical stimulus as pressure which was usually ineffective in normal animals. 4) After induction of inflammation, low threshold (LT) cell appeared to be converted to WDR cell, showing responses not only to brush but also to pressure and pinch. 5) The mustard oil-induced inflammation enhanced responses of WDR and HT cells to the thermal stimuli and also resulted in a pronounced after-discharge in WDR cells. 6) After subcutaneous injection of lidocaine, the increased background activity of WDR cells due to inflammation was almost completely abolished. 7) A subcutaneous injection of mustard oil inside of the RF invariably desensitized the dorsal horn cells which receive sensory inputs from the inflamed RF. From the results of Present study it was revealed that a neurogenic inflammation induced by mustard oil resulted in an enhancement of responses of cat dorsal horn cells to mechanical and thermal stimuli.

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BES 기법을 이용한 육계사 내부 고온 스트레스 평가를 위한 THI 지수 모의 (Estimation of THI Index to Evaluate Thermal Stress of Animal-occupied Zone in a Broiler House Using BES Method)

  • 하태환;권경석;홍세운;최희철;이준엽;이동현;우샘이;양가영;김락우;여욱현;이상연;이인복
    • 한국농공학회논문집
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    • 제60권2호
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    • pp.75-84
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    • 2018
  • Thermal stress of livestock has been issued due to recent climate change trends and this causes reproductive disorders, decreased feed consumption, immunosuppression, and increased mortality of animals. Concept of THI has been widely used to quantitatively evaluate the degree of thermal stress for animals, however use of this concept is restricted for animals living in the enclosed facilities such as mechanically ventilated broiler houses. In this study, time-based internal energy flow and variation trends of temperature and humidity were analyzed based on BES technique. Local weather data, insulation characteristics of building materials, heat and moisture generation rate from broilers according to age, algorithm of ventilation operation were adopted for boundary condition of the model to accurately compute THI values inside the mechanically ventilated broiler house. From the BES computation, excess frequency of THI threshold in Jeju city was highest on the assumption that air conditioning equipments were not installed. When general raising density ($39kg\;m^{-2}$) was adopted, total 2,191 hours were exceeded. Excess hours of THI threshold were strongly related to the cumulative air temperature ($R^2=0.87$).