• 제목/요약/키워드: Thermal Probe

검색결과 338건 처리시간 0.027초

태양열 흡수판용 복층 TiNOx 박막의 제조와 특성 분석 (Characteristic Analysis and Preparation of Multi-layer TiNOx Thin Films for Solar-thermal Absorber)

  • 오동현;한상욱;김현후;장건익;이용준
    • 한국전기전자재료학회논문지
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    • 제27권12호
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    • pp.820-824
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    • 2014
  • TiNOx multi-layer thin films on aluminum substrates were prepared by DC reactive magnetron sputtering method. 4 multi-layers of $TiO_2$/TiNOx(LMVF)/TiNOx(HMVF)/Ti/substrate have been prepared with ratio of Ar and ($N_2+O_2$) gas mixture. $TiO_2$ of top layer is anti-reflection layer on double TiNOx(LMVF)/TiNOx(HMVF) layers and Ti metal of infrared reflection layer. In this study, the crystallinity and surface properties of TiNOx thin films were estimated by X-ray diffraction(XRD) and field emission scanning electron microscopy(FE-SEM), respectively. The grain size of TiNOx thin films shows to increase with increasing sputtering power. The composition of thin films has been investigated using electron probe microanalysis(EPMA). The optical properties with wavelength spectrum were recorded by UV-Vis-NIR spectrophotometry at a range of 200~1,500 nm. The TiNOx multi-layer films show the excellent optical performance beyond 9% of reflectance in those ranges wavelength.

Plasma source ion implantations for shallow $p^+$/n junction

  • Jeonghee Cho;Seuunghee Han;Lee, Yeonhee;Kim, Lk-Kyung;Kim, Gon-Ho;Kim, Young-Woo;Hyuneui Lim;Moojin Suh
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.180-180
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    • 2000
  • Plasma source ion implantation is a new doping technique for the formation of shallow junction with the merits of high dose rate, low-cost and minimal wafer charging damage. In plasma source ion implantation process, the wafer is placed directly in the plasma of the appropriate dopant ions. Negative pulse bias is applied to the wafer, causing the dopant ions to be accelerated toward the wafer and implanted below the surface. In this work, inductively couples plasma was generated by anodized Al antenna that was located inside the vacuum chamber. The outside wall of Al chamber was surrounded by Nd-Fe-B permanent magnets to confine the plasma and to enhance the uniformity. Before implantation, the wafer was pre-sputtered using DC bias of 300B in Ar plasma in order to eliminate the native oxide. After cleaning, B2H6 (5%)/H2 plasma and negative pulse bias of -1kV to 5 kV were used to form shallow p+/n junction at the boron dose of 1$\times$1015 to 5$\times$1016 #/cm2. The as-implanted samples were annealed at 90$0^{\circ}C$, 95$0^{\circ}C$ and 100$0^{\circ}C$during various annealing time with rapid thermal process. After annealing, the sheet resistance and the junction depth were measured with four point probe and secondary ion mass spectroscopy, respectively. The doping uniformity was also investigated. In addition, the electrical characteristics were measured for Schottky diode with a current-voltage meter.

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Growth and characterization of molecular beam epitaxy grown GaN thin films using single source precursor with ammonia

  • Chandrasekar, P.V.;Lim, Hyun-Chul;Chang, Dong-Mi;Ahn, Se-Yong;Kim, Chang-Gyoun;Kim, Do-Jin
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.174-174
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    • 2010
  • Gallium Nitride(GaN) attracts great attention due to their wide band gap energy (3.4eV), high thermal stability to the solid state lighting devices like LED, Laser diode, UV photo detector, spintronic devices, solar cells, sensors etc. Recently, researchers are interested in synthesis of polycrystalline and amorphous GaN which has also attracted towards optoelectronic device applications significantly. One of the alternatives to deposit GaN at low temperature is to use Single Source Molecular Percursor (SSP) which provides preformed Ga-N bonding. Moreover, our group succeeds in hybridization of SSP synthesized GaN with Single wall carbon nanotube which could be applicable in field emitting devices, hybrid LEDs and sensors. In this work, the GaN thin films were deposited on c-axis oriented sapphire substrate by MBE (Molecular Beam Epitaxy) using novel single source precursor of dimethyl gallium azido-tert-butylamine($Me_2Ga(N_3)NH_2C(CH_3)_3$) with additional source of ammonia. The surface morphology, structural and optical properties of GaN thin films were analyzed for the deposition in the temperature range of $600^{\circ}C$ to $750^{\circ}C$. Electrical properties of deposited thin films were carried out by four point probe technique and home made Hall effect measurement. The effect of ammonia on the crystallinity, microstructure and optical properties of as-deposited thin films are discussed briefly. The crystalline quality of GaN thin film was improved with substrate temperature as indicated by XRD rocking curve measurement. Photoluminescence measurement shows broad emission around 350nm-650nm which could be related to impurities or defects.

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Superhard SiC Thin Films with a Microstructure of Nanocolumnar Crystalline Grains and an Amorphous Intergranular Phase

  • Lim, Kwan-Won;Sim, Yong-Sub;Huh, Joo-Youl;Park, Jong-Keuk;Lee, Wook-Seong;Baik, Young-Joon
    • Corrosion Science and Technology
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    • 제18권5호
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    • pp.206-211
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    • 2019
  • Silicon carbide (SiC) thin films become superhard when they have microstructures of nanocolumnar crystalline grains (NCCG) with an intergranular amorphous SiC matrix. We investigated the role of ion bombardment and deposition temperature in forming the NCCG in SiC thin films. A direct-current (DC) unbalanced magnetron sputtering method was used with pure Ar as sputtering gas to deposit the SiC thin films at fixed target power of 200 W and chamber pressure of 0.4 Pa. The Ar ion bombardment of the deposited films was conducted by applying a negative DC bias voltage 0-100 V to the substrate during deposition. The deposition temperature was varied between room temperature and $450^{\circ}C$. Above a critical bias voltage of -80 V, the NCCG formed, whereas, below it, the SiC films were amorphous. Additionally, a minimum thermal energy (corresponding to a deposition temperature of $450^{\circ}C$ in this study) was required for the NCCG formation. Transmission electron microscopy, Raman spectroscopy, and glancing angle X-ray diffraction analysis (GAXRD) were conducted to probe the samples' structural characteristics. Of those methods, Raman spectroscopy was a particularly efficient non-destructive tool to analyze the formation of the SiC NCCG in the film, whereas GAXRD was insufficiently sensitive.

Amphiphilic graft copolymers: Effect of graft chain length and content on colloid gel

  • Nitta, Kyohei;Kimoto, Atsushi;Watanabe, Junji;Ikeda, Yoshiyuki
    • Biomaterials and Biomechanics in Bioengineering
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    • 제2권2호
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    • pp.97-109
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    • 2015
  • A series of amphiphilic graft copolymers were synthesized by varying the number of graft chains and graft chain lengths. The polarity of the hydrophobic graft chain on the copolymers was varied their solution properties. The glass transition temperature of the copolymers was in the low-temperature region, because of the amorphous nature of poly (trimethylene carbonate) (PTMC). The surface morphology of the lyophilized colloid gel had a bundle structure, which was derived from the combination of poly(N-hydroxyethylacrylamide)( poly(HEAA)) and PTMC. The solution properties were evaluated using dynamic light scattering and fluorescence measurements. The particle size of the graft copolymers was about 30-300 nm. The graft copolymers with a higher number of repeating units attributed to the TMC (trimethylene carbonate) component and with a lower macromonomer ratio showed high thermal stability. The critical association concentration was estimated to be between $2.2{\times}10^{-3}$ and $8.9{\times}10^{-2}mg/mL$, using the pyrene-based fluorescence probe technique. These results showed that the hydrophobic chain of the graft copolymer having a long PTMC segment had a low polarity, dependent on the number of repeating units of TMC and the macromonomer composition ratio. These results demonstrated that a higher number of repeating units of TMC, with a lower macromonomer composition, was preferable for molecular encapsulation.

THE GEOMETRIC ALBEDO OF (4179) TOUTATIS ESTIMATED FROM KMTNET DEEP-SOUTH OBSERVATIONS

  • Bach, Yoonsoo P.;Ishiguro, Masateru;Jin, Sunho;Yang, Hongu;Moon, Hong-Kyu;Choi, Young-Jun;JeongAhn, Youngmin;Kim, Myung-Jin;Kwak, SungWon
    • 천문학회지
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    • 제52권3호
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    • pp.71-82
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    • 2019
  • We derive the geometric albedo of a near-Earth asteroid, (4179) Toutatis, to investigate its surface physical conditions. The asteroid has been studied rigorously not only via ground-based photometric, spectrometric, polarimetric, and radar observations but also via in situ observation by the Chinese Chang'e-2 space probe; however, its geometric albedo is not well understood. We conducted V-band photometric observations when the asteroid was at opposition in April 2018 using the three telescopes in the southern hemisphere that compose the Korea Microlensing Telescope Network (KMTNet). The observed time-variable cross section was corrected using the radar shape model. We find that Toutatis has a geometric albedo $p_V=0.185^{+0.045}_{-0.039}$, which is typical of S-type asteroids. We compare the geometric albedo with archival polarimetric data and further find that the polarimetric slope-albedo law provides a reliable estimate for the albedo of this S-type asteroid. The thermal infrared observation also produced similar results if the size of the asteroid is updated to match the results from Chang'e-2. We conjecture that the surface of Toutatis is covered with grains smaller than that of the near-Sun asteroids including (1566) Icarus and (3200) Phaethon.

Catalytic CVD 저온공정으로 제조된 나노급 니켈실리사이드의 물성 (Property of Nano-thickness Nickel Silicides with Low Temperature Catalytic CVD)

  • 최용윤;김건일;박종성;송오성
    • 대한금속재료학회지
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    • 제48권2호
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    • pp.133-140
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    • 2010
  • 10 nm thick Ni layers were deposited on 200 nm $SiO_2/Si$ substrates using an e-beam evaporator. Then, 60 nm or 20 nm thick ${\alpha}$-Si:H layers were grown at low temperature (<$200^{\circ}C$) by a Catalytic-CVD. NiSi layers were already formed instantaneously during Cat-CVD process regardless of the thickness of the $\alpha$-Si. The resulting changes in sheet resistance, microstructure, phase, chemical composition, and surface roughness with the additional rapid thermal annealing up to $500^{\circ}C$ were examined using a four point probe, HRXRD, FE-SEM, TEM, AES, and SPM, respectively. The sheet resistance of the NiSi layer was 12${\Omega}$/□ regardless of the thickness of the ${\alpha}$-Si and kept stable even after the additional annealing process. The thickness of the NiSi layer was 30 nm with excellent uniformity and the surface roughness was maintained under 2 nm after the annealing. Accordingly, our result implies that the low temperature Cat-CVD process with proposed films stack sequence may have more advantages than the conventional CVD process for nano scale NiSi applications.

A Study on the Magnetic Properties of Ion Irradiated Cu/Co Multilayer System

  • Kim, T.Y.;Chang, G.S.;Son, J.H.;Kim, S.H.;Shin, S.W.;Chae, K.H.;Sung, M.C.;Lee, J.;Jeong, K.;Lee, Y.P.;;Whang, C.N
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.163-163
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    • 2000
  • In this research, we used the ion irradiation technique which has an advantae in improving intentionally the properties of surface and interface in a non-equilibrium, instead of the conventional annealing method which has been known to improve the material properties in the equilibrium stat. Cu/Co multilayered films were prepared on SiN4/SiO2/Si substrates by the electron-beam evaporation for the Co layers and the thermal evaporation for the Cu layers in a high vacuum. The ion irradiation with a 80keV Ar+ was carried out at various ion doses in a high vacuum. Hysteresis loops of the films were investigated by magneto-optical polar Kerr spectroscopy at various experimental conditions. The change of atomic structure of the films before and after the ion irradiation was studied by glancing angle x-ray diffraction, and the intermixing between Co and Cu sublayers was confirmed by Rutherford backscattering spectroscopy. The surface roughness and magneto-resistance were measured by atomic force microscopy and with a four-point probe system, respectively. During the magneto-resistance measurement, we changed temperature and the direction of magnetization. From the results of experiments, we found that the change at the interfaces of the Cu/Co multilayered film induced by ion irradiation cause the change of magnetic properties. According to the change in hysteresis loop, the surface inplane component of magnetic easy axis was isotropic before the ion irradiation, but became anisotropic upon irradiation. It was confirmed that this change influences the axial behavior of magneto-resistance. Especially, the magneto-resistance varied in accordance with an external magnetic field and the direction of current, which means that magneto-resistance also shows the uniaxial behavior.

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TRAO KSP TIMES: Homogeneous, High-sensitivity, Multi-transition Spectral Maps toward the Orion A and Ophiuchus Cloud with a High-velocity Resolution.

  • Yun, Hyeong-Sik;Lee, Jeong-Eun;Choi, Yunhee;Evans, Neal J. II;Offner, Stella S.R.;Heyer, Mark H.;Lee, Yong-Hee;Baek, Giseon;Choi, Minho;Kang, Hyunwoo;Cho, Jungyeon;Lee, Seokho;Tatematsu, Ken'ichi;Gaches, Brandt A.L.;Yang, Yao-Lun;Chen, How-Huan;Lee, Youngung;Jung, Jae Hoon;Lee, Changhoon
    • 천문학회보
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    • 제44권2호
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    • pp.68.1-68.1
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    • 2019
  • Turbulence plays a crucial role in controlling star formation as it produces density fluctuation as well as non-thermal pressure against gravity. Therefore, turbulence controls the mode and tempo of star formation. However, despite a plenty of previous studies, the properties of turbulence remain poorly understood. As part of the Taeduk Radio Astronomy Observatory (TRAO) Key Science Program (KSP), "mapping Turbulent properties In star-forming MolEcular clouds down to the Sonic scale (TIMES; PI: Jeong-Eun Lee)", we mapped the Orion A and the Ophiuchus clouds, in three sets of lines (13CO 1-0/C18O 1-0, HCN 1-0/HCO+ 1-0, and CS 2-1/N2H+ 1-0) with a high-velocity resolution (~0.1 km/s) using the TRAO 14-m telescope. The mean Trms for the observed maps are less than 0.25 K, and all these maps show uniform Trms values throughout the observed area. These homogeneous and high signal-to-noise ratio data provide the best chance to probe the nature of turbulence in two different star-forming clouds, the Orion A and Ophiuchus clouds. We present comparisons between the line intensities of different molecular tracers as well as the results of a Principal Component Analysis (PCA).

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SnO2/AgNi/SnO2 다중층 구조의 투명 전극 특성 (Transparent Electrode Characteristics of SnO2/AgNi/SnO2 Multilayer Structures)

  • 황민호;이현용
    • 한국전기전자재료학회논문지
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    • 제37권5호
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    • pp.500-506
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    • 2024
  • The transparent electrode characteristics of the SnO2/AgNi/SnO2 (OMO) multilayer structures prepared by sputtering were investigated according to the annealing temperature. Ni-doped Ag of various compositions was selected as the metal layer and heat treatment was performed at 100~300℃ to evaluate the thermal stability of the metals. The manufactured OMO multilayer structures were heat treated for 6 hours at 400~600℃ in an N2 atmosphere. The structural, electrical, and optical properties of the OMO structures before and after annealing were evaluated and analyzed using a UV-VIS spectrophotometer, 4-point probe, XPS, FE-SEM, etc. OMO with Ni-doped Ag shows improved performance due to the reduction of structural defects of Ag during annealing, but OMO structure with pure Ag shows degradation characteristics due to Ag diffusion into the oxide layer during high-temperature annealing. The figure of merit (FOM) of SnO2/Ag/SnO2 was highest at room temperature and gradually decreased as the heat treatment temperature increased. On the other hand, the FOM value of SnO2/AgNi/SnO2 mostly showed its maximum value at high temperature(~550℃). In particular, the FOM value of SnO2/Ag-Ni (3.2 at%)/SnO2 was estimated to be approximately 2.38×10-2-1. Compared to transparent electrodes made of other similar materials, the FOM value of the SnO2/Ag-Ni (3.2 at%)/SnO2 multilayer structure is competitive and is expected to be used as an alternative transparent conductive electrode in various devices.