• Title/Summary/Keyword: Target material

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SNP Detection Using Indicator-free DNA Chip (비수식화 DNA를 이용한 유전자 검출)

  • Choi, Yong-Sung;Moon, Jong-Dae;Lee, Kyung-Sup
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.410-411
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    • 2006
  • High throughput analysis using a DNA chip microarray is powerful tool in the post genome era. Less labor-intensive and lower cost-performance is required. Thus, this paper aims to develop the multi-channel type label-free DNA chip and detect SNP (Single nucleotide polymorphisms). At first, we fabricated a high integrated type DNA chip array by lithography technology. Various probe DNAs were immobilized on the microelectrode array. We succeeded to discriminate of DNA hybridization between target DNA and mismatched DNA on microarray after immobilization of a various probe DNA and hybridization of label-free target DNA on. the electrodes simultaneously. This method is based on redox of an electrochemical ligand.

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Detection of SNP Using Microelectrode Array Biochip (마이크로전극어레이형 바이오칩을 이용한 SNP의 검출)

  • Choi, Yong-Sung;Kwon, Young-Soo;Paek, Dae-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.845-848
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    • 2004
  • High throughput analysis using a DNA chip microarray is powerful tool in the post genome era. Less labor-intensive and lower cost-performance is required. Thus, this paper aims to develop the multi-channel type label-free DNA chip and detect SNP (Single nucleotide polymorphisms). At first, we fabricated a high integrated type DNA chip array by lithography technology. Various probe DNAs were immobilized on the microelectrode array. We succeeded to discriminate of DNA hybridization between target DNA and mismatched DNA on microarray after immobilization of a various probe DNA and hybridization of label-free target DNA on the electrodes simultaneously. This method is based on redox of an electrochemical ligand.

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The Effect of Substrate Temperature on Tribological and Electrical Properties of Sputtered Carbon Nitride Thin Film (스퍼터링 질화탄소 박막의 트라이볼로지 및 전기적 특성의 기판 온도 영향)

  • Park, Chan Il
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.34 no.1
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    • pp.33-38
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    • 2021
  • Using facing target magnetron sputtering (FTMS) with a graphite target source, carbon nitride thin films were deposited on silicon and glass substrates at different substrate temperatures to confirm the tribological, electrical, and structural properties of thin films. The substrate temperatures were room temperature, 150℃, and 300℃. The tribology and electrical properties of the carbon nitride thin films were measured as the substrate temperature increased, and a study on the relation between these results and structural properties was conducted. The results show that the increase in the substrate temperature during the fabrication of the carbon nitride thin films increased the hardness and elastic modulus values, the critical load value was increased, and the residual stress value was reduced. Moreover, the increase in the substrate temperature during thin-film deposition was attributed to the improvement in the electrical properties of carbon nitride thin film.

Control of Deposition Parameters in ITO Films: Figure of Merit

  • Kim, H.H.;Park, C.H.;M.J. Cho;K.J. Lim;J.H. Shin;Park, K.J.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11a
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    • pp.398-401
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    • 2001
  • Indium tin oxide films were deposited on unheated PET substrates by DC reactive magnetron sputtering of In-Sn (90-10 wt%) metallic alloy target. Electrical and optical properties of as-deposited films were systematically studied by control of the deposition parameters such as working pressure, DC power, and oxygen partial pressure. The figures of merit are important factors that summarize briefly the relationship between electrical and optical properties of transparent conducting films. The formulae of T/R$\sub$sh/ and T$\^$10//R$\sub$sh/ are expressed as a function of transmittance and sheet resistance. The best values of those figures of merit were approximately 38.6 and 8.95 (x10$\^$-3/Ω$\^$-1/), respectively.

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Heat source control intelligent system for heat treatment process

  • Lee, JeongHoon;Cho, InHee
    • International journal of advanced smart convergence
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    • v.11 no.4
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    • pp.28-40
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    • 2022
  • Although precise temperature control in the heat treatment process is a key factor in process reliability, there are many cases where there is no separate heat source control optimization system in the field. To solve this problem, the program monitors the temperature data according to the heat source change through sensor communication in a recursive method based on multiple variables that affect the process, and the target heat source value and the actual heat treatment heat source to match the internal air temperature and material temperature. A control optimization system was constructed. Through this study, the error rate between the target temperature and the atmosphere (material surface) temperature of around 10.7% with the existing heat source control method was improved to an improved result of around 0.1% using a process optimization algorithm and system.

Evaluation of Dynamic Delivery Quality Assurance Process for Internal Target Volume Based RapidArc

  • Song, Ju-Young
    • Progress in Medical Physics
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    • v.28 no.4
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    • pp.181-189
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    • 2017
  • The conventional delivery quality assurance (DQA) process for RapidArc (Varian Medical Systems, Palo Alto, USA), has the limitation that it measures and analyzes the dose in a phantom material and cannot analyze the dosimetric changes under the motional organ condition. In this study, a DQA method was designed to overcome the limitations of the conventional DQA process for internal target volume (ITV) based RapidArc. The dynamic DQA measurement device was designed with a moving phantom that can simulate variable target motions. The dose distribution in the real volume of the target and organ-at-risk (OAR)s were reconstructed using 3DVH with the ArcCHECK (SunNuclear, Melbourne, USA) measurement data under the dynamic condition. A total of 10 ITV-based RapidArc plans for liver-cancer patients were analyzed with the designed dynamic DQA process. The average pass rate of gamma evaluation was $81.55{\pm}9.48%$ when the DQA dose was measured in the respiratory moving condition of the patient. Appropriate method was applied to correct the effect of moving phantom structures in the dose calculation, and DVH data of the real volume of target and OARs were created with the recalculated dose by the 3DVH program. We confirmed the valid dose coverage of a real target volume in the ITV-based RapidArc. The variable difference of the DVH of the OARs showed that dose variation can occur differently according to the location, shape, size and motion range of the target. The DQA process devised in this study can effectively evaluate the DVH of the real volume of the target and OARs in a respiratory moving condition in addition to the simple verification of the accuracy of the treatment machine. This can be helpful to predict the prognosis of treatment by the accurate dose analysis in the real target and OARs.

Design of X-ray Target for a CNT-based High-brightness Microfocus X-ray Tube (탄소나노튜브를 이용한 고휘도 마이크로빔 X-선원 발생부 설계)

  • Ihsan Aamir;Kim Seon Kyu;Heo Seong Hwan;Cho Sung Oh
    • Journal of the Korean Vacuum Society
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    • v.15 no.1
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    • pp.103-109
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    • 2006
  • A target for a high-brightness microfocus x-ray tube, which is based on carbon nanotubes (CNT) as electron source, is designed. The x-ray tube has the following specifications: brightness of $1\times10^{11}phs/s.mm^2. mrad^2$, spot size $\~5{\mu}m$, and average x-ray energy of $20\~40 keV$. In order to meet the specifications, the design parameters of the target, such as configuration, material, thickness of the target as well as the required beam current, were optimized using computer code MCNPX. The design parameters were determined from the calculation of both x-ray spectrum and intensity distribution for a transmission type configuration. For the thin transmission type target to withstand vacuum pressure and localized thermal loading, the structural stability and temperature distribution were also considered. The material of the target was selected as molybdenum(Mo) and the optimized thickness was $7.2{\mu}m$ to be backed by $150{\mu}m$ beryllium (Be). In addition, the calculations revealed that the maximum temperature of the transmission target can be maintained within the limits of stable operation.

A Study on the Expert System for Food Wastes Reduction using MFA (물질흐름분석(MFA)을 활용한 주방 음식물쓰레기 저감 전문가시스템)

  • Kim, Kwang-Man
    • Journal of the Korea Safety Management & Science
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    • v.15 no.4
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    • pp.245-251
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    • 2013
  • In this paper, the expert system to reduce the amount of food waste is proposed. The method of material flow analysis (MFA) is applied. Proper handling of waste beyond the terms of the need for proactive research been mentioned before, but actually cause the waste generator research focuses on consumer behavior and the business community to analyze the flow of materials within the study are insufficient. In this paper, the type of food consumption and food waste, look at the relationship between the occurrence of secondary schools in the diet is provided for students to examine the preferences of the target model diet expert system was reconfigured. Preference for leaving the food in the diet leads to the important information that is Each diet recipes that make up the target material flow analysis (MFA) was constructed to perform all the database. This database is currently being generated from the rain while cooking diet edible plants and materials to reflect the self-esteem following the recommended diet is used to create. Reducing food waste is actually being used currently in research knowledge to the knowledge base was constructed. Future Home Smart System was developed in conjunction with the system to the user, by providing guidelines for the utilization can be expected.

A Study on the Shape of the Pattern Milled Using FIB (집속이온빔 연마에 의한 패턴의 형태에 관한 연구)

  • Jung, Won-Chae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.27 no.11
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    • pp.679-685
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    • 2014
  • For the measurements of surface shape milled using FIB (focused ion beam), the silicon bulk, $Si_3N_4/Si$, and Al/Si samples are used and observed the shapes milled from different sputtering rates, incident angles of $Ga^+$ ions bombardment, beam current, and target material. These conditions also can be influenced the sputtering rate, raster image, and milled shape. The fundamental ion-solid interactions of FIB milling are discussed and explained using TRIM programs (SRIM, TC, and T-dyn). The damaged layers caused by bombarding of $Ga^+$ ions were observed on the surface of target materials. The simulated results were shown a little bit deviation with the experimental data due to relatively small sputtering rate on the sample surface. The simulation results showed about 10.6% tolerance from the measured data at 200 pA. On the other hand, the improved analytical model of damaged layer was matched well with experimental XTEM (cross-sectional transmission electron microscopy) data.