• Journal of Korean Society on Water Environment
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• v.31 no.6
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• pp.653-664
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• 2015

TPLMS (Total water pollutant load management system) that is the most powerful water-quality protection program have been implemented since 2004. In the implementation of TPLMS, target water-quality and permissible discharged load from each unit watershed can be decided by water-quality modeling. And NPS (Non-point sources) discharge coefficients associated with certain (standard) flow are used on estimation of input data for model. National Institute of Environmental Research (NIER) recommend NPS discharge coefficients as 0.15 (Q₂₇₅) and 0.50 (Q₁₈₅) in common for whole watershed in Korea. But, uniform coefficient is difficult to reflect various NPS characteristics of individual watershed. Monthly NPS discharge coefficients were predicted and estimated using surface flow and water-quality from HSPF watershed model in this study. Those coefficients were plotted in flow duration curve of study area (Palger stream and Geumho C watershed) with monthly average flow. Linear regression analysis was performed about NPS discharge coefficients of BOD, T-N and T-P associated with flow, and R² of regression were distributed in 0.893~0.930 (Palger stream) and 0.939~0.959 (Geumho C). NPS Discharge coefficient through regression can be estimated flexibly according to flow, and be considered characteristics of watershed with watershed model.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.05a
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• pp.66-70
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• 2001

The partial discharge testing is widely used in diagnostic measuring technology because it gives low stress to power equipment which is undertaken tests. Therefore it is very useful method compare to previous destructive methods and effective diagnosis method in power system that requires on-line/on-site diagnosis. But partial discharges have very complex characteristics of discharge pattern, so it is required continuous research to development of precise analysis method. In recent, the study of partial discharge is carrying out discover of initial defect of power equipment through condition diagnosis and system development of degradation diagnosis using HFPD(High Frequency Partial Discharge) detection. In this study, simulated system is manufactured and HFPD occurred from those simulator is measured with broad-band antenna in real time, the degradation grade of system is analyzed through produced patterns in simulated target according to the AI/statistics processing.

• Korean Journal of Materials Research
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• v.28 no.3
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• pp.159-165
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• 2018

In order to increase the efficiency of the sputtering method widely used in thin film fabrication, a dc sputtering apparatus which supplies both high frequency and magnetic field from the outside was fabricated, and cobalt thin film was fabricated using this apparatus. The apparatus can independently control the applied voltage, the target-substrate distance, and the target current, which are important parameters in the sputtering method, so that a stable glow discharge is obtained even at a low gas pressure of $10^{-3}$ Torr. The fabrication conditions using the sputtering method were mainly performed in $Ar+O_2$ mixed gas containing about 0.6 % oxygen gas under various Ar gas pressures of 1 to 30 mTorr. The microstructure of Co thin films deposited using this apparatus was examined by electron diffraction pattern and X-ray techniques. The magnetic properties were investigated by measuring the magnetization curves. The microstructure and magnetic properties of Co thin films depend on the discharge gas pressure. The thin film fabricated at high gas pressure showed a columnar structure containing a large amount of the third phase in the boundary region and the thin film formed at low gas pressure showed little or no columnar structure. The coercivity in the plane was slightly larger than that in the latter case.

• Transactions on Electrical and Electronic Materials
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• v.5 no.3
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• pp.98-103
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• 2004

The plasma properties in the facing target sputtering system during carbon nitride film deposition have been investigated. The ionized nitrogen species of the deposited films increased with increasing discharge current and were independent of the nitrogen pressure. The nitrogen content in the films did not vary significantly with the variation of nitrogen gas. The electron temperature was high close to that in the inter-cathode region, reduced as the electrons moved away from the most intense region of magnetic confinement and increased again outside this region. Calculations based on the film composition showed that the ion to carbon atom ratio at the substrate was about 50 and that the ratio between the ionized and neutral nitrogen molecules was about 0.25.

• Journal of Korean Society on Water Environment
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• v.23 no.4
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• pp.434-439
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• 2007

Amended Water Quality Environment Preservation Law enacted that the areas where nonpoint pollution is serious can be designated as Nonpoint Source Management Region. According to Section 54 of Water Quality Environment Preservation Law, corresponding watersheds are areas where runoff from nonpoint pollution source may deteriorate river and lake water quality, residents' health and property, and ecosystem. The criteria are as followings; i) where nonpoint source contribution result in or will result in significant ecological destruction, iii) national or local industrial complexes and cities having population greater than one million where nonpoint source managements are necessary, iv) where specific measurement is necessary because of its geological and stratigraphic characteristics. In this research, detailed designation criteria was developed reflecting current nonpoint source management situation and its discharge characteristics. Depending on the result, target regions were also suggested. In additions, it will be desirable that the target regions are prioritized considering institutional execution availability, stakeholder's agreement, and connection with existing nonpoint source pollution management measures.

• Korean Journal of Materials Research
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• v.24 no.7
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• pp.344-350
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• 2014

Metal films (i.e., Ti, Al and SUH310S) were prepared in a magnetron sputtering apparatus, and their cross-sectional structures were investigated using scanning electron microscopy. The apparatus used consisted of a cylindrical metal target which was electrically grounded, and two anode rings attached to the top and to the bottom of the target. A wire was placed along the center-line of the cylindrical target to provide a substrate. When the electrical potential of the substrate was varied, the metal-film formation rate depended on both the discharge voltage and the electrical potential of the substrate. As we made the magnetic field stronger, the plasma which appeared near the target collected on the plasma wall surface and thereby decreased the bias current. The bias current on the conducting wire was different from that for cation collection. The bias current decreased because the collection of cations decreased when we increased the magnetic-coil current. When the substrate was electrically isolated, the films deposited showed a slightly coarse columnar structure with thin voids between adjacent columns. In contrast, in the case of the grounded substrate, the deposited film did not show any clear columns but instead, showed a densely-packed granular structure. No peeling region was observed between the film and substrate, indicating good adhesion.

• Journal of the Korean Vacuum Society
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• v.19 no.1
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• pp.45-51
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• 2010

We measured the temperature of target surface inducing by various physical phenomenon on magnetron sputtering target and confirmed the possibilities if the temperature distribution could affect plasma and deposited thin film. The target of magnetron sputtering has two types: round type and rectangular type. In a rectangular target, the concentrated discharge area by corner effect by magnetic field and non-uniform erosion of target are generated. And we found the generation of non-uniform temperature distribution on the target surface from this. This area was $10{\sim}20^{\circ}C$ higher than non-sputtering area. And if particles are generated during sputtering process, they were $20^{\circ}C$ higher than the area where is higher than non-sputtering area. These effects result in non-uniformity of thin films, crack of ceramic target, and shortening target life by non-uniform erosion.

• Journal of Environmental Impact Assessment
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• v.22 no.6
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• pp.557-568
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• 2013

In this study, Calculated the nonpoint sources(NPS) load per unit area about various rainy events in vineyard of Nakdong River basin. NPS monitoring and calculation for NPS load per unit area were estimated from 'Investigation method of precipitation discharge(National Institute of Environmental Research, 2007)'. The evaluation of applicability for NPS load per unit by compared with prior research data and Total Maximum Daily Load(TMDL) data. Five target areas were each $2000m^2$, $1800m^2$, $1943m^2$, $2484m^2$, $864m^2$ and located in Gyeongsangbukdo Gyeongju, Gyeongsangbukdo Sangju, Gyeongsangnamdo Hapcheon in Korea. Since fruits were the only crop on the target area, the characteristics of stormwater discharge at survey sites could be evaluated independently. A total of 115 rainfall events in the Orchard area during five years(2008-2012) was surveyed, and 38 of them became stormwater discharge. In the Nakdong River watershed, average of event mean concentrations(EMCs) in Orchard area for biochemical oxyzen demand(BOD), Chemical oxyzen demand(COD), total nitrogen(T-N), total phosphorus(T-P) were 2.0mg/L, 10.1mg/L, 3.195mg/L, 0.578mg/L, respectively. NPS load per unit area in Orchard area showed BOD : $2.0kg/km^2{\cdot}day$, COD : $10.2kg/km^2{\cdot}day$, T-N : $3.220kg/km^2{\cdot}day$, T-P : $0.606kg/km^2{\cdot}day$.

• Current Optics and Photonics
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• v.1 no.3
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• pp.196-202
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• 2017

Corona discharge is always a sign of failure processes of high-voltage electrical apparatus, including those utilized in electric railway systems. Solar-blind ultraviolet (UV) cameras are effective tools for corona inspection. In this work, we present an automatic railway corona-discharge detection system based on solar-blind ultraviolet detection. The UV camera, mounted on top of a train, inspects the electrical apparatus, including transmission lines and insulators, along the railway during fast cruising of the train. An algorithm based on the Hough transform is proposed for distinguishing the emitting objects (corona discharge) from the noise. The detection system can report the suspected corona discharge in real time during fast cruises. An experiment was carried out during a routine inspection of railway apparatus in Xinjiang Province, China. Several corona-discharge points were found along the railway. The false-alarm rate was controlled to less than one time per hour during this inspection.

• Journal of the Korean Society for Heat Treatment
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• v.23 no.1
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• pp.23-28
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• 2010

The cylindrical magnetron sputtering has not been widely used, although this system is useful for only certain types of applications such as fiber coatings. This paper presents electrode configurations which improved the complicacy of the target assembly by using the positive voltage power supply. It is a modified type which has a target constructed with a large cylindrical part, a conical part and a small cylindrical part. When positive voltage was applied to an anode, a stable glow discharge was established and a high deposition rate was obtained. The substrate bias current was monitored to estimate the effect of ion bombardment. As a result, it was found that the substrate current was large. With cylindrical and conical cathode magnetron sputter deposition on the surface of the substrate to prevent re-sputtering, ion impact because it can increase the effectiveness with excellent ductility and adhesion of Ti film deposition can be obtained. We board at the front end of the ground resistance of $5\;k{\Omega}$ attached to the substrate potential can be controlled easily, and Ti film deposition with excellent adhesion can be obtained. Microstructure and morphology of Ti films deposited on pure Cu wires were investigated by scanning electron microscopy in relation to preparation conditions. High level ion bombardment was found to be effective in obtaining a good adhesion for Cu wire coatings.