• Title/Summary/Keyword: TFT-LCD display

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In-Plane Switching Liquid Crystal Display using Two Transistors (두 개의 트랜지스터로 구동되는 In-Plane Switching (IPS) 액정 디스플레이)

  • Jung, Jun-Ho;Park, Ji-Woong;Kim, Min-Su;Ha, Kyung-Su;Lee, Seung-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.308-309
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    • 2008
  • We have proposed a high performance liquid crystal display using two thin film transistors (TFTs) for the large size TFT-LCD desirably 42inch WXGA panel for TVs. The device generates stronger electric fields to reorient liquid crystals than that in the conventional IPS device because the voltages with opposite polarity with respect to the common electrode are applied to each finger-type electrode. As a result, the operation voltage of 2Tr-IPS mode can be decreased and the transmittance can be increased compared to conventional IPS device. Consequently, the 2Tr-IPS has all the advantages over conventional IPS from large size point of view.

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The Development of 12.1' SVGA Reflective Color Thin Film Transistor Liquid Crystal Display with The New Structured Reflector and Optimized Optical Films

  • Shin, Jong-Eup;Joo, Young-Kuil;Jang, Yong-Kyu;Kang, Myeon-Koo;Souk, Jun-Hyung
    • 한국정보디스플레이학회:학술대회논문집
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    • 2000.01a
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    • pp.19-20
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    • 2000
  • We have developed the 12.1" SVGA reflective type color TFT-LCD(Thin Film Transistor - Liquid Crystal Display) with the high aperture ratio and well designed reflector for the applications such as mini note PC, Note PC and electronic book. The panel shows the high reflectance(30%) and contrast ratio(20:1) resulted from optimizing the optical films and designing the embossing shaped reflector. By improving the chromacity, the color reproducibility was increased up to 20%. As removing the backlight unit, we reduced the power consumption, thickness and weight of the panel to 0.8W, 2.2mm, and 250gram, respectively. According to the above performances, we have obtained fabrication process for mass production, and furthermore, could have access to fast market launching.

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Soft Mold Deformation of Large-area UV Impring Process (대면적 UV 임프린팅 공정에서 유연 몰드의 변형)

  • Kim, Nam-Woong;Kim, Kug-Weon
    • Journal of the Semiconductor & Display Technology
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    • v.10 no.4
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    • pp.53-59
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    • 2011
  • Recently there have been considerable attentions on nanoimprint lithography (NIL) by the display device and semiconductor industry due to its potential abilities that enable cost-effective and high-throughput nanofabrication. Although one of the current major research trends of NIL is large-area patterning, the technical difficulties to keep the uniformity of the residual layer become severer as the imprinting area increases more and more. In this paper we focused on the deformation of the $2^{nd}$ generation TFT-LCD sized ($370{\times}470mm^2$) large-area soft mold in the UV imprinting process. A mold was fabricated with PDMS(Poly-dimethyl Siloxane) layered glass back plate(t0.5). Besides, the mold includes large surrounding wall type protrusions of 1.9 mm width and the via-hole(7 ${\mu}m$ diameter) patterend area. The large surrounding wall type protrusions cause the proximity effect which severely degrades the uniformity of residual layer in the via-hole patterend area. Therefore the deformation of the mold was calculated by finite element analysis to assess the effect of large surrounding wall type protrusions and the flexiblity of the mold. The deformation of soft mold was verified by the measurements qualitatively.

Pressure Distribution by Rubber Roller in Large-area UV Imprinting Lithography Process (대면적 UV 임프린팅 공정에서 고무 롤러에 의한 압력분포)

  • Kim, Nam-Woong;Kim, Kug-Weon;Lee, Woo-Young
    • Journal of the Semiconductor & Display Technology
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    • v.9 no.2
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    • pp.91-96
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    • 2010
  • In recent years there have been considerable attentions on nanoimprint lithography (NIL) by the display device and semiconductor industry due to its potential abilities that enable cost-effective and high-throughput nanofabrication. Although one of the current major research trends of NIL is large-area patterning, the technical difficulties to keep the uniformity of the residual layer become severer as the imprinting area increases more and more. In this paper we consider the roll-to-plate type imprinting process. In the process a glass mold, which is placed upon the 2nd generation TFT-LCD glass sized substrate(370${\yen}$470 mm), is rolled by a rubber roller to achieve a uniform residual layer. The pressure distribution on the glass mold by rolling of the rubber roller is crucial information to analyze mold deformation, transferred pattern quality, uniformity of residual layer and so forth. In this paper the quantitative pressure distribution induced by rolling of the rubber roller was calculated with finite element analysis under the assumption of Neo-Hookean hyperelastic constitutive relation. Additionally the numerical results were verified by the experiments.

RF Power Conversional System for Environment-friendly Ferrite Core Inductively Coupled Plasma Generator (환경친화형 페라이트 코어 유도결합 플라즈마 고주파 전력 변환 장치)

  • Lee, Joung-Ho;Choi, Dae-Kyu;Kim, Soo-Seok;Lee, Byoung-Kuk;Won, Chung-Yuen
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.20 no.8
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    • pp.6-14
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    • 2006
  • This paper is a study about a proper method of plasma generation to cleaning method and a high frequency power equipment circuit to generation of plasma that used cleaning of chamber for TFT-LCD PECVD. The high density plasma required for cleaning causes a possibility of high density plasma more than $1{\times}10^{11}[EA/cm^3]$. It apply a ferrite core of ferromagnetic body to a existing ICP form. In case of power transfer equipment on 400[kHz] high frequency to generation of plasma it makes certain a stable switching operation in condition of plasma through using a inverter form for general purpose HB. And it demonstrates the performance of power transfer equipment using methods of measurement which use a transformer of series combination the density of plasma and the rate of dissolution of $NF_3$ in condition of $A_r\;and\;NF_3$.

Development of a Portable Digital Electrocardiograph(ECG) measurable with Gel-less Metal Electrodes (젤리스 금속 전극으로 측정가능한 휴대용 디지털 심전도계의 개발)

  • Nam, Young-Jin;Park, Kwang-Min
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.14 no.4
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    • pp.1903-1907
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    • 2013
  • Heart condition should be observed for long periods of time because it does not appear abnormal all the time. However, there are many difficulties checking our health for a long time due to its size, operation of equipment, and cost. To solve these problems, an electrocardiograms(ECG), specially interfacing three gel-less metal electrodes for low cost portable applications, is designed and implemented. Gel-less metal electrodes are used for ECG monitoring system instead of gel-type electrodes that can cause skin rashes and itching problem. The whole ECG system consists of two parts-analog and digital circuits. The analog measurement circuit that has a 18*25mm size is made up of op-amps maintaining a sufficiently high common-mode noise rejection and passive elements of SMD type. Analog heart signal is converted to digital stream suitable for display on a TFT-LCD by an 8-bit microcontroller. The size of the completed ECG system is 25*80*50mm and its weighing is about 150g, which is small enough to be easily used. Therefore, the implemented ECG system can be used as a portable one.

A Low Power Source Driver of Small Chip Area for QVGA TFT-LCD Applications

  • Hung, Nan-Xiong;Jiang, Wei-Shan;Wu, Bo-Cang;Tsao, Ming-Yuan;Liu, Han-Wen;Chang, Chen-Hao;Shiau, Miin-Shyue;Wu, Hong-Chong;Cheng, Ching-Hwa;Liu, Don-Gey
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.1005-1008
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    • 2007
  • In this study, an architecture for 262K-color TFT-LCD source driver. In this paper proposed the chip consumes smaller area and static current which is suitable for QVGA resolutions. In the conventional structures, all of them need large number of OPAMP buffers to drive the pixels, Therefore, highly resistive R-DACs are needed to generate gamma voltages to reduce the static current. In this study, our design only used two OPAMPs and low resistance RDACs without increasing the quiescent current. Thus, it was experted that chip would be more in consuming lower static power for longer battery lifetime. The source driver were implemented by the 3.3 V $0.35\;{\mu}m$ CMOS technology provided by TSMC. The area of the core OPAMP circuit was about $110\;{\mu}m\;{\times}\;150\;{\mu}m$ and that of the source driver was $880\;{\mu}m\;{\times}\;430\;{\mu}m$. As compared to the conventional structure, approximately 64.48 % in area was achieved.

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Design a Portable Biomedical Signal Measuring System for U-Health (U-Health를 위한 휴대형 생체신호 측정 시스템 설계)

  • Lee, Han-Wook;Kim, Sung-Hoo;Jeong, Won-Geun;Lee, Ju-Won;Jang, Doo-Bong;Lee, Gun-Ki
    • The Journal of Korea Institute of Information, Electronics, and Communication Technology
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    • v.1 no.2
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    • pp.51-56
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    • 2008
  • U-Health is abbreviated from ubiquitous Health. Its final aim is "to improve the quality of life. To realize it, it is needed to generalize IT infrastructure such as the development of information-technology and construction of network. It is guaranteed to get medical care benefits unconsciously every time and everywhere based on this system. In this study, the environment of unconscious measurement was set up through ultra-violet instead of the existing Probe to wear with finger to follow this. TFT-LCD was included into module for display. U-Healthcare focused on the minimization and portable characteristic through the designed Zigbee communication module. Handled healthcare device was developed based on the U-Healthcare.

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대기압 플라즈마 정밀 Etching 기술 개발

  • Im, Chan-Ju;Kim, Yun-Hwan;Lee, Sang-Ro;Ak, Heun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.263-263
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    • 2011
  • 본 연구에서는 DBD (Dielectric Barrier Discharge)방식의 상압 플라즈마를 이용하여 FPD (flat panel display) 공정에 사용되는 a-Si, Si3N4의 식각 공정 특성을 평가하였다. 사용된 DBD 반응기는 기존의 blank planar plate 형태의 Power가 인가되는 anode 부분과 Dielectric Barrier 사이 공간을 액상의 도전체로 채워 넣은 형태의 전극이 사용 하였으며, 인가 Power는 40kHz AC 최대인가 전압 15 kVp를 사용 하였다. 방전 가스는 N2, 반응가스로는 CDA (Clean Dry Air)와 NF3, 액상의 Etchant를 사용 하였으며 모든 공정은 In-line type으로 시편을 처리 하였다. NF3의 경우 30 mm/sec 이송속도 1회 처리 기준 a-Si 1300${\AA}$, Si3N4 1900${\AA}$의 식각 두께를 보였으며 a-Si : Si3N4 선택비는 N2, CDA의 조절을 통하여 최대 1:2에서 4:1 정도까지 변화가 가능하였다. 균일도는 G2 (370 mm${\times}$470 mm)의 경우 5.8 %의 균일도를 보이고 있다. 이외에도 NF3 공정의 경우 실제 TFT-LCD 공정 중 n+ channel (n+ a-Si:H)식각 공정에 적용하여 5.5 inch LCD panel feasibility를 확인 할 수 있었다. 액상 Etchant (HF수용액, NH4HF2)는 버블러를 사용하여 기화 시켜 플라즈마 소스를 통해 1차적으로 활성화 시키고 기존 DBD 반응기에 공급해 주는 형태로 평가를 진행하였다. 식각 특성은 30mm/sec 이송속도에서 a-Si $25{\AA}$ 정도로 가스 형태의 Etchant에 비해 매우 낮은 수준이나 Etching rate 향상을 위한 factor 파악 및 개선을 위한 연구를 진행 하였다.

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대기압 플라즈마를 이용한 a-Si 식각 기술

  • No, Tae-Hyeop;Seok, Dong-Chan;Yu, Seung-Yeol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.142-142
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    • 2013
  • DBD (Dielectric Barrier Discharge) 대기압 플라즈마를 이용한 a-Si 식각기술에 대한 연구결과를 논하고자 한다. 기술개발의 목적은 대면적 TFT-LCD 혹은 Flexible Display 공정에 적용가능한 대기압 플라즈마 식각장치의 개발 및 검증이다. 실험에서 식각 가스로는 SF6, NF3 등을 사용하였으며, 질소를 기본 가스로 사용하였다. 검증용으로 개발된 대기압 플라즈마 식각 장치는 대기압 플라즈마 장치를 연속적으로 통과하는 in-line system 형식으로 개발되었다. 검증에 사용된 대기압 플라즈마 장치는 300 mm의 방전 폭으로 1세대 LCD기판의 처리가 가능하다. 대기압 플라즈마 식각 기술 개발에서 식각율에 영향을 미치는 변수들은 기판의 온도, 식각가스의 농도, 기판의 이송속도, 기판과 플라즈마 발생장치 사이의 간격 그리고 플라즈마의 인가 전력 등으로 크게 구분지어 생각할 수 있다. 개발된 식각 장치는 SF6를 사용하는 경우 최대 환산 식각율은 500 nm/min 정도이다. 식각 기술에서 중요한 식각 Uniformity와 그와 연관된 a-Si/SiNx 식각 선택비는 사용하는 가스의 Recipe 개발에 중점을 두고 연구를 진행하였다. 식각 Uniformity는 약 7% 이내의 균일도를 갖고 a-Si/ SiNx의 선택비는 10이상의 결과를 얻었다. 또한 식각 가스는 식각 profile에 영향을 줄 수 있는데 대기압 환경에서 형성되는 collisional sheath에도 불구하고 비 등방성 식각이 가능하였다.

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