• Bulletin of the Korean Chemical Society
• /
• v.23 no.2
• /
• pp.225-228
• /
• 2002

Amorphous $Ga_2O_3$ films have been grown on Si(100) substrates by metal organic chemical vapor deposition (MOCVD) using gallium isopropoxide, $Ga(O^iPr)_3$, as single precursor. Deposition was carried out in the substrate temperature range 400-800 $^{\circ}C$. X-ray photoelectron spectroscopy (XPS) analysis revealed deposition of stoichiometric $Ga_2O_3$ thin films at 500-600 $^{\circ}C$. XPS depth profiling by $Ar^+$ ion sputtering indicated that carbon contamination exists mostly in the surface region with less than 3.5% content in the film. Microscopic images of the films by scanning electron microscopy (SEM) and atomic force microscopy (AFM) showed formation of grains of approximately 20-40 nm in size on the film surfaces. The root-mean-square surface roughness from an AFM image was ${\sim}10{\AA}$. The interfacial layer of the $Ga_2O_3$/Si was measured to be ${\sim}35{\AA}$ thick by cross-sectional transmission electron microscopy (TEM). From the analysis of gaseous products of the CVD reaction by gas chromatography-mass spectrometry (GC-MS), an effort was made to explain the CVD mechanism.

• Applied Microscopy
• /
• v.40 no.1
• /
• pp.21-28
• /
• 2010

In a simulation study of atomic resolution transmission electron microscope images of single layer and bilayer graphene, it is demonstrated that the conventional Bloch wave formulations can be used when high-order Laue zone reflections are properly taken into account in the theory. The simulated images for bilayer graphene show 3-fold rotational lattice symmetry rather than the 6-fold one under certain conditions. This result can be understood as revealed the 3-fold rotational lattice symmetry of bilayer graphene in three dimensions along [0001]. For single layer graphene the observed phase images showing 3-fold rotational lattice symmetry were particularly noted. This phenomenon has been explained by an assumption of the re-configuration of electron density on the surface of graphene. And the matching images have been obtained as simulated with up to the second order Laue zone reflections only, reflecting the re-configuration of electrons on the surface.

• Korean Journal of Materials Research
• /
• v.3 no.4
• /
• pp.319-326
• /
• 1993

The effects of $SnO_2$ crystallite size on the powder characteristics, the resistance in air and the sensitivity to 0.5 vol % $H_2$, CO-air mixture were observed. The size of SnO, powder was controlled by calcining temperature variation ($500^{\circ}C$ ~$1100^{\circ}C$) of $\alpha$-stannic acid fabricated from $SnCl_4 \cdot xH_2O$. Its crystallite size. evaluated from TEM image, was in the range of 8-54nm. With the reduction of crystallite size, the adsoption peak of $H_2O$ on FTIR curve became more clear while the lattice parameters were invariable. As the crystallite size decreased, with elements of thick film, the temperatures showing a minimum resistance in air and a maximum sensitivity to H, gas reduced. The temperature variations were assigned to the changes of activation energy of the active adsorbates, and it was suggested that the decrease of activation energy can be one of the reasons for the' sensitivity increase with the' fine powder.

• Transactions of the Korean Society of Mechanical Engineers B
• /
• v.23 no.9
• /
• pp.1151-1162
• /
• 1999

The effects of radial heat and $H_2O$ diffusion on the evolution of silica particles in coflow diffusion flames have been studied experimentally. The evolution of silica aggregate particles in coflow diffusion flames has been measured experimentally using light scattering and thermophoretic sampling techniques. The measurements of scattering cross section from $90^{\circ}$ light scattering have been utilized to calculate the aggregate number density and volume fraction using with combination of measuring the particle size and morphology through the localized sampling and a TEM image analysis. Aggregate or particle number densities and volume fractions were calculated using Rayleigh-Debye-Gans and Mie theory for fractal aggregates and spherical particles, respectively. Flame temperatures and volumetric differential scattering cross sections have been measured for different flame conditions such as inert gas species, $H_2$ flow rates, and burner injection configurations to examine the relation between the formation of particles and radial $H_2O$ diffusion. The comparisons of oxidation and flame hydrolysis have also been made for various $H_2$ flow rates using $N_2$ or $O_2$ as a carrier gas. Results indicate that the role of oxidation becomes dominant as both carrier gas($O_2$) and $H_2$ flow rates increases since the radial heat diffusion precedes $H_2O$ diffusion in coflow flames used in this study. The effect of carrier gas flow rates on the evolution of silica particles have also been studied. When using $N_2$ as a carrier gas, the particle volume fraction has a maximum at a certain carrier gas flow rate and as the flow rate is further increased, the hydrolysis reaction Is delayed and the spherical particles finally evolves into fractal aggregates due to decreased flame temperature and residence time.

• Progress in Superconductivity and Cryogenics
• /
• v.18 no.4
• /
• pp.15-20
• /
• 2016

The effects of electron beam (EB) irradiation on the superconducting critical temperature ($T_c$) and critical current density ($J_c$) of YBCO films were studied. The YBCO thin films were irradiated using a KAERI EB accelerator with an energy of 0.2 MeV and a dose of $10^{15}-10^{16}e/cm^2$. A small $T_c$ decrease and a broad superconducting transition were observed as the EB dose increased. The value of $J_cs$ (at 20 K, 50 K and 70 K) increased at doses of $7.5{\times}10^{15}$ and $2.2{\times}10^{16}e/cm^2$. However, $J_cs$ decreased as the dose increased further. The X-ray diffraction (XRD) analysis showed that the c axis of YBCO was elongated and the full width at half maximum (FWHM) increased as the dose increased, which is strong evidence of the atomic displacement by EB irradiation. The transmission electron microscopy (TEM) showed that the amorphous layer formed in the vicinity of the surfaces of the irradiated films. The amorphous phase was often present as an isolated form in the interior of the films. In addition to the formation of the amorphous phase, many striations running along the a-b direction of YBCO were observed. The high magnification lattice image showed that the striations were stacking faults. The enhancement of $J_c$ by EB irradiation is likely to be due to the lattice distortion and the formation of defects such as vacancies and stacking faults. The decrease in $J_c$ at a high EB dose is attributed to the extension of the amorphous region of a non-superconducting phase.

• Journal of Korean Biological Nursing Science
• /
• v.2 no.1
• /
• pp.49-63
• /
• 2000

Aflatoxin $B_1(AFB_1)$ is a potent hepatotoxic and hepatocarcinogenic mycotoxin in human beings. It is accumulated in animal tissues and injured cell through variable metabolic pathway. This study was conducted to determine the effect of antioxidant vitamins on liver function enzymes and hepatic damage of $AFB_1$ treated mice. The 6 weeks old male ICR mice were randomly separated 6 groups, vehicle solvent or vitamin C(10 mg/kg/day) and vitamin E(63.8 mg/kg/day) were administered by intraperitoneal(i.p.) injection and 1 hr later, vehicle solution(DMSO) or $AFB_1$(0.4 mg/kg) were injected. The results obtained as follow ; The levels of liver function enzymes such as GOT, GPT, LDH, and alkaline phosphatase, in sera of mice were remarkably elevated by treatment with $AFB_1$ only. However, those enzymes were significantly alleviated by co-treatment with antioxidant vitamins(p<0.01). Especially the levels of LDH and ALK phosphatase were similar to those of control groups(p<0.01). The transmission electron microscopy(TEM) image of intracellular microrganelles on the liver cell of mice was also degenerated extremely by treatment with $AFB_1$, but vitamin C and vitamin E gave good effects on cellular deformation. The intracellular microrganelles such as mitochondria, endoplasmic reticulum, nucleus and nucleic membrane were nearly disappeared the cellular deformation by antioxidant vitamins co-administration. With above results, we could estimated that antioxidant vitamins blocked AFB1 induced hepatic cell damage.

• Applied Microscopy
• /
• v.25 no.3
• /
• pp.82-89
• /
• 1995

High resolution transmission electron microscopic observations on quaternary $Zn_{1-x}Mg_{x}S_y$ $S_{1-y}$(x=0.13, y=0.16) on (001) GaAs substrate grown up to $1.2{\mu}m$ with 20nm ZnSe buffer layer at $300^{\circ}C$ by RIBER MBE system which has a single growth chamber were investigated by HRTEM working at 300kV with point resolution of 0.18nm. The ZnSe buffer layer maintains the coherency with the GaAs substrate. The stacking faults had begun at ZnSe buffer/$Zn_{1-x}Mg_{x}S_{y}S_{1-y}$ interface, whose length and spacing became larger than 60nm and wider than 40nm, respectively. The inverse triangular stacking fault was bounded by stacking faults which were formed on {111} planes with different variants. There exists rare stacking faults inside the triangular defect. The epilayer surrounded by the straight stacking faults, which had formed in the same direction, became the columnar structure.

• Korean Journal of Materials Research
• /
• v.11 no.10
• /
• pp.879-888
• /
• 2001

The effects of final annealing temperature on the microstructure and creep characteristics were investigated for the Zr-lNb-0.2X (X=0, Mo, Cu) and Zr-lNb- 1Sn-0.3Fe-0.1X (X=0, Mo, Cu) alloys. The microstructures were observed by using TEM/EDS, and grain size and distributions of precipitates were analyzed using a image analyzer. The creep test was performed at $400^{\circ}C$ under applied stress of 150 MPa for 10 days. The $\beta$-Zr was observed at annealing temperature above $600^{\circ}C$. In the temperature above$ 600^{\circ}C$, the grain sizes of both alloy systems appeared to be increased with increasing the final annealing temperature. The creep strengths of Zr-1Nb-1Sn-0.3Fe-0.1X alloys were higher than those of Zr-1Nb-0.2X ones due to the effect of solid solution hardening by Sn in Zr-lNb-lSn-0.3Fe-0.1X alloy system. Also, Mo addition showed the strong effect of precipitate hardening in both alloy systems. The creep strength rapidly decreased with increasing the annealing temperature up to $600^{\circ}C$. However, a superior creep resistance was obtained in the sample that annealed to have a second phase of $\beta$-Zr. It was considered that the appearance of $\beta$-Zr would play an important role in the strengthening mechanism of creep deformation.

• Korean Journal of Materials Research
• /
• v.29 no.3
• /
• pp.183-188
• /
• 2019

Flexible dye-sensitized solar cells using binder free $TiO_2$ paste for low temperature sintering are developed. In this paste a small amount of titanium gel is added to a paste of $TiO_2$ nanoparticle. Analysis of titanium gel paste prepared at $150^{\circ}C$ shows that it has a pure anatase phase in XRD and mesoporous structure in SEM. The formation of the titanium gel 1-2 nm coated layer is confirmed by comparing the TEM image analysis of the titanium gel paste and the pristine paste. This coating layer improves the excited electron transfer and electrical contact between particles. The J-V curves of the organic binder DSSCs fabricated at $150^{\circ}C$ shows a current density of $0.12mA/cm^2$ and an open-circuit voltage of 0.47 V, while the titanium gel DSSCs improves electrical characteristics to $5.04mA/cm^2$ and 0.74 V. As a result, the photoelectric conversion efficiency of the organic binder DSSC prepared at low temperature is as low as 0.02 %, but the titanium gel paste DSSCs has a measured effciency of 2.76 %.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2012.08a
• /
• pp.154-155
• /
• 2012

The promise of nano-crystalites (nc) as a technological material, for applications including display backplane, and solar cells, may ultimately depend on tailoring their behavior through doping and crystallinity. Impurities can strongly modify electronic and optical properties of bulk and nc semiconductors. Highly doped dopant also effect structural properties (both grain size, crystal fraction) of nc-Si thin film. As discussed in several literatures, P atoms or radicals have the tendency to reside on the surface of nc. The P-radical segregation on the nano-grain surfaces that called self-purification may reduce the possibility of new nucleation because of the five-coordination of P. In addition, the P doping levels of ${\sim}2{\times}10^{21}\;at/cm^3$ is the solubility limitation of P in Si; the solubility of nc thin film should be smaller. Therefore, the non-activated P tends to segregate on the grain boundaries and the surface of nc. These mechanisms could prevent new nucleation on the existing grain surface. Therefore, most researches shown that highly doped nc-thin film by using conventional PECVD deposition system tended to have low crystallinity, where the formation energy of nucleation should be higher than the nc surface in the intrinsic materials. If the deposition technology that can make highly doped and simultaneously highly crystallized nc at low temperature, it can lead processes of next generation flexible devices. Recently, we are developing a novel CVD technology with a neutral particle beam (NPB) source, named as neutral beam assisted CVD (NBaCVD), which controls the energy of incident neutral particles in the range of 1~300eV in order to enhance the atomic activation and crystalline of thin films at low temperatures. During the formation of the nc-/pm-Si thin films by the NBaCVD with various process conditions, NPB energy directly controlled by the reflector bias and effectively increased crystal fraction (~80%) by uniformly distributed nc grains with 3~10 nm size. In the case of phosphorous doped Si thin films, the doping efficiency also increased as increasing the reflector bias (i.e. increasing NPB energy). At 330V of reflector bias, activation energy of the doped nc-Si thin film reduced as low as 0.001 eV. This means dopants are fully occupied as substitutional site, even though the Si thin film has nano-sized grain structure. And activated dopant concentration is recorded as high as up to 1020 #/$cm^3$ at very low process temperature (＜ $80^{\circ}C$) process without any post annealing. Theoretical solubility for the higher dopant concentration in Si thin film for order of 1020 #/$cm^3$ can be done only high temperature process or post annealing over $650^{\circ}C$. In general, as decreasing the grain size, the dopant binding energy increases as ratio of 1 of diameter of grain and the dopant hardly be activated. The highly doped nc-Si thin film by low-temperature NBaCVD process had smaller average grain size under 10 nm (measured by GIWAXS, GISAXS and TEM analysis), but achieved very higher activation of phosphorous dopant; NB energy sufficiently transports its energy to doping and crystallization even though without supplying additional thermal energy. TEM image shows that incubation layer does not formed between nc-Si film and SiO2 under later and highly crystallized nc-Si film is constructed with uniformly distributed nano-grains in polymorphous tissues. The nucleation should be start at the first layer on the SiO2 later, but it hardly growth to be cone-shaped micro-size grains. The nc-grain evenly embedded pm-Si thin film can be formatted by competition of the nucleation and the crystal growing, which depend on the NPB energies. In the evaluation of the light soaking degradation of photoconductivity, while conventional intrinsic and n-type doped a-Si thin films appeared typical degradation of photoconductivity, all of the nc-Si thin films processed by the NBaCVD show only a few % of degradation of it. From FTIR and RAMAN spectra, the energetic hydrogen NB atoms passivate nano-grain boundaries during the NBaCVD process because of the high diffusivity and chemical potential of hydrogen atoms.