• Korean Journal of Optics and Photonics
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• v.13 no.3
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• pp.215-222
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• 2002

Using an in-situ ellipsometer, we monitored the growth curve of optical recording media in real time. For confirmation of the thickness control using in-situ ellipsometry, we analyzed the deposited multi-layer sample made of Ge-Sb-Te alloy film and ZnS-Si0$_2$ dielectric films using an exsitu spectroscopic ellipsometer. The target material in the first sputtering gun is ZnS-SiO$_2$ as the protecting dielectric layer and that in the second gun is Ge$_2$sb$_2$Te$_{5}$ as the receding layer. While depositing ZnS-SiO$_2$, Ge$_2$Sb$_2$Te$_{5}$ and ZnS-SiO$_2$ films on c-Si substrate in sequence, we measured Ψ $\Delta$ in real time. Utilizing the complex refractive indices of Ge$_2$Sb$_2$Te$_{5}$ and ZnS-SiO$_2$ obtained from the analysis of spectroscopic ellipsometry data, the evolution of ellipsometric constants Ψ, $\Delta$ with thickness is calculated. By comparing the calculated evolution curve of ellipsometric constants with the measured one, and by analyzing the effect of density variation of the Ge$_2$Sb$_2$Te$_{5}$ recording layer on ellipsometric constants with thickness, we precisely monitored the growth rate of the Ge-Sb-Te multilayer and controlled the growth process. The deviation of the real thicknesses of Ge-Sb-Te multilayer obtained under the strict monitoring is post confirmed to be less than 1.5% from the target structure of ZnS-SiO$_2$(1400 $\AA$)IGST(200 $\AA$)$\mid$ZnS-SiO$_2$(200$\AA$).(200$\AA$).

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.134-134
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• 2009

In this work, we report that crystallization speed as well as the electrical and optical properties about the N-doped $Ge_2Sb_2Te_5$ thin films. The 200-nm-thick N-doped $Ge_2Sb_2Te_5$ thin film was deposited on p-type (100) Si and glass substrate by RF reactive sputtering at room temperature. The amorphous-to-crystalline phase transformation of N-doped $Ge_2Sb_2Te_5$ thin films investigated by X-ray diffraction (XRD). Changes in the optical transmittance of as-deposited and annealed films were measured using a UV-VIS-IR spectrophotometer and four-point probe was used to measure the sheet resistance of N-doped $Ge_2Sb_2Te_5$ thin films annealed at different temperature. In addition, the surface morphology and roughness of the films were observed by Atomic Force Microscope (AFM). The crystalline speed of amorphous N-doped $Ge_2Sb_2Te_5$ films were measured by using nano-pulse scanner with 658 nm laser diode (power : 1~17 mW, pulse duration: 10~460 ns). It was found that the crystalline speed of thin films are decreased by adding N and the crystalline temperature is higher. This means that N-dopant in $Ge_2Sb_2Te_5$ thin film plays a role to suppress amorphous-to-crystalline phase transformation.

• Electrical & Electronic Materials
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• v.8 no.5
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• pp.619-625
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• 1995

Polycrystalline CdTe thin film has been studied for photovoltaic application due to the 1.45 eV band gap energy ideal for solar energy conversion and high absorption coefficient. The formation of low resistance contact to p-CdTe is difficult because of large work function(>5.5eV). Common methods for ohmic contact to p-CdTe are to form a p+ region under the contact by in-diffusion of contact material to reduce the barrier height and modify a p-CdTe surface layer using chemical treatment. In this study, the surface chemical treatment of p CdTe was carried out by H$\_$3/PO$\_$4/+HNO$\_$3/ or K$\_$2/Cr$\_$2/O$\_$7/+H$\_$2/SO$\_$4/ solution to provide a Te-rich surface. And various thin film contact materials such as Cu, Au, and Cu/Au were deposited by E-beam evaporation to form ohmic contact to p-CdTe. After the metallization, post annealing was performed by oven heat treatment at 150.deg. C or by RTA(Rapid Thermal Annealing) at 250-350.deg. C. Surface chemical treatments of p-CdTe thin film improved metal/p-CdTe interface properties and post heat treatment resulted in low contact resistivity to p-CdTe.Of the various contact metal, Cu/Au and Cu show low contact resistance after oven and RTA post-heat treatments, respectively.

• Solar Energy
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• v.11 no.3
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• pp.74-83
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• 1991

In this study, the (p)ZnTe/(n)Si solar cell and (n)CdS-(p)ZnTe/(n)Si poly-junction thin film are fabricated by vaccum deposition method at the substrate temperature of $200{\pm}1^{\circ}C$ and then their electrical properties are investigated and compared each other. The test results from the (p)ZnTe/(n)Si solar cell the (n)CdS-(p)ZnTe/(n)Si poly-junction thin fiim under the irradiation of solar energy $100[mW/cm^2]$ are as follows; Short circuit current$[mA/cm^2]$ (p)ZnTe/(n)Si:28 (n)CdS-(p)ZnTe/(n)Si:6.5 Open circuit voltage[mV] (p)ZnTe/(n)Si:450 (n)CdS-(p)ZnTe/(n)Si:250 Fill factor (p)ZnTe/(n)Si:0.65 (n)CdS-(p)ZnTe/(n)Si:0.27 Efficiency[%] (p)ZnTe/(n)Si:8.19 (n)CdS-(p)ZnTe/(n)Si:2.3 The thin film characteristics can be improved by annealing. But the (p)ZnTe/(n)Si solar cell are deteriorated at temperatures above $470^{\circ}C$ for annealing time longer than 15[min] and the (n)CdS-(p)ZnTe/(n)Si thin film are deteriorated at temperature about $580^{\circ}C$ for longer than 15[min]. It is found that the sheet resistance decreases with the increase of annealing temperature.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.21-22
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• 2008

In the paper, we report several experimental data capable of evaluating the phase transformation characteristics of $Ag_x(Ge_2Sb_2Te_5)_{1-x}$ (x =0, 0.05, 0.1) thin films. The $Ag_x(Ge_2Sb_2Te_5)_{1-x}$ phase change thin films have been prepared by thermal evaporation. The crystallization characteristics of amorphous$Ag_x(Ge_2Sb_2Te_5)_{1-x}$ thin films were investigated by using nano-pulse scanner with 658 nm laser diode (power; 1~17 mW, pulse duration; 10~460 ns) and XRD measurement. It was found that the more Ag is doped, the more crystallization speed was 50 improved. In comparision with $Ge_2Sb_2Te_5$ thin film, the sheet resistance$(R_{amor})$ of the amorphous $Ag_x(Ge_2Sb_2Te_5)_{1-x}$ thin films were found to be lager than that of $Ge_2Sb_2Te_5$ film($R_{amor}$ $\sim10^7\Omega/\square$ and $R_{cryst}$ 10 $\Omega/\square$). That is, the ratio of $R_{amor}/R_{cryst}$ was evaluates to be $\sim10^6$ This is very helpful to writing current reduction of phase-change random acess memory.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.118-119
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• 2006

In the present work, we investigate the basic physical and thermal properties and electrical resistance change due to phase change in chalcogenide-based $Ge_1Se_1Te_2$ and $Ge_2Se_2Te_5$ thin films. The phase transition from amorphous to crystalline states, and vice versa, of $Ge_1Se_1Te_2$ and $Ge_2Se_2Te_5$ thin films by applying electrical pulses have been studied. The reversible phase transition between the amorphous and crystalline states, which is accompanied by a considerable change in electrical resistivity, is exploited as means to store bits of information.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.15 no.4
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• pp.157-161
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• 2005

Spectroscopic ellipsomerty measurements of the complex dielectric function of the CdTe thin films grown on GaAs(100) substrates by hot wall epitaxy have been performed in 1.5${\~}$5.5 eV photon energy range at room temperature. The spectroscopic ellipsometer spectra revealed distinct structures at energies of the $E_l,\;E_1+{\Delta}_1$, and $E_2$ critical points. These energies were decreased with increasing thickness of CdTe thin films.

• Proceedings of the Korea Association of Crystal Growth Conference
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• 1996.06b
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• pp.311-352
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• 1996

Peltier 효과를 이용한 열전소자는 열응담 감도가 좋고 선택적 냉각이 가능하며 무소음, 무진동 및 소형화의 장점으로 각종 전자부품의 국부냉각소자로 응용되고 있다. 또한 최근 냉매의 사용없이 냉각이 가능한 열전재료를 이용한 자동차나 가정용 에어컨 및 냉장고 등의 각종 냉방시스템의 개발도 크게 주목을 받고 있다. 기존의 Bi2Te3계 단결정 열전재료는 성능지수는 우수하나, 기계적 취약성에 기인하여 소자가공시 수율 저하가 가장 큰 문제점으로 지적되고 있다. 이와 같은 문제점을 해결하기 위해 최근 단결정에 비해 기계적 강도가 우수한 다결정 열전재료의 제조공정에 관한 연구가 활발히 이루어지고 있으며, 그 일환으로 기계적 합금화법을 이용한 열전재료의 제조공정이 연구되고 있다. 원료금속이 고 에너지 볼-밀 내에서의 연쇄적인 파괴와 압접에 의해 합금분말로 변화되는 기계적 합금화 공정은 상온공정으로 이를 사용하여 다결정 열전재료를 제조시 기존의 다결정 열전재료의 제조공정인 "용해 및 분쇄법'과 비교하여 제조단가를 낮출 수 있는 장점이 있다. 본 연구에서는 전자냉각소자용 열전재료로서 상온부근에서 성능지수가 가장 우수한 p형 (Bi,Sb)2Te3 및 n형 Bi2(Te,Se)3 합금분말을 기계적 합금화 공정으로 제조하여 분말 특성을 분석하였으며, 가압소결 후 열전특성의 변화거동을 연구하였다. 순도 99.99% 이상인 Bi, Sb, Te, Se granule을 (Bi1-xSbx)2Te3 및 Bi2(Te1-ySey)3 조성에 맞게 칭량하여 불과 분말의 무게비 5:1로 강구와 함께 공구강 vial에 장입 후, Spex mixer/mill을 이용하여 기계적 합금화 하였다. 기계적 합금화 공정으로 제조한 분말에 대한 X-선 회절분석과 시차 열분석으로 합금화 정도를 분석하였다. (Bi1-xSbx)2Te3 및 Bi2(Te1-ySey)3 합금분말을 10-5 torr의 진공중에서 300℃∼550℃의 온도로 30분간 가압소결하였다. 가압소결체의 파단면에서의 미세구조를 주사전자현미경으로 관찰하였으며, 상온에서 가압소결체의 열전특성을 측정하였다. (Bi1-xSbx)2Te3의 기계적 합금화에 요구되는 공정시간은 Sb2Te3 함량에 따라 증가하여 x=0.5 조성에서는 4 시간 45분, x=0.75 조성에서는 5 시간, x=1 조성에서는 6 시간 45분의 vibro 밀링이 요구되었다. n형 Bi2(Te1-ySey)3 합금분말의 제조에 요구되는 밀링시간 역시 Bi2Se3 함량 증가에 따라 증가하였으며 Bi2(Te0.95Se0.05)3 합금분말의 제조에는 2시간, Bi2(Te0.9Se0.1)3 및 Bi2(Te0.85Se0.15)3 합금분말의 형성에는 3시간의 bivro 밀링이 요구되었다. 기계적 합금화로 제조한 p형 (Bi0.2Sb0.8)2Te3 및 n형 Bi2(Te0.9Se0.1)3 가압 소결체는 각기 2.9x10-3/K 및 2.1x10-3/K 의 우수한 성능지수를 나타내었다.

• Journal of Powder Materials
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• v.19 no.4
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• pp.285-290
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• 2012

The present study was focused on the analysis of the electric and thermal properties of spark plasma sintered $Bi_{0.5}Sb_{1.5}Te_3$ thermoelectric material. The crystal structure, microstructure, electric and thermal properties of the sintered body were evaluated by measuring XRD, SEM, electric resistivity, Hall effect and thermal conductivity. The $Bi_{0.5}Sb_{1.5}Te_3$ sintered body showed anisotropic crystal structure. The c-axis of the $Bi_{0.5}Sb_{1.5}Te_3$ crystal aligned in a parallel direction with applied pressure during spark plasma sintering. The degree of the crystal alignment increased with increasing sintering temperature and sintering time. The electric resistivity and thermal conductivity of the $Bi_{0.5}Sb_{1.5}Te_3$ sintered body showed anisotropic characteristics result from crystal alignment.

• Applied Chemistry for Engineering
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• v.28 no.5
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• pp.571-575
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• 2017

In this study, cadmium telluride (CdTe) quantum dots were synthesized by using ultrasonic irradiation method. Optical properties and structural characteristics of the CdTe quantum dots were analyzed by two main variables; the ratio of the precursor and the synthesis time. As the synthesis time increased, the band gap reduction was observed with the growth of CdTe quantum dots. As for the luminescence properties, the red shift appeared at 510~610 nm wavelength range. Also, it was confirmed that the red shift occurs rapidly as the ratio of Te increases. According to PL peak intensity, the highest intensity was shown at 180 to 240 min. Structural characteristics of CdTe quantum dots were investigated through XRD and TEM, and the cubic zinc blend structure was observed. The size of quantum dots was about 2.5 nm and uniformly dispersed when the synthesis time took 210 min. In addition, the apparent crystallinity was discovered in FFT image.