• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.278.2-278.2
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• 2014

We have investigated the highly flexible and transparent Si-doped $In_2O_3$(ISO)/Ag/ISO multilayer grown on polyethylene terephthalate (PET) substrates using a roll-to-roll sputtering system. The electrical and optical properties of ISO/Ag/ISO multilayer electrodes depended on the insertion of a nano-size Ag layer. Due to the high conductivity of a nano-size Ag layer, the optimized ISO/Ag/ISO multilayer electrodes showed the lowest resistivity of $3.679{\times}10^{-5}Ohm-cm$, even though the ISO/Ag/ISO multilayer electrodes was sputtered at room temperature. Furthermore, the ISO/Ag/ISO multilayer electrodes exhibited a high transmittance of 86.33%, because of the anti-reflection effect, comparable to Sn-doped $In_2O_3$ (ITO) electrodes. In addition, the ISO/Ag/ISO multilayer electrodes had a very smooth surface morphology without surface defects and showed good flexibility. The flexible OSCs fabricated on ISO(30nm)/Ag(8nm)/ISO(30nm) multilayer electrode showed a power conversion efficiency of 3.272%. This result indicates that the ISO/Ag/ISO multilayer is a promising transparent conducting electrode for flexible OSCs.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.50 no.3
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• pp.144-148
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• 2001

For the purpose of developing capacitive humidity sensor having interdigit electrodes, interdigit electrode was modeled and simulated to obtain capacitance and sensitivity as a function of geometric parameters like the structural gap and thichness. For the development of ASIC, switched capacitor signal conditioning circuits for capacitive humidity sensor were designed and simulated by cadence using 0.25um CMOS process parameters. The signal conditioning circuits are composed of amplifier for voltage gain control, and clock generator for sensor driving and switch control The characteristics of the fabricated sensors are; 1) sensitivity is 9fF/%R.H., 2) temperature coefficient of offset(TCO) is 0.4%R.H./$^{\circ}C$, 3) nonlinearity is 1.2%FS, 4) hysteresis is 1.5%FS in humidity range of 3%R.H. ${\sim}$ 98%R.H.. The response time is 50 seconds in adsorption and 70 seconds in desorption. Fabricated process used in this capacitive humidity sensor having interdigit electrode are just as similar as conventional IC process technology. Therefore this can be easily mass produced with low cost, simple circuit and utilized in many applications for both industrial and environmental measurement and control system, such as monitoring system of environment, automobile, displayer, IC process room, and laboratory etc..

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.35 no.1
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• pp.32-36
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• 2022

AGZO thin films were deposited on glass substrates using RF magnetron sputtering system under Ar flow rates, and their structural, electrical, and optical properties were analyzed systematically. As a result of the XRD pattern, the peak of the (002) (2θ≈33.7˚) orientation was observed, and it was found to have a hexagonal wurtzite structure. The sheet resistance of Ar 5 sccm was 3.073×10² Ω/sq and showed the best electrical properties because of the improvement of mobility due to the increase of the grain size and the variation of RMS roughness. In addition, the average transmittance was more than 90% for all samples, which demonstrated good optical properties. It is expected that the TCO characteristics can be improved by controlling Ar flow rates, and this will increase the efficiency of photoelectronic devices such as OLED and solar cells.

• Journal of Ceramic Processing Research
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• v.13 no.spc2
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• pp.407-410
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• 2012

The properties of Al-doped ZnO (AZO) films were investigated as a function of H2/(Ar + H2) gas ratio using an AZO (2 wt% Al2O3) ceramic target in a radio frequency (RF) magnetron sputtering system. The deposition process was done at 200 ℃ and in 2 × 10-2Torr working pressure and with various ratios of H2/(Ar + H2) gas. During the AZO film deposition process, partial H2 gas affected the AZO film characteristics. The electron resistivity (~ 9.21 × 10-4 Ωcm) was lowest and mobility (~17.8 ㎠/Vs) was highest in AZO films when the H2/(Ar + H2) gas ratio was 2.5%. When the H2/(Ar + H2) gas ratio was increased above 2.5%, the electron resistivity increased and mobility decreased with increasing H2/(Ar + H2) gas ratio in AZO films. The carrier concentration increased with increasing H2/(Ar + H2) gas ratio from 0% to 7.5%. This phenomenon was explained by reaction of hydrogen and oxygen and additional formation of oxygen vacancy. The average optical transmission in the visible light wavelength region over 90% and an orientation of the deposition was [002] orientation for AZO films grown with all H2/(Ar + H2) gas ratios.

• Information Systems Review
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• v.7 no.2
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• pp.213-228
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• 2005

Due to the rapid progress of IT utilization, many firms have been perplexed how to increase the productivity and efficiency of the Information System and also to reduce the Total Cost of Ownership (TCO) of IS Organization. This paper employs the lens of the competitive advantages through Information System Outsourcing (ISO) arrangement. And also the concept of the "Utility Computing" of IBM-VNS. The Information Outsourcing System(ISO) is the fully or partly endorsed IT Outsourcing method, that supplies IT infrastructure, application system and system maintenance service, as well for the company networks. Many companies have implemented their own Information System. But some of the projects were not successfully carried out. We found many reasons for such a unsatisfaction with the quality of the new Information system. In this paper we select the "HanGlas Group" as the Case Study for Information System Outsourcing to overcome such difficulties. Through this Case Study we will learn the positive and negative aspects of ISO based on Utility Computing.

• The Sea:JOURNAL OF THE KOREAN SOCIETY OF OCEANOGRAPHY
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• v.17 no.2
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• pp.33-44
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• 2012

Transparent exopolymer particles (TEP) are formed by aggregation of polysaccharide products excreted by phytoplankton and have sticky character like gel. They play important role in the production of marine snow in water column. To study the distribution pattern of TEP concentration and its role in carbon cycle in the surface ocean, we measured pH, Total alkalinity (TA), and chlorophyll-a in addition to physical characteristics of seawater within the surface water column. TEP concentrations ranged from nearly undetectable values to $338{\mu}g\;Xeq\;l^{-1}$. They were considerably lower than previously reported values from costal sites, but showed similar values observed in other oceanic region during phytoplankton bloom periods. The spatial distribution of TEP concentrations were similar to those of chlorophyll-a, which indicate that the production of TEP were closely related to phytoplankton. Calculated total dissolved inorganic carbon ($TCO_2$) from the pH and TA was normalized to 35 psu of salinity ($NTCO_2$) and showed negative linear relationship with temperature. Biological drawdown of $NTCO_2$ ($NTCO_{2bio}$) was estimated from the difference between theoretical $NTCO_2$ values and observed $NTCO_2$. In the warm region located south of $40^{\circ}N$ along the $132.5^{\circ}N$ meridional lines, $NTCO_{2bio}$ showed negative value and TEP concentrations were high. This suggested that negative $NTCO_{2bio}$ may be attributed to the biological processes. At the stations located between 44 and $46^{\circ}N$, TEP concentrations showed high concentration at the chlorophyll-a maximum layer within the water column while they showed low concentration in the surface layer. Carbon content of TEP constituted about 40% of $NTCO_{2bio}$ at the chlorophylla maximum layer. In this study, we could not observe any positive and negative relationship between TEP concentration and $NTCO_2$ or pH. It is obvious that we should consider the importance of TEP in the biological carbon cycling processes within surface layer.

• Journal of KIISE:Computing Practices and Letters
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• v.6 no.1
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• pp.82-92
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• 2000

This paper introduces an implementation of the diagnosis software for CC-NUMA systems. The CC-NUMA architecture is composed of two or more SMP nodes installed with the specialized hardware to provide cache-coherent operation and the high-speed interconnection network to connect each node, it enables both the high performance and the high scalability. While the CC-NUMA system provides the single system image in the operating system aspect, it should be considered the multiple systems by the diagnostic software. Thus it is difficult to diagnose and manage CC-NUMA system using commercial administration software due to characteristics of the complicated architecture. The remote diagnosis and management are also required with a view to reduce Total Cost of Ownership. In this paper, we design diagnostic software to manage CC-NUMA server system, and propose its mechanism in client-server manner to support remote administration. Additionally, we use the Java-based user interface to enlarge an administrator's accessibility.

• Korean Journal of Materials Research
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• v.20 no.4
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• pp.175-180
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• 2010

Transparent conducting oxide (TCO) films are widely used for optoelectronic applications. Among TCO materials, zinc oxide (ZnO) has been studied extensively for its high optical transmission and electrical conduction. In this study, the effects of $O_2$ plasma pretreatment on the properties of Ga-doped ZnO films (GZO) on polyethylene naphthalate (PEN) substrate were studied. The $O_2$ plasma pretreatment process was used instead of conventional oxide buffer layers. The $O_2$ plasma treatment process has several merits compared with the oxide buffer layer treatment, especially on a mass production scale. In this process, an additional sputtering system for oxide composition is not needed and the plasma treatment process is easily adopted as an in-line process. GZO films were fabricated by RF magnetron sputtering process. To improve surface energy and adhesion between the PEN substrate and the GZO film, the $O_2$ plasma pre-treatment process was used prior to GZO sputtering. As the RF power and the treatment time increased, the contact angle decreased and the RMS surface roughness increased significantly. It is believed that the surface energy and adhesive force of the polymer surfaces increased with the $O_2$ plasma treatment and that the crystallinity and grain size of the GZO films increased. When the RF power was 100W and the treatment time was 120 sec in the $O_2$ plasma pretreatment process, the resistivity of the GZO films on the PEN substrate was $1.05\;{\times}\;10^{-3}{\Omega}-cm$, which is an appropriate range for most optoelectronic applications.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.288-289
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• 2011

Indium Tin Oxide (ITO) is a typical highly Transparent Conductive Oxide (TCO) currently used as a transparent electrode material. Most widely used deposition method is the sputtering process for ITO film deposition because it has a high deposition rate, allows accurate control of the film thickness and easy deposition process and high electrical/optical properties. However, to apply high quality ITO thin film in a flexible microelectronic device using a plastic substrate, conventional DC magnetron sputtering (DMS) processed ITO thin film is not suitable because it needs a high temperature thermal annealing process to obtain high optical transmittance and low resistivity, while the generally plastic substrates has low glass transition temperatures. In the room temperature sputtering process, the electrical property degradation of ITO thin film is caused by negative oxygen ions effect. This high energy negative oxygen ions(about over 100eV) can be critical physical bombardment damages against the formation of the ITO thin film, and this damage does not recover in the room temperature process that does not offer thermal annealing. Hence new ITO deposition process that can provide the high electrical/optical properties of the ITO film at room temperature is needed. To solve these limitations we develop the Magnetic Field Shielded Sputtering (MFSS) system. The MFSS is based on DMS and it has the plasma limiter, which compose the permanent magnet array (Fig.1). During the ITO thin film deposition in the MFSS process, the electrons in the plasma are trapped by the magnetic field at the plasma limiters. The plasma limiter, which has a negative potential in the MFSS process, prevents to the damage by negative oxygen ions bombardment, and increases the heat(-) up effect by the Ar ions in the bulk plasma. Fig. 2. shows the electrical properties of the MFSS ITO thin film and DMS ITO thin film at room temperature. With the increase of the sputtering pressure, the resistivity of DMS ITO increases. On the other hand, the resistivity of the MFSS ITO slightly increases and becomes lower than that of the DMS ITO at all sputtering pressures. The lowest resistivity of the DMS ITO is $1.0{\times}10-3{\Omega}{\cdot}cm$ and that of the MFSS ITO is $4.5{\times}10-4{\Omega}{\cdot}cm$. This resistivity difference is caused by the carrier mobility. The carrier mobility of the MFSS ITO is 40 $cm^2/V{\cdot}s$, which is significantly higher than that of the DMS ITO (10 $cm^2/V{\cdot}s$). The low resistivity and high carrier mobility of the MFSS ITO are due to the magnetic field shielded effect. In addition, although not shown in this paper, the roughness of the MFSS ITO thin film is lower than that of the DMS ITO thin film, and TEM, XRD and XPS analysis of the MFSS ITO show the nano-crystalline structure. As a result, the MFSS process can effectively prevent to the high energy negative oxygen ions bombardment and supply activation energies by accelerating Ar ions in the plasma; therefore, high quality ITO can be deposited at room temperature.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.181.1-181.1
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• 2016

플렉서블 디스플레이 및 태양전지가 지향하고 있는 저가, 고속의 대량 생산을 위해서는 필름을 기반으로 하는 연속 공정에 의한 대량의 ITO 박막의 증착이 필수적이다. 이로 인해 롤투롤(roll-to-roll) 스퍼터링법을 이용한 ITO 박막의 연속 증착 공정이 차세대 플렉서블 디스플레이 및 태양전지의 대량 생산을 위한 해결책으로 각광받고 있다. 그러나 대부분의 폴리머 필름의 경우 증착 시 발생되는 열 또는 플라즈마에 의해 방출되는 수분과 유기 솔벤트 같은 오염 물질들에 의한 ITO 박막의 특성 저하와, 낮은 열적 안정성을 가지는 기판 특성상 고온(>$200^{\circ}C$)에서 증착이나 후 열처리를 할 수가 없기 때문에, 낮은 저항과 높은 광투과도 특성을 가지는 ITO 필름을 제작하기 위한 공정 최적화가 필요하다. 따라서, 본 연구에서는 롤투롤 스터링법으로 PET 필름 위에 Sn함량이 각각 3, 5, 7.5 10% 도핑된 ITO 타겟을 사용하여 ITO 박막을 증착 하였고, 전기적 광학적 특성을 조사하여 롤투롤 스퍼터링법으로 우수한 전기 전도도와 광투과도 특성을 가지는 ITO/PET 필름의 증착 조건을 최적화 하였다. 또한, ITO 증착 시 필름에서 발생하는 수분에 의한 ITO 박막의 특성 저하 현상에 대하여 조사하였다.