• Transactions on Electrical and Electronic Materials
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• v.11 no.3
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• pp.116-119
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• 2010

The etching characteristics of zinc oxide (ZnO) were investigated, including the etch rate and the selectivity of ZnO in a $Cl_2/BCl_3$/Ar plasma. It was found that the ZnO etch rate, the RF power, and the gas pressure showed non-monotonic behaviors with an increasing Cl2 fraction in the $Cl_2/BCl_3$/Ar plasma, a gas mixture of $Cl_2$(3 sccm)/$BCl_3$(16 sccm)/Ar (4 sccm) resulted in a maximum ZnO etch rate of 53 nm/min and a maximum etch selectivity of 0.89 for ZnO/$SiO_2$. We used atomic force microscopy to determine the roughness of the surface. Based on these data, the ion-assisted chemical reaction was proposed as the main etch mechanism for the plasmas. Due to the relatively low volatility of the by-products formed during etching with $Cl_2/BCl_3$/Ar plasma, ion bombardment and physical sputtering were required to obtain the high ZnO etch rate. The chemical states of the etched surfaces were investigated using X-ray photoelectron spectroscopy (XPS). This data suggested that the ZnO etch mechanism was due to ion enhanced chemical etching.

• Journal of Photoscience
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• v.3 no.3
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• pp.167-169
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• 1996

Absorption of UV light induces photocleavage of polymer chains to produce free radicals which initiate photodegradation of the polymer molecules. Discoloration, cracking of surface, stiffening, and decreasing of mechanical properties of polymeric products occur as a result of photodegradation of the polymers. Photostabilizers are added to the polymer systems in order to minimize the unwanted effects of UV light. It is well known that Hindered Amine Light Stabilizers (HALS) are one of the most effective photostabilizer for polymers.' HALS have been used in a large number of commercial polymers and predominantly used in styrenic and engineering plastics. They are efficient and cost-effective in many applications despite their high prices. However, low molecular weight HALS vaporize easily, emitting harmful amines, and have poor extraction resistance, decreasing their photostabilization effect. They also decompose during processing and migrate within the polymers resulting in deposition on the polymer surfaces called 'blooming". These drawbacks of low molecular HALS can be overcome by use of the polymeric HALS. We have been studying photochemical reactions of the polymer systems. The present paper reports the preparation of a new polymeric photostabilizer containing HALS groups and their stabilization effects on photooxidation of polystyrene. The synthetic scheme for the preparation of polymeric photostabilizers containing HALS groups were shown at Scheme 1. N-[(Chloroformyl) phenyl]maleimide (CPMI) and N-[4-(chlorocarbonyl) phenyl]maleimide (CPMIC) were prepared by the known procedure. N[4-N'-(2,2,6,6-tetramethyl-4-piperidinyl)aminocarbonyl-phenyl] maleimide (TMPI) was prepared by the reaction of CPMI with 4-amino-2,2,6,6-tetramethylpiperidine (ATMP).

• Journal of the Korean Applied Science and Technology
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• v.11 no.2
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• pp.113-120
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• 1994

Amphoteric surfactants were synthesized by the cyclization of 1-(2-hydroxyethyl)-2-undecyl-2-imidazoline [I] with acrylic acid ethyl ester. Compound [I] was easily hydrolyzed with water, especially in the presence of a alkali, to afford amidoamines. After [I] was hydrolyzed, the reaction mixture was allowed to react with acrylic acid ethyl ester and then soapoinfied. Only sodium salts of N- -(2-carboxyethyl)-N'-(2-hydroxyethyl)aminoethyl]dodecanoyl amide[III] was obtained. However, when the reacton of [I] with acrylic acid ethyl ester was carried out in the presence of water, followed by soapnification, ring cleavage of [I] occurred at 2, 3 position, different from hydrolysis of [I] where the cleavage occurred at 1, 2 position, to give sodium salts of N-[N'-(2-carboxyethyl)aminoethyl]-N-(2-hydroxyethyl)dodecanoyl amide [IV] and N-[N', N'-bis(2-carboxyethyl)aminoethyl]-N(2-hydroxyethyl)dodecanoyl amide [V] as main products.

• Journal of the Korean Chemical Society
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• v.27 no.6
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• pp.457-463
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• 1983

-Alkyl-2-hydroxyphenazine-5,10-dioxides were synthesized from hydroquinone, and alkyl benzofuroxanes which were previously obtained through five reaction steps starting from aniline. Infrared, nuclear mangnetic resonance spectrometry and elemental analysis were employed to identify the products concerned in the synthetic processes. It was observed that these alkylated phenazine oxides lowered the surface tension of water substantially. These derivatives showed stronger antimicrobial activity against both gram positive and negative microbes than 1-carboxyphenazine which had no alkyl side chain. It was also found that the antimicrobial activity of the phenazine compound increased when the nitrogen of the ring was bound to the oxygen atom.

• Journal of the Korean Wood Science and Technology
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• v.19 no.4
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• pp.18-26
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• 1991

This study was carried out to examine not only the effect and the process of activation of aluminum sulfate for the manufacture of PB and MDF, but also application of the activation treatment to PB and MOF made with MDI adhesive. The results were as follows: 1. For the manufacture of PB, activating effect did not take place Because the low moisture content of 30% in the process of activation treatment made probably insufficient activation. It needs to examine higher moisture content for the uniform and enough activation same as that of MOF. 2. In the case of MOF, Activating effect was excellent, it showed not only better results of MOR 48%, MOE 29%, IB 60% than those of the control but also better dimensional stability. 3. Application of alum activation to the PB and MDF made with MDI adhesive yielded no effects. Maybe it was the reson that the curing mechanism of MDI is different. 4. Modifing the wood surface was the oxidation and wettability was not the variable limiting glueline performance. It is necessary to make a more study about activating reaction.

• Journal of the Korean Chemical Society
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• v.25 no.2
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• pp.92-96
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• 1981

The reactions of adsorbed oxygen species, $O_2^-$ and $O^-$, with propylene on ZnO were studied by EPR spectroscopy and temperature programmed desorption technique. Propylene interacts with adsorbed $O_2^-$ at $25^{\circ}C$ and the surface intermediate was decomposed to CO, $H_2$, $CO_2$ and $CH_4$ by raising the temperature above $200^{\circ}C$, while $O^-$ gave the products of complete oxidation, $CO_2$ and $H_2O$ above $300^{\circ}C$.

• Journal of the Korean Ceramic Society
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• v.43 no.9 s.292
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• pp.564-568
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• 2006

AlO(OH) nano gel is used in precursor of ceramic material, coating material and catalyst. For use of these, not only physiochemical control for particle morphology, pore characteristic and peptization but also studies of synthetic method for preparation of advanced application products were required. In this study, AlO(OH) nano gel was prepared through the aging and drying process of aluminum hydroxides gel precipitated by the hydrolysis reaction of dilute NaOH solution and aluminum sulfate solution. In this process, optimum synthetic condition of AlO(OH) nano gel having excellent pore volume as studying the effect of water and aluminum sulfate mole ratio on gel precipitates has been studied. Water and aluminum sulfate mole ratio brought about numerous changes on crystal morphology, surface area, pore volume and pore size. Physiochemical properties were investigated as using XRD, TEM, TG/DTA, FT-IR, and $N_2$ BET method.

• Journal of the Korean Ceramic Society
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• v.44 no.9
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• pp.517-523
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• 2007

For the preparation of tricalciumaluminate $(C_3A)$ clinker, in traditional clinkering method using oxides and carbonates as a raw material, uneconomical repetition of burning have been necessary to avoid the melting of clinker by eutectic reaction in the system $CaO-Al_2O_3$. In this study, special starting raw materials for the clinker burning were prepared from a mixture of oyster shell and aluminium hydroxide by heating to $1100^{\circ}C$ and hydrating at $30^{\circ}C$. The starting raw materials, hardened body with weak hydraulic strength, were mainly composed of $C_3AH_6$ formed by resolution-precipitation mechanism of the system $CaO-Al_2O_3-H_2O$. By heating them, relatively pure $C_3A$ clinker could be obtained by one-time burning at the fairly lower temperature than that of conventional method. The easier formation of $C_3A$ clinker seemed to be caused by higher compositional homogeneity and stoichiometry of the starting materials, high surface area and crystallographic instability of the thermally decomposed products, and the catalytic effect of decomposed moisture on the early-stage crystallization of calciumaluminates. The basic hydration behavior of the clinker was also confirmed.

• Proceedings of the Korean Institute of Building Construction Conference
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• 2011.05a
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• pp.19-22
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• 2011

For underground structures that are exposed to environmental conditions, the declination of the durability of concrete occurs easily because of leakages from high hydraulic pressure and the frequent contact of water due to environmental factors. Therefore this study is to confirm that the leakage reduction of natural inorgnic powder compound applying subsurface structural weak part and make the performance improvement of concrete as an objective. The test was done by making the rebar, flat tie, nail and film infiltration and each of its water tank and cylindrical test body then after pouring water to each of the test body, the test observe the change of the water tank surface absorbed condition and leakage of each specimen with respect to time. As a conclusion, the test was observed that this water proofing admixture has better watertightness from the beginning of the setting time(when it hardens), the ettringite and the thaumasite generates a large quantity of hydration products that controls the formation in a large opening and the CSH produced by pozzolan reaction makes a dent at this opening.

• Tribology and Lubricants
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• v.38 no.4
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• pp.152-161
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• 2022

Chemical mechanical planarization (CMP) is a technology that planarizes the surfaces of semiconductor devices using chemical reaction and mechanical material removal, and it is an essential process in manufacturing highly integrated semiconductors. In the CMP process, a conditioning process using a diamond conditioner is applied to remove by-products generated during processing and ensure the surface roughness of the CMP pad. In previous studies, prediction of pad wear by CMP conditioning has depended on numerical analysis studies based on mathematical simulation. In this study, using an artificial neural network, the ratio of conditioner coverage to the distance between centers in the conditioning system is input, and the average conditioning density, standard deviation, nonuniformity (NU), and conditioning density distribution are trained as targets. The result of training seems to predict the target data well, although the average conditioning density, standard deviation, and NU in the contact area of wafer and pad and all areas of the pad have some errors. In addition, in the case of NU, the prediction calculated from the training results of the average conditioning density and standard deviation can reduce the error of training compared with the results predicted through training. The results of training on the conditioning density profile generally follow the target data well, confirming that the shape of the conditioning density profile can be predicted.