• Journal of the Korea Concrete Institute
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• v.11 no.6
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• pp.79-88
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• 1999

In this paper, the electro-deposition method for the rehabilitation of cracked concrete, based on the electro-chemical technique, is presented. The main purpose of this paper is to apply this technique to reinforced concrete members on land. After cracking with a specified load(crack width 0.5mm), 10$\times$10$\times$20cm concrete specimens with embedded steel bars were immersed in several solutions, then a constant current density between the embedded steel in concrete and an electrode in the solution was applied for 4~20 weeks. The results indicate that electro-deposits formed in this process are able to close concrete cracks and to coat the concrete surface and that formation of these electro-deposits is confirmed to have an effect of protection against detrimental materials. Therefore, it is demonstrated that the electro-deposition method can be usefully applied for the rehabilitation technique of concrete.

• Journal of the Korean institute of surface engineering
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• v.33 no.2
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• pp.69-76
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• 2000

The rf plasma chemical vapor deposition is a common method employed for diamond or amorphous carbon deposition. Diamond possesses the strongest bonding, as exemplified by a number of unique properties-extraordinary hardness, high thermal conductivity, and a high melting tempera tore. Therefore, it is very important to investigate the synthesis of semiconducting diamond and its use as semiconductor devices. An inductively coupled rf plasma CVD system for producing amorphous carbon films were developed. Uniform temperature and concentration profiles are requisites for the deposition of high quality large-area films. The system consists of rf matching network, deposition chamber, pumping lines for gas system. Gas mixtures with methane, and hydrogen have been used and Si (100) wafers used as a substrate. Amorphous carbon films were deposited with methane concentration of 1.5% at the process pressure of S torr~20 torr, and process temperature of about $750^{\circ}C$. The nucleation and growth of the amorphous carbon films have been characterized by several methods such as SEM and XRD.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.66 no.8
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• pp.1236-1241
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• 2017

We deposited Al-doped ZnO (ZnO:Al) thin films on glass substrates ($200mm{\times}200mm$) by using in-line magnetron sputtering system. Effects of various deposition parameters such as working pressure, deposition power and substrate temperature on optoelectronic characteristics including surface-texture etching profiles were carefully investigated in this study. We found that relatively low working pressure and high deposition power offered to obtain enhanced conductivity and optical transmittance. Haze properties showed similar trend with the transmittance. Furthermore, surface-texture etching study exhibited good morphologies when the films were deposited at $200-300^{\circ}C$. On the basis of these optimizations, we could find the deposition region that produces highly transparent and conductive properties including efficient light scattering capability.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.26 no.3
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• pp.410-416
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• 2002

The fluid flow, heat transfer and the local mass fraction of chemical species in the chemical vapor deposition(CVD) manufacturing process are studied numerically. Flow with a dilute precursor concentration of silane in hydrogen as the carrier gas enters to the reactor and deposits silicon onto the heated surface. The silicon deposition rate using silane is calculated in the horizontal or vertical, axisymmetric reactor. The effects of inlet carrier gas velocity, mass fraction of silane, susceptor angle and rotation of surface on the deposition rate are described.

• Journal of the Korean institute of surface engineering
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• v.29 no.5
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• pp.474-477
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• 1996

The solid state cesium ion beam sputter deposition system has been developed for negative carbon ion beam deposition. The negative carbon ion beams are effectively produced by cesium ion bombardment. The C-ion beam current and deposition energy can be independently controlled for the deposition of a-D films. This system is very compact, reliable and high flux without any gas discharge or plasma and has been successfully used in the studies of the ion beam deposited amorphous diamond(a-D)

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.06a
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• pp.6-7
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• 2001

• Journal of the Korean institute of surface engineering
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• v.26 no.3
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• pp.135-142
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• 1993

탄소강 및 Nickel 음극에서 아연의 전착특성에 대하여 조사하였다. 황산아연 및 염화아연용액속에서 회전전극을 사용하여 실험한 결과 아연의 평형전위 이전에서 전착이 일어나는 소위 Underpotential Deposition 현상이 관찰되었다. 또한 이렇게 전착이 일어난 아연층은 평형상태에서 일정한 두께로 제한되는데 전착전압에 따른 전착층의 전하량을 계산한 결과 다층흡착구조과 유사한 경향을 나타내었다.

• Journal of Korean Society for Atmospheric Environment
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• v.19 no.6
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• pp.773-787
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• 2003

There are variations in the temperature Held due to urban heat island and anthropogenic heating so that regional scale meteorological field is changed. Therefore we simulate and predict the regional climate change according to surface characteristics through regional meteorological model. This study investigates the regional meteorological field by urbanization that influences in local circulation system using CSU-RAMS and simulates dry deposition velocity (V$_{d}$) using PNU/DEM which includes surface characteristics (such as albedo, surface hydrology and rough-ness length etc.) with calculated meteorological field. During the summer, horizontal distributions of V$_{d}$ were simulated using CSU-RAMS and PNU/DEM at Busan metropolitan area. The estimated values of V$_{d}$ were larger in forest and agricultural areas than water areas since ozone with low water solubility is destroyed slowly at wet surface or water.water.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 1997.10a
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• pp.1042-1046
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• 1997

Fused deposition modelling(FDM) is a rapid prototyping(RP) process that fabricates part layer by layer by deposition of molten thennoplastic material extrude from a nozzle. RP system has many benefit. One of the benefit would be the ability to experiment with physical objects of any complexity in a relatively short period of time. But it has a matter of surface roughness and geometric accuracy. We research into a change of Surface roughness making the sphere by adjustment of extrusion in FDM.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.11 no.5
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• pp.340-346
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• 1998

In this study, we intended to investigate aging effect of polyimide prepared by VDPD(vapor deposition polymerized method). The prepared polymide was treated by the oxygen and argon gas plasma. And we evaluated the polyimide treated by plasma from contact angle, surface leakage current, FT-IR and SEM. We know that the structure of polyimide at surface are changed to amide structure by plasma treating. It seems that strong energy of plasma causes breaking the molecular chin of the polyimide. And surface roughness increases with plasma treating time increased and sequentially the wettability and leakage current increases.