• Title/Summary/Keyword: Surface and cross-sectional microstructure

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Crystallized Nano-thick ZnO Films with Low Temperature ALD Process (저온 원자층 증착으로 형성된 ZnO 박막의 물성과 결정성 연구)

  • Yu, Byungkwan;Han, Jeungjo;Song, Ohsung
    • Korean Journal of Metals and Materials
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    • v.48 no.12
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    • pp.1109-1115
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    • 2010
  • ZnO thin films were deposited on Si(100) substrates at low temperatures ($44^{\circ}C{\sim}210^{\circ}C$) by atomic layer deposition using DEZn (diethyl zinc) and water as precursors. The film thickness was measured by ellipsometry calibrated with cross-sectional TEM. The phase formation, microstructure evolution, UV-absorbance, and chemical composition changes were examined by XRD, SEM, AFM, TEM, UV-VIS-NIR, and AES, respectively. A uniform amorphous ZnO layer was formed even at $44^{\circ}C$ while stable crystallized ZnO films were deposited above $90^{\circ}C$. All the samples showed uniform surface roughness below 3 nm. Fully crystallized ZnO layers with a band-gap of 3.37 eV without carbon impurities can be formed at substrate temperatures of less than $90^{\circ}C$.

Microstructural Analysis of Epitaxial Layer Defects in Si Wafer

  • Lim, Sung-Hwan
    • Korean Journal of Materials Research
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    • v.20 no.12
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    • pp.645-648
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    • 2010
  • The structure and morphology of epitaxial layer defects in epitaxial Si wafers produced by the Czochralski method were studied using focused ion beam (FIB) milling, scanning electron microscopy (SEM), and transmission electron microscopy (TEM). Epitaxial growth was carried out in a horizontal reactor at atmospheric pressure. The p-type Si wafers were loaded into the reactor at about $800^{\circ}C$ and heated to about $1150^{\circ}C$ in $H_2$. An epitaxial layer with a thickness of $4{\mu}m$ was grown at a temperature of 1080-$1100^{\circ}C$. Octahedral void defects, the inner walls of which were covered with a 2-4 nm-thick oxide, were surrounded mainly by $\{111\}$ planes. The formation of octahedral void defects was closely related to the agglomeration of vacancies during the growth process. Cross-sectional TEM observation suggests that the carbon impurities might possibly be related to the formation of oxide defects, considering that some kinds of carbon impurities remain on the Si surface during oxidation. In addition, carbon and oxygen impurities might play a crucial role in the formation of void defects during growth of the epitaxial layer.

Property and Microstructure Evolution of Nickel Silicides on Nano-thick Polycrystalline Silicon Substrates (나노급 다결정 실리콘 기판 위에 형성된 니켈실리사이드의 물성과 미세구조)

  • Kim, Jong-Ryul;Choi, Young-Youn;Song, Oh-Sung
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.9 no.1
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    • pp.16-22
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    • 2008
  • We fabricated thermally-evaporated 10 nm-Ni/30 nm and 70 nm Poly-Si/200 nm-$SiO_2/Si$ structures to investigate the thermal stability of nickel silicides formed by rapid thermal annealing(RTA) of the temperature of $300{\sim}1100^{\circ}C$ for 40 seconds. We employed for a four-point tester, field emission scanning electron microscope(FE-SEM), transmission electron microscope(TEM), high resolution X-ray diffraction(HRIXRD), and scanning probe microscope(SPM) in order to examine the sheet resistance, in-plane microstructure, cross-sectional microstructure evolution, phase transformation, and surface roughness, respectively. The silicide on 30 nm polysilicon substrate was stable at temperature up to $900^{\circ}C$, while the one on 70 nm substrate showed the conventional $NiSi_2$ transformation temperature of $700^{\circ}C$. The HRXRD result also supported the existence of NiSi-phase up to $900^{\circ}C$ for the Ni silicide on the 30 nm polysilicon substrate. FE-SEM and TEM confirmed that 40 nm thick uniform silicide layer and island-like agglomerated silicide phase of $1{\mu}m$ pitch without residual polysilicon were formed on 30 nm polysilicon substrate at $700^{\circ}C\;and\;1000^{\circ}C$, respectively. All silicides were nonuniform and formed on top of the residual polysilicon for 70 nm polysilicon substrates. Through SPM analysis, we confirmed the surface roughness was below 17 nm, which implied the advantage on FUSI gate of CMOS process. Our results imply that we may tune the thermal stability of nickel monosilicide by reducing the height of polysilicon gate.

High Temperature Properties of Vanadium and Molybdenum Added High Silicon Ductile Iron (바나듐과 몰리브덴이 첨가된 고규소 구상흑연주철의 고온특성)

  • Park, Heung-Il;Jeong, Hae-Yong
    • Journal of Korea Foundry Society
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    • v.27 no.5
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    • pp.203-208
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    • 2007
  • The high temperature properties of vanadium and molybdenum added high silicon ductile iron, so called V-Mo-Si ductile iron, were investigated. The (V,Mo) complex carbides and Mo carbides precipitated at the cellular boundaries of the as-cast specimens. The microhardness of the (V,Mo) carbides were in the range of 553-619, while that of the Mo carbides in the range of 341-390. The thermo-mechanical tests were carried out with a Gleeble system at 700 and $800^{\circ}C$ under vacuum condition. The tensile strengths of the specimen tested at $700^{\circ}C$ with the dynamic deformation rate of 50 mm/sec and those with the static deformation rate of 0.15 mm/sec were 235.7 and 115.3 MPa, while the reduction in area were 23.7 and 22.4%, respectively. At the high dynamic deformation rates, the tensile strength was steeply increased due to promoting the brittle fracture of pearlite in the matrix of the specimens. But the changes of the reduction in area with the deformation rates on the same specimens were negligible. The weight gain of the V-Mo-Si specimens oxidized in the air atmosphere for 6 hours at 800 and $900^{\circ}C$ were 1.1 and 4.1.%, respectively. The cross-sectional microstructure of oxidized specimens consisted of the porous external scale layer grown outside from the original surface, the dense internal scale layer grown into the original surface, the decarburized ferrite layer between the internal scale and the matrix of base metal. The (V,Mo) carbides and Mo carbides formed in the matrix of as-cast specimen did not decompose during oxidation at 900 for 24 hours in air atmosphere.

Corrosion of Selected Materials in Boiling Sulfuric Acid for the Nuclear Power Industries

  • Kim, Dong-Jin;Lee, Han Hee;Kwon, Hyuk Chul;Kim, Hong Pyo;Hwang, Seong Sik
    • Corrosion Science and Technology
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    • v.6 no.2
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    • pp.37-43
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    • 2007
  • Iodine sulfur (IS) process is one of the promising processes for a hydrogen production by using a high temperature heat generated by a very high temperature gas cooled reactor(VHTR) in the nuclear power industries. Even though the IS process is very efficient for a hydrogen production and it is not accompanied by a carbon dioxide evolution, the highly corrosive environment of the process limits its application in the industry. Corrosion tests of selected materials were performed in sulfuric acid to select appropriate materials compatible with the IS process. The materials used in this work were Fe-Cr alloys, Fe-Ni-Cr alloys, Fe-Si alloys, Ni base alloys, Ta, Ti, Zr, SiC, Fe-Si, etc. The test environments were 50 wt% sulfuric acid at $120^{\circ}C$ and 98 wt% at $320^{\circ}C$. Corrosion rates were measured by using a weight change after an immersion. The surface morphologies and cross sectional areas of the corroded materials were examined by using SEM equipped with EDS. Corrosion behaviors of the materials were discussed in terms of the chemical composition of the materials, a weight loss, the corrosion morphology, the precipitates in the microstructure and the surface layer composition.

A Study on Characteristics of Durability for Plunger of High Speed and Ultra-High Pressure Reciprocating Pump Using High Velocity Oxygen Fuel Spraying (초고속 용사 적용 고속 초고압 왕복동 펌프 플런저의 내구성 특성에 관한 연구)

  • Bae, Myung-Whan;Park, Byoung-Ho;Jung, Hwa;Park, Hui-Seong
    • Transactions of the Korean Society of Automotive Engineers
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    • v.22 no.5
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    • pp.20-28
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    • 2014
  • The high velocity oxygen fuel spraying (HVOF) is a kind of surface modification process technology to form the sprayed coating layer after spraying the powder to molten or semi-molten state by the ultra-high speed at the high-temperature heat source and conflicting with a substrate. It is desirable to melt completely the thermal spray powder in order to produce the coating layer with an optimal adhesion, however, because a semi-molten powder in a spray process has the low efficiency and become a factor that degrades the mechanical property by the inducement of pore-forming within the coating layer. To improve the wear resistance, corrosion resistance and heat resistance, in this study, the plungers of high-speed and ultra-high pressure reciprocating hydraulic pumps for oil and water used in ironwork are produced with $420J_2$ and the coating layers of plungers are formed by the powders of WC-Co-Cr and WC-Cr-Ni including the high hardness WC. The surface of these plungers is modified by the super-mirror face grinding machine using variable air pressure developed in this laboratory, and then the characteristics of cross-sectional microstructure, and surface roughness and hardness values between no operation and 100 days-operation are examined and made a comparison. The fine tops and bottoms on surface roughness curve of oil-hydraulic pump plunger sprayed by WC-Cr-Ni are molded more and higher than those of water-hydraulic pump sprayed by WC-Co-Cr because the plunger diameter of oil-hydraulic pump is 0.4 times smaller than that of water-hydraulic pump and the pressure of oil-hydraulic pump exerted on the plunger is operated with the 70 bars higher than that of water-hydraulic pump. As a result, it is found that the values of centerline average surface roughness and maximum height for oil-hydraulic pump plunger are bigger than those of water-hydraulic pump plunger.

Property of Nickel Silicides on ICP-CVD Amorphous Silicon with Silicidation Temperature (ICP-CVD 비정질 실리콘에 형성된 처리온도에 따른 저온 니켈실리사이드의 물성 변화)

  • Kim, Jong-Ryul;Choi, Young-Youn;Park, Jong-Sung;Song, Oh-Sung
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.9 no.2
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    • pp.303-310
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    • 2008
  • We fabricated hydrogenated amorphous silicon(a-Si:H) 140 nm thick film on a $180\;nm-SiO_2/Si$ substrate with an inductively-coupled plasma chemical vapor deposition(ICP-CVD) equipment at $250^{\circ}C$. Moreover, 30 nm-Ni film was deposited with a thermal-evaporator sequently. Then the film stack was annealed to induce silicides by a rapid thermal annealer(RTA) at $200{\sim}500^{\circ}C$ in every $50^{\circ}C$ for 30 minuets. We employed a four-point tester, high resolution X-ray diffraction(HRXRD), field emission scanning electron microscope(FE-SEM), transmission electron microscope(TEM), and scanning probe microscope(SPM) in order to examine the sheet resistance, phase transformation, in-plane microstructure, cross-sectional microstructure evolution, and surface roughness, respectively. We confirmed that nano-thick high resistive $Ni_3Si$, mid-resistive $Ni_2Si$, and low resistive NiSi phases were stable at the temperature of <300, $350{\sim}450^{\circ}C$, and >$450^{\circ}C$, respectively. Through SPM analysis, we confirmed the surface roughness of nickel silicide was below 12 nm, which implied that it was superior over employing the glass and polymer substrates.

Ultrasonic characterization of exhumed cast iron water pipes

  • Groves, Paul;Cascante, Giovanni;Knight, Mark
    • Smart Structures and Systems
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    • v.7 no.4
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    • pp.241-262
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    • 2011
  • Cast iron pipe has been used as a water distribution technology in North America since the early nineteenth century. The first cast iron pipes were made of grey cast iron which was succeeded by ductile iron as a pipe material in the 1940s. These different iron alloys have significantly different microstructures which give rise to distinct mechanical properties. Insight into the non-destructive structural condition assessment of aging pipes can be advantageous in developing mitigation strategies for pipe failures. This paper examines the relationship between the small-strain and large-strain properties of exhumed cast iron water pipes. Nondestructive and destructive testing programs were performed on eight pipes varying in age from 40 to 130 years. The experimental program included microstructure evaluation and ultrasonic, tensile, and flexural testing. New applications of frequency domain analysis techniques including Fourier and wavelet transforms of ultrasonic pulse velocity measurements are presented. A low correlation between wave propagation and large-strain measurements was observed. However, the wave velocities were consistently different between ductile and grey cast iron pipes (14% to 18% difference); the ductile iron pipes showed the smaller variation in wave velocities. Thus, the variation of elastic properties for ductile iron was not enough to define a linear correlation because all the measurements were practically concentrated in single cluster of points. The cross-sectional areas of the specimens tested varied as a result of minor manufacturing defects and levels of corrosion. These variations affect the large strain testing results; but, surface defects have limited effect on wave velocities and may also contribute to the low correlations observed. Lamb waves are typically not considered in the evaluation of ultrasonic pulse velocity. However, Lamb waves were found to contribute significantly to the frequency content of the ultrasonic signals possibly resulting in the poor correlations observed. Therefore, correlations between wave velocities and large strain properties obtained using specimens manufactured in the laboratory must be used with caution in the condition assessment of aged water pipes especially for grey cast iron pipes.

Homogeneity of Microstructure and Mechanical Properties of Ultrafine Grained OFHC Cu Bars Processed by ECAP (ECAP 가공에 의해 제조된 초미세립 OFHC Cu 봉재의 미세조직 및 기계적 특성의 균질성)

  • Ji, Jung Hoon;Park, Lee-Ju;Kim, Hyung Won;Hwang, Si Woo;Lee, Chong Soo;Park, Kyung Tae
    • Korean Journal of Metals and Materials
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    • v.49 no.6
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    • pp.474-487
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    • 2011
  • Bars of OFHC Cu with the diameter of 45 mm were processed by equal channel angular pressing up to 16 passes via route $B_c$, and homogeneity of their microstructures and mechanical properties was examined at every four passes which develop the equiaxed ultrafine grains. In general, overall hardness, yield strength and tensile strength increased by 3, 7, and 2 times respectively compared with those of unECAPed sample. Cross-sectional hardness exhibited a concentric distribution. Hardness was the highest at the center of bar and it decreased gradually from center to surface. After 16 passes, overall hardness decreased due to recovery and partial recrystallization. Regardless of the number of passage, yield strength and tensile strength were quite uniform at all positions, but elongation showed some degree of scattering. At 4 passes, coarse and ultrafine grains coexisted at all positions. After 4 passes, uniform equiaxed ultrafine grains were obtained at the center, while uniform elongated ultrafine grains were manifested at the upper half position. At the lower half position, grains were equiaxed but its size were inhomogeneous. It was found that inhomogeneity of grain morphology and grain size distribution at different positions are to be attributed to scattering in elongation but they did not affect strength. The present results reveal the high potential of practical application of equal channel angular pressing on fabrication of large-sized ultrafine grained bars with quite homogeneous mechanical properties.

Property of Composite Silicide from Nickel Cobalt Alloy (니켈 코발트 합금조성에 따른 복합실리사이드의 물성 연구)

  • Kim, Sang-Yeob;Song, Oh-Sung
    • Korean Journal of Materials Research
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    • v.17 no.2
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    • pp.73-80
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    • 2007
  • For the sub-65 nm CMOS process, it is necessary to develop a new silicide material and an accompanying process that allows the silicide to maintain a low sheet resistance and to have an enhanced thermal stability, thus providing for a wider process window. In this study, we have evaluated the property and unit process compatibility of newly proposed composite silicides. We fabricated composite silicide layers on single crystal silicon from $10nm-Ni_{1-x}Co_x/single-crystalline-Si(100),\;10nm-Ni_{1-x}Co_x/poly-crystalline-\;Si(100)$ wafers (x=0.2, 0.5, and 0.8) with the purpose of mimicking the silicides on source and drain actives and gates. Both the film structures were prepared by thermal evaporation and silicidized by rapid thermal annealing (RTA) from $700^{\circ}C\;to\;1100^{\circ}C$ for 40 seconds. The sheet resistance, cross-sectional microstructure, surface composition, were investigated using a four-point probe, a field emission scanning probe microscope, a field ion beam, an X-ray diffractometer, and an Auger electron depth profi1ing spectroscopy, respectively. Finally, our newly proposed composite silicides had a stable resistance up to $1100^{\circ}C$ and maintained it below $20{\Omega}/Sg$., while the conventional NiSi was limited to $700^{\circ}C$. All our results imply that the composite silicide made from NiCo alloy films may be a possible candidate for 65 nm-CMOS devices.