• Title/Summary/Keyword: Surface Profiler

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증착 온도 변화에 따른 IGZO 박막의 특성

  • Kim, Seong-Yeon;Lee, Tae-Il;Myeong, Jae-Min
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2009.05a
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    • pp.23.1-23.1
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    • 2009
  • Transparent thin film transistor(TTFT)는 기존의 디스플레이가 가지고 있는 공간적, 시각적 제약을 해소하는 것이 가능하며, 이는 디스플레이 산업 및 기술이 지향하는 대면적, 저가격, 공정의 단순함을 해결해 줄 수 있기 때문에 최근 TTFT에 관한 연구가 급증하고 있다. 산화물 기반의 TFT는 유리, 금속, 플라스틱 등등 그 기판 종류에 상관없이 균일한 제작이 가능하며, 상온 및 저온에서 대면적으로 제작 가능하고, 저렴한 비용으로 제작 가능하다는 장점 때문에 최근 산화물을 기반으로 하는 TFT 연구가 많이 이루어지고 있다. 현재 TTFT 물질로 많이 연구되고 있는 산화물은 ZnO(3.4 eV)나 $InO_x$(3.6 eV), $GaO_x$(4.9 eV), $SnO_x$(3.7 eV)등의 물질과 각각의 조합으로 구성된 재료들이 주로 사용되고 있다. 가장 많은 연구가 이루어진 ZnO 기반의 TFT는 mobility와 switching 속도에서 우수한 특성을 보이나, amorphous ZnO 기반의 TFT의 경우 소자의 안정성이 떨어지는 것으로 보고되고 있다. 따라서 본 연구에서는 ZnO 보다 넓은 bandgap energy를 가질 수 있으며, n-type 특성을 보이고, amorphous 구조로 제작 가능한 IGZO 물질을 사용하여 RF magnetron sputtering 방법으로 박막 증착 온도의 변화를 주어 증착하였고, 증착된 IGZO 박막의 열처리를 통해 이에 따른 특성 변화를 분석하였다. Field emission scanning electron microscope(FESEM)와 surface profiler를 이용하여 IGZO 박막의 표면의 형상과 두께를 확인하였으며, x-ray diffraction(XRD) 분석을 통해 박막의 결정학적 특성을 관찰하였다. TTFT 물질로서 IGZO 박막의 적합성 여부를 확인하기 위하여 TFT를 만든 후 I-V를 측정하였으며, UV-vis를 이용하여 IGZO 박막의 투과율을 분석하여 TTFT로의 응용 가능성을 확인하였다.

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Etching mechanism of ZnO films using high density plasma (고밀도 플라즈마를 이용한 ZnO 박막의 식각 특성 분석)

  • Kang, Chan-Min;Kim, Gwan-Ha;Kim, Chang-Il
    • Proceedings of the KIEE Conference
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    • 2006.07c
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    • pp.1382-1383
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    • 2006
  • ZnO 박막은 wide band gap(Eg=3.37eV)의 derect band gap을 갖고 있기 때문에 여러 소자로의 응용가능성에 큰 기대를 하고 있는 물질이다. 본 논문에서는 소자 제조과정에서 요구되는 ZnO 박막의 식각변수에 따른 식각율과 식각특성에 관하여 연구하였으며 Inductively coupled plasma(ICP)를 사용하여 $BCl_3$/Ar 가스를 혼합하여 식각을 하였다. $BCl_3$/Ar=8/2 플라즈마에서 화학적 식각의 도움을 받아 ZnO 박막의 식각률은 1724 ${\AA}/min$ 로 최고를 보였으며 이때의 공정 조건은 800 W 의 RF power, 400 W 의 bias power, 1 Pa 의 공정 압력이었다. 식각시에 플라즈마 내부의 이온 거동상태를 측정하기위해 quadrupolemass spectrometer(QMS)를 사용하여 분석하였고 식각후 ZnO 박막의 식각률은 surface profiler(KLA fencer, ${\alpha}$-step 500)을 이용하여 측정하고 ZnO 박막과 B, Cl 라디칼과의 표면 반응 상태를 고찰하기 위하여 식각된 ZnO 박막의 표면을 X-ray photoelectron spectroscopy(XPS)로 분석하였다. XPS를 통하여 ZnO 박막과 Cl 라디칼과 반응을 하여 식각된다는 것과 낮은 휘발성으로 인하여 Ar 이온에 의한 스퍼터링 효과의 도움에 의해서 식각이 진행됨을 확인하였다.

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Laser Patterning of Indium Tin Oxide for Flat Panel Display (평판디스플레이를 위한 Indium Tin Oxide의 레이저 페터닝)

  • Ahn, Min-young;Lee, Kyoung-cheol;Lee, Cheon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.340-343
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    • 2000
  • ITO(Indium Tin Oxide) films for transparent electrodes of FPD(Flat Panel Display) were patterned in atmosphere using laser. A pulse type(repetition rate of 10 Hz) Q-switched Nd:YAG laser which can generate the fundamental wavelength at 1064 nm or its harmonics(532, 266 nm) was used for Patterning of the ITO film. In case of using the second harmonic(532 nm) of Nd:YAG laser, the ITO film(thickness of 20 nm) was removed clearly with a laser fluence of 5.2 J/$\textrm{cm}^2$ and a beam scan speed of 200${\mu}{\textrm}{m}$/s. But the glass substrate was damaged when the laser fluence was over 5.2 J/$\textrm{cm}^2$. We discussed the etching mechanism of the ITO film using Nd:YAG laser with observation of the etching characteristics including a depths and widths of ITO films as a function of laser fluence using SEM(Scanning Electron Microscopy) and surface profiler($\alpha$-step 500).

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Nano-thick Nickel Silicide and Polycrystalline Silicon on Glass Substrate with Low Temperature Catalytic CVD (유리 기판에 Catalytic CVD 저온공정으로 제조된 나노급 니켈실리사이드와 결정질 실리콘)

  • Song, Ohsung;Kim, Kunil;Choi, Yongyoon
    • Korean Journal of Metals and Materials
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    • v.48 no.7
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    • pp.660-666
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    • 2010
  • 30 nm thick Ni layers were deposited on a glass substrate by e-beam evaporation. Subsequently, 30 nm or 60 nm ${\alpha}-Si:H$ layers were grown at low temperatures ($<220^{\circ}C$) on the 30 nm Ni/Glass substrate by catalytic CVD (chemical vapor deposition). The sheet resistance, phase, microstructure, depth profile and surface roughness of the $\alpha-Si:H$ layers were examined using a four-point probe, HRXRD (high resolution Xray diffraction), Raman Spectroscopy, FE-SEM (field emission-scanning electron microscopy), TEM (transmission electron microscope) and AES depth profiler. The Ni layers reacted with Si to form NiSi layers with a low sheet resistance of $10{\Omega}/{\Box}$. The crystallinty of the $\alpha-Si:H$ layers on NiSi was up to 60% according to Raman spectroscopy. These results show that both nano-scale NiSi layers and crystalline Si layers can be formed simultaneously on a Ni deposited glass substrate using the proposed low temperature catalytic CVD process.

A STUDY ON THE RESISTANCE OF WEAR AND CYTOTOXICITY OF THE TITANIUM SURFACE AFTER FILM DEPOSITIONS (박막증착시 티타늄 표면의 마손저항도와 세포독성에 관한 연구)

  • Kim Hyung-Woo;Kim Chang-Whe;Kim Yung-Soo
    • The Journal of Korean Academy of Prosthodontics
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    • v.39 no.1
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    • pp.84-95
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    • 2001
  • Titanium is widely used in dentistry for its low density, high strength, fatigue resistance, corrosion resistance, and biocompatibility. But it has a tendency of surface damage under circumstance of friction and impact for its low hardness of the surface. Coating is one of methods fir increasing surface hardness. Its effect is to improve surface physical characteristics without change of titanium. Diamond-like carbon and titanium nitride are known for its high hardness of the surface. So that this study was aimed at the wear test and the cytotoxicity test of the commercially pure titanium and Ti-6Al-4V alloy which were deposited by diamond-like carbon film or titanium nitride film to acertain improvement of the surface hardness and the biocompatibility. A disk (25mm diameter, 2mm thickness) was made of commercially pure titanium and Ti-6Al-4V alloy and these substrates were deposited by diamond-like carbon film or titanium nitride film. Diamond-like carbon film was deposited by the method of radiofrequency plasma assisted chemical vapor deposition and titanium nitride film was deposited by the method of reactive arc ion plating. Then these substrates were tested about wear characteristics by the pin-on-disk type wear tester in which ruby ball was used as a wear causer under the load of 32N, The fracture cycles were measured by rotating the substrates until their films were fractured. The wear volume was measured after 150 cycles and 3,000 cycles using surface profiler. The cytotoxicity test was peformed by the method of the MTT assay. The results were as follows : 1. In the results of the wear volume test, commercially pure titanium and titanium alloy which were coated by diamond-like carbon film or titanium nitride aim had higher resistance against wear than the substrates which were not coated by any films (P<0.05). 2. In the results of the fracture cycle test and the wear volume test, diamond-like carbon film had higher resistance against wear than titanium nitride film (P<0.05). 3. In both coatings of diamond-like carbon aim and titanium nitride film, Ti-6Al-4V alloy had higher resistance against wear than commercially pure titanium (P<0.05) 4. In the results of the cytotoxicity test, diamond-like carbon film and titanium nitride film had little cytotoxicity as like commercially pure titanium or Ti-6Al-4V alloy (P>0.05).

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An Evaluation of Antibacterial Titanium Surface For Dental Implant (치과용 임플란트 적용을 위한 항균력을 가진 티타늄 표면의 평가)

  • Kang, Min-Kyung;Moon, Seung-Kyun;Kim, Kyoung-Nam
    • Journal of dental hygiene science
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    • v.11 no.5
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    • pp.405-410
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    • 2011
  • The aim of this study was to evaluate antibacterial effect of Cl coated titanium. To coat the Cl on the titanium, first, the titanium was modified by blasting treatment with hydroxyapatite and alumina powder. Anodization process was completed using electrolyte solution of 0.04 M ${\beta}$-glycerol phosphate disodium salt n-hydrate, 0.4 M calcium acetate n-hydrate and 1 M NaCl on the condition of 250 voltages for 3 min. Surface morphology and elements' observation were performed with scanning electron microscopy and energy dispersive spectroscopy and surface profiler was used to analyze the surface roughness. Antibacterial effect was evaluated by film adhesion method. The anodized titanium after blasting showed dimpled surface contained the Cl. Surface average roughness of these surfaces had significantly higher compared to polished titanium. Result of antibacterial test showed that anodized titanium after blasting had an enhanced antibacterial effect compared to the polished titanium. Therefore, these results suggested that titanium contained Cl by anodization after blasting had a rough surface as well as antibacterial effect.

Effect of Sound Velocity on Bathymetric Data Aquired by EM120(multi-beam echo sounder) (EM120(multi-beam echo sounder)을 이용한 지형조사 시 적용되는 해수 중 음속 측정의 중요성; 수중음속 측정장비의 특성 비교)

  • Ham, Dong-Jin;Kim, Hyun-Sub;Lee, Gun-Chang
    • The Sea:JOURNAL OF THE KOREAN SOCIETY OF OCEANOGRAPHY
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    • v.13 no.3
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    • pp.295-301
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    • 2008
  • Bathymetric data collected using a multi-beam echo sounder during marine scientific survey is essential for geologic and oceanographic research works. Accurate measurment of sound velocity profile(SVP) in water-column is important for bathymetric data processing. SVP can vary at different locations during the survey undertaken for wide areas. In addition, an observational error can occur when different equipments(Sound Velocity Profiler, Conductivity Temperature Depth, eXpendable BathyThermograph) are used for measuring SVP at the same water column. In this study, we used an MB-system software to show changes in bathymetry caused by variation of SVP. The analyses showed that the sound velocity(SV) changes due to the depth and thickness of thermocline had more significant effects on the resulting bathymetric data than those of surface mixed layer. The observational errors between SVP measuring instruments did not cause much differneces in the processed bathymetric data. Bathymetric survey line is better to be established to the direction that the change of temperature can be minimize to reduce the variation of SVP during the data acquisition along the survey line.

Effects of Electron Beam Irradiation on Tribological and Physico-chemical Properties of Polyoxymethylene (POM-C) copolymer

  • Rahman, Md. Shahinur;Yang, Jong-Keun;Shaislamov, Ulugbek;Lyakhov, Konstantin;Kim, Min-Seok;Lee, Heon-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.153-153
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    • 2016
  • Polyoxymethylene copolymer (POM-C) is an attractive and widely used engineering thermoplastic across many industrial sectors owing to outstanding physical, mechanical, self-lubricating and chemical properties. In this research work, the POM-C blocks were irradiated with 1 MeV electron beam energy in five doses (100, 200, 300, 500 and 700 KGy) in vacuum condition at room temperature. The tribological and physico-chemical properties of electron beam irradiated POM-C blocks have been analyzed using Pin on disk tribometer, Raman spectroscopy, SEM-EDS, Optical microscopy, 3D Nano surface profiler system and Contact angle analyzer. Electron beam irradiation at a dose of 100 kGy resulted in a decrease of the friction coefficient and wear loss of POM-C block due to well suited cross-linking, carbonization, free radicals formation and energetic electrons-atoms collisions (physical interaction). It also shows lowest surface roughness and highest water contact angle among all unirradiated and irradiated POM-C blocks. The irradiation doses at 200, 300, 500 and 700 kGy resulted in increase of the friction coefficient as compared to unirradiated POM-C block due to severe chain scission, chemical and physical structural degradation. The electron beam irradiation transferred the wear of unirradiated POM-C block from the abrasive wear, adhesive wear and scraping to mild scraping for the 1 MeV, 100 kGy irradiated POM-C block which is concluded from SEM-EDS and Optical microscopic observations. The degree of improvement for tribological attribute relies on the electron beam irradiation condition (energy and dose rate).

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Growth of $Al_xTa_{1-x}$ Alloy Thin Films by RE-Magnetron Sputter and Evaluation of Structural and Electrical Properties (E-Magnetron 스퍼터링에 의한 $Al_xTa_{1-x}$ 합금박막의 성장 및 구조적, 전기적 특성 분석)

  • 송대권;이종원;전종한
    • Journal of the Microelectronics and Packaging Society
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    • v.10 no.2
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    • pp.55-59
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    • 2003
  • In this study, $Al_xTa_{1-x}$(x=0.0∼1.0) alloy thin films were grown by RF-Magnetron sputtering system, and the structural, mechanical and electrical properties of samples were examined by 4-point probe, XRD, AFM and micro-Vickers hardness profiler. The electrical resistivity was maximum and the crystal quality was optimum for the samples with Al content x=0.245 (Al 24.5 at.%). Regarding the surface hillock formation, the hillock density decreased with an increase of Al content for the low Al content range, and the hillock was eliminated for the sample with Al=24.5 at.%. The hillock density increased with the further increase of Al content. The high values of micro-Vickers hardness were obtained for the samples with x=0.2∼0.45. The results obtained demonstrate that the crystal quality, electrical resistivity, surface morphology and micro-hardness are closely inter-related, and that the optimum physical properties are obtained for the sample with x=0.245.

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Morphological Structural and Electrical Properties of DC Magnetron Sputtered Mo Thin Films for Solar Cell Application

  • Fan, Rong;Jung, Sung-Hee;Chung, Chee-Won
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.389-389
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    • 2012
  • Molybdenum is one of the most important materials used as a back ohmic contact for $Cu(In,Ga)(Se,S)_2$ (CIGS) solar cells because it has good electrical properties as an inert and mechanically durable substrate during the absorber film growth. Sputter deposition is the common deposition process for Mo thin films. Molybdenum thin films were deposited on soda lime glass (SLG) substrates using direct-current planar magnetron sputtering technique. The outdiffusion of Na from the SLG through the Mo film to the CIGS based solar cell, also plays an important role in enhancing the device electrical properties and its performance. The structure, surface morphology and electrical characteristics of Mo thin films are generally dependent on deposition parameters such as DC power, pressure, distance between target and substrate, and deposition temperature. The aim of the present study is to show the resistivity of Mo layers, their crystallinity and morphologies, which are influenced by the substrate temperature. The thickness of Mo films is measured by Tencor-P1 profiler. The crystal structures are analyzed using X-ray diffraction (XRD: X'Pert MPD PRO / Philips). The resistivity of Mo thin films was measured by Hall effect measurement system (HMS-3000/0.55T). The surface morphology and grain shape of the films were examined by field emission scanning electron microscopy (FESEM: Hitachi S-4300). The chemical composition of the films was obtained by the energy dispersive X-ray spectroscopy (EDX). Finally the optimum substrate temperature as well as deposition conditions for Mo thin films will be developed.

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