• 한국콘크리트학회:학술대회논문집
• /
• 한국콘크리트학회 2005년도 추계 학술발표회 제17권2호
• /
• pp.543-546
• /
• 2005

The development and maintenance of a sound bond are an essential requirements of concrete repair and replacement. The bond property of a bonded overlay to its substrate concrete during the lifetime is one of the most important performance requirements which should be quantified This study was performed to investigate the characteristics of adhesive strength for overlay concrete. Three different removal methods of deteriorated concrete such as chip-patch, mill-patch and water-jet were varied in this study. According to the adhesive strength of pull- off test, case III using water-jet was measured $2\~3$ times higher than that of chip-patch or mill-patch.

• Tribology and Lubricants
• /
• 제32권2호
• /
• pp.61-66
• /
• 2016

Total thickness variation (TTV), BOW, and surface roughness are essential characteristics for high quality sapphire substrates. Many researchers have attempted to increase removal rate by controlling the key process parameters like pressure and velocity owing to the high cost of consumables in sapphire chemical mechanical polishing (CMP). In case of the pressure approach, increased pressure owing to higher deviation of pressure over the wafer leads to significant degradation of the TTV. In this study, the authors focused on reducing TTV under the high-pressure conditions. When the production equipment polishes multiple wafers attached on a carrier, higher loads seem to be concentrated around the leading edge of the head; this occurs because of frictional force generated by the combination of table rotation and the height of the gimbal of the polishing head. We believe the skewed pressure distribution during polishing to be the main reason of within-wafer non-uniformity (WIWNU). The insertion of a hub ring between the polishing head and substrate carrier helped reduce the pressure deviation. Adjusting the location of the hub ring enables tuning of the pressure distribution. The results indicated that the position of the hub ring strongly affected the removal profile, which confirmed that the position of the hub ring changes the pressure distribution. Furthermore, we analyzed the deformation of the head via finite element method (FEM) to verify the pressure non-uniformity over the contact area Based on experiment and FEM results, we determined the optimal position of hub ring for achieving uniform polishing of the substrate.

• Tribology and Lubricants
• /
• 제38권6호
• /
• pp.247-254
• /
• 2022

Chemical mechanical polishing (CMP) is a hybrid surface-polishing process that utilizes both mechanical and chemical energy. However, the recently emerging semiconductor substrate and thin film materials are challenging to process using the existing CMP. Therefore, previous researchers have conducted studies to increase the material removal rate (MRR) of CMP. Most materials studied to improve MRR have high hardness and chemical stability. Methods for enhancing the material removal efficiency of CMP include additional provision of electric, thermal, light, mechanical, and chemical energies. This study aims to introduce research trends on CMP using ultraviolet (UV) light to these methods to improve the material removal efficiency of CMP. This method, photocatalysis-assisted chemical mechanical polishing (PCMP), utilizes photocatalytic oxidation using UV light. In this study, the target materials of the PCMP application include SiC, GaN, GaAs, and Ru. This study explains the photocatalytic reaction, which is the basic principle of PCMP, and reviews studies on PCMP according to materials. Additionally, the researchers classified the PCMP system used in existing studies and presented the course for further investigation of PCMP. This study aims to aid in understanding PCMP and set the direction of future research. Lastly, since there have not been many studies on the tribology characteristics in PCMP, research on this is expected to be required.

• 대한기계학회:학술대회논문집
• /
• 대한기계학회 2001년도 춘계학술대회논문집D
• /
• pp.585-588
• /
• 2001

Particle contamination on the data storage disks has been a serious problem for magnetic hard disk drive manufacturers. For high storage optical disks, such as DVD-ROM/RAM or NFR (near field recording) system, particle-induced damages can be also detected because only a few micrometer particles can prevent read/write signal from optical lens. The increasing areal density and smaller bit size accelerates particle induced damages on the optical disk. One of the methods to prevent particle contamination on the optical disk surface is to handle the disk enclosed in a cartridge like a modern DVD-RAM disk. However, even for a perfectly sealed disk drive, particles are found inside the drive. The other method is to improve disk surface characteristics. Particle contamination on the surface can be reduced by proper selection of disk coating materials. [n this paper, particle detachment ratios for CD (compact disk), DVD (digital versatile disk), HD (magnetic hard disk), HD with Jut lubricant, and aluminosilicate substrate HD were investigated. Surface roughness and surface energy of the test disks were compared with the particle detachment ratios. Proper substrate and lubricant characteristics to reduce particle contamination on the disk surface were found.

• Environmental Engineering Research
• /
• 제9권5호
• /
• pp.238-247
• /
• 2004

The objective of this study was to develop kinetic model for the MBR and investigate kinetic characteristics of the gravitational flow transverse direction MBR system. Kinetic model was derived by mass balance of substratc and biomass combined with empirical membranc filtration rerm for the MBR. To find kinctic values, permeale flux and COD removal were analyzed through the laboratory, MBR operation as different solids retention times. Permeate flux was ranged 2.5-5.0 LMH (L/m$^2$/hr) as sludge characteristics in each run. Although the soluble COD in the bioreactor was changed, the effluent COD was stable as average 99% removal rate during the experimental periods. Y$_g$ of this MBR system was higher than those of cross-flow MBR processes. The kinetics of this MBR showed that smaller k, larger b, and larger K$_s$ values than the conventional activated sludge process. These results indicated that substrate was used for cell maintenance rather than growth in this MBR system.

• 상하수도학회지
• /
• 제10권1호
• /
• pp.112-120
• /
• 1996

In this study, the porous glass media was utilized as biomass carrier, and the optimum characteristics of this new media in fixed bed biofilm process were investigated. The characteristics of media considered here are a void volume fraction, a specific surface area, and surface characteristics of media. The effect of surface roughness and material could be clearly demonstrated by the fact that the porous glass media showed a good potential for biofilm development. This might results from the fact that biofilm is initially formed in the surface cavities of the media is protect from the shear effect. Therefore, the microcolonies are not readily detached by the fluid shear. In the steady state, biofilm formation along the packing bed depth was different from media to media. The specific area was also an important factor for the attachment of microorganism on the media surface. The specific area was also an important factor for the attachment of microorganism on the media surface. In the case of porous glass media, about $100m^2/m^3$ was enough to obtain a good organic removal efficiency The organic removal efficiency could be improved by increasing the void volume fraction in the reactor, at least 80% was required to obtain a high removal efficiency and prevent clogging. From the analysis of kinetics study, the yield coefficient, Y, was 0.42 mgMLSS/mgSBOD, endogenous respiration coefficient, ke, was $0.12day^{-1}$ and substrate removel coefficient of Mckinney. km, was $16.8hr^{-1}$ for the porous glass media G-2

• 한국식품과학회지
• /
• 제18권6호
• /
• pp.450-457
• /
• 1986

대두(大豆)중에 존재하는 장내(腸內) 가스발생인자(發生因子)(flatulence factor)인 raffinose와 stachyose의 제거(除去)에 효소제(酵素劑)를 이용하기 위한 기초연구로서, 시판효소제(市販酵素劑)에 대한 ${\alpha}-Galactosidase$의 활성도(活性度)를 비교하고 그의 효소적(酵素的) 특성(特性)을 조사하였다. 시판(市販)되는 6종의 효소제(酵素劑)중 Aspergillus niger에서 얻은 pectinase 제제가 가장 강력하였다. 선정된 효소제(酵素劑)의 특성(特性)을 조사한 결과 작용최적(作用最適) pH는 4.0-4.5, 안정도최적(安定度最適) pH는 4-5, 작용최적(作用最適) 온도는 $45^{\circ}C$였다. 합성기질(合成基質)인 $p{\cdot}nitropheyl-{\alpha}-D{\cdot}galactoside$에 대한 Michaelis constant(Km)는 2.08mM, 최대반응속도(最大反應速度)(Vmax)는 435 ${\mid}{\mu}{\mid}$moles substrate/minute/g enzyme preparation 이었으며 조해제(阻害劑)의 실험 결과 SH기(基)를 필수로 하는 효소(酵素)로 밝혀졌다. 본(本) 효소제(酵素劑)는 3가지 기질(基質)인 raffinose, sucrose, $p-nitrophenyl-{\alpha}-D{\cdot}galactoside$를 거의 완전하게 가수분해(加水分解)하였으며, raffinose와 stachyose의 분해(分解)과정을 thin-layer chromatography로 조사한 결과 단당류의 Spot만이 나타났다. 따라서 대두식품(大豆食品)중의 장내(腸內) 가스발생인자(發生因子)는 ${\alpha}-Galactosidase$ 역가(力價)를 가지는 효소제(酵素劑)의 이용에 의하여 쉽게 제거될 수 있을 것이다.

• 한국산학기술학회논문지
• /
• 제16권8호
• /
• pp.5728-5735
• /
• 2015

단일챔버 미생물연료전지에 분리막으로 세라믹막과 나피온막을 적용하여 전기발생특성을 분석함으로써 세라믹막의 적용가능성을 구명하고자 하였다. 또한 환원전극으로서 백금촉매가 도포된 탄소천과 일반 탄소천을 사용하여 백금촉매 효과 및 전기발생특성을 비교하였다. 회분식 실험에서 전기발생특성이 가장 안정적인 것은 acetate를 기질로 사용하였을 때였다. Formate는 전기발생특성이 acetate보다 다소 높았으나 불안정하였고 propionate와 butyrate는 acetate에 비하여 전기발생량이 상대적으로 낮았다. 환원전극으로서 백금촉매가 도포되어 있는 탄소천과 일반 탄소천을 비교한 결과 백금촉매가 도포된 탄소천의 전력발생량이 일반 탄소천에 비하여 1.2배 높게 나타났지만 약 5배 정도 비용 차이가 있음을 고려하면 미생물연료전지의 적용에 있어 효율성과 경제성은 함께 고려되어야 할 것으로 판단된다. 분리막으로서 세라믹막과 나피온막을 적용한 미생물 연료전지에서 발생한 평균 전압은 합성폐수를 이용한 실험에서 각각 $523.67mV{\pm}49.41mV$, $424.09mV{\pm}79.95mV$이었다. 미생물연료전지에 분리막으로 세라믹막과 나피온막을 적용하여 전력발생 및 유기물제거효율을 비교한 결과, 세라믹막이 나피온막의 대안이 될 수 있음을 확인하였다.

• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2002년도 International Meeting on Information Display
• /
• pp.860-863
• /
• 2002

In this study, Ag thin films deposited on LCD-grade glass were etched using inductively coupled fluorine-based plasmas and the effect of various $CF_4$-based gas mixtures on the Ag etching characteristics were studied. When $CF_4$-based gas mixtures were used with $N_2$, due to the very low vapor pressure of etch products, etch products remained on the substrate after the etching. However, when $CF_4$ used with Ar, residue-free Ag etching could be obtained due to the removal of etch product by sputtering by $Ar^+$ ions.

• 생명과학회지
• /
• 제11권3호
• /
• pp.273-278
• /
• 2001

Removal of nitrogen compound from waste water is essential and often accomplished by biological process. Deni-trification bacterium. Paracoccus denitrificans(KCTC 2350) is employed to estimate the ability and the characteristics of denitrification. In the immobilized biological reactor system, the measurement of absolute amount of active strain in the reactor is comparatively difficult or impossible. In this study, strain immobilized denitrification reactor was designed with the unwoven texture wrapped peeped hole plastic tube to calculated the absolute amount of active strain by comparing the activity of the immobilized reactor adn the free cell reactor. The reactor system was continuous stirred tank reactor and the rate of substrate consumption was assumed to be Michaelis-Menten equation. As a result, we found that the amount of immobilized active strain was the half of the total active strain in the reactor and the time required to reach in the equilibrium state in the immobilized reactor system was shorter than that of the free cell reactor system.