한국정보디스플레이학회:학술대회논문집
- 2002.08a
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- Pages.860-863
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- 2002
Characteristics of Ag Etching using Inductively Coupled Halogen-based Plasmas
- Park, Sang-Duk (Department of Materials Engineering, Sungkyunkwan University) ;
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Lee, Young-Joon
(Department of Materials Engineering, Sungkyunkwan University) ;
- Kim, Sang-Gab (AMLCD Division, Samsung Electronics Co., Ltd) ;
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Choe, Hee-Hwan
(AMLCD Division, Samsung Electronics Co., Ltd) ;
- Hong, Moon-Poe (AMLCD Division, Samsung Electronics Co., Ltd) ;
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Yeom, Geun-Young
(Department of Materials Engineering, Sungkyunkwan University)
- Published : 2002.08.21
Abstract
In this study, Ag thin films deposited on LCD-grade glass were etched using inductively coupled fluorine-based plasmas and the effect of various
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