• The Journal of the Petrological Society of Korea
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• v.6 no.1
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• pp.19-33
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• 1997

This study reports the results about the petrography and geochemical characteristics of 10 representative volacanic rocks. The Cretaceous volcanic rocks distributed in the vicinity of the Kageo island composed of andesitic rocks, dacitic welded tuff, and rhyolitic rocks in ascending order. Sedimentary rock is the basement in the study area covered with volcanic rocks. Andesitic rocks composed of pyroclastic volcanic breccia, lithic lapilli tuff and cryptocrystallin lava-flow. Most dacitic rocks are lapilli ash-flow welded tuff. Rhyolitic rocks consists of rhyolite tuff and rhyolite lava flow. Rhyolite tuff are lithic crystal ash-flow tuff and crystal vitric ash-flow tuff with somewhat accidental fragments of andesitic rocks, but dacitic rocks. The variation of major and trace element of the volcanic rocks show that contents of $Al_2O_3$, FeO, CaO, MgO, $TiO_2$ decrease with increasing of $SiO_2$. On the basis of Variation diagrams such as $Al_2O_3$ vs. CaO, Th/Yb vs. Ta/Yb, and $Ce_N/YB_N$ vs. $Ce_N$, these rocks represent mainly differentiation trend of calc-alkaline rock series. On the discriminant diagrams such as Ba/La and La/Th ratio, Rb vs. Y + Nb, the volcanic rocks in study area belongs to high-K Orogenic suites, with abundances of trace element and ternary diagram of K, Na, Ca. According to the tectonic discriminant diagram by Wood, these rocks falls into the diestructructive continental margin. K-Ar ages of whole rocks are from andesite to rhyolite $97.0{\pm}6.8~94.5{\pm}6.6,\68.9{\pm}4.8,\61.5{\pm}4.9~60.7{\pm}4.2$ Ma, repectively. Volcanic rocks in study area show well correlation to the Yucheon Group in terms of rock age dating and geochemcial data, and derived from andesitic calc-alkaline magma that undergone low pressure fractional crystallization dominated plagioclase at <30km.

• Journal of the Korean Ceramic Society
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• v.29 no.1
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• pp.65-73
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• 1992

The effect of grain size on the time-dependent piezoelectrice degradation of a poled PZT of MPB composition Pb0.988Sr0.012 (Zr0.52Ti0.48)O3 with 2.4 mol% of Nb2O5 was studied, and the degradation mechanism was discussed. Changes in the internal bias field and the internal stress both responsible for the time-dependent degradation of poled PZT were examined by the polarization reveral technique, XRD and Vickers indentation, respectively. The piezoelectric degradation increased with increasing time and grain size, and the internal bias field due to space charge diffusion decreased with increasing grain size of poled PZT. The internal bias field, however, was almost insensitive to the degradation time regardless of the grain size. On the other hand, both the x-ray diffraction peak intensity ratio of (002) to (200) and the fracture behavior including the crack propagation support that the ferroelectric domain rearrangement of larger grain size showed rapid relaxation of the internal stress compared with smaller one, which is thought the origin of the larger piezoelectric degradation in the former. In conclusion, the contribution of space charge diffusion on the piezoelectric degradation of PZT is strongly dependent on both the grain size and the composition. Thus, the relaxation of internal stress due to the ferroelectric domain rearrangement as well as the amount and time-dependence of the internal bias field due to space charge diffusion should be considered simultaneously in the degradation mechanism of PZT.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.477-477
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• 2008

For more than three decades, the gate dielectrics in CMOS devices are $SiO_2$ because of its blocking properties of current in insulated gate FET channels. As the dimensions of feature size have been scaled down (width and the thickness is reduced down to 50 urn and 2 urn or less), gate leakage current is increased and reliability of $SiO_2$ is reduced. Many metal oxides such as $TiO_2$, $Ta_2O_4$, $SrTiO_3$, $Al_2O_3$, $HfO_2$ and $ZrO_2$ have been challenged for memory devices. These materials posses relatively high dielectric constant, but $HfO_2$ and $Al_2O_3$ did not provide sufficient advantages over $SiO_2$ or $Si_3N_4$ because of reaction with Si substrate. Recently, $HfO_2$ have been attracted attention because Hf forms the most stable oxide with the highest heat of formation. In addition, Hf can reduce the native oxide layer by creating $HfO_2$. However, new gate oxide candidates must satisfy a standard CMOS process. In order to fabricate high density memories with small feature size, the plasma etch process should be developed by well understanding and optimizing plasma behaviors. Therefore, it is necessary that the etch behavior of $HfO_2$ and plasma parameters are systematically investigated as functions of process parameters including gas mixing ratio, rf power, pressure and temperature to determine the mechanism of plasma induced damage. However, there is few studies on the the etch mechanism and the surface reactions in $BCl_3$ based plasma to etch $HfO_2$ thin films. In this work, the samples of $HfO_2$ were prepared on Si wafer with using atomic layer deposition. In our previous work, the maximum etch rate of $BCl_3$/Ar were obtained 20% $BCl_3$/ 80% Ar. Over 20% $BCl_3$ addition, the etch rate of $HfO_2$ decreased. The etching rate of $HfO_2$ and selectivity of $HfO_2$ to Si were investigated with using in inductively coupled plasma etching system (ICP) and $BCl_3/Cl_2$/Ar plasma. The change of volume densities of radical and atoms were monitored with using optical emission spectroscopy analysis (OES). The variations of components of etched surfaces for $HfO_2$ was investigated with using x-ray photo electron spectroscopy (XPS). In order to investigate the accumulation of etch by products during etch process, the exposed surface of $HfO_2$ in $BCl_3/Cl_2$/Ar plasma was compared with surface of as-doped $HfO_2$ and all the surfaces of samples were examined with field emission scanning electron microscopy and atomic force microscope (AFM).

• Journal of the Korean Ceramic Society
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• v.34 no.8
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• pp.877-885
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• 1997

The dependence of strength, crack growth, fracture mode and degree of domain rearrangement of PZT ceramics on poling strength were studied. The PZT [(Pb0.94Sr0.06)(Zr0.46Ti0.54)O3+Nb(trace)] specimens were poled at 0, 0.5, 1.0, 1.5, 2.0, 2.5, 3.0 kv/mm, and the strength of the specimens was measured by 3 point flexure system. The bending strength of the specimen decreased in different modes according to the bending directions; xz, zx and yz plane direction with x axis of the poling direction in Cartesian coordinate system. The strength differences between the directions increased as the poling strength increased. The fracture mode transferred to intergranular fracture mode from transgranular one as the poling strength increased. The mechanical breakdown occurred when the poling strength higher than 3 kV/mm was applied to the specimen. It was observed that the crack length increased in the normal direction to the poling direction, however, decreased in the parallel direction to the poling direction when the poled PZT specimen was indented by the Vickers indenter. However, the crack produced by indentation continuously was continuously increased little by little after indentation on the specimen. The domain rearrangement occurred as the poling strength increased and the domains were rearranged more effectively when the electric field was continuously increased little by little.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.191-191
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• 2008

강유전성 세라믹스 재료로써는 PZT계열의 세라믹재료가 널리 쓰이고 있다. 이는 우수한 유전 및 압전특성을 가지고 있으나, PbO을 다량 함유하고 있어 $1000^{\circ}C$이상에서 PbO가 급격하게 휘발되는 성질 때문에 조성의 변동이 생겨 재현성이 어려우며 이를 방지하기 위하여 PbO를 과잉 첨가시키기 때문에 PbO휘발로 인한 강한 독성이 인체에 유해하고, 비환경 친화적인 물질로 최근에는 환경문제가 대두됨에 따라 대체 또는 보완 할 수 있는 방안에 검토되고 있다. 본 연구는 그 해결책의 한 방안으로 압전특성이 우수한 $(Pb_{0.94}Sr_{0.06})[(Ni_{1/2}W_{1/2})_{0.02}(Mn_{1/3}Nb_{2/3})_{0.07}(Zr_{0.51}Ti_{0.49})_{0.91}]O_3$계 조성을 설계하고 Glass frit(0~1.1 wt%)를 소량 첨가하여 액상 소결 특성을 부여하고 $1000^{\circ}C$ 이하의 저온에서 소결하여 유전 및 압전 특성을 평가하였다. 실험방법은 일반적인 세라믹스 제조공정으로 24시간 ball milling하고 $850^{\circ}C$에서 2시간 하소 후 Glass frit를 소결조제로 소랑 첨가하여 $1000^{\circ}C$ 이하 온도에서 소결을 진행하여 각 소결온도에 따른 유전 및 압전 특성을 평가하였다. 최종 소결된 시편의 밀도와 수축율을 분석하여 최적의 소결온도를 확립하였으며 XRD분석을 통해 perovskite구조를 확인하고 미세구조확인을 위해 SEM으로 관찰하였다. 압전 특성을 평가하였다.

• Nuclear Engineering and Technology
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• v.52 no.1
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• pp.109-114
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• 2020

This work presents the results of laboratory scale tests of the CARBOFLUOREX (CARBOnate FLUORide EXtraction) process - a novel technology for the recovery of U and Pu from the solid fluorides residue (fluorination ash) of Fluoride Volatility Method (FVM) reprocessing of spent nuclear fuel (SNF). To study the oxidative leaching of U from the fluorination ash (FA) by Na₂CO₃ or Na₂CO₃-H₂O₂ solutions followed by solvent extraction by methyltrioctylammonium carbonate in toluene and purification of U from the fission products (FPs) impurities we used a surrogate of FA consisting of UF₄ or UO₂F₂, and FPs fluorides with stable isotopes of Ce, Zr, Sr, Ba, Cs, Fe, Cr, Ni, La, Nd, Pr, Sm. Purification factors of U from impurities at the solvent extraction refining stage reached the values of 10⁴-10⁵, and up to 10⁶ upon the completion of the processing cycle. Obtained results showed a high efficiency of the CARBOFLUOREX process for recovery and separating of U from FPs contained in FA, which allows completing of the FVM cycle with recovery of U and Pu from hardly processed FA.

• JSTS:Journal of Semiconductor Technology and Science
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• v.8 no.1
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• pp.66-79
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• 2008

Several oxides have recently been reported to have resistance-switching characteristics for nonvolatile memory (NVM) applications. Both binary and ternary oxides demonstrated great potential as resistive-switching memory elements. However, the switching mechanisms have not yet been clearly understood, and the uniformity and reproducibility of devices have not been sufficient for gigabit-NVM applications. The primary requirements for oxides in memory applications are scalability, fast switching speed, good memory retention, a reasonable resistive window, and constant working voltage. In this paper, we discuss several materials that are resistive-switching elements and also focus on their switching mechanisms. We evaluated non-stoichiometric polycrystalline oxides ($Nb_2O_5$, and $ZrO_x$) and subsequently the resistive switching of $Cu_xO$ and heavily Cu-doped $MoO_x$ film for their compatibility with modem transistor-process cycles. Single-crystalline Nb-doped $SrTiO_3$ (NbSTO) was also investigated, and we found a Pt/single-crystal NbSTO Schottky junction had excellent memory characteristics. Epitaxial NbSTO film was grown on an Si substrate using conducting TiN as a buffer layer to introduce single-crystal NbSTO into the CMOS process and preserve its excellent electrical characteristics.

• Journal of the Mineralogical Society of Korea
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• v.13 no.3
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• pp.147-163
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• 2000

The mineralogy and chemical composition of reddish to brownish yellow residual soils, so called "Hwangto" have been examined according to representative host rocks. The result of the study indicates that Hwangto consists of 40-80% clay minerals and various minerals such as quartz, feldspar, hornblende, goethite, and gibbsite. Clay minerals include kaolinite, halloysite, illite, hydroxy interlayered vermiculite (HIV), mica/vermiculite interstratifield mineral and chlorite. The mineralogical constituents and contents of Hwangto were different depending on the types of host rocks. Moreover, the Jurassic granitic rocks contain relatively more kaolin minerals, whereas the Cretaceous granitic rocks contain more HIV and illite. In addition, reddish Hwangto contains relatively more kaolinite and HIV, and yellowish Hwangto contains more illite and halloysite. It is suggested that feldspars and micas of host rocks were chemically weathered into illite, halloysite, illite/vermiculite interstratified minerals, and HIV, and finally into kaolinite. Compared with their host rocks, the major chemical compositions of Hwangto tend to contain more $Al_2O_3,\;Fe_2O_3,\;H_2O$ in amount and less Ca, Mg, and Na. Hwangto contains relatively high amount of trace elements, P, S, Zr, Sr, Ba, Rb, and Ce including considerable amount of Li, V, Cr, Zn, Co, Ni, Cu, Y, Nb, La, Nd, Pb, Th in excess of 10 ppm. Relatively high amount of most trace elements were detected in the Hwangto. The major and minor chemical compositions of the Hwangto were different depending on the types of host rocks. However, their difference was in the similar range compared with the compositions of host rocks.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.37 no.4
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• pp.457-463
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• 2024

(Bi_1/2Na_1/2)TiO₃(BNT) piezoelectric ceramics are one of the promising materials that can replace Pb(Zr, Ti)O₃(PZT) piezoelectric ceramics due to the high electromechanical strain properties. However, it is still difficult to use practical applications because the required electric field for inducing electromechanical strain is relatively higher than that of PZT ceramics. To overcome this problem, it has been intensively studied on doping impurity or modifying other ABO₃ for BNT-based piezoelectric ceramics. Therefore, this study investigated the effects of La₂O₃ doping on the phase transition behavior and electromechanical strain properties in BNT-SrTiO₃ (BNT-ST) lead-free piezoelectric ceramics. In the case of the temperature-dependent dielectric properties, it was confirmed that a phase transition from ferroelectrics to relaxors is induced with increasing La₂O₃ content. As a result, the electromechanical strain properties of BNT-ST ceramics were improved. The highest S_max/E_max value corresponding to 300 pm/V was obtained at 2 mol% La₂O₃-dopped BNT-ST ceramics. Accordingly, this study successfully demonstrated that La₂O₃ doping is effective on the inducing phase transition from ferroelectrics to relaxors and the improving electromechanical strain properties of BNT-ST lead-free piezoelectric ceramics.

• Journal of the Mineralogical Society of Korea
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• v.14 no.1
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• pp.39-51
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• 2001

공주군 유구면 일대의 화강암질 편마암의 풍화작용에 따른 원소의 거동과 pH와 이차광물과의 관계를 XRF, ICP-AES, ICP-MS를 이용한 원소분석결과를 통하여 검토하였다. 이 지역의 암석은 pH6 내외의 산성환경, 침철석, 아나타제와 같은 다양한 이차광물을 생성하면서 심각한 화학조성의 변화를 초래했다. 주원소의 화학조성을 이용한 풍화지수는 토양층에서 79~88로 모암 중의 사장석이 용해되고 흑운모가 변질되어 캐올리광물의 생성이 활발한 방향으로 풍화작용이 진행되었다. 지표층으로 가면서 Al에 대한 주 원소의 거동은 Si, Ca, Na, K, P가 감소하고 Fe, Ti, Mn이 증가하는 경향을 보이며 pH가 낮은 풍화단면에서 주 원소의 변화량이 더 크다. 이 풍화대에서 Mg은 거의 일정하다. Li, As 모든 전이원소는 pH가 감소함에 따라 증가하며 특히 이들 원소는 Fe의 함량과 비례해서 증가해 침철석과 공침하였거나 표면에 흡착되어 있는 것으로 보인다. Ga은 Fe와 비례하기는 하지만 변화량은 전 풍화단면에서 일정하다. Zr, Mo, Sn, Cd은 pH에 변화에 상관없이 일정한 반면에 Rb, Sr, Ba, Y, Pb, Th, U 등은 감소하는 경향을 보인다. 특히 Rb 과 Sr은 Ca에 비례해서 감소한다. 희토류원소는 전 풍화단면에서 감소하는 경향을 보이는데 $Al_2$$O_3$에 대한 상대적인 변화량을 보면 경희토류원소는 사프롤라이트(saprolite)하부와 상부에서 부화되어 있고 중부 사프롤라이트와 토양층에서 감소하는 반면에 중희토류원소는 사프롤라이트 하부와 상부에서 감소하고 중부사프롤라이트 및 토양층에서 부화되는 경향을 보인다. 전반적으로 희토류원소의 원자번호가 클수록 손실율이 커진다. 이 풍화단면에서 원소의 거동은 각 풍화층의 pH와 생성된 이차광물의 조성에 지배를 받았다.