• 제목/요약/키워드: Sol-gel spin coating method

검색결과 159건 처리시간 0.028초

졸-겔 스핀코팅법에 의한 반사방지 및 정전기방지 복층막의 제조 및 특성 (Preparation and Characterization of Anti-reflective and Anti-static Double Layered Films by Sol-Gel Spin-Coating Method)

  • 이준종;최세영
    • 한국세라믹학회지
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    • 제34권1호
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    • pp.79-87
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    • 1997
  • 졸-겔 스핀코팅법을 이용하여 VDT 기판에 반사방지 및 정전기방지 복층막을 코팅하고 코팅졸과 겔분말의 특성 및 코팅막의 전기적, 광학적, 기계적 특성을 조사하였다. 1층막은 복층막의 간섭조건을 만족시키는 굴절율을 얻기위해 투명 전도성 재료인 ATO(Antimony doped Tin Oxide) 졸과 SiO2 졸을 몰비 68:32로 혼합한 ATO-SiO2 복합졸을, 2층막에는 저굴절율의 SiO2 졸을 사용하였다. 각 코팅막을 45$0^{\circ}C$에서 30분간 열처리하였을 때 잔류 유기물은 완전히 제거되었다. ATO막의 표면저항은 3mol%의 Sb 첨가시 약 6$\times$107$\Omega$/$\square$로 최소를 나타내었고 SiO2 졸과의 혼합시 약 30mol% 까지는 표면저항이 완만히 증가하다가 그 이후에는 급격히 증가하는 경향을 나타내었으며, 간섭조건을 만족시키는 조성인 32mol%에서는 약 3$\times$108$\Omega$/$\square$를 나타내었다. 복층막의 반사율은 550nm의 기준파장에서 약 0.64%를 나타내었으며 광투과율은 약 3.20% 증가하였다. 복층막의 미소경도는 약 471.4kg.f/mm2로 코팅하지 않은 VDT기판의 경도와 유사한 값을 나타내었다.

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졸-겔법으로 증착된 $(Bi,Nd)_4Ti_3O_{12}$ 박막의 미세구조와 강유전성에 대한 연구 (Microstructure and Ferroelectric Properties of Randomly Oriented Polysrystalline $(Bi,Nd)_4Ti_3O_{12}$ Thin Films Prepared by Sol-Gel Method)

  • 강동균;김영호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.296-296
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    • 2007
  • Ferroelectric neodymium-substituted $Bi_4Ti_3O_{12}$(BTO) thin films have been successfully deposited on Pt/Ti/$SiO_2$/Si substrate by a sol-gel spin-coating process and the effect of crystallization temperature on their microstructure and ferroelectric properties were studied systematically. $Bi(TMHD)_3$, $Nd(TMHD)_3$, $Ti(O^iPr)_4$ were used as the precursors, which were dissolved in 2-methoxyethanol. The thin films were annealed at various temperatures from 600 to $720^{\circ}C$ in oxygen ambient for 1 hr, which was followed by post-annealed for 1 hr after depositing a Pt electrode to enhance the electrical properties. X-ray diffraction (XRD) and scanning electron microscopy (SEM) were used to analyze the crystallinity and surface morphology of layered perovskite phase, respectively. The crystallinity of the BNT films was improved and the average grain size increased as the crystallization temperature increased from 600 to $720^{\circ}C$ at an interval of $40^{\circ}C$. The polarization values of the films were a monotonous function of the crystallization temperature. The remanent polarization value of the BNT thin films annealed at $720^{\circ}C$ was $24.82\;{\mu}C/cm^2$ at an applied voltage of 5 V.

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Influence of the Fluorine-doping Concentration on Nanocrystalline ZnO Thin Films Deposited by Sol-gel Process

  • Yoon, Hyunsik;Kim, Ikhyun;Kang, Daeho;Kim, Soaram;Kim, Jin Soo;Son, Jeong-Sik;Leem, Jae-Young
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.204.2-204.2
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    • 2013
  • Wide band gap II-VI semiconductors have attracted the interest of many research groups during the past few years due to the possibility of their applications in light-emitting diodes and laser diodes. Among the II-VI semiconductors, ZnO is an important optoelectronic device material for use in the violet and blue regions because of its wide direct band gap (Eg ~3.37 eV) and large exciton binding energy (60 meV). F-doped ZnO (FZO) and undoped ZnO thin films were grown onto quartz substrate by the sol-gel spin-coating method. The doping level in the solution, designated by F/Zn atomic ratio of was varied from 0 to 5 in 1 steps. To investigate the effects of the structure and optical properties of FZO thin films were investigated using X-ray diffraction (XRD), UV-visible spectroscopy, and photoluminescence (PL). In the XRD, the residual stress, FWHM, bond length, and average grain size were changed with increasing the doping concentration. For the PL spectra, the high INBE/IDLE ratio of the FZO thin films doping concentration at 1 at.% than the other samples.

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PZT(53/47) 박막의 식각 및 전기적 특성에 관한 연구 (A study on the Etching and electrical Properties of PZT Thin Films)

  • 김경태;이성갑;이영희;김창일
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 하계학술대회 논문집
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    • pp.39-42
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    • 2000
  • The effect of excess Pb contents on the etching of PZT thin films and their electrical properties has been investigated. Ferroelectric PZT(53/47) thin films were prepared by the metal alkoxide-based Sol-Gel method, in which they were spin-coating on P7Ti/Si02/Si substrate using the PZT(53/47) stock solutions with various excess Pb contents. Etching of PZT film was performed using planar inductively coupled Ar/Cl$_2$/BCl$_3$ plasma. The etch rate of PZT film was 2450 $\AA$/min at Ar(20)/BCl$_3$(80) gas mixing ratio and substrate temperature of 8$0^{\circ}C$.

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졸-겔 방법으로 제조된 Er doped $Al_2O_3/SiO_2$ 필름의 다공성과 결정성에 대한 광 발광 특성 (The dependence of porosity and crystallity on photoluminescence properties of Er doped $Al_2O_3/SiO_2$ films prepared by sol-gel method)

  • 권정오;김재홍;석상일;정동운
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 추계학술발표강연 및 논문개요집
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    • pp.137-137
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    • 2003
  • Optical amplificator have been used to compensate the losses in the optical signal transmission and processing. Today, there has been increasing demand for the very low cost optical amplifier. Sol-gel offers considerable potential both low cost manufacture, and for great flexibility in materials composition and structure. In addition, the sol-gel process is a very attractive method for producing porous materials with controlled structure. In this work, we present the potoluminescence properties of Er doped A1$_2$O$_3$/SiO$_2$ films. Erbium doped alumina nano sol was prepared by Al(NO$_3$)$_3$.9$H_2O$ and Er(NO$_3$)$_3$.5$H_2O$ through hydrolysis and peptization, and then GPS (3-Glycidoxypropyltrimethoxysilane) was added into Er doped alumina nano sol for organic- inorganic hybridization. Er doped A1$_2$O$_3$/SiO$_2$ film was obtained by spin coating, dip coating and thermal treatment from 30$0^{\circ}C$~120$0^{\circ}C$, and there were crack-free after thermal treatment. The thickness of film was measured SEM, and the porosity of film was characterized by BET and TGA. The crystal phase of Er doped A1$_2$O$_3$/SiO$_2$ were determined by XRD. Finally, the photoluminescence properties of Er doped A1$_2$O$_3$/SiO$_2$ films will be discuss with the consideration of porosity and crystallity.

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예열 온도 변화에 따른 Sol-Gel 법에 의해 제작된 ZnO 박막의 물리적 특성 연구 (Physical Properties of ZnO Thin Films Grown by Sol-Gel Process with Different Preheating Temperatures)

  • 김익주;한호철;이충선;송용진;태원필;서수정;김용성
    • 한국세라믹학회지
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    • 제41권2호
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    • pp.136-142
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    • 2004
  • 출발물질로 zinc acetate dihydrate(Zn($CH_3$COO)$_2$$.$2$H_2O$)를 사용하였고, 이 물질을 isopropanol(($CH_3$)$_2$CHOH)-monoethanolamine(MEA:H$_2$NCH$_2$C$H_2O$H) 용액에 용해하여 균일하고 안정한 sol을 만들었다. Sol-gel spin-coating 법에 의해 ZnO 박막을 제조시 예열 온도에 따른 박막의 c-축 배향성과 그 물리적 특성을 조사하였다. c-축으로의 성장은 예열 온도의 변화에 따라 차이를 보였으며. 275$^{\circ}C$에서 예열 후 $650^{\circ}C$에서 최종 열처리한 ZnO 박막은 XRD 측정결과 기판에 수직한 (002) 방향으로 강한 배향성을 나타내었다 200∼30$0^{\circ}C$에서 예열 후, $650^{\circ}C$에서 최종 열처리한 ZnO 박막은 UV-vis측정결과 가시광선 영역에서 온도에 따른 투과도의 변화를 보이지만 평균 85% 이상의 높은 투과도를 보였다. 또한 370nm 부근에서 흡수단을 나타내었으며, 광학적 밴드갭은 약 3.22 eV로 나타났다. 발광방출(PL) 측정결과, 황색(620nm, 2.0 eV)발광이 관찰되어, 무기발광 소자로의 응용 가능성을 나타내었다.

스핀코팅법으로 제작한 산화구리 박막의 일산화질소 가스 감지 특성 (Nitrogen Monoxide Gas Sensing Properties of Copper Oxide Thin Films Fabricated by a Spin Coating Method)

  • 황현정;김효진;김도진
    • 한국재료학회지
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    • 제25권4호
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    • pp.171-176
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    • 2015
  • We present the detection characteristics of nitrogen monoxide(NO) gas using p-type copper oxide(CuO) thin film gas sensors. The CuO thin films were fabricated on glass substrates by a sol-gel spin coating method using copper acetate hydrate and diethanolamine as precursors. Structural characterizations revealed that we prepared the pure CuO thin films having a monoclinic crystalline structure without any obvious formation of secondary phase. It was found from the NO gas sensing measurements that the p-type CuO thin film gas sensors exhibited a maximum sensitivity to NO gas in dry air at an operating temperature as low as $100^{\circ}C$. Additionally, these CuO thin film gas sensors were found to show reversible and reliable electrical response to NO gas in a range of operating temperatures from $60^{\circ}C$ to $200^{\circ}C$. It is supposed from these results that the p-type oxide semiconductor CuO thin film could have significant potential for use in future gas sensors and other oxide electronics applications using oxide p-n heterojunction structures.

이산화티탄 나노입자로부터 고굴절 하드코팅 도막의 제조 (Preparation of Hard Coating Films with High Refractive Index from Titania Nanoparticles)

  • 김남우;안치용;송기창
    • Korean Chemical Engineering Research
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    • 제53권6호
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    • pp.762-769
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    • 2015
  • 직경 2~3 nm 크기를 갖는 이산화티탄 나노입자가 산성 용액에서 titanium tetraisopropoxide(TTIP)의 가수분해 반응을 조절함에 의해 합성되었다. 생성된 이산화티탄 나노입자를 졸-겔법에 의해 3-glycidoxypropyl trimethoxysilane(GPTMS)과 반응시킴에 의해 유-무기 혼성 코팅 용액이 제조되었다. 그 후 코팅 용액을 기재인 polycarbonate(PC) 시트 위에 스핀 코팅시키고, $120^{\circ}C$에서 열경화 시켜 고굴절률 하드코팅 도막이 제조되었다. 코팅 도막은 가시광선 영역에서 90%의 높은 광학적 투과율을 보였으며 2H의 연필경도를 나타내었다. 또한 코팅 용액 내의 이산화티탄 나노입자의 함량이 4%에서 25%로 증가됨에 따라 코팅 필름의 굴절률은 633 nm 파장에서 1.502로부터 1.584로 향상되었다.

PZT 후막의 미세 구조적 특성에 조성과 전구체 용액의 코팅이 미치는 영향 (Effect of Composition and Coating of Precursor Solution on a Micro Structural Properties of PZT Thick Films)

  • 박상만;노현지;이성갑
    • 한국전기전자재료학회논문지
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    • 제19권11호
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    • pp.1014-1019
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    • 2006
  • The influence of the number of solution coatings on the densification of the PZT thick films was studied. PZT powder and PZT precursor solution was prepared by a sol-gel method and PZT thick films were fabricated by the screen-printing method on the alumina substrates. The powder and solution of composition were (A) PZT(80/20)/PZT(20/80), (B) PZT(70/30)/PZT(30/70) and (C) PZT(60/40)/PZT(40/60), (D) PZT(52/48)/PT. The coating and drying procedure was repeated 4 times. And then the PZT precursor solution was spin-coated on the PZT thick films. A concentration of a coating solution was 0.5 moth and the number of coating was repeated from 0 to 6. The porosity of the thick films was decreased with increasing the number of coatings and the PZT thick films with 6-times coated showed the dense microstructure and thickness of about $60{\mu}m$. A grain size was increased with increasing the coating number. All PZT thick films showed the typical XRD patterns of a typical perovskite polycrystalline structure. The relative dielectric constant of PZT thick films was improved 30-100% as the number of coatings.

Synthesis of direct-patternable ZnO film incorporating Pt Nanoparticles

  • Choi, Yong-June;Park, Hyeong-Ho;Reddy, A.Sivasankar;Park, Hyung-Ho
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.369-369
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    • 2007
  • ZnO film has been investigated during several decades because it has excellent optical property like a transmittance among the range of visible light for using transparent conducting oxide (TCO) films. But ZnO film has not enough conductivity for applying to TCO devices. Therefore we synthesized platinum nanoparticles and they incorporated into ZnO due to improve the electrical property of ZnO film by sol-gel synthesis method. Also, we fabricated photosensitive ZnO thin film containing Pt nanoparticles by sol-gel process and spin-coating for using photochemical solution deposition. Photosensitive ZnO film could carry out the direct-pattern which allow the etching process to be convenient. The optical and electrical properties of ZnO film with or without various atomic percent of Pt nanoparticles annealed at various temperatures were investigated by using UV-Vis spectroscopy and 4-point probe method, respectively. We characterized the ZnO thin film containing Pt nanoparticles using X-ray diffraction, scanning electron microscopy, and X-ray photoelectron spectroscopy.

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