• 한국진공학회:학술대회논문집
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• 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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• pp.100-100
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• 2000

Aluminium oxide (Al2O3) films have been investigated for many applications such as insulating materials, hard coatings, and diffusion barriers due to their attractive electrical and mechanical properties. In recent years, application of Al2O3 films for dielectric materials in integrated circuits as gates and capacitors has attracted much attention. Various deposition techniques such as sol-gel, metalorganic decomposition (MOD), sputtering, evaporation, metalorganic chemical vapor deposition (MOCVD), and pulsed laser ablation have been used to fabricate Al2O3 thin films. Among these techniques, reactive sputtering has been widely used due to its high deposition rate and easy control of film composition. It has been also reported that the sputtered Al2O3 films exhibit superior chemical stability and mechanical strength compared to the films fabricated by other processes. In this study, Al2O3 thin films were deposited on Pt/Ti/SiO/Si2 and Si substrates by DC reactive sputtering at room temperature with variation of the Ar/O2 ratio in sputtering ambient. Crystalline phase of the reactively sputtered films was characterized using X-ray diffractometry and the surface morphology of the films was observed with Scanning election microscopy. Effects of Th Ar/O2 ratio characteristics of Al2O3 films were investigated with emphasis on the thickness dependence of the dielectric properties. Correlation between the dielectric properties and the microstructure was also studied

• Journal of Industrial and Engineering Chemistry
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• 제67권
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• pp.164-174
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• 2018

The purpose of this work designed hybrid-structured and plasma effect photocatalyst of $Ag/In_2O_3/TiO_2/HNTs$ via sol-gel and photo-reduction methods. The structures, morphologies, optical and photoelectric performances of as-prepared photocatalysts were characterized via XRD, TEM, XPS, BET, UV-vis DRS, PL and photocurrents. The photocatalytic activity was evaluated by degradation of TC. The results showed that the hybrid-structure and plasma effect can effectively cause the multi-transfer of electrons and increase the separation rate of electron and hole pairs which obtained high photocatalytic activity. The photocatalytic degradation processes reveal that $^{\bullet}O_2{^-}$ and $h^+$ are major active species.

• 한국산학기술학회논문지
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• 제18권3호
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• pp.1-6
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• 2017

태양전지의 셀을 보호하기 위한 커버 글라스에는 반사방지 코팅 및 셀프클리닝과 같은 기능성 코팅이 적용되어왔다. 일반적으로 메조포러스 실리카를 이용한 반사방지 코팅은 빛의 투과를 증가시키며, $TiO_2$ 광촉매 필름은 셀프클리닝 코팅에 적용되어왔다. 본 연구에서는 $SiO_2/TiO_2$ 박막 코팅에 의한 투명 발수 반사방지 및 셀프클리닝 코팅을 sol-gel 공정과 dip-coating 공정으로 글라스 기판 위에 제조하였다. 기능성 코팅의 표면형상은 전계방출 주사전자현미경과 원자힘 현미경으로 분석하였고, 광학적 특성은 UV-visible 분광광도계로 분석하였다. 필름의 발수특성은 접촉각 측정으로 확인하였다. 그 결과 $TiO_2$ 필름은 기판인 슬라이드 글라스와 비슷한 수준의 높은 광 투과율을 나타내었다. 일반적으로 $TiO_2$ 나노입자는 필름에서 반사를 증가시키며, 결과적으로 투과율의 저하를 가져온다. 하지만 본 연구의 $SiO_2/TiO_2$ 박막으로 이루어진 기능성 코팅은 $110^{\circ}$의 접촉각을 나타내었으며, 파장 550 nm에서 기판인 슬라이드 글라스의 투과율보다 2.0% 증가한 93.5%의 광 투과율 특성을 나타내었다.

• 한국진공학회지
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• 제15권5호
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• pp.534-540
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• 2006

$V_2O_3$, $VO_2$, $V_2O_5$ 박막들이 하나의 선구 용액으로부터 다양한 후열처리 조건을 통하여 제작될 수 있었다. 진공 중 후열처리 시 rhombohedral 구조의 $V_2O_3$ 박막이 형성되어졌고, 공기 중 후열처리 시 orthorhombic 구조의 $V_2O_5$ 박막을 얻을 수 있었다. Monoclinic 구조의 $VO_2$ 박막은 진공 후열처리 중 $O_2$ 가스를 공급함으로써 제작될 수 있었다. $V_2O_3$ 박막이 상온에서 도체적 특성을 보이는 반면, $V_2O_5$, $VO_2$ 박막은 반도체적 성질을 지니고 있음을 전기적, 광학적 특성 조사를 통하여 알 수 있었다. 크롬(Cr)이 도핑됨에 따라 $VO_2$ 박막은 그 전기전도성이 n-type에서 p-type으로 변화하였고 비저항이 감소되는 결과를 나타내었다. 또한, 크롬 도핑된 $VO_2$ 박막은 orthorhombic 구조를 나타내었다. 이와 같은 바나듐 옥사이드 박막들에서 관측된 광학적 흡수 구조들은 O 2p 에서 V 3d 밴드로의 전이에 의한 것으로 해석되어진다. 바나듐 이온의 $t_{2g}$ 상태와 $e_g$ 상태 사이의 결정장 갈라짐(crystal-field splitting)은 $V_2O_5$와 $VO_2$에 대해서 각각 1.5 및 1.0 eV로 해석된다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.254-254
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• 2016

Tin dioxide (SnO2) thin film is one of the most important n-type semiconducting materials having a high transparency and chemical stability. Due to their favorable properties, it has been widely used as a base materials in the transparent conducting substrates, gas sensors, and other various electronic applications. Up to now, SnO2 thin film has been extensively studied by a various deposition techniques such as RF magnetron sputtering, sol-gel process, a solution process, pulsed laser deposition (PLD), chemical vapor deposition (CVD), and atomic layer deposition (ALD) [1-6]. Among them, ALD or plasma-enhanced ALD (PEALD) has recently been focused in diverse applications due to its inherent capability for nanotechnologies. SnO2 thin films can be prepared by ALD or PEALD using halide precursors or using various metal-organic (MO) precursors. In the literature, there are many reports on the ALD and PEALD processes for depositing SnO2 thin films using MO precursors [7-8]. However, only ALD-SnO2 processes has been reported for halide precursors and PEALD-SnO2 process has not been reported yet. Herein, therefore, we report the first PEALD process of SnO2 thin films using SnCl4 and oxygen plasma. In this work, the growth kinetics of PEALD-SnO2 as well as their physical and chemical properties were systemically investigated. Moreover, some promising applications of this process will be shown at the end of presentation.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2001년도 The 6th International Symposium of East Asian Resources Recycling Technology
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• pp.240-244
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• 2001

Recycling process involving mechanical, thermal, hydrometallurgical, and sol-gel step has been applied to recover cobalt and lithium from spent lithium ion batteries and to synthesize LiCoO$_2$from leach liquor as cathodic active materials. Electrode materials containing lithium and cobalt could be concentrated with 2-step thermal and mechanical treatment. Leaching behaviors of the lithium and cobalt in nitric acid media was investigated in terms of reaction variables. Hydrogen peroxide in 1 M HNO$_3$solution turned out to be an effective reducing agent by enhancing the leaching efficiency. O f many possible processes to produce LiCoO$_2$, the amorphous citrate precursor process (ACP) has been applied to synthesize powders with a large specific surface area and an exact stoichiometry. After leaching used LiCoO$_2$with nitric acid, the molar ratio of Li/Co in the leach liquor was adjusted at 1.1 by adding a fresh LiNO$_3$solution. Then, 1 M citric acid solution at a 100% stoichiometry was also added to prepare a gelatinous precursor. When the precursor was calcined at 95$0^{\circ}C$ for 24 hr, purely crystalline LiCoO$_2$was successfully obtained. The particle size and specific surface area of the resulting crystalline powders were 20 пm and 30 $\textrm{cm}^2$/g, respectively The LiCoO$_2$powder was proved to have good characteristics as cathode active materials in charge/discharge capacity and cyclic performance.

• Bulletin of the Korean Chemical Society
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• 제32권7호
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• pp.2178-2182
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• 2011

Recently, the synthesis of ordered macroporous materials has received much attention due to its potential use as photonic band gap materials.$^1$ In this study, we have used the three-dimensional (3D) latex array template impregnated with benzenesulfonic acid (BSA), which is capable of catalyzing the reaction using tetraethyl orthosilicate (TEOS) as a precursor and distilled water. The polystyrene (PS) templates were reacted with TEOS in $scCO_2$ at 40 $^{\circ}C$ and at 80 bar. In the reactor, TEOS was filtrated into the PS particle lattice. After the reaction, porous silica materials were obtained by calcinations of the template. The stability test of the PS template in pure $CO_2$ was conducted before the main experiment. Scanning electron microscopy (SEM) images showed that the reaction in $scCO_2$ takes place only on the particle surface. This new method using $scCO_2$ has advantages over conventional sol-gel processes in its capability to control the fluid properties such as viscosity and interfacial tension. It has been found that the reaction in $scCO_2$ occurs only on the particle surface, making the proposed technique as more rapid and sustainable method of synthesizing inverse opal materials than conventional coating processes in the liquid phase and in the vapor phase.

• 한국초전도저온공학회:학술대회논문집
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• 한국초전도저온공학회 2002년도 학술대회 논문집
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• pp.340-340
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• 2002

In an effort to develop alternative single buffer layer technology for YBa$_2$Cu$_3$O$_{7-{\delta}}$ (YBCO) coated conductors, we have investigated both LaMnO$_3$, (LMO) and La$_2$Zr$_2$O$_{7}$ (LZO) as potential buffer layers. High-quality LMO films were grown directly on textured Ni and Ni-W (3%) substrates using rf magnetron sputtering. Highly textured LZO buffers were grown on textured Ni substrates using sol-gel alkoxide processing route. YBCO films were then grown on both LMO and LZO buffers using pulsed laser deposition. Detailed X-ray studies have shown that YBCO films were grown on both LMO and LZO layers with a single epitaxial orientation. A high J$_{c}$ of over 1 MA/cm$^2$ at 77 K and self-field was obtained on YBCO films grown on both LMO-buffered Ni or Ni-W substrates, and also on LZO-buffered Ni substrates. We have identified LaMnO$_3$ as a good diffusion barrier layer for Ni and it also provides a good template for growing high current density YBCO films. Similarly we have also demonstrated the growth of high J$_{c}$ YBCO films on all solution buffers. We will discuss in detail about our buffer deposition processes. processes.s.s.s.s.

• 멤브레인
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• 제20권1호
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• pp.21-28
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• 2010

염료감응형 태양전지에 사용되기 위한 유기/무기 복합소재를 합성하였다. 다양한 분자량(600, 1,500, 2,000, 3,400)의 polyethylene glycol 양 끝단을 ethoxysilane기로 치환하여 전구체를 제조하였으며, 전구체간의 졸-겔 반응을 통하여 복합소재를 합성하였다. 전해질막은 유기/무기 복합소재를 KI 및 $I_2$로 도핑하여 제조하였으며, 제조한 전해질의 이온전도도 특성을 측정하였다. 전해질막의 이온전도도는 원료로 사용한 PEG에 크게 영향을 받았으며 가장 높은 이온전도도는 분자량 2,000의 PEG를 사용한 전해질막에서 볼 수 있었다. 복합전해질막은 이온전도도에 있어서 큰 향상을 보였다. PEO 전해질막에 비하여 분자량 2,000의 PEG를 사용하여 제조한 복합전해질막은 월등하게 높은 이온전도도를 보였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.319-319
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• 2013

Even though the fabrication methods of metal oxide based thin film capacitor have been well established such as RF sputtering, Sol-gel, metal organic chemical vapor deposition (MOCVD), ion beam assisted deposition (IBAD) and pulsed laser deposition (PLD), an applicable capacitor of printed circuit board (PCB) has not realized yet by these methods. Barium Strontium Titanate (BST) and other high-k ceramic oxides are important materials used in integrated passive devices, multi-chip modules (MCM), high-density interconnect, and chip-scale packaging. Thin film multi-layer technology is strongly demanded for having high capacitance (120 nF/$mm^2$). In this study, we suggest novel multi-layer thin film capacitor design and fabrication technology utilized by plasma assisted deposition and photolithography processes. Ba0.6Sr0.4TiO3 (BST) was used for the dielectric material since it has high dielectric constant and low dielectric loss. 5-layered BST and Pt thin films with multi-layer sandwich structures were formed on Pt/Ti/$SiO_2$/Si substrate by RF-magnetron sputtering and DC-sputtering. Pt electrodes and BST layers were patterned to reveal internal electrodes by photolithography. SiO2 passivation layer was deposited by plasma-enhanced chemical vapor deposition (PE-CVD). The passivation layer plays an important role to prevent short connection between the electrodes. It was patterned to create holes for the connection between internal electrodes and external electrodes by reactive-ion etching (RIE). External contact pads were formed by Pt electrodes. The microstructure and dielectric characteristics of the capacitors were investigated by scanning electron microscopy (SEM) and impedance analyzer, respectively. In conclusion, the 0402 sized thin film multi-layer capacitors have been demonstrated, which have capacitance of 10 nF. They are expected to be used for decoupling purpose and have been fabricated with high yield.