• Journal of Korean Ophthalmic Optics Society
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• v.3 no.1
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• pp.237-242
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• 1998

A transparent and colorless $80SiO_2-20TiO_2$(mol%) thin films on soda-lime-silica slide glass and sapphire substrate were obtained by spin-coating technique using tetraethyl orthosilicate and titanium trichloride as starting materials. The prepared film annealed at $750^{\circ}C$ showed a high transmittance and a low reflectance. For the $SiO_2-TiO_2$ films on slide glasses, a strong interaction between the sodium ion and oxygens is properbly the origin of the good stability to the high temperature and the high humidity.

• Journal of Korean Ophthalmic Optics Society
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• v.12 no.1
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• pp.17-22
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• 2007

Metal-doped $TiO_2$ thin films were prepared on soda-lime-silica glass substrates by using a spin coating-pyrolysis process. As-deposited films were prefired at $500^{\circ}C$ or 10 min in air. Five-coated films were finally annealed at $600^{\circ}C$ for 30 min in air. High resolution X-ray diffraction, field emission scanning electron microscope and UV spectrophotometer were used to analyze film's property. The largest red shift in optical energy gap is obtained in the Fe-doped $TiO_2$ film.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07b
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• pp.857-860
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• 2002

The material that is both conductive in electricity and transparent to the visible-ray is called transparent conducting thin film. It has many field of application such as solar cell, liquid crystal display, transparent electrical heater, selective optical filter, and a optical electric device. In this study, indium tin oxide (ITO ; Sn-doped $In_2O_3$) thin films were deposited on $SiO_2$/soda-lime glass plates by a dc magnetron sputtering technique. The crystallinity and electrical properties of the films were investigated by X-ray diffraction(XRD), atomic force microscopy (AFM) scanning and 4-point probe. The optical transmittance of ITO films in the range of 300-1000nm were measured with a spectrophotometer. As a result, we obtained polycrystalline structured ITO films with (222), (400), and (440) peak. Transmittance of all the films were higher than 90% in the visible range.

• Korean Journal of Materials Research
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• v.12 no.6
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• pp.499-507
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• 2002

The carbon nanotube emitters for field emission displays were fabricated by using screen printing techniques. The pastes for screen printing are composed of organic binders, carbon nanotubes (multiwalled or singlewalled), and some additive materials. The pastes were printed on Cr-coated/Ag-printed soda-lime glass substrates. From the I-V characteristics, the turn-on field of SWNT was lower than that of MWNT. The decrease in the mesh size of screen masks (i.e. increase in the opening size of the screen mesh) resulted in decreasing the turn-on field and increasing the electron emission current. When the carbon nanotubes were mixed with silver pastes, silver powders appeared to contribute to the vertically aligning of carbon nanotubes on a glass.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07a
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• pp.383-386
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• 2002

Polycrystalline Cu(In,Ga)Se$_2$(CIGS) thin-films were grown by co-evaporation on a soda lime glass substrate. In this paper the effects of the Se evaporation temperature on the properties of CuIn0.75Ga0.25Se2 (CIGS) thin films. Structure, surface morphology and optical properties of CIGS thin films deposited at various Se evaporation temperatures have been investigated using a number of analysis techniques. X-ray diffraction (XRD) analysis shows that CIGS films exhibit a strong <112> preferred orientation. As expected, at higher Se evaporation temperatures the films displayed a lower degree of crystallinity. The <112> peak was also enhanced and other CIGS peaks appeared simultaneously. These results were supported by experimental work using scanning electron microscopy When the Se evaporation temperature was increased, the average grain size also decreased together with a reduction Cu content. The Se evaporation temperature also had a significant inf1uence on the transmission spectra. Increasing the Se evaporation temperature, the cell efficiency was improved dramatically to 11.75% with Voc = 556 mV, Jsc = 32.17 mA/cm2 and FF = 0.66. The Se evaporation temperature is an important parameter in thin film deposition regardless of the deposition technique being used to deposit thin films

• Journal of the Korean Ceramic Society
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• v.42 no.7 s.278
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• pp.455-460
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• 2005

Deposition of TiN$_{x}$ film was conducted with a DC sputtering technique. The effect of the processing parameters such as substrate temperature, deposition time, working pressure, bias power, and volumetric flowing rate ratio of Ar to N$_{2}$ gas on the resistivity of TiN$_{x}$ film was systematically investigated. Three kinds of substrates, soda-lime glass, (100) Si wafer, and 111m thermally grown (111) SiO$_{2}$ wafer were used to explore the effect of substrate. The phase of TiN$_{x}$ film was analyzed by XRD peak pattern and deposition rate was determined by measuring the thickness of TiNx film through SEM cross-sectional view. Resistance was obtained by 4 point probe method as a function of processing parameters and types of substrates. Finally, optimum condition for synthesizing TiN$_{x}$ film having lowest resistivity was discussed.

• The Korean Journal of Ceramics
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• v.5 no.4
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• pp.404-408
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• 1999

Gallium doped zinc oxide(GZO) films were deposited on soda-lime glass substrates without substrate heating $(T_s<50^{\circ}C$) by dc planar magnetron sputtering using GZO ceramic oxide targe with different inert gas (Ar, or Ne). For the GZO films deposited under different total gas pressure $(P_{tot})$, structural and electrical properties were investigated by XRD and Hall effect measurements. Crystallinity of GZO films deposited using Ar was degraded with increase in $(P_{tot})$, suggesting that it was heavily affected by kinetic energy of sputtered Zn particles$(PA_{zn})$ arriving at substrate surface. Whereas, crystallinity of GZO films deposited at lower Ptot than 3.0 Pa using Ne gas was degraded with decrease in $(P_{tot})$. This degradation was considered to be result of film damage caused by the bombardment of high-energy neutrals ($Ne^{\circ}$). On the basis of a hard sphere collision processes, the average final energy of particles (sputtered Zn, $Ar^{\circ}$and $Ne^{\circ}$)arriving at substrate surface were estimated.

• Proceedings of the KSME Conference
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• 2001.11a
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• pp.137-142
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• 2001

In structural applications, brittle materials such as soda-lime glasses and ceramics are often subjected to multiaxial stress. Brittle materials with crack or damaged by foreign object impacts are abruptly fractured from cracks, because of their properities of very high strength and low fracture toughness. But in most cases, the residual strength has been derived from tests under uniaxial stress such as a 4-point bend test. The strengths under multiaxial stresses might be different from the strength. In comparable tests, the residual strength under biaxial stress state by the ball-on-ring test was greater than that under the uniaxial one by the 4-point bend test. In the case that crack having 90deg. to loading direction, the ratio of biaxial to uniaxial flexure strength was 1.12. At a different crack angle to loading direction when it was evaluated by the 4-point bend test, the residual strength was different and the ratio of 45deg. to 90deg. was 1.16.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.25 no.4
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• pp.629-636
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• 2001

In order to investigate the possibility of impact punching in brittle materials, an experimental setup was developed. In the setup, a long bar as a punch was used to apply the impact load to the specimen plate and measure the applied impact force during the impact punching process. Impact punching tests with various shape of punches were performed in soda-lime glass and silicon wafer under a different level of contact pressure. The damage appearance after the impact punching was examined according to the applied contact pressure. The minimum contact pressure required for a complete punching in glass specimens without development of radial cracks around the punched hole was sought at each condition. The minimum contact pressure increased with increasing the thickness of specimens and decreasing the end radius of punches. The profile of impact forces was measured during the impact punching experiment, and it could explain well the behavior of the punching process in brittle material plates. The measured impact force increased with increasing the contact pressure applied to the plates.

• Applied Chemistry for Engineering
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• v.24 no.3
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• pp.239-246
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• 2013

Principle of foamed glass manufacturing process first starts with putting vitreous material powder into a mold. After the foaming calcination, foamed body should be annealed after separation from the mold. For this reason, existing manufacturing process could not be a continuous type process. In this study, in order to develop a continuous production process of foamed glass, the possibility of new foam glass manufacturing process was investigated by foaming calcination of the compact body obtained from compression-molding of vitreous raw materials in stead of using a mold. Through the experimental results of the foaming calcination of the compact body with adding various foaming agents such as $Na_2CO_3$, $CaCO_3$ and petroleum coke, into hydrated soda-lime vitreous raw materials, it was shown that developing a continuous process without using any molds for manufacturing foamed glass would be possible.