• Journal of the Korean institute of surface engineering
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• v.46 no.2
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• pp.61-67
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• 2013

Thin film solar cells have attracted much attention due to their high cell efficiency, comparatively low process cost, and applicability to flexible substrates. In particular, CIGS solar cells have been widely studied and produced because they demonstrated the highest cell efficiency. However, the deposition process of CIGS films generally includes the selenization process conducted at elevated temperature using toxic $H_2Se$ gas. To avoid this selenization process, CIGS thin films were, in this study, deposited by RF sputtering using single composite CIGS target. In addition, the effects of sputtering bias voltage and heat treatment on the microstructural and morphological changes in deposited CIGS films were investigated and discussed.

• Journal of the Korean institute of surface engineering
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• v.54 no.5
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• pp.285-293
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• 2021

High-entropy TiAlCrSiN nano-composite coating was designed to improve mold life for high temperature liquid molding. Alloy design, powder fabrication and single alloying target fabrication for the high-entropy nano-composite coating were carried out. Using the single alloying target, an arc ion plating method was applied to prepare a TiAlCrSiN nano-composite coating had a 30 nm TiAlCrSiN layers are deposited layer by layer, and form about 4 ㎛-thickness of multi-layered coating. TiAlCrSiN nano-composite coating had a high hardness of about 39.9 GPa and a low coefficient of friction of less than about 0.47 in a dry environment. In addition, there was no change in the structure of the coating after the dissolution loss test in the molten metal at a temperature of about 1100 degrees.

• Korean Journal of Materials Research
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• v.1 no.4
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• pp.191-197
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• 1991

The surface roughnesses of titanium silicide films and the diffusion behaviours of dopants in single crystal and polycrystalline silicon substrates durng titanium silicide formation by rapid thermal annealing(RTA) of sputter deposited Ti-filicide film from the composite $TiSi_{2.6}$ target were investigated by the secondary ion mass spectrometry(SIMS), a four-point probe, X-ray diffraction, and surface roughness measurements. The as-deposited films were amorphous but film prepared on single silicon substrate crystallized to the orthorhombic $TiSi_2$(C54 structure) upon rapid thermal annealing(RTA) at $800^{\circ}C$ for 20sec. There was no significant out-diffusion of dopants from both single crystal and polycrystalline silicon substrate into titanum silicide layers during annealing. Most of the implanted dopants piled up near the titanium silicide/silicon interface. The surface roughnesses of titanium silicide films were in the range between 16 and 22nm.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.29 no.10
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• pp.665-670
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• 2016

Prevailing dissemination of machine tools and cutting technology have caused drastic developments of high speed dry machining with work materials of high hardness, and demands on the high-hardness-materials with high efficiency have become increasingly important in terms of productivity, cost reduction, as well as environment-friendly issue. Addition of Si to TiAlN has been known to form nano-composite coating with higher hardness of over 30 GPa and oxidation temperature over $1,000^{\circ}C$. However, it is not easy to add Si to TiAlN by using conventional PVD technologies. Therefore, Ti-Al-Si-N have been prepared by hybrid process of PVD with multiple target sources or PVD combined with PECVD of Si source gas. In this study, a single composite target of Ti-Al-Si was prepared by powder metallurgy of MA (mechanical alloying) and SPS (spark plasma sintering). Properties of he resulting alloying targets were examined. They revealed a microstructure with micro-sized grain of about $1{\sim}5{\mu}m$, and all the elements were distributed homogeneously in the alloying target. Hardness of the Ti-Al-Si-N target was about 1,127 Hv. Thin films of Ti-Al-Si-N were prepared by unbalanced magnetron sputtering method by using the home-made Ti-Al-Si alloying target. Composition of the resulting thin film of Ti-Al-Si-N was almost the same with that of the target. The thin film of Ti-Al-Si-N showed a hardness of 35 GPa and friction coefficient of 0.66.

• Journal of the Korean Society of Radiology
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• v.14 no.3
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• pp.193-201
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• 2020

The purpose of this study is to evaluate the photon characteristics according to the material and thickness of the electrons incidented through a linear accelerator. The computer simulation design is a linear accelerator target consisting of a 2 mm thick tungsten single material and a 1.8 mm and 2.3 mm thick tungsten and copper composite material. In the research method, First, the behavior of primary particles in the target was evaluated by electron fluence and electron energy deposition. Second, photons occurring within the target were evaluated by photon fluence. Finally, the photon angle-energy distribution at a distance of 1 m from the target was evaluated by photon fluence. As a result, first, electrons, which are primary particles, were not released out of the target for electron fluence and energy deposition in the target of a single material and a composite material. Then, electrons were linearly attenuated negatively according to the target thickness. Second, it was found that the composite material target had a higher photon generation than the single material target. This confirmed that the material composition and thickness influences photon production. Finally, photon fluence according to the angular distribution required for shielding analysis was calculated. These results confirmed that the photon generation rate differed depending on the material and thickness of the linear accelerator target. Therefore, this study is necessary for designing and operating a linear accelerator use facility for container security screening that is being introduced in the country. In addition, it is thought that it can be used as basic data for radiation protection.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2017.05a
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• pp.95.1-95.1
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• 2017

In this study, it has been tried to make the single Mo-Cu alloying targets with the Cu showing the best surface hardness that was determined by investigation on the coatings with the double target process. The single alloying targets were prepared by powder metallurgy methods such as mechanical alloying and spark plasma sintering. The nanocomposite coatings were prepared by reactive magnetron sputtering process with the single alloying targets in $Ar+N_2$ atmosphere. The microstructure changes of the Mo-Cu-N coatings with diverse Cu contents were investigated by using XRD, SEM and EDS. The mechanical properties of the coatings were evaluated by using nano-indentor, scratch test, and ball on disc methods. Especially, the coated samples were tested by using various lubricating oil to compare the property of anti wear-resistance. In this study, the nano-composite MoN-Cu coatings prepared using an alloying target was eventually compared with the coatings from the multiple targets.

• Analytical Science and Technology
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• v.5 no.2
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• pp.199-202
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• 1992

Ti-silicide was formed by using metal-Ti target and composite target on the silicon substrate that $BF_2$ were introduced into. Implant energies of $BF_2$ were 50keV and 90keV. The behavior of boron was investigated by SIMS. The redistribution of boron occurred during the formation of Ti-silicide by metal-Ti target and the sample implanted at the energy of 50keV showed severe out-diffusion. In the case that Ti-silicide was formed by composite target, there was little redistribution of boron.

• Journal of the Korean institute of surface engineering
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• v.49 no.4
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• pp.368-375
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• 2016

MoN-Cu thin films were prepared to achieve appropriate properties of high hardness and low friction coefficient, which could be applied to automobile engine parts for reducing energy consumption as well as solving wear problems. Composite thin films of MoN-Cu have been deposited by various processes using multiple targets such as Mo and Cu. However, those deposition with multiple targets revealed demerits such as difficulties in exact control of composition and homogeneous deposition. This study is aiming for suggesting an appropriate process to solve those problems. A single alloying target of Mo-Cu (10 at%) was prepared by powder metallurgy methods of mechanical alloying (MA) and spar plasma sintering (SPS). Thin film of MoN-Cu was then deposited by magnetron sputtering using the single alloying target of Mo-Cu (10 at%). Properties of the resulting MoN-Cu thin film were examined and compared to those of MoN-Cu thin films prepared with double targets of Mo and Cu.

• Nuclear Engineering and Technology
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• v.55 no.6
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• pp.1994-1998
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• 2023

This study quantitatively evaluated the source term of a linear accelerator according to target thickness for a 6-20 MeV electron beam using MCNP6. The elements of the target were tungsten and copper, and a composite target and single target were simulated by setting different thickness parameters depending on energy. The accumulation of energy generated through interaction with the collided target was evaluated at 0.1-mm intervals, and F6 tally was used. The results indicated that less than 3% reference error was maintained according to the MCNP recommendations. At 6, 8, 10, 15, 18, and 20 MeV, the energy accumulation peaks identified for each target were 0.3 mm in tungsten, 1.3 mm in copper, 1.5 mm in copper, 0.5 mm in tungsten, 0.5 mm in tungsten, and 0.5 mm in tungsten. For 8 and 10 MeV in a single target consisting only of copper, the movement of electrons was confirmed at the end of the target, and the proportion of escaped electrons was 0.00011% and 0.00181%, respectively.

• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.213-213
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• 2000

Direct laser vaporization of transition-metal(Co, Ni)/graphite composite pellet produced single wall carbon naotubes(SWNT) in the condensing vapor in a heated flow cylinder-type tube furnace, Transition metal/graphite composite pellet target was made by mixing graphite, Co, and Ni in 98:1:1 atomic weight ratios, pressing the mixed powder, and curing it. The target was placed in a tube furnace maintained at 1200$^{\circ}C$ and Ar inert collision gas continuously flowed into the tube. The 2nd harmonic, 532nm wavelength light from Nd-YAG laser was used to vaporize the tube. The carbon nanotubes produced by the laser vaporization were accumulated on quartz tube wall. The raw carbon nanotube materials were purified with surfactants(Triton X-100) in a ultrasonicator. These carbon nanotubes were analyzed using SEM, XRD, and Raman spectroscopic method. The carbon nanotube growth on the Ni-patterned Si substrate was investigated by the CVD process. Transition-metal, Ni and CH4 gas were used as a catalyst and a reactant gas, respectively. The structure and the phonon frequencies of the carbon nanotubes formed on the patterned Si substrate were measured by SEM and Raman spectrometer.