• Title/Summary/Keyword: Silsesquioxane

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반도체 산업용 나노기공 함유 유기실리카 박막

  • 차국헌;윤도영;이진규;이희우
    • Proceedings of the Korea Crystallographic Association Conference
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    • 2002.11a
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    • pp.48-48
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    • 2002
  • It is generally accepted that ultra low dielectric interlayer dielectric materials (k < 2.2) will be necessary for ULSI advanced microelectronic devices after 2003, according to the International Technology Roadmap for Semiconductors (ITRS) 2000. A continuous reduction of dielectric constant is believed to be possible only by incorporating nanopores filled with air (k = 1.0) into electrically insulating matrices such as poly(methyl silsesquioxane) (PMSSQ). The nanopo.ous low dielectric films should have excellent material properties to survive severe mechanical stress conditions imposed during the advanced semiconductor processes such as chemical mechanical planarization process and multilayer fabrication. When air is incorporated into the films for lowering k, their mechanical strength has inevitably to be sacrificed. To minimize this effect, the nanopores are controlled to exist in the film as closed cells. The micromechanical properties of the nanoporous thin films are considered more seriously than ever, particularly for ultra low dielectric applications. In this study, three approaches were made to design and develop nanoporous low dielectric films with improved micromechanical properties: 1) wall density increase of nanoporous organosilicate film by copolymerization of carbon bridged comonomers; 2) incorporation of sacrificial phases with good miscibility; 3) selective surface modification by plasma treatment. Nanoporous low-k films were prepared with copolymerized PMSSQ and star-shaped sacrificial organic molecules, both of which were synthesized to control molecular weight and functionality. The nanoporous structures of the films were observed using field emission scanning electron microscopy, cross-sectional transmission electron microscopy, atomic force microscopy, and positronium annihilation lifetime spectroscopy(PALS). Micromechanical characterization was performed using a nanoindentor to measure hardness and modulus of the films.

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Improved Air Stability of OTFT's with a P3HT/POSS Active Layer (P3HT/POSS 합성 활성층을 이용한 OTFT 소자의 대기안정성 향상)

  • Park, Jeong-Hwan;Han, Kyo-Yong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.2
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    • pp.107-113
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    • 2009
  • In order to improve air stability, we proposed a new active layer of an organic TFT by synthesizing P3HT/POSS conjugated polymer. P3HT/POSS OTFTs with the various P3HT/POSS volume ratios were fabricated and characterized. With the P3HT/POSS volume ratio of 1:1, we achieved the field-effect mobilities of ${\sim}1.19{\times}10^{-3}\;cm^2/v{\cdot}sec$ in the saturation region and the current on/off ratio of ${\sim}2.51{\times}10^2$. The resulting current on-off ratio was much higher than that of the P3HT-based OTFTs and resulted from the dramatic decrease of the off-current. Since the off-current can be reduced by preventing oxygen in atmosphere from doping the P3HT/POSS active layers, this new active layer shows its ability to avoid oxygen doping in atmosphere. Therefore, the improvement of the air stability can be achieved by employing the P3HT/POSS active layers.

ABRASION RESISTANCE OF DENTURE BASE RESIN INCLUDING VINYLOLIGOSILSESQUIOXANE (Vinyloligosilsesquioxane 함유 의치상용 아크릴릭 레진의 마모 저항성)

  • Park Ran;Shim June-Sung;Han Dong-Hoo
    • The Journal of Korean Academy of Prosthodontics
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    • v.41 no.5
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    • pp.626-639
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    • 2003
  • Statement of problem : Recently, in attempts to reinforce the acrylic resin and to reduce the polymerization shrinkage, it has been reported that adding vinyloligo-silsesquioxane (vinyl-POSS) to PMMA significantly compensates for polymerization shrinkage and somewhat increases the fracture resistance. Purpose : There haven't been any studies on abrasion that can affect the adaptation of the denture in long-term use. In this study abrasion resistance was compared between acrylic resin with vinyl-POSS and commercialized acrylic resin for denture base. In addition, the difference in abrasion resistance according to molding methods was compared. Material and method : Using PaladentR 20 including vinyl-POSS. PaladentR 20, Lucitone 199R, SR IvocapR, denture bases were fabricated using compression molding technique and continuous-pressure injection technique. Surface hardness and abrasion were measured for each group, and the worn surfaces were observed under a scanning electron microscope. Results : 1. When surface hardness was measured for each material and molding technique, there was no statistically significant difference among the materials. (p<0.05) 2. When same denture base material and molding technique were used, the abrasion due to toothpaste solution was 5 times as severe as the abrasion due to soap solution. 3, When toothpaste solution was used, the abrasion decreased in the order of PaladentR20, PaladentR 20 including vinyl-POSS, SR IvocapR, and Lucitone 199R. However statistically significant difference was seen only among PaladentR 20, SR IvocapR, and Lucitone 199R. (p<0.05). 4. When soap solution was used, the abrasion was more severe in PaladentR 20 and including vinyl-POSS PaladentR 20 groups than in SR IvocapR and Lucitone 199R groups. (p<0.05). Conclusion : Addition of vinyl-POSS doesn't improve the abrasion resistance, and the abrasion resistance was similar to those of existing materials. Additional studies under different conditions are needed. For clinical application of vinyl-POSS, further investigations with different requirements and conditions are necessary.

A COMPARATIVE STUDY ON THE DIMENSIONAL CHANGE OF THE DIFFERENT DENTURE BASES

  • Kim, Myung-Joo;Kim, Chang-Whe
    • The Journal of Korean Academy of Prosthodontics
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    • v.44 no.6
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    • pp.712-721
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    • 2006
  • Statement of problem. Acrylic resin is most commonly used for denture bases. However, acrylic resin has week points of volumetric shrinkage during polymerization that reduces denture fit. The expandability of POSS (Polyhedral Oligomeric Silsesquioxane) containing polymer could be expected to reduce the polymerization shrinkage of denture bases and would increase the adaptability of the denture to the tissue. Purpose. The purpose of this study was to compare the dimensional stability in the conventional acrylic resin base, POSS-containing acrylic resin base, and metal bases. Materials and methods. Thirty six maxillary edentulous casts and dentures of different base were fabricated. Tooth movement and tissue contour change of denture after processing (resin curing, deflasking, decasting and finishing without polishing) and immersion in artificial saliva at $37^{\circ}C$ for 1 week and 4 weeks were measured using digital measuring microscope and threedimensional laser scanner. Results. The results were as follows: 1. The conventional resin group showed significant (p<0.01) dimensional change throughout the procedure (processing and immersion in artificial saliva). 2. After processing, the metal group and POSS resin group showed lower linear and 3-dimensional change than conventional resin group (p<0.01). 3. There was no statistically significant linear and 3-dimensional change after immersion for 1 week and 4 weeks in metal and POSS resin group. 4. In all groups, the midline and alveolar ridge crest area presented smaller 3-dimensional change compared with vestibule and posterior palatal seal area after processing and soaking in artificial saliva for 1 week and 4 weeks (p<0.01). Conclusion. In this study, a reinforced acrylic-based resin with POSS showed good dimensional stability.

Advanced Low-k Materials for Cu/Low-k Chips

  • Choi, Chi-Kyu
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.71-71
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    • 2012
  • As the critical dimensions of integrated circuits are scaled down, the line width and spacing between the metal interconnects are made smaller. The dielectric film used as insulation between the metal lines contributes to the resistance-capacitance (RC) time constant that governs the device speed. If the RC time delay, cross talk and lowering the power dissipation are to be reduced, the intermetal dielectric (IMD) films should have a low dielectric constant. The introduction of Cu and low-k dielectrics has incrementally improved the situation as compared to the conventional $Al/SiO_2$ technology by reducing both the resistivity and the capacitance between interconnects. Some of the potential candidate materials to be used as an ILD are organic and inorganic precursors such as hydrogensilsequioxane (HSQ), silsesquioxane (SSQ), methylsilsisequioxane (MSQ) and carbon doped silicon oxide (SiOCH), It has been shown that organic functional groups can dramatically decrease dielectric constant by increasing the free volume of films. Recently, various inorganic precursors have been used to prepare the SiOCH films. The k value of the material depends on the number of $CH_3$ groups built into the structure since they lower both polarity and density of the material by steric hindrance, which the replacement of Si-O bonds with Si-$CH_3$ (methyl group) bonds causes bulk porosity due to the formation of nano-sized voids within the silicon oxide matrix. In this talk, we will be introduce some properties of SiOC(-H) thin films deposited with the dimethyldimethoxysilane (DMDMS: $C_4H_{12}O_2Si$) and oxygen as precursors by using plasma-enhanced chemical vapor deposition with and without ultraviolet (UV) irradiation.

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Proton Conductivity and Methanol Permeability of Sulfonated Polysulfone/PPSQ Composite Polymer Electrolyte Membrane (설폰화된 폴리설폰/PPSQ 유-무기 복합 전해질막의 수소이온 전도도 및 메탄올 투과 특성)

  • Kwon Jeongdon;Lee Changjin;Kang Yongku
    • Journal of the Korean Electrochemical Society
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    • v.7 no.2
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    • pp.89-93
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    • 2004
  • Sulfonated polysulfone (SPSF) with poly(phenylmethyl silsesquioxane, PPSQ) composite polymer electrolyte membranes were prepared and their proton conductivity, water uptake and methanol permeability of membranes were characterized. By controlling the ratio of $(CH_3)_3SCI\;and\;CISO_3H$ and reaction time, SPSF with $37\~75\%$ degree of sulfonation were synthesized. The increase of sulfonate groups in the base polymer resulted in the increase of the water uptake in the membranes as well as methanol permeability. Composite membranes were prepared by casting of DMF solution of SPSF and PPSQ. The proton conductivity of the composite membrane at room temperature was $2.8\times10^{-3}\~4.9\times10^{-2}S/cm.$ The increase of PPSQ contents in composite membranes resulted in a decrease in water uptake and methanol permeability. Composite membranes containing $5\%$ PPSQ did not make a significant effect on the proton conductivity nO methanol permeability compared with that of pristine SPSF, but a significant decrease of water uptake was observed.

Preparation and Property of POSS-Based Organic-Inorganic Hybrid Filler and Polyamide Thermoplastic Elastomer (PA-TPE)/POSS Nanocomposite (POSS 기반 유-무기 하이브리드 충전제와 폴리아미드계 TPE로 이루어진 나노복합체의 제조 및 특성)

  • Han, Jae Hee;Kim, Hyung Joong
    • Polymer(Korea)
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    • v.37 no.1
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    • pp.34-40
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    • 2013
  • Commercially available polyamide thermoplastic elastomer (PA-TPE) was blended with hybrid filler which was prepared by means of the reaction between polyhedral oligomeric silsesquioxane (POSS) containing amine group and toluene diisocyanate (TDI)-caprolactam (CL) to explore the effect of blending the hybrid filler with the TPE. The chemical structure of the filler was identified by using FTIR and $^1H$ NMR. The composites, PA-TPE/POSS-(TDI+CL), which were the blends of TDI+CL modified POSS filler and PA-TPE up to 7 wt%, showed better elastic recovery delivered from lower tension setting compared to the PA-TPE and the PA-TPE/octaphenyl POSS blend. In addition the tensile strength and the initial modulus increased with increasing the hybrid filled content. Consequently it was assumed that the POSS-(TDI+CL) filler was a suitable material for enhancing strength and modulus without loss of elastic properties for the original PA-TPE.

Development of UV-screening Polysilsesquioxane Spheres (자외선차단 기능을 갖는 폴리실세스퀴옥산 구형 입자의 개발)

  • Yoon, Kyung-Sup;Lim, Mi-Sun;Kim, Young-Baek;Jung, Teak-Kyu
    • Journal of the Society of Cosmetic Scientists of Korea
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    • v.31 no.1 s.49
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    • pp.65-71
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    • 2005
  • A silsesquioxane precursor that contains p-methoxycinnamoyl group was synthesized to produce UV absorbing spherical polysilsesquioxane (PSQ) spheres with diameters of 10nm to a few ${\mu}m$ under different conditions. A dispersion of $10wt\%$ in Vaseline of these PSQ spheres with diameters of approximately $0.6{\mu}m$ showed SPF values of 5.7 and the identical dispersion did not turn white when applied to human hands. These UV absorbing PSQ spheres showed higher boosting effect of sun protection factor (SPF) than the well known UV blocking octyl methoxycinnamate (OMC). The results indicated that the PSQ spheres with p-methoxycinnamoyl group should be useful as the ingredients in UV screening functional cosmetics without causing allergies and whitening.

A Study on the Improvement of Skin-affinity and Spreadability in the Pressed Powder using Air Jet Mill Process and Mono-dispersed PMMA (Air Jet Mill 공법과 PMMA의 단분산성이 프레스드 파우더의 밀착성 및 발림성 향상에 대한 연구)

  • Song, Sang Hoon;Hong, Kyong Woo;Han, Jong Seob;Kim, Kyong Seob;Park, Sun Gyoo
    • Journal of the Society of Cosmetic Scientists of Korea
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    • v.43 no.1
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    • pp.61-68
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    • 2017
  • The key quality attributes of the pressed powder, one of base makeup products, are skin-affinity and spreadability. In general, there was a limit to meet skin-affinity and spreadability simultaneously, which are opposite attributes each other. In this study, air jet mill process was tried to satisfy two main properties. Skin-affinity was improved by a wet coating of sericite with a mixture of lauroyl lysine (LL) and sodium cocoyl glutamate (SCG). The application of mono-dispersed polymethyl methacrylate (PMMA) and diphenyl dimethicone/vinyl diphenyl dimethicone/silsesquioxane crosspolymer (DDVDDSC) improved both qualities. Air jet mill process has been mainly applied in the pharmaceutical and food industries, and is a method used for processing powder materials in cosmetic field. In this study, we were able to complete makeup cosmetics with an optimum particle size $6.8{\mu}m$ by combining the air jet mill process at the manufacturing stage. It was confirmed that the Ti element was uniformly distributed throughout the cosmetics by EDS mapping, and that the corners of the tabular grains were rounded by SEM analysis. It is considered that this can provide an effect of improving the spreadability when the cosmetic is applied to the skin by using a makeup tool. LL with excellent skin compatibility and SCG derived from coconut with little skin irritation were wet coated to further enhance the adhesion of sericite. SEM images were analyzed to evaluate effect of the dispersion and uniformity of PMMA on spreadability. With the spherical shapes of similar size, it was found that the spreading effect was further increased when the distribution was homogeneously mono-dispersed. The dispersion and spreadability of PMMA were confirmed by measuring the kinetic friction and optimal content was determined. The silicone rubber powder, DDVDDSC, was confirmed by evaluating the hardness, spreading value, and drop test. Finally, it was found that the dispersion of PMMA and silicone rubber powder affected spreadability. Such makeup cosmetics have excellent stability in drop test while having appropriate hardness, and good stability over time. Taken together, it is concluded that air jet mill process can be utilized as a method to improve skin-affinity and spreadability of the pressed powder.

Development of Epoxy Adhesives Containing Mixed POSSs for Stone Conservation (혼합 POSS를 함유한 에폭시 접착제 특성 연구)

  • Yoon, Il-Nyoung;Kang, Doc-Ki;Min, Jung-Sik;Won, Jong-Ok;Kim, Min-Young;Kim, Jeong-Jin
    • Journal of Conservation Science
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    • v.26 no.1
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    • pp.85-94
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    • 2010
  • Color stable hydrogenated bisphenol-A (HBA) epoxy adhesives containing organic-inorganic hybrid nanocomposites were prepared and investigated the properties. Isophorone-diamine (IPDA) was used as a hardener and polyhedral organomeric silsesquioxanes (POSS; EP0408 and EP0409) having epoxy function groups were used to tailor adhesives in the nanoscale range. The dependence of the concentration of different nano materials were studied since the large surface area of the nanosized particles can cause significant changes in properties of adhesives. HBA-IPDA adhesives containing different amount of nanomaterials have been applied to the fresh Namsan granite and compared with those of commercial adhesives, which have problems of color change as well as a high viscosity. The mechanical properties of HBA-IPDA containing POSSs are consistent with those of commercial adhesives in addition to the low viscosity.