• 열처리공학회지
• /
• 제10권4호
• /
• pp.246-254
• /
• 1997

The 6.5wt %Si-Fe alloy sheets were made by the twin roll process. The magnetic properties and microstructures of sheets annealed in the sulfur atmosphere were studied. In the as-prepared sheet, non-oriented columnar grains about $10{\mu}m$ in diameter were observed, which grew from the surface to the inner part of the sheet. When the annealing temperature was around $700^{\circ}C$, the primary recrystallization was formed around the middle part of the sheet thickness, and the grain size increased with increasing annealing temperature. At the annealing temperature of $900^{\circ}C$, the grain size became $30{\sim}40{\mu}m$. Around the annealing temperature, the motive force of the grain growth is the grain boundary energy. However, above $1000^{\circ}C$ the surface energy played an important role in the observed grain growth. When the sheet were annealed at $1200^{\circ}C$, the grains whose (100) planes were paralled to the thin plate surface grew, and all sheet surfaces were covered with these grains after 1 hour annealing. This phenomenon is called tertiary recrystallization. A difference in surface energy between (100) and (110) surfaces provides a driving force for growth of tertiary grains. The coercive force was 0.27 mOe and the AC core loss $W_{12/50}$ was 0.38w/kg for the 6.5wt%Si-Fe alloy.

• Bulletin of the Korean Chemical Society
• /
• 제31권1호
• /
• pp.162-167
• /
• 2010

We investigated the adsorption and desorption characteristics of benzene molecules on $Si(001)-2{\times}n$ surfaces using a variable-low temperature scanning tunneling microscopy. When benzene was adsorbed on a $Si(001)-2{\times}n$ surface at a low coverage, five distinct adsorption configurations were found: tight-binding (TB), standard-butterfly (SB), twisted-bridge, diagonal-bridge, and pedestal. The TB and SB configurations were the most dominant ones and could be reversibly interconverted, diffused, and desorbed by applying an electric field between the tip and the surface. The population ratios of the TB and SB configurations were affected by the benzene coverage: at high coverage, the population ratio of SB increased over that of TB, which was favored at low coverage. The desorption yield decreased with increasing benzene coverage and/or density of vacancy defect. These results suggest that the interaction between the benzene molecules is important at a high coverage, and that the vacancy defects modify the adsorption and desorption energies of the benzene molecules on Si(001) surface.

• 한국가시화정보학회지
• /
• 제21권1호
• /
• pp.67-73
• /
• 2023

In the study, pool boing critical heat flux (CHF) was experimentally investigated depending on the length of heaters. A smooth silicon oxide surfaces are used as the boiling surfaces. As the results of pool boiling experiments based on distilled water in ambient pressure condition, the CHF decreased as the length of the heater increased. By the high speed imaging, it was shown that the number of vapor columns increased as the length of the heater increased. Comparing the number of vapor columns and the CHF according to the heater length, the change in the CHF according to the heater length was analyzed based on the hydrodynamic instability.

• Current Photovoltaic Research
• /
• 제9권3호
• /
• pp.75-83
• /
• 2021

The tunnel oxide passivated contact (TOPCon) structure got more consideration for development of high performance solar cells by the introduction of a tunnel oxide layer between the substrate and poly-Si is best for attaining interface passivation. The quality of passivation of the tunnel oxide layer clearly depends on the bond of SiO in the tunnel oxide layer, which is affected by the subsequent annealing and the tunnel oxide layer was formed in the suboxide region (SiO, Si₂O, Si₂O₃) at the interface with the substrate. In the suboxide region, an oxygen-rich bond is formed as a result of subsequent annealing that also improves the quality of passivation. To control the surface morphology, annealing profile, and acceleration rate, an oxide tunnel junction structure with a passivation characteristic of 700 mV or more (V_oc) on a p-type wafer could achieved. The quality of passivation of samples subjected to RTP annealing at temperatures above 900℃ declined rapidly. To improve the quality of passivation of the tunnel oxide layer, the physical properties and thermal stability of the thin layer must be considered. TOPCon silicon solar cell has a boron diffused front emitter, a tunnel-SiO_x/n⁺-poly-Si/SiN_x:H structure at the rear side, and screen-printed electrodes on both sides. The saturation currents J_o of this structure on polished surface is 1.3 fA/cm² and for textured silicon surfaces is 3.7 fA/cm² before printing the silver contacts. After printing the Ag contacts, the J_o of this structure increases to 50.7 fA/cm² on textured silicon surfaces, which is still manageably less for metal contacts. This structure was applied to TOPCon solar cells, resulting in a median efficiency of 23.91%, and a highest efficiency of 24.58%, independently. The conversion efficiency of interdigitated back-contact solar cells has reached up to 26% by enhancing the optoelectrical properties for both-sides-contacted of the cells.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
• /
• pp.418-418
• /
• 2008

The electrochemical etching of silicon in HF-based solutions is known to form various types of porous structures. Porous structures are generally classified into three categories according to pore sizes: micropore (below 2 nm in size), mesopore (2 ~ 50 nm), and macropore (above 50 nm). Recently, the formation of macropores has attracted increasing interest because of their promising characteristics for an wide scope of applications such as microelectromechanical systems (MEMS), chemical sensors, biotechnology, photonic crystals, and photovoltaic application. One of the promising applications of macropores is in the field of MEMS. Anisotropic etching is essential step for fabrication of MEMS. Conventional wet etching has advantages such as low processing cost and high throughput, but it is unsuitable to fabricate high-aspect-ratio structures with vertical sidewalls due to its inherent etching characteristics along certain crystal orientations. Reactive ion dry etching is another technique of anisotropic etching. This has excellent ability to fabricate high-aspect-ratio structures with vertical sidewalls and high accuracy. However, its high processing cost is one of the bottlenecks for widely successful commercialization of MEMS. In contrast, by using electrochemical etching method together with pre-patterning by lithographic step, regular macropore arrays with very high-aspect-ratio up to 250 can be obtained. The formed macropores have very smooth surface and side, unlike deep reactive ion etching where surfaces are damaged and wavy. Especially, to make vertical microwire or nanowire arrays (aspect ratio = over 1:100) on silicon wafer with top-down photolithography, it is very difficult to fabricate them with conventional dry etching. The electrochemical etching is the most proper candidate to do it. The pillar structures are demonstrated for n-type silicon and the formation mechanism is well explained, while such a experimental results are few for p-type silicon. In this report, In order to understand the roles played by the kinds of etching solution and mask patterns in the formation of microwire arrays, we have undertaken a systematic study of the solvent effects in mixtures of HF, dimethyl sulfoxide (DMSO), iso-propanol, and mixtures of HF with water on the structure formation on monocrystalline p-type silicon with a resistivity with 10 ~ 20 $\Omega{\cdot}cm$. The different morphological results are presented according to mask patterns and etching solutions.

• Restorative Dentistry and Endodontics
• /
• 제13권2호
• /
• pp.323-334
• /
• 1988

The purpose of this study was to observe the effect of dentin surface conditioners on the dentin surfaces. Freshly extracted human molars were used in this study. They were stored at $4^{\circ}C$ saline solution before experiment. The crown portions of the teeth were cut in various directions by means of wet diamond point to expose dentin which include transverse, vertical oblique, horizontal and oblique cut to the long axis (Fig. 1). Each tooth was then mounted with self curing acrylic resin in brass ring to expose the flattened dentin surfaces. Final finish was accomplished by grinding the dentin specimens with wet No. 180 and No. 600 grit silicon carbide abrasive paper until a 6.0mm in diameter on a dentin surface was exposed without pulp exposure. The specimens were divided into 9 groups according to the modes of dentin treatment procedure. The following surface treatments were applied on these preparation surfaces; Group 1: unetched (control group) after finish with No. 600 silicon carbide abrasive paper. Group 2: etched with 30% phosphoric acid for 60s Group 3: etched with 10-3 solution for 60s Group 4: Cleaned with 5% NaOCl for 30s Group 5: applied Dentin Adhesit Group 6: cleaned with 5% NaOCl followed by applying the Dentin Adhesit$^{(R)}$ Group 7: applied Photo Bond on the unetched dentin followed by applying the Photo Clearfil Bright Group 8: Etched with 30% phosphoric acid followed by applying Photo Bond and Photo Clearfil Bright Group 9: etched with 10-3 solution followed by applying Photo Bond and Photo Clearfil Bright All the specimens were stored in $37^{\circ}C$ under 50% relative humidity for 24 hours before observations. The specimens in 7, 8, and 9 group, omitting the group 1 to 6, were demineralized in 10% HCl for 10s in order to observe the resin tags. All the specimens in each group were then dried at room temperature. The dried specimens were ion coated with Eiko ion coater (Eiko-engineering Co.), and observed in Hitachi S-430 Scanning electron microscope (Hitachi, Co. Tokyo) at 15KV. The following results were obtained as follows; 1. The smear layers were still remained in group 1,2,4,5, and 6. 2. There is no effect of 5% NaOCl and 30% phosphoric acid on the changes of dentin morphology 3. The dentin treated with 10-3 solution, indicating the tubules opened when the smear layer and the dental plug dissolved. 4. In case of applying the bonding agents the resin tag was not formed at the deep area of dentinal tubules, but in case of applying the Dentin Adhesit$^{(R)}$ that was not.

• 한국방사선학회논문지
• /
• 제13권3호
• /
• pp.319-324
• /
• 2019

실리콘광전증배관(Silicon Photomultiplier, SiPM)과 두 층의 섬광 픽셀 배열을 이용한 반응 깊이 측정 검출기를 설계하였으며, 위치 측정 능력을 DETECT2000을 사용하여 검증하였다. 섬광 픽셀의 면 처리와 반사체 조합을 통해 섬광 픽셀과 감마선이 반응한 위치를 추적하였다. 아래층은 광학적으로 연결된 부분을 제외하고 반사체로 처리하였으며, 위층은 가장 외곽부분을 제외하고 모두 광학적으로 연결되도록 처리하여 빛의 공유가 아래층에 비해 자유롭도록 구성하였다. 거울반사체와 난반사체, 섬광 픽셀의 거친 면과 매끈한 면의 조합을 통해 평면 영상을 획득하였으며, 층별 영상이 생성되는 위치를 측정하여 분석하였다. 앵거 알고리듬을 사용하여 SiPM의 16채널 신호를 4개의 채널로 감소시켜 영상을 재구성하였다. 섬광 픽셀의 거친면과 모든 반사체 조합에서 두 층으로 구분되는 것을 확인할 수 있었으며, 매끈한 면일 경우에는 모두 층 구분이 불가능한 것을 확인할 수 있었다. 따라서 거친 면의 섬광 픽셀과 반사체 조합을 사용한 검출기를 사용할 경우 전임상용 PET에서 반응 깊이 측정을 통해 검출 시야 외곽에서의 공간분해능을 향상시킬 수 있을 것이다.

• Journal of the Optical Society of Korea
• /
• 제18권5호
• /
• pp.569-573
• /
• 2014

We demonstrate a low-cost, superbly efficient way of etching for the nano-, and micro-sized pyramid patterns on (100)-oriented Si wafer surfaces for use as a patterned master. We show a way of producing functional optical films for the viewing angle direction brightness-enhancement of Lambertian LED (light emitting diode)/OLED (organic light emitting diode) planar lighting applications. An optimally formulated KOH (Potassium hydroxide) wet etching process enabled random-positioned, and random size-distributed (within a certain size range) pyramid patterns to be developed over the entire (100) silicon wafer substrates up to 8" and a simple replication process of master patterns onto the PC (poly-carbonate) and PMMA (poly-methyl methacrylate) films were performed. Haze ratio values were measured for several film samples exhibiting excellent values over 90% suitable for LED/OLED lighting purposes. Brightness was also improved by 13~14% toward the viewing angle direction. Computational simulations using LightTools$^{TM}$ were also carried out and turned out to be in strong agreement with experimental data. Finally, we could check the feasibility of fabricating low-cost, large area, high performance optical films for commercialization.

• Current Photovoltaic Research
• /
• 제6권4호
• /
• pp.102-108
• /
• 2018

A glass-texturing technique was developed for photovoltaic (PV) module cover glass; periodic honeycomb textures were formed by using a conventional lithography technique and diluted hydrogen fluoride etching solutions. The etching conditions were optimized for three different types of textured structures. In contrast to a flat glass substrate, the textured glasses were structured with etched average surface angles of $31-57^{\circ}$, and large aspect ratios of 0.17-0.47; by using a finite difference time-domain simulation, we show that these textured surfaces increase the amount of scattered light and reduce reflectance on the glass surface. In addition, the optical transmittance of the textured glass was markedly improved by up to 95% for wavelengths ranging from 400 to 1100 nm. Furthermore, applying the textured structures to the cover glass of the PV module with heterojunction with intrinsic thin-layer crystalline silicon solar cells resulted in improvements in the short-circuit current density and module efficiency from 39 to $40.2mA/cm^2$ and from 21.65% to 22.41%, respectively. Considering these results, the proposed method has the potential to further strengthen the industrial and technical competitiveness of crystalline silicon solar cells.

• Current Photovoltaic Research
• /
• 제10권4호
• /
• pp.95-100
• /
• 2022

Solar cell is a device that converts photon energy into electrical energy. Therefore, absorption of solar spectrum light is one of the most important characteristics to design the solar cell structures. Various methods have emerged to reduce optical losses, such as textured surfaces, back contact solar cells, anti-reflection layers. Here, the anti-reflection coating (ARC) layer is typically utilized whose refractive index value is between air (~1) and silicon (~4) such as SiN_x layer (~1.9). This research is to print a material called polydimethylsiloxane (PDMS) to form a double anti-reflection layer. Light with wavelength in the range of 0.3 to 1.2 micrometers does not share a wavelength with solar cells. It is confirmed that the refractive index of PDMS (~1.4) is an ARC layer which decreases the reflectance of light absorption region on typical p-type solar cells with SiN_x layer surface. Optimized PDMS printing with analyzing optical property for cell structure can be the effective way against outer effects by encapsulation.