• 제목/요약/키워드: Silicon oxide substrate

검색결과 238건 처리시간 0.032초

LPCVD 질화막 만을 이용한 새로운 LOCOS 공정에 관한 연구 (Study of a New LOCOS Process Using Only Thin LPCVD Nitride)

  • 김지범;오기영;김달수;주승기;최민성
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1987년도 전기.전자공학 학술대회 논문집(I)
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    • pp.429-432
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    • 1987
  • A new LOCOS (Local Oxidation of Silicon) process using a thin nitride film directly deposited on the silicon substrate by LPCVD has been developed in order to reduce the bird's beak length. SEM studies showed that nitride thickness of 50nm can decrease the bird's beak length down to 0.2um with 450nm field oxide. No crystalline defects are observed around the bird's beak after the Wright etch. A 30% improvement in current density was obtained when this new method was applied to MOS transistors (W/L*2.9/20.4) compared to conventional LOCOS process (bird's beak length=0.7um). Other various electrical parameters improved by this new simple LOCOS process are reported in this paper.

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Schottky Barrier Tunnel Transistor with PtSi Source/Drain on p-type Silicon On Insulator substrate

  • 오준석;조원주
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.146-146
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    • 2010
  • 일반적인 MOSFET (Metal-Oxide-Semiconductor-Field-Effect-Transistor)은 소스와 드레인의 형성을 위해서 불순물을 주입하고 고온의 열처리 과정을 거치게 된다. 이러한 고온의 열처리 과정 때문에 녹는점이 낮은 메탈게이트와 게이트 절연막으로의 high-k 물질의 사용에 제한을 받게된다. 이와 같은 문제점을 보완하기 위해서 소스와 드레인 영역에 불순물 주입공정 대신에 금속접합을 이용한 Schottky Barrier Tunnel Transistor (SBTT)가 제안되었다. SBTT는 $500^{\circ}C$ 이하의 저온에서 불순물 도핑없이 소스와 드레인의 형성이 가능하며 실리콘에 비해서 수십~수백배 낮은 면저항을 가지며, 단채널 효과를 효율적으로 제어할 수 있는 장점이 있다. 또한 고온공정에 치명적인 단점을 가지고 있는 high-k 물질의 적용 또한 가능케한다. 본 연구에서는 p-type SOI (Silicon-On-Insulator) 기판을 이용하여 Pt-silicide 소스와 드레인을 형성하고 전기적인 특성을 분석하였다. 또한 본 연구에서는 기존의 sidewall을 사용하지 않는 새로운 구조를 적용하여 메탈게이트의 사용을 최적화하였고 게이트 절연막으로써 실리콘 옥사이드를 스퍼터링을 이용하여 증착하였기 때문에 저온공정을 성공적으로 수행할 수 있었다. 이러한 게이트 절연막은 열적으로 형성시키지 않고도 70 mv/dec 대의 우수한 subthreshold swing 특성을 보이는 것을 확인하였고, $10^8$정도의 높은 on/off current ratio를 갖는 것을 확인하였다.

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Power 및 temperature에 의한 증착률 변화와 Al-doped ZnO의 특성변화에 관한 연구

  • 안시현;박철민;조재현;장경수;백경현;이준신
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.107-107
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    • 2011
  • 오늘 날 transparent conductive oxide는 다양한 분야에서 활용되고 있다. 최근에는 태양전지 분야에서도 많이 활용되고 있으며, 초기에는 transmittance 및 낮은 sheet resistance 특성을 가지는 ITO가 많이 활용되었지만 thin film solar cell와 같이 hydrogenation 공정에 약한 ITO보다는 Al-doped ZnO가 사용되기 시작하면서 많은 연구가 진행되고 있다. 본 연구에서는 thin film solar cell 및 silicon heterojunction solar cell에 적용 가능한 Al-doped ZnO에 관한 연구로써 a-Si:H의 Si-H bonds에 영향을 주지 않는 낮은 영역의 substrate temperature와 power로 Al-doped ZnO를 형성하고 상기 parameter에 따른 Al-doped ZnO의 특성 변화에 대해서 분석하였다. 특히 substrate temperature가 변화할수록 carrier concentration 및 sheet resistance가 많은 변화를 보였으며 이로 인하여 transmittance 특성이 온도에 따라 좋아지다가 너무 높은 온도에서는 오히려 좋지 않게 되었다. 이는 너무 높은 carrier concentration은 free carrier absorption에 의해 transmittance 특성을 오히려 좋지 않게 한다. 우리는 본 연구를 통해 92.677% (450 nm), 90.309% (545 nm), 94.333% (800 nm)의 transmittance를 얻을 수 있었다.

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Low temperature deposition of carbon nanofilaments using vacuum-sublimated $Fe(CO)_5$ catalyst with thermal chemical vapor deposition

  • Kim, Nam-Seok;Kim, Kwang-Duk;Kim, Sung-Hoon
    • 한국결정성장학회지
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    • 제17권1호
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    • pp.18-22
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    • 2007
  • Carbon nanofilaments were deposited on silicon oxide substrate by thermal chemical vapor deposition method. We used $Fe(CO)_5$ as the catalyst for the carbon nanofilaments formation. Around $800^{\circ}C$ substrate temperature, the formation density of carbon nanofilaments could be enhanced by the vacuum sublimation technique of $Fe(CO)_5$, compared with the conventional spin coating technique. Finally, we could achieve the low temperature, as low as $350^{\circ}C$, formation of carbon nanofilaments using the sublimated Fe-complex nanograins with thermal chemical vapor deposition. Detailed morphologies and characteristics of the carbon nanofilaments were investigated. Based on these results, the role of the vacuum sublimation technique for the low temperature deposition of carbon nanofilaments was discussed.

Enhancement of the characteristics of carbon nanofibers by the on/off cyclic modulation of $C_2H_2/H_2$ flow

  • Kim, Sung-Hoon
    • 한국결정성장학회지
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    • 제17권4호
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    • pp.160-164
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    • 2007
  • Carbon nanofibers were deposited on silicon oxide substrate by thermal chemical vapor deposition method. For the enhancement of the characteristics of carbon nanofibers, the source gases ($C_2H_2,\;H_2$) flows were intentionally manipulated as the cyclic on/off modulation of $C_2H_2$ flow. By the cyclic modulation process during the initial deposition stage, the formation density of carbon nanofibers on the substrate could be much more enhanced. The diameter of as-grown carbon nanofibers was also reduced by the cyclic modulation process. The cause for the variation in the characteristics of carbon nanofibers by the cyclic modulation process was discussed in association with the hydrogen gas etching ability.

The geometry change of carbon nanofilaments by SF6 incorporation in a thermal chemical vapor deposition system

  • Kim, Sung-Hoon
    • 한국결정성장학회지
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    • 제21권3호
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    • pp.119-123
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    • 2011
  • Carbon nanotilaments (CNFs) could be synthesized on nickel catalyst layer-deposited silicon oxide substrate using $C_2H_2$ and$H_2$ as source gases under thermal chemical vapor deposition system. By the incorporation of $SF_6$ as a cyclic modulation manner, the geometries of carbon coils-related materials, such as nano-sized coil and wave-like nano-sized coil could be observed on the substrate. The characteristics (formation density and morphology) of as-grown CNFs with or without $SF_6$ incorporation were investigated. Diameter size reduction for the individual CNFs-related shape and the enhancement of the formation density of CNFs-related material could be achieved by the incorporation of $SF_6$ as a cyclic modulation manner. The cause for these results was discussed in association with the slightly increased etching ability by $SF_6$ addition and the sulfur role in SF 6 for the geometry change.

Design and Analysis of GAIVAE System and Application to the Growth of Semiconductor Thin Films -On the Growth of GaAs on Si-

  • Kang, Ey-Goo;Sung, Man-Young;Park, Sung-Hee
    • Journal of Electrical Engineering and information Science
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    • 제3권1호
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    • pp.110-116
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    • 1998
  • A single-crystalline epitaxial film of GaAs has been grown on Si using a gs assisted-ionized vapour beam eptaxial technique. The native oxide layer on the silicon substrate was removed at 550$^{\circ}C$ by use of an accelerated arsenic ion beam, instead of a high-temperature desorption. During the growth the substrate temperature was maintained at 550$^{\circ}C$. Transmission electron microscopy and electron diffraction data suggest that the GaAs layer is an epitaxially grown single-crystalline layer. The possibility of growing device quality GaAs on Si is able demonstrated through fabrication of GaAs MODFET on Si substrates.

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Photocurrent of CdSe nanocrystals on singlewalled carbon nanotube-field effect transistor

  • Jeong, Seung-Yol;Lim, Seung-Chu;Lee, Young-Hee
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 춘계학술대회 논문집
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    • pp.40-40
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    • 2010
  • CdSe nanocrystals (NCs) have been decorated on singlewalled carbon nanotubes (SWCNTs) by combining a method of chemically modified substrate along with gate-bias control. CdSe/ZnS core/shell quantum dots were negatively charged by adding mercaptoacetic acid (MAA). The silicon oxide substrate was decorated by octadecyltrichlorosilane (OTS) and converted to hydrophobic surface. The negatively charged CdSe NCs were adsorbed on the SWCNT surface by applying the negative gate bias. The selective adsorption of CdSe quantum dots on SWCNTs was confirmed by confocal laser scanning microscope. The measured photocurrent clearly demonstrates that CdSe NCs decorated SWCNT can be used for photodetector and solar cell that are operable over a wide range of wavelengths.

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GaAs on Si결정(結晶)의 성장(成長)과 그 특성해석(特性解析) (Analysis and Growth of GaAs on Si)

  • 정세진;성만영
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1990년도 하계학술대회 논문집
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    • pp.250-253
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    • 1990
  • A single-crystalline epitaxial film of GaAs has been grown on Si using an ionized cluster beam technique. The native oxide layer on the silicon substrate was removed at $550^{\circ}C$ by use of an accelerated arsonic ion beam, instead of a high-temperature desorption. During the growth the substrate temperature was maintained at $550^{\circ}C$. Transmission electron microscopy and electron diffraction data suggest that the eats layer is an epitaxially grown single-crystalline layer.

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A Review of Wet Chemical Etching of Glasses in Hydrofluoric Acid based Solution for Thin Film Silicon Solar Cell Application

  • Park, Hyeongsik;Cho, Jae Hyun;Jung, Jun Hee;Duy, Pham Phong;Le, Anh Huy Tuan;Yi, Junsin
    • Current Photovoltaic Research
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    • 제5권3호
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    • pp.75-82
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    • 2017
  • High efficiency thin film solar cells require an absorber layer with high absorption and low defect, a transparent conductive oxide (TCO) film with high transmittance of over 80% and a high conductivity. Furthermore, light can be captured through the glass substrate and sent to the light absorbing layer to improve the efficiency. In this paper, morphology formation on the surface of glass substrate was investigated by using HF, mainly classified as random etching and periodic etching. We discussed about the etch mechanism, etch rate and hard mask materials, and periodic light trapping structure.