• Transactions on Electrical and Electronic Materials
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• 제9권6호
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• pp.231-236
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• 2008

B, P, and Cs ions were implanted with various parameters into silicon nitride layers prepared by LPCVD. In order to get the maximum impurity concentration at the silicon nitride surface, a high temperature oxide (HTO) buffer layers was deposited prior to the implantation. Alkali ion and pH sensing properties of the layers were investigated with an electrolyte-insulator-silicon (EIS) structure using high frequency capacitance-voltage (HF-CV) measurements. The ion sensing properties of implanted silicon nitrides were compared to those of as-deposited silicon nitride. Band Cs co-implanted silicon nitrides showed a pronounced difference in pH and alkali ion sensing properties compared to those of as-deposited silicon nitride. B or P implanted silicon nitrides in contrast showed similar ion sensitivities like those of as-deposited silicon nitride.

• 한국분말재료학회지
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• 제5권1호
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• pp.22-27
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• 1998

The effect of the $\alpha$/$\beta$ phase fraction on the mechanical properties in silicon nitrides was investigated in part 1. In part II, we describe the role of microstructure on the mechanical properties and contact damage of silicon nitrides with coarse/equiaxed and coarse/elongated microstructures. Grain sizes and shapes were controlled by starting powder. Hertzian indentation using spherical indenter was also used to investigate contact damage behavior. Cone cracks from the spherical indentation were suppressed when the silicon nitride contains coarse and elongated grains. Coarse and elongated grains played an important role of cone crack suppression. The size of quasi-plastic zone does not depend on grain size or shape but depends on the fraction of $\alpha$/$\beta$ phase. A quasi-plastic zone was consisting of microcracks by shear stress during indentation.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.327.1-327.1
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• 2014

Nitrides-on-silicon structures are considered to be an excellent candidate for unique design architectures and creating devices for high-power applications. Therefore, a lot of effort has been concentrating on growing high-quality III-nitrides on Si substrates, mostly Si(111) and Si(001) substrates. However, there are several fundamental problems in the growth of nitride compound semiconductors on silicon. First, the large difference in lattice constants and thermal expansion coefficients will lead to misfit dislocation and stress in the epitaxial films. Second, the growth of polar compounds on a non-polar substrate can lead to antiphase domains or other defective structures. Even though the lattice mismatches are reached to 16.9 % to GaN and 19 % to AlN and a number of dislocations are originated, Si(111) has been selected as the substrate for the epitaxial growth of nitrides because it is always favored due to its three-fold symmetry at the surface, which gives a good rotational matching for the six-fold symmetry of the wurtzite structure of nitrides. Also, Si(001) has been used for the growth of nitrides due to a possible integration of nitride devices with silicon technology despite a four-fold symmetry and a surface reconstruction. Moreover, Si(110), one of surface orientations used in the silicon technology, begins to attract attention as a substrate for the epitaxial growth of nitrides due to an interesting interface structure. In this system, the close lattice match along the [-1100]AlN/[001]Si direction promotes the faster growth along a particular crystal orientation. However, there are insufficient until now on the studies for the growth of nitride compound semiconductors on Si(110) substrate from a microstructural point of view. In this work, the microstructural properties of nitride thin layers grown on Si(110) have been characterized using various TEM techniques. The main purpose of this study was to understand the atomic structure and the strain behavior of III-nitrides grown on Si(110) substrate by molecular beam epitaxy (MBE). Insight gained at the microscopic level regarding how thin layer grows at the interface is essential for the growth of high quality thin films for various applications.

• 한국재료학회지
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• 제7권3호
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• pp.224-228
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• 1997

2종류의 질화규소에 대하여 Ring형시험편을 이용하여 접촉피로시험을 하였다. 질화규소는 금속재료에서와 같은 형태의 피로현상을 나타냈고, 파면해석 및 관찰결과 접촉피로에 있어서 균열의 발생은 고탄소크롬강의 경우와 같이 표면하의 반복전단응력에 의한 것으로 밝혀졌다. 그리고 시험펴 파단면에서 표면하의 Heltz전단응력의 변동이 최대로 되는 깊이의 위치에 다수의 균열이 관찰되었다.

• 한국분말재료학회지
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• 제5권1호
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• pp.15-21
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• 1998

The effect of $\alpha$/$\beta$ phase on the mechanical properties and contact damage of silicon nitrides $Si_3N_4$) was investigated. Silicon nitride materials were prepared from two starting powders, at selective increasing hot-pressing temperatures to coarsen the microstructures: (i) from relatively coarse $\alpha$-phase powder, essentially equiaxed $\alpha$-$Si_3N_4$ grains, with limited, slow transformation to $\beta$-$Si_3N_4$ grain; (ii) from relatively fine $\alpha$-phase powder, a more rapid transformation to $\beta$-$Si_3N_4$, with attendant grain elongation. The resulting micro-structure thereby provided a spectrum of $\alpha$/$\beta$ phase ratios, grain sizes, and grain shapes. Fracture strength, hardness, and toughness were measured, and contact damage and strength degradation after indentation were investigated by Hertzian indentation using spherical indenter. A brittle to ductile transition in $Si_3N_4$ depended on $\alpha$/$\beta$ phase ratio as well as grain size. Silicon nitride with elongated $\beta$ grains showed a superior, contact damage resistance.

• 한국세라믹학회지
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• 제45권11호
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• pp.675-680
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• 2008

The effect of pore former content on both porosity and pore structure was investigated for porous sintered reaction-bonded silicon nitrides (SRBSNs). A spherical PMMA with $d_{50}=8{\mu}m$ was employed as a pore-former. Its amount ranged from 0 to 30 part. Porous SRBSNs were fabricated by post-sintering at various temperatures where the porosity was controlled at $12{\sim}52%$. The strong tendency of increasing porosity with PMMA content and decreasing porosity with sintering temperature was observed. Measured pore-channel diameter increased $(0.3{\rightarrow}1.1{\mu}m)$ with both PMMA content and sintering temperature.

• Journal of Advanced Marine Engineering and Technology
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• 제27권6호
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• pp.783-789
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• 2003

An experimental method to investigate the fracture strength and fracture toughness for the silicon nitrides sintered at various sintering temperature is established. The erosion rate for these materials in the various concentration of NaOH solution is also investigated. In result, the fracture strength of Si3N4 is decreased with the increase of sintering temperature. On the other hand, the fracture toughness KIC is increased with the increase of sintering temperature. The erosion rate of silicon nitride in the NaOH solution depend largely on the grain size and the concentration of NaOH solution. The erosion rate of silicon nitride sintered at $1800^{\circ}C$ was much higher than that at $1950^{\circ}C$. These results are due to the unique columnar structure of silicon nitride.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.334.2-334.2
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• 2016

Silicon nitride (SiNx:H) films are generally used as passivation layer on solar cell and they are usually made by plasma enhanced chemical vapor deposition (PECVD). In this study, we investigated the properties of silicon nitride (SiNx:H) films made by PECVD. Effects of mixture ratio of process gases with silane (SiH4) and ammonia (NH3) on the passivation qualities of silicon nitride film are evaluated. Passivation properties of SiNx:H are focused by making antireflection properties identical with thickness and refractive index controlled. The absorption coefficient of each film was evaluated by spectrometric ellipsometery and the minority carrier lifetimes were evaluated by quasi-steady-state photo-conductance (QSSPC) measurement. The optical properties were obtained by UV-visible spectrophotometer. The interface properties were measured by capacitance-voltage (C-V) measurement and the film components were identified by Fourier transform infrared spectroscopy (FT-IR) and Rutherford backscattering spectroscopy detection (RBS) - elastic recoil detection (ERD).

• 한국세라믹학회지
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• 제46권5호
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• pp.478-483
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• 2009

Thermal shock and hot corrosion resistance of silicon nitride ceramics are investigated in this study. Silicon nitrides are fabricated by nitride pressureless sintering (NPS) process, which process is the continuous process of nitridation reaction of Si metal combined with subsequent pressureless sintering. The results of thermal shock test show it sustains 400MPa of initial strength during test in the designated condition of ${\Delta}T=700{\sim}25^{\circ}C$ up to maximum 4,800 cycles. Hot corrosion tests also reveal that the strength degradation of NPS silicon nitride did not occur at $700^{\circ}C$ with an exposure in Ar, $H_2$, Na and K for 1,275 h.

• 센서학회지
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• 제6권3호
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• pp.200-206
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• 1997

열산화시킨 실리콘 웨이퍼 위에 저압화학기상성장법으로 $SiCl_{2}H_{2}$, $NH_{3}$ 및 $N_{2}O$ 기체를 사용하여 실리콘 옥시나이트라이드($Si_{x}O_{y}N_{z}$) 층을 제작하였다. 세 가지의 다른 조성이 기체 유속비($NH_{3}/N_{2}O$)를 각기 0.2, 0.5 및 2로 변화시키고 $SiCl_{2}H_{2}$의 기체 유속은 고정시킴으로써 얻어졌다. 엘립소메트리와 HFCV(High Frequency Capacitance-Voltage) 측정법을 채택하여 굴절율, 유전율 및 조성의 차이를 각각 조사했다. 실리콘 옥시나이트라이드는 내부에 포함된 실리콘 나이트라이드 성분량에 관계없이 용액 중에서 순수한 실리콘 나이트라이드와 유사한 안정성을 보유했다. 실리콘 옥시나이트라이드 층 알칼리이온 감지성의 크기 순서는 실리콘 나이트라이드 성분량에 영향을 받았다. 보다 나은 알칼리이온 감지성이 실리콘 옥시나이트라이드의 벌크 내에 있는 실리콘 디옥시드의 성분량을 증가시킴으로써 얻어졌다.