• Journal of Korean Society of Environmental Engineers
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• v.31 no.9
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• pp.793-802
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• 2009

Adsorption properties were estimated for the organic silicon compounds (siloxanes) in an actual landfill gas (LFG) using adsorbents such as coconut activated carbon, coal activated carbon, silica gel, sulfur adsorbent, carbonized sludge, and molecular sieve 13X. Coconut activated carbon showed the highest removal efficiency of more than 95%. The desorption of hexamethyldisiloxane (L2) from the adsorbent, however, resulted in the remarkable concentration variation of the compound in the treated gas. Silica gel, which had high adsorption capacity for L2 in single substance adsorption experiment in the other study, could not remove the component in the actual landfill gas while it adsorbed well octamethylcyclotetrasiloxane (D4) and decamethylcyclopentasiloxane (D5) in the LFG. Therefore the elimination of hexamethyldisiloxane is an important factor to determine the level of total organosilicon compound in pretreated landfill gas. Moreover, the L2 from the actual landfill gas was effectively adsorbed by the serial adsorption test using two columns packed with coconut activated carbon which has the great capacity of siloxanes removal among others. In order to utilize efficiently LFG as a renewable energy, the emission and adsorptive characteristics of the substance to be treated should be considered for the organization, operation, and management of pretreatment process.

• Resources Recycling
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• v.22 no.4
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• pp.38-45
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• 2013

The porous ceramic beads using mine tailing were prepared and applied to catalytic converter for NOx/SOx removal. Catalytic support was used synthesized mesoporous silica (SBA-15) which coated on surface. Internal structure for porous ceramic beads was composed of three-dimensional network structure and porosity was about 80%. In addition, the specific surface area for mesoporous silica(SBA-15) coated on converter was significantly increased 55 $m^2/g$ compared with 0.8 $m^2/g$ before coating. NOx/SOx removal experiment was performed using $V_2O_5$ and $V_2O_5$/CuO converter. NOx conversion ratio for $V_2O_5$/CuO converter was approximately increased 10% compared to $V_2O_5$ converter. In addition, catalytic converter of $V_2O_5$/CuO was shown to remove 95% of NOx and 90% of SOx at reaction temperature of $350^{\circ}C$, space velocity of 10000 $h^{-1}$ and $O_2$ concentrations of 5%, respectively.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.21 no.5
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• pp.767-772
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• 2012

Generally, abrasive fluid jet polishing system has been used for polishing of complex shape or freeform surface which has steep local slopes. In the system, abrasive fluid jet is injected through a nozzle at high pressure; however, it is inevitable to lose its coherence as the jet exits a nozzle. This problem causes incorrect polishing results because of unstable and unpredictable workpiece material removal at the impact zone. In order to solve this problem, MR fluid jet polishing method has been developed using a mixture of abrasive and MR fluid which can maintain highly collimated and coherent jet by applied magnetic field. Thus, in this study, an injection nozzle and an electromagnetic module, most important parts in the MR polishing system, were designed and verified by magnetic field and flow analysis. As the results of experiments, it can be confirmed that stable fluid jets for polishing were generated since smooth W-shapes and uniform spot size were observed regardless of standoff distance changes.

• Proceedings of the Membrane Society of Korea Conference
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• 1996.06a
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• pp.121-147
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• 1996

Since 1980, the water quality of ultra-pure water has been rapidly improved, and presently ultra-pore water producing equipment for 64Mbit is in operation. Table 1 shows the degree of integration of DRM and required water quality exlmple. The requirements of the ultra-pure water for 64Mbit are resistivity: 18.2 MQ/cm or higher, number of particulates: 1 pc/ml or less (0.05 $\mu$m or larger). bacteria count: 0.1 pc/l or less. TOC (Total Organic Carbon, index of organic snbstance) : 1ppb or less, dissolved oxygen: 5ppb or less, silica: 0.5ppb or less, heavy metal ions: 5ppb or less. The effect of metals on the silicon wafer has been well known, and recently it has been reported that the existence of organic substance in ultra-pure water is closely related to the device defect, drawing attention. It is reported that if organic substance sticks to the natural oxidation film, the oxide film remaims on the organic substance attachment in the hydrofluoric acid treatment (removal of natural oxidation film). The organic substance forms film on the silicon wafer, and harmful elements such as metals and N.P.S., components contained in the organic substance and the bad effect due to the generatinn of silicon carbide cannot be forgotten. In order to remove various impurities in raw water, many technological develoments (membrane, ion exchange, TOC removal, piping material, microanalysis, etc.) have been made with ultra-pure water producing equipment and put to practical use. In this paper, technologies put to practical use in recent ultra-pure vater producing equimeut are introduced.

• Advances in environmental research
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• v.6 no.1
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• pp.35-51
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• 2017

The use of Granular Activated Carbon (GAC) and naturally occurring silica (Sand) as filtration media in water and waste water treatment systems is very common. While GAC offers the additional functionality of being an "adsorptive" filter for dissolved organics it is also more expensive. In this paper we present an experimental evaluation of the performance of a bed of GAC for colloid removal and compare the same with that from an equivalent bed of Sand. The experiments are performed in an "intermittent" manner over extended time, to "simulate" performance over the life of the filter bed. The experiments were continued till a significant drop in water flow rate through the bed was observed. A novel "deposition" and "detachment" rate based transient mathematical model is developed. It is observed that the data from the experiments can be explained by the above model, for different aqueous phase electrolyte concentrations. The model "parameters", namely the "deposition" and "detachment" rates are evaluated for the 2 filter media studied. The model suggests that the significantly better performance of GAC in colloid filtration is probably due to significantly lower detachment of colloids from the same. While the "deposition" rates are higher for GAC, the "detachment" rates are significantly lower, which makes GAC more effective than sand for colloid removal by over an order of magnitude.

• Korean Journal of Materials Research
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• v.24 no.8
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• pp.429-433
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• 2014

As the fabrication technology used in FPDs(flat-panel displays) advances, the size of these panels is increasing and the pattern size is decreasing to the um range. Accordingly, a cleaning process during the FPD fabrication process is becoming more important to prevent yield reductions. The purpose of this study is to develop a FPD cleaning system and a cleaning process using a two-phase flow. The FPD cleaning system consists of two parts, one being a cleaning part which includes a two-phase flow nozzle, and the other being a drying part which includes an air-knife and a halogen lamp. To evaluate the particle removal efficiency by means of two-phase flow cleaning, silica particles $1.5{\mu}m$ in size were contaminated onto a six-inch silicon wafer and a four-inch glass wafer. We conducted cleaning processes under various conditions, i.e., DI water and nitrogen gas at different pressures, using a two-phase-flow nozzle with a gap distance between the nozzle and the substrate. The drying efficiency was also tested using the air-knife with a change in the gap distance between the air-knife and the substrate to remove the DI water which remained on the substrate after the two-phase-flow cleaning process. We obtained high efficiency in terms of particle removal as well as good drying efficiency through the optimized conditions of the two-phase-flow cleaning and air-knife processes.

• Applied Chemistry for Engineering
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• v.34 no.2
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• pp.199-205
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• 2023

Arsenic is a highly toxic element, and its contamination is widespread around the world. The natural materials with high selectivity and efficiency toward pollutants are important in wastewater treatment technology. In this study, the mesoporous synthetic hectorite was synthesized by facile hydrothermal crystallization of gels comprising silica, magnesium hydroxide, and lithium fluoride. Additionally, the naturally available clay was modified using zirconium at room temperature. Both synthetic and modified natural clays were employed in the removal of arsenate from aquatic environments. The materials were fully characterized by scanning electron microscope (SEM), X-ray diffraction (XRD), and Fourier transform-infrared (FT-IR) analyses. The synthesized materials were used to remove arsenic (V) under varied physicochemical conditions. Both materials, i.e., Zr-bentonite and Zr-hectorite, showed high percentage removal of arsenic (V) at lower pH, and the efficiency decreased in an alkaline medium. The equilibrium-state sorption data agrees well with the Langmuir and Freundlich adsorption isotherms, and the maximum sorption capacity is found to be 4.608 and 2.207 mg/g for Zr-bentonite and Zr-hectorite, respectively. The kinetic data fits well with the pseudo-second order kinetic model. Furthermore, the effect of the background electrolytes study indicated that arsenic (V) is specifically sorbed at the surface of these two nanocomposites. This study demonstrated that zirconium intercalated synthetic hectorite as well as zirconium modified natural clays are effective and efficient materials for the selective removal of arsenic (V) from aqueous medium.

• Membrane Journal
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• v.34 no.3
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• pp.182-191
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• 2024

This review addresses the pressing need for effective wastewater treatment methodologies by exploring advanced thin-film nanocomposite (TFN) nanofiltration membranes aimed at efficient dye removal from industrial effluents. Utilizing insights from recent research, the review focuses on the fabrication of TFN membranes incorporating innovative materials such as nanocarbons, silica nanospheres, metal-organic frameworks (MOFs), and MoS₂. The primary goals are to enhance dye removal efficiency, improve antifouling properties, and maintain high selectivity for dye/salt separation. By leveraging the distinct advantages of these nanomaterials-including large surface areas, mechanical robustness, and specific pollutant interaction capabilities-this review aims to overcome the limitations of current nanofiltration technologies and provide sustainable solutions for water treatment challenges.

• The Korean Journal of Pesticide Science
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• v.15 no.1
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• pp.22-27
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• 2011

Nonylphenols are toxic compounds classified as endocrine disruptors. We investigated the nonylphenols clean-up procedures for the contamination control in the quantitative analysis. In this research we analyzed the residual nonylphenols in the solvent and the SPE cartridges. First, at the analysis of HPLC grade solvents (n-hexane, diethyl ether, ethyl acetate and its mixture), diethyl ether was confirmed the residue as 0.963 ${\mu}g/mL$, and we eliminated the contaminant through the distillation with $CaH_2$, Second, at the analysis of SPE cartridges (silica gel and Florisil), all products were showed the residue at 0.046~13.0 ${\mu}g/mL$, but unfortunately the residue in the cartridge were not easily removed with referenced methods in all tested SPE cartridges except in silica gel SPE cartridge with glass ware.

• Proceedings of the KIEE Conference
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• 2004.07c
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• pp.1727-1729
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• 2004

Chemical mechanical polishing (CMP) process has been widely used to planarize dielectric layers, which can be applied to the integrated circuits for sub-micron technology. Despite the increased use of CMP precess, it is difficult to accomplish the global planarization of in the defect-free inter-level dielectrics (ILD). we investigated the performance of $WO_3$ CMP used silica slurry, ceria slurry, tungsten slurry. In this paper, the effects of addition oxidizer on the $WO_3$ CMP characteristics were investigated to obtain the higher removal rate and lower non-uniformity.