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http://dx.doi.org/10.3740/MRSK.2014.24.8.429

Optimization of FPD Cleaning System and Processing by Using a Two-Phase Flow Nozzle  

Kim, Min-Su (Department of Bionano Technology, Hanyang University)
Kim, Hyang-Ran (Department of Bionano Technology, Hanyang University)
Kim, Hyun-Tae (Department of Bionano Technology, Hanyang University)
Park, Jin-Goo (Department of Bionano Technology, Hanyang University)
Publication Information
Korean Journal of Materials Research / v.24, no.8, 2014 , pp. 429-433 More about this Journal
Abstract
As the fabrication technology used in FPDs(flat-panel displays) advances, the size of these panels is increasing and the pattern size is decreasing to the um range. Accordingly, a cleaning process during the FPD fabrication process is becoming more important to prevent yield reductions. The purpose of this study is to develop a FPD cleaning system and a cleaning process using a two-phase flow. The FPD cleaning system consists of two parts, one being a cleaning part which includes a two-phase flow nozzle, and the other being a drying part which includes an air-knife and a halogen lamp. To evaluate the particle removal efficiency by means of two-phase flow cleaning, silica particles $1.5{\mu}m$ in size were contaminated onto a six-inch silicon wafer and a four-inch glass wafer. We conducted cleaning processes under various conditions, i.e., DI water and nitrogen gas at different pressures, using a two-phase-flow nozzle with a gap distance between the nozzle and the substrate. The drying efficiency was also tested using the air-knife with a change in the gap distance between the air-knife and the substrate to remove the DI water which remained on the substrate after the two-phase-flow cleaning process. We obtained high efficiency in terms of particle removal as well as good drying efficiency through the optimized conditions of the two-phase-flow cleaning and air-knife processes.
Keywords
flat panel display; two-phase flow nozzle; air-knife; particle removal;
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