• Textile Coloration and Finishing
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• v.24 no.4
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• pp.313-320
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• 2012

For the preparation of hardened films which can be applied as a binder for flame-resistant materials such as silica, linseed oil was subjected to a low temperature plasma treatment with argon, or oxygen gas. The film was produced much faster than so-called drying of oil in air. The SEM analysis for silica particles embedded in the hardened film after plasma treatment showed that the silica particles were immobilized on substrate and were evenly dispersed. The FT-IR spectral analysis for the plasma-treated linseed oil films demonstrated that the radicals which were formed during the plasma treatments caused the linseed oil to be cross-linked, and the plasmas attacked carbon chains of the oil randomly without focusing on specific vulnerable bonds such carbon double and carbonyl bonds intensively unless exposure times of the plasmas were prolonged too much, while the cross-linking of the air-dried film was considered to occur at the well-known typical sites, i.e., carbon-carbon double bond and ${\alpha}$-methylene carbon. Burning times, as a measure of flame/fire resistance, of silica-filled cellulose substrates, increased with increasing contents of silica.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.268-268
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• 2012

Adsorption and desorption of toluene from bare and $TiO_2$-coated silica with a mean pore size of 15 nm was studied using breakthrough curves and temperature programmed desorption. Thicknesses of $TiO_2$ films prepared by atomic layer deposition on silica were < 2 nm, and ~ 5 nm, respectively. For toluene adsorption, both dry and humid conditions were used. $TiO_2$-thin film significantly improved toluene adsorption capacity of silica under dry condition, whereas desorption of toluene from the surface as a consequence of displacement by water vapor was more pronounced for $TiO_2$-coated samples with respect to the result of bare ones. In the TPD experiments, silica with a thinner $TiO_2$ film (thickness < 2 nm) showed the highest reactivity for toluene oxidation to $CO_2$ in the absence and presence of water. We show that the toluene adsorption and oxidation reactivity of silica can be controlled by varying thickness of $TiO_2$ thin films.

• Current Photovoltaic Research
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• v.2 no.3
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• pp.84-87
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• 2014

Protection of solar cell surface is important to prevent from dust, pollen, sand, etc. Therefore, development of large area antifouling film is urgent for high performance of solar cells. The surface of silica spheres was modified to fabricate large area antifouling film. The surface of monodisperse silica spheres has been modified with 3-(trimethoxysilyl) propylmethacrylate (TMSPM) to fabricate large area photonic crystal. Although the surface modification of silica spheres with TMSPM has been failed for the base catalyst, the second trial using acid catalyst showed the following results. The FTIR absorption peak at $1721cm^{-1}$ representing C=O stretching vibration indicates that the TMSPM was attached on the surface of silica spheres. The methanol solution comprised of the surface modified silica spheres (average diameter of 380 nm) and a photoinitiator was poured in the patterned silicon wafer with the dimension of 10 cm x 10 cm and irradiated UV-light during the self-assembly process. The result showed large area crack and defect free nanostructures.

• Journal of the Korean Ceramic Society
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• v.41 no.10 s.269
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• pp.766-770
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• 2004

High-transmittance film was coated by using spherical silica nano colloids. Silica colloid sol was preservred between two inclined slide glasses by capillary force, and particles were stacked to form a film onto the substrate as the upper glass was sliding. As the sliding speed increased, the thickness of the film decreased and light transmittance varied. The microstructure observed by SEM showed that silica particles were nearly close packed, which enabled the calculation of the effective refractive index of the film. The film thickness calculated from the wavelength of maximum transmittance and the effective refractive index was well coincided with the thickness observed by SEM and measured by profiler. The maximum transmittance of $94.7\%$ was obtained. This means that $97.4\%$ of transmittance or $1.3\%$ of reflectance can be achieved by simple process if both sides of the substrate are coated.

• KSBB Journal
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• v.17 no.4
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• pp.345-349
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• 2002

The adsorption of the antimicrobial compounds(AMCs) and their heat-resistance were investigated for the packaging film manufacture, wherein, the antimicrobial compounds were adsorbed on a silica component. The naturally source antimicrobial compounds were produced by methylotropic actinomycetes strains MO-16 and MO-17, extracted with ethylacetate. Antimicrobial compounds adsorbed on water-soluble silica had retained activity against Gram(+) and the Gram(-) bacteria after heat treatment at 150$\^{C}$ for 5min. The benzoic acid showed strong antimicrobial activity to fungi and was stable to heat treatment. The combination of antimicrobial compound plus benzoic acid was synergistic against test strains. Therefore, we estimated that the water-soluble silica is suitable for the packaging film manufacture as a adsorbent of the antimicrobial compounds.

• Journal of the Semiconductor & Display Technology
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• v.8 no.2
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• pp.49-53
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• 2009

The oxygen barrier films were formed on poly(ethylene terephthalate) (PET) substrate by a sol-gel process using 3-aminoproprytrimethoxysilane (APTMOS). The effects of solvent type, coating times and incorporation of fumed silica on oxygen permeability coefficient were investigated. The APTMOS coating film prepared from methanol as a solvent exhibited higher oxygen barrier properties than that using THF. The oxygen permeability coefficient of coated film with APTMOS/methanol by coating 7 times was measured to be $2.28{\times}10^{-6}$, while that of PET film was $1.16{\times}10^{-4}$ GPU. The addition of fumed silica does not affect the oxygen barrier properties. It may be explained that silica particles disrupt chain packing, which leads to an increase in free volume for permeation.

• Korean Journal of Metals and Materials
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• v.48 no.9
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• pp.856-860
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• 2010

Silver nanoparticles were formed on silica substrates through thin film dewetting at high temperature. The microstructural and morphological evolution of the particles were characterized as a function of processing variables such as initial film thickness, annealing time, and temperature. Silver thin films were deposited onto the silica using a pulsed laser deposition system and annealed in reducing atmosphere to induce agglomeration of the films. The film thicknesses before dewetting were in the range of 5 to 25 nm. A noticeable agglomeration occurs with annealing at temperatures higher than $300^{\circ}C$, and higher annealing temperature increases particle size uniformity for the same film thickness sample. Average particle size linearly correlates to the film thickness, but it does not strongly depend on annealing temperature and time, although threshold temperature for complete dewetting increases with an increase of film thickness. Lower annealing temperature develops faceted surface morphology of the silver particles by enhancing the growth of the low index crystal plane of the particles.

• Korean Journal of Materials Research
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• v.11 no.5
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• pp.413-418
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• 2001

We investigated change of crystal structure, surface morphology and crystal orientation of the electrodeposited film from dispersed $SiO_2$ suspensions (colloidal silica) copper sulfate bath and arse corrosion potentials and physical specific properties. As addition of colloidal silica in copper electrolytic hath, the crystal Particles on filial was fined-down, made uniform and account of particles were increased. Hardness of copper electrodeposited film ascended about 15% and (111), (200) and (311) plane of X-ray diffraction patterns were almost swept away, so preferred orientation chanced from (111) to (110) plane. Also, corrosion potential of electrodeposited copper film was noble with colloidal silica addition.

• Membrane Journal
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• v.2 no.1
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• pp.21-32
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• 1992

Hydrogen-permselective silica membranes were synthesized within tim walls of porous Vycor tubes by chemical vapor depostion of $SiO_2$. Film deposition was carried out using $SiCl_4$ hydrolysis either in the oppm shag reactants or in the one-sided geometry. At temperatures above $600^{\circ}C$ the permeation rate of hydrogen thorough the silica films varied between 0.01 and $025cm^3(STP)/cm^2-min-atm$ depending on the reaction geometry and the $H_2 : N_2$ permeation ratio was about 1000. Permeation rates of both $H_2$ and $N_2$ increased with increasing temperature. The silica membranes produced by one-sided deposition have higher hydrogen permmeation rates than those produced by the opposing reactants geometry although the membranes formed in an opposing reactants geometry were relatively stable during the heat treatment or after exposure to ambient air. These membranes can be applied to high temperature gas separations or membrane reactors once the film deposition process is optimized to get high permeability as well as good stability.

• Bulletin of the Korean Chemical Society
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• v.21 no.8
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• pp.817-822
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• 2000

Crack-free hard coating siIica films were prepared by sol-gel processfrom twokinds of silicon alkoxide (tetra-ethoxysilane and methyltrimethoxysilane) and two kinds of alcohol (methanol and isopropyl alcohol) with an acid catalyst,acetic acid. A silicate framework of the precursor solution was investigated by infrared spectros-copy (IR) in the process of hydrolysis and condensation. Theextent of the condensation in the intermediates was elucidated by gel permeation chromatography (GPC) and 29Si-NMR spectroscopy. The hard coating films werecharacterized by IR,scanning electron microscope (SEM), thermo gravimetric analyzer (TGA) and dif-ferential scanning calroimeter (DSC). The synthetic condition for the crack-free and transparent silica film for-mation was optimized interms of starting materials for the precursor solution as well as preparation method of the silica film.