• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.308-309
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• 2016

Reducing surface recombination is a critical factor for high efficiency silicon solar cells. The passivation process is for reducing dangling bonds which are carrier. Tunnel oxide layer is one of main issues to achieve a good passivation between silicon wafer and emitter layer. Many research use wet-chemical oxidation or thermally grown which the highest conversion efficiencies have been reported so far. In this study, we deposit ultra-thin tunnel oxide layer by PECVD (Plasma Enhanced Chemical Vapor Deposition) using $N_2O$ plasma. Both side deposit tunnel oxide layer in different RF-power and phosphorus doped a-Si:H layer. After deposit, samples are annealed at $850^{\circ}C$ for 1 hour in $N_2$ gas atmosphere. After annealing, samples are measured lifetime and implied Voc (iVoc) by QSSPC (Quasi-Steady-State Photo Conductance). After measure, samples are annealed at $400^{\circ}C$ for 30 minute in $Ar/H_2$ gas atmosphere and then measure again lifetime and implied VOC. The lifetime is increase after all process also implied VOC. The highest results are lifetime $762{\mu}s$, implied Voc 733 mV at RF-power 200 W. The results of C-V measurement shows that Dit is increase when RF-power increase. Using this optimized tunnel oxide layer is attributed to increase iVoc. As a consequence, the cell efficiency is increased such as tunnel mechanism based solar cell application.

• 한국전기전자재료학회논문지
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• 제32권3호
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• pp.201-206
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• 2019

This report constitutes the first demonstration in Korea of single-crystal lateral gallium oxide ($Ga_2O_3$) as a metal-oxide-semiconductor field-effect-transistor (MOSFET), with a breakdown voltage in excess of 480 V. A Si-doped channel layer was grown on a Fe-doped semi-insulating ${\beta}-Ga_2O_3$ (010) substrate by molecular beam epitaxy. The single-crystal substrate was grown by the edge-defined film-fed growth method and wafered to a size of $10{\times}15mm^2$. Although we fabricated several types of power devices using the same process, we only report the characterization of a finger-type MOSFET with a gate length ($L_g$) of $2{\mu}m$ and a gate-drain spacing ($L_{gd}$) of $5{\mu}m$. The MOSFET showed a favorable drain current modulation according to the gate voltage swing. A complete drain current pinch-off feature was also obtained for $V_{gs}<-6V$, and the three-terminal off-state breakdown voltage was over 482 V in a $L_{gd}=5{\mu}m$ device measured in Fluorinert ambient at $V_{gs}=-10V$. A low drain leakage current of 4.7 nA at the off-state led to a high on/off drain current ratio of approximately $5.3{\times}10^5$. These device characteristics indicate the promising potential of $Ga_2O_3$-based electrical devices for next-generation high-power device applications, such as electrical autonomous vehicles, railroads, photovoltaics, renewable energy, and industry.

• 한국세라믹학회지
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• 제48권2호
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• pp.168-172
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• 2011

Alumina powder was added in a general porcelain (Backja) with clay, feldspar and quartz contents to promote the mullite ($3Al_2O_3{\cdot}2SiO_2$) generation in the porcelain. Low melting materials ($B_2O_3(450^{\circ}C)$, $MnO_3(940^{\circ}C)$, CuO($1080^{\circ}C$)) were doped at ~3 wt% to modify the sinterability of porcelain with a high alumina contents and promote the mullite generation. Green body was made by slip casting method with blended slurry and then, they were fired at $1280^{\circ}C$ for 1hr by a $2^{\circ}C/min$. Densifications of samples with high alumina contents (20~30 wt%) were impeded. As the doping contents of low melting materilas increased, the sinterability of samples was improved. The shrinkage rate and bulk density of samples were improved by doping with low melting materials. Mullite phase increased with increasing the low melting contents in the phase analyses. This means lots of alumina and quartz were transformed into mullite phase by low melting contents doping. In the results, high bending strength of samples with high alumina contents was accomplished by improving the densification and mullite generation in the porcelain.

• Transactions on Electrical and Electronic Materials
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• 제18권1호
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• pp.55-57
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• 2017

Amorphous oxide thin film transistors (TFTs) were fabricated with 0.5 wt% silicon doped zinc tin oxide (a-0.5SZTO) thin film deposited by radio frequency (RF) magnetron sputtering. In order to investigate the effect of annealing treatment on the electrical properties of TFTs, a-0.5SZTO thin films were annealed at three different temperatures ($300^{\circ}C$, $500^{\circ}C$, and $700^{\circ}C$ for 2 hours in a air atmosphere. The structural and electrical properties of a-0.5SZTO TFTs were measured using X-ray diffraction and a semiconductor analyzer. As annealing temperature increased from $300^{\circ}C$ to $500^{\circ}C$, no peak was observed. This provided crystalline properties indicating that the amorphous phase was observed up to $500^{\circ}C$. The electrical properties of a-0.5SZTO TFTs, such as the field effect mobility (${\mu}_{FE}$) of $24.31cm^2/Vs$, on current ($I_{ON}$) of $2.38{\times}10^{-4}A$, and subthreshold swing (S.S) of 0.59 V/decade improved with the thermal annealing treatment. This improvement was mainly due to the increased carrier concentration and decreased structural defects by rearranged atoms. However, when a-0.5SZTO TFTs were annealed at $700^{\circ}C$, a crystalline peak was observed. As a result, electrical properties degraded. ${\mu}_{FE}$ was $0.06cm^2/Vs$, $I_{ON}$ was $5.27{\times}10^{-7}A$, and S.S was 2.09 V/decade. This degradation of electrical properties was mainly due to increased interfacial and bulk trap densities of forming grain boundaries caused by the annealing treatment.

• Current Photovoltaic Research
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• 제5권1호
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• pp.1-8
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• 2017

Two different fluorine-doped tin oxide (FTO)-coated glass substrates were investigated to find better suitability for CdTe solar cells. Substrate A consisted of FTO (300 nm)/$SiO_2$ (24 nm)/intrinsic $SnO_2$ (30 nm)/borosilicate glass (2.2 mm), and substrate B consisted of FTO (700 nm)/intrinsic $SnO_2$ (30nm)/borosilicate glass (1.8 mm). The overall thickness of the FTO/glass substrates was about 2.5 mm. The total light transmittance of substrate B was much higher than that of substrate A throughout the whole spectral region, even though the thickness of the FTO in substrate B was twice larger than that of the FTO in the substrate A. The short-circuit current greatly increased in substrate B and the external quantum efficiency (EQE) increased over the whole wavelength range. This study shows that the diffuse optical transmittance played a key role in the large EQE value in the blue wavelength region, and the direct transmittance played a key role in the large EQE value in the red wavelength region. The higher transmittance is due to the rough surface generated by the thicker FTO on glass. The conversion efficiency of the CdTe solar cell increased from 12.4 to 15.1% in combination of rough FTO substrate and Cu solution back contact.

• 한국세라믹학회지
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• 제42권6호
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• pp.377-383
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• 2005

Generally, the strength achieved of glass-ceramics is higher as is the fracture toughness, as compared with the original glass. This improvement is due to the microstructure consisting of very small crystals. In this study, Ag-doped $45SiO_2-24CaO-24Na_2O-4P_2O_5$ glasses were irradiated to strengthen by the crystallization using Femto second laser Pulses. Through the UV/VIS spectroscope, XRD, Nano-indenter and SEM etc., heat-treated and irradiation of laser pulses without heat-treated samples were analyzed. Two kinds of samples, heat-treated and laser irradiated without heat-treated samples, showed the peaks in the same wavelength near 360 nm. Especially, samples irradiated by 140 mW laser with XYZ stage having at the rate of 100$\~$l000 $\mu$m/s had the largest absorption peak among them, and heat-treated samples was shown lower absorption range than over 90 mW laser irradiated samples. Moreover, samples irradiated by laser had higher values ($4.4\~4.56{\times}10^{-3}(Pa)$) of elastic modulus which related with strength of glass than values of heat-treated samples and these are 1.2$\~$1 .5 times higher values than them of mother glass.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 제4회 영호남학술대회 논문집
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• pp.25-30
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• 2002

The ternary semiconducting compounds of the $A_{4}BX_{6}$(A=Cd, Zn, Hg; B=Si, Sn, Ge; X=S, Se, Te) type exhibit strong fluorescence and high photosensitivity in the visible and near infrared ranges, so these are supposed to be materials applicable to photoelectrical devices. These materials were synthesized and single crystals were first grown by Nitsche, who identified the crystal structure of the single crystals. In this paper. author describe the undoped and $Co^{2+}$-doped $Zn_{4}SnSe_{6}$ single crystals were grown by the chemical transport reaction(CTR) method using iodine of $6mg/cm^{3}$ as a transport agent. For the crystal. growth, the temperature gradient of the CTR furnace was kep at $700^{\circ}C$ for the source aone and at $820^{\circ}C$ for the growth zone for 7-days. It was found from the analysis of x-ray diffraction that undoped and $Co^{2+}$-doped $Zn_{4}SnSe_{6}$ compounds have a monoclinic structure. The optical absorption spectra obtained near the fundamental absorption edge showed that these compounds have a direct energy gaps. These temperature dependence of the optical energy gap were closely investigated over the temperature range 10[K]~300[K]

• 청정기술
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• 제16권3호
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• pp.191-197
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• 2010

초임계이산화탄소에서 실릴화제를 사용하여 반응시간, 압력, 온도를 변화하며 플라스마에 의해 손상된 다공성 p-SiOCH 필름의 실릴화 보수반응을 진행하였다. FT-IR 분석 결과 $3150{\sim}3560cm^{-1}$ 영역의 $SiOH/H_2O$ 특성밴드의 감소는 다소 확인할 수 있었지만, 메틸화 peak의 변화치는 관찰하기 어려웠다. 그러나 실릴화에 따른 표면 소수성은 빠른 반응시간 내에 복원되었다. 내부 복원반응을 효과적으로 유도하기 위하여 열 전처리 공정을 상압 또는 진공 조건에서 진행하였으며, 전처리에 따라 표면 접촉각이 약간 상승하였고, 뒤이은 초임계 실릴화반응으로 표면 소수성이 완전히 복원되는 것을 관찰하였다. 플라스마 손상과정에서 표면 내부 메틸기의 감소가 나타나지만 실릴화 보수반응에 따라 메틸기의 복원은 눈에 띄게 나타나지 않음을 FT-IR, spectroscopic ellipsometry 와 secondary ion mass spectroscopy의 분석결과를 통하여 확인하였다. 막질에 대한 Ti 증착 후 glow discharge spectrometry로 내부 Ti 원소를 분석한 결과, 초임계 실릴화반응을 통하여 손상된 p-SiOCH막질의 열린 기공의 봉인효과가 나타나는 것을 확인하였다.

• 한국가시화정보학회지
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• 제9권4호
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• pp.41-46
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• 2011

Oxygen sensitive functional particles(OSParticle) were fabricated by three different methods for using the particles as oxygen sensors and PIV tracers. The used methods were a physical coating method, an ion-exchange method and a dispersion polymerization method. The physical coating method is dipping $SiO_2$ hollow particles into dye solution then drying. This method is very simple, but particles are not uniform in diameter and luminescence. The particles fabricated by the ion-exchange method have very uniform diameter and well doped. However, it can not be used in water since the particles are hydrophobic. In case of the dispersion polymerization method, the diameter of OSParticles is quite uniform. The diameter of OSParticles can be changed by controlling the quantity of AIBN (2,2'-azobis isobutyronitrile). For the purpose of dissolved oxygen concentration measurement in micro scale water flows, the dispersion polymerized OSParticles turn out to be the most superior functional particles. The luminescent intensity of OSParticles was tested with the variation of dissolved oxygen concentration in water samples. As a result, the luminescent intensity of OSParticles is monotonically decreased with increasing DO (Dissolved oxygen) concentration of water.

• 한국재료학회지
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• 제27권3호
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• pp.161-165
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• 2017

In this paper, synthesis of terephthalate intercalated Zn-Al: Layered double hydroxides (LDHs) was studied. We designed freestanding Zn-Al: carbonate LDH nanosheets for a facile exchange technique. The as-prepared Zn-Al carbonate LDHs were converted to terephthalate intercalated Zn-Al:LDHs by ion exchange method. Initially, Al-doped ZnO (AZO) thin films were deposited on p-Si (001) by facing target sputtering. For synthesis of free standing carbonate Zn-Al:LDH, we dipped the AZO thin film in naturally carbonated water for 3 hours. Further, Zn-Al: carbonate LDH nanosheets were immersed in terepthalic acid (TA) solution. The ion exchange phenomena in the terephthalate assisted Zn-Al:LDH were confirmed using FT-IR analysis. The crystal structure of terephthalate intercalated Zn-Al:LDH was investigated by XRD pattern analysis with different mole concentrations of TA solution and reaction times. The optimal conditions for intercalation of terephthalate from carbonated Zn-Al LDH were established using 0.3 M aqueous solution of TA for 24 hours.