• Progress in Medical Physics
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• v.25 no.3
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• pp.185-192
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• 2014

The purpose of this study is to evaluate the results for the quality assurance through a statistical analysis on the output characteristics of linear accelerators belonging to Yeungnam University Medical Center by using the Shewhart-type chart, Exponentially weighted moving average chart (EWMA) chart, and process capability indices $C_p$ and $C_{pk}$. To achieve this, we used the output values measured using respective treatment devices (21EX, 21EX-S, and Novalis Tx) by medical physicists every month from September, 2012 to April, 2014. The output characteristics of treatment devices followed the IAEA TRS-398 guidelines, and the measurements included photon beams of 6 MV, 10 MV, and 15 MV and electron beams of 4 MeV, 6 MeV, 9 MeV, 12 MeV, 16MeV, and 20 MeV. The statistical analysis was done for the output characteristics measured, and was corrected every month. The width of control limit of weighting factors and measurement values were calculated as ${\lambda}=0.10$ and L=2.703, respectively; and the process capability indices $C_p$ and $C_{pk}$ were greater than or equal to 1 for all energies of the linear accelerators (21EX, 21EX-S, and Novalis Tx). Measured values of output doses with drastic and minor changes were found through the Shewhart-type chart and EWMA chart, respectively. The process capability indices $C_p$ and $C_{pk}$ of the treatment devices in our institution were, respectively, 2.384 and 2.136 for 21EX, 1.917 and 1.682 for 21EX-S, and 2.895 and 2.473 for Novalis Tx, proving that Novalis Tx has the most stable and accurate output characteristics.

• Journal of the Korean Data and Information Science Society
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• v.14 no.2
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• pp.289-301
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• 2003

In this paper, we propose Shewhart control chart and EWMA control chart using the autocorrelated data which are common in chemical and process industries and lead to increase the number of false alarms when conventional control charts are applied. The effect of autocorrelated data is modeled as a autoregressive process, and canonical analysis is used to reduce the dimensionality of the data set and find the canonical variables that explain as much of the data variation as possible. Charting statistics are constructed based on the residual vectors from the canonical variables which are uncorrelated over time, and the control charts for these statistics can attenuate the autocorrelation in the process data. The charting procedures are illustrated with a numerical example and simulation is conducted to investigate the performances of the proposed control charts.

• Journal of Korean Society for Quality Management
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• v.12 no.2
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• pp.15-24
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• 1984

Since W.A. Shewhart (1931) developed the quality control method using the control chart, many theoretical and empirical works about such an analytical method have been done. However there are two major methods relating to the control chart analysis; the conventional 3 sigma control method and the warning limit method which has been suggested as a modification of the former. The conventional 3 sigma method requires to take a remedial action only when a quality characteristic is beyond the control limit (3 sigma). However, once a quality characteristic is over the control limit, searching and repairing an assignable cause requires time consuming job and high costs. Therefore if we set the warning limit between the central line and the control limit, we will be able to take remedial measures before too late. In spite of its advantage, much attention has not been paid to use the control chart with warning limit in Korean industries. The main object of this study is to examine improvement of quality and productivity when the control chart with warning limit is used.

• Proceedings of the Korean Society for Quality Management Conference
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• 2007.04a
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• pp.302-309
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• 2007

To conduct statistical process control needs the assumption that the process data are independent. However, most of chemical processes, like a semi-conduct processes do not satisfy the assumption because of autocorrelation. It causes abnormal out of control signal in the process control and misleading process capability. In this study, we introduce that Shore's method to solve the problem and to find the optimal subgroup size to estimate variance for AR(l) model. Especially, we focus on finding an actual subgroup size for small samples using simulation. It may be very useful for statistical process control to analyze process capability and to make a Shewhart chart properly.

• Journal of the Korea Safety Management & Science
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• v.8 no.6
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• pp.119-137
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• 2006

This paper seeks to Combination for Efficient Application of SPC/EPC minimize variability by transferring the output variable to a related process controllable variable, while SPC seeks to reduce variability by detecting and eliminating assignable causes of variation. In the case of product control, a very reasonable objective is to try to minimize the variance of the output deviations from the target or set point. We consider an alternative EPC model with autoregressed disturbance. We compare three control systems; EPC, Cp, SPC combined system with EWMA, CUSUM and Shewhart. This paper shows through simulation that the performance of the integrated model of EPC and SPC, Cp is more preferable than that of EPC.

• Journal of Korean Society for Quality Management
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• v.32 no.4
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• pp.156-168
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• 2004

This research investigates the statistical efficiency of variable sampling size & sampling interval(VSSI) $\bar{X}$ charts under two assignable causes. Algorithms for calculating the average run length(ARL) and average time to signal(ATS) of the VSSI $\bar{X}$ chart are proposed by employing Markov chain method. States of the process are defined according to the process characteristics after the occurrence of an assignable cause. Transition probabilities are carefully derived from the state definition. Statistical properties of the proposed chart are also investigated. A simple procedure for designing the proposed chart is presented based on the properties. Extensive sensitivity analyses show that the VSSI $\bar{X}$ chart is superior to the VSS or VSI $\bar{X}$ chart as well as to the Shewhart $\bar{X}$ chart in statistical sense, even tinder two assignable causes.

• IE interfaces
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• v.16 no.3
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• pp.344-351
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• 2003

Critical dimension is one of the most important characteristics of up-to-date integrated circuit devices. Hence, critical dimension control in a semiconductor wafer fabrication process is inevitable in order to achieve optimum device yield as well as electrically specified functions. Currently, in complex semiconductor wafer fabrication processes, statistical methodologies such as Shewhart-type control charts become crucial tools for practitioners. Meanwhile, given a critical dimension sampling plan, the analysis of variance technique can be more effective to investigating critical dimension variation, especially for on-chip and on-wafer variation. In this paper, relating to a typical sampling plan, linear statistical models are presented for the analysis of critical dimension variation. A case study is illustrated regarding a semiconductor wafer fabrication process.

• Industrial Engineering and Management Systems
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• v.16 no.1
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• pp.109-117
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• 2017

In this article, a control chart based on multiple dependent (or deferred) state sampling for the gamma distributed quality characteristic is proposed using the gamma to normal transformation. The proposed control chart has two pairs of control limits, which can be determined by considering the in-control average run length (ARL). The shift in the scale parameter of a gamma distribution is considered and the out-of-control ARL is evaluated. The performance of the proposed chart has been shown for different levels of the parameters of the proposed control chart. It is also shown that the proposed chart is better than the Shewhart chart in terms of ARLs. A case study with a real data has been included for the practical usage of the proposed scheme.

• Proceedings of the Korean Operations and Management Science Society Conference
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• 1996.04a
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• pp.15-18
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• 1996

Shewhart control chart is a basic technique to monitor the state of a process. We observe observations of a group of size four or five in a rational way and plot some statistics (e.g., means and ranges) on the chart. When setting up the control chart, the control limits are calculated based on preliminary 20-40 samples, which were supposedly obtained from stable operating conditions. But it may be hard to believe, especially at the beginning of constructing the chart for the first time, whether the process is stable and hence all samples were generated under the homogeneous operating conditions. In this report we suggest a mechanism to obtain robust control limits under self-criticism. When outliers are present in the sample, we obtain tighter control limits and hence increase the sensitivity of the chart. Examples will be given via simulation study.

• Communications for Statistical Applications and Methods
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• v.10 no.3
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• pp.825-833
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• 2003

Knowing the time of the process change could lead to quicker identification of the responsible special cause and less process down time, and it could help to reduce the probability of incorrectly identifying the special cause. In this paper, we propose a maximum likelihood estimator of the process change point when a Shewhart $\bar{X}$ chart with variable sample size (VSS) scheme signals a change in the process mean. Also we build a confidence interval for the process change point by using the likelihood function.