• 조명전기설비학회논문지
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• 제27권6호
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• pp.95-99
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• 2013

Furnace is currently the most important doping process using POCl3 in solar cell. However furnace need an expensive equipment cost and it has to purge a poisonous gas. Moreover, furnace typically difficult appling for selective emitters. In this study, we developed a new atmospheric pressure plasma source, in this procedure, we research the atmospheric pressure plasma doping that dopant is phosphoric acid($H_3PO_4$). Metal tube injected Ar gas was inputted 5 kV of a low frequency(scores of kHz) induced inverter, so plasma discharged at metal tube. We used the P type silicon wafer of solar cell. We regulated phosphoric acid($H_3PO_4$) concentration on 10% and plasma treatment time is 90 s, 150 s, we experiment that plasma current is 70 mA. We check the doping depth that 287 nm at 90 s and 621 nm at 150 s. We analysis and measurement the doping profile by using SIMS(Secondary Ion Mass Spectroscopy). We calculate and grasp the sheet resistance using conventional sheet resistance formula, so there are 240 Ohm/sq at 90 s and 212 Ohm/sq at 150 s. We analysis oxygen and nitrogen profile of concentration compared with furnace to check the doped defect of atmosphere.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1995년도 하계학술대회 논문집 C
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• pp.1314-1316
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• 1995

Basic discharge characteristics of a ferroelectric ball and mica sheet double barrier have been studied for learning the fundamentals of the barrier discharges and for checking the potential to be used as a plasma generator. It is found that plasma generation of the plasma generator was influenced greatly by the dielectric constant of the ferroelectric ball barrier and applied power frequency. As a result, there are optimum conditions of the dielectric constant as a barrier and the applied frequency to generate ozone effectively, which were ${\varepsilon}_r$=600 and f=4 kHz at the present experimental case.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.5-6
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• 2009

In this paper, plasma ion implant is performed with $PH_3$ gas diluted by helium gas on P-type Si wafer (100). Spike Rapid Thermal Processing(RTP) annealing performed for 30~60 sec from $800\;^{\circ}C$ to $1000\;^{\circ}C$ in $N_2+O_2$ ambient. Crystalline defect is analyzed by Transmission Electron Microscope(TEM) and Double crystal X-ray Diffraction(DXRD). Contact resistivity($\rho c$), contact resistance(Rc) and sheet resistance(Rs) are analyzed by measuring Transfer Length Method(TLM) using 4155C analysis. As annealing temperature increase, Rs decrease and ${\rho}c$ and Rc increase at temperature higher than $850\;^{\circ}C$. We achieve low Rs, ${\rho}c$ and Rc with Plasma ion implant and spike RTP.

• 한국산학기술학회논문지
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• 제6권6호
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• pp.497-501
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• 2005

Dry film 공정에 의해 PDP(Plasma Display Panel)용 무연 투명유전체를 제조하였다. 여러 슬러리 조성으로부터 고밀도 green sheet를 제조하는데 최적의 조성을 선정하였다. 한편, 슬러리는 양질의 green sheet를 제작하는데 적합한 shear thinning 특성을 나타냈다. 제조한 투명유전체의 열팽창계수는 유리기판인 PD-200과 유사한 $97{\times}10^{-7}/^{\circ}C$로 측정되었다. PD-200에 접합된 투명유전체의 단면 주사현미경 관찰로부터 두 층은 갭이 없이 매우 견실히 접합되어 있음을 확인할 수 있었다.

• Bulletin of the Korean Chemical Society
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• 제35권3호
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• pp.905-907
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• 2014

The plasma and microwave surface treatments of carbon nanotubes that loaded on plastic substrates were carried out with expecting a change of carbon nanotube dispersion by increasing treatment time. The microwave treatment process was undergone by commercial microwave oven (800 W). The electrical property was measured by hall measurement and resistance was increased by increasing $O_2$ flow rate of plasma, suggesting an improvement of carbon nanotube dispersion and a possibility of controlling the resistances of carbon nanotubes by plasma surface treatment. The resistance was increased in both polyethylene terephthalate and polyimide substrates by increasing $O_2$ flow rate. Resistance changes only slightly with different $O_2$ flow treatment in measure rho for all polyimide samples. Sheet resistance is lowest in polyimide substrate not due to high carbon nanotube loading but due to tendency to remain in elongated structure. $O_2$ or $N_2$ plasma treatments on both polyethylene terephthalate and polyimide substrates lead to increase in sheet resistance.

• Applied Science and Convergence Technology
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• 제27권1호
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• pp.5-8
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• 2018

In this paper, plasma treatment effects on a ploy(dimethyl siloxane) substrate were analyzed for the applications of stretchable silver nanowire (Ag NWs) electrodes. The oxygen plasma treated sample shows the best performance compared to nitrogen treated and untreated samples. The lowest sheet resistance and reasonable stretching capability was achieved up to 20% strain condition without open circuit fail for the oxygen plasma treated sample.

• 한국세라믹학회지
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• 제41권4호
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• pp.277-283
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• 2004

Plasma Display Panel(PDP) 상판용 투명유전체의 green sheet를 제조코자 투명유전체 슬러리의 분산특성 및 유기물의 함량과 조성비에 따른 밀도와 기계적 특성을 연구하였다. 비수계 시스템에서 슬러리의 완전분산을 위한 분산제의 종류와 분산제의 양을 결정하기 위해 침강실험, 점도측정을 행하여 최적의 분산조건을 구하였다. 조성물 변수로서 투명유전체조성 분말/(투명유전체조성 분말＋유기물)의 비와 결합제/(결합제＋가소제)의 비를 각각 변화시켜 green sheet를 제조하였다. 제조된 tape casting 슬러리의 대부분은 의가소성(pseudoplastic) 거동을 보이는데, 의가소성 거동은 shear thinning의 효과를 가지는 것으로 기술 할 수 있다. 각각의 조성을 가지는 슬러리는 모두 전단속도가 증가함에 겉보기 점도가 감소하는 shear thinning 효과를 보여 주었다. Green sheet의 특성을 조사한 결과 유기물의 함량 및 조성이 green sheet의 밀도와 기계적 특성을 결정하는 중요한 인자가 되었다.

• Journal of Welding and Joining
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• 제30권2호
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• pp.54-58
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• 2012

Al-coated steel sheets with excellent heat and corrosion resistance are widely used in various applications. In welding of thin plate, some defects such as unmelted zone and metal-through occur easily in the beginning and ending of welding line. In the study, the welding defects in Al-coated steel sheets were investigated with respect to plasma arc current, height between Cu block and base metals, and using a roller to align the height of the base metal. Full penetration and voids free welds were obtained with a plasma arc current 52A and weld speed 2.3m/min. An unmelted zone increased and Ericshen rate decreased as the height between Cu block and base metal increased from 0 to 0.6mm. Using a roller moving ahead of the plasma arc, the length of unmelted zone decreased from 1.7mm to 0.5mm.

• 한국전기전자재료학회논문지
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• 제22권1호
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• pp.81-85
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• 2009

We has been analysed optical properties of OLED(organic light emitting diode) and characteristics of ITO(Indium Tin Oxide) in terms of $O_2$ plasma treatment for manufacturing high efficiency OLED, RF power of $O_2$ plasma was changed 25, 50, 100, 200 W. $O_2$ gas flow, gas pressure and treatment time were fixed. Sheet resistance and surface roughness of ITO were measured by Hall-effect measurement system and AFM, respectively. The ranges of sheet resistance and surface roughness were $5.5{\sim}6,06\;{\Omega}$ and $2.438{\sim}3.506\;nm$ changing of RF power, respectively, PM(Passive Matrix)OLED was fabricated with the structure of ITO(plasm treatment)/TPD($400\;{\AA}$)/$Alq_3(600\;{\AA})$/LiF($5\;{\AA}$)/Al($1200\;{\AA}$). Turn-on voltage of PMOLED was 7 V and luminance was $7,371\;cd/m^2$ at the RF power of 25 W, $O_2$ plasma treatment of ITO surface was result in lowering the operating voltage and improving luminance of PMOLED.

• 한국전기전자재료학회논문지
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• 제32권2호
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• pp.147-150
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• 2019

There is a need for the development of transparent conductive materials that are economical and environmentally friendly with exhibit low resistivity and high transmittance in the visible spectrum. In this study, the deposition rate and uniformity of Al-doped ZnO-thin films were improved by changing the Z-motion of the sputtering system. The deposition rate and the uniformity were determined to be 3.44 nm/min and 1.23%, respectively, under the 10 mm Z-motion condition. During $O_2$ plasma treatment, the intrusion-type metal elements in the thin film were reduced, which contributed to an oxygen vacancy reduction in addition to structural stabilization. Moreover, the sheet resistance was more easily saturated.