• Title/Summary/Keyword: Self-etching

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The Tribological Behaviors of Mesoporous $SiO_2$ Thin Film Formed by Sol-Gel and Self-Assembly Method (졸겔법과 자가조립법을 통해 제조된 메조포러스 $SiO_2$ 박막의 트라이볼로지 특성)

  • Lee, Young-Ze;Shin, Yun-Ha;Kim, Ji-Hoon;Kim, Ji-Man;Kim, Tae-Sung
    • Tribology and Lubricants
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    • v.23 no.6
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    • pp.298-300
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    • 2007
  • Frictional characteristics of mesoporous $SiO_2$ thin films were evaluated with different pore sizes. The films were manufactured by sol-gel and self-assembly methods to have a porous structure. The pores on the surface may play as the outlet of wear particle and the storage of lubricant so that the surface interactions could be improved. The pores were exposed on the surface by chemical mechanical polishing (CMP) or plasma-etching after forming the porous films. The ball-on-disk tests with mesoporous $SiO_2$ thin films on glass specimen were conducted at sliding speed of 15 rpm and a load of 0.26 N. The results show considerable dependency of friction on pore size of mesoporous $SiO_2$ thin films. The friction coefficient decreased as increasing the pore size. CMP process was very useful to expose the pores on the surface.

Fabrication of All-Nb Josephson Junction Array Using the Self-Aligning and Reactive ion Etching Technique (Self-Aligning 기술과 반응성 이온 식각 기술로 제작된 Nb 조셉슨 접합 어레이의 특성)

  • Hong, Hyun-Kwon;Kim, Kyu-Tea;Park, Se-Il;Lee, Kie-Young
    • Progress in Superconductivity
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    • v.3 no.1
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    • pp.49-55
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    • 2001
  • Josephson junction arrays were fabricated by DC magnetron sputtering, self-aligning and reactive ion etching technique. The Al native oxide, formed by thermal oxidation, was used as the tunneling barrier of Nb/$Al-A1_2$$O_3$Nb trilayer. The arrays have 2,000 Josephson junctions with the area of $14\mu\textrm{m}$ $\times$ $46\mu\textrm{m}$. The gap voltages were in the range of 2.5 ~2.6 mV and the spread of critical current was $\pm$11~14%. When operated at 70~94 ㎓, the arrays generated zero-crossing steps up to 2.1~2.4 V. To improve transmission of microwave power and prevent diffusion of oxygen into Nb ground-plane while depositing $SiO_2$dielectric, we applied a plasma nitridation process to the Nb ground-plane. The microwave power was well propagated in Josephson junction arrays with nitridation. The difference in microwave transmission 7an be interpreted by the surface impedance change depending on nitridation.

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Evaluation of Shear Bond Strength of Various Orthodontic Bracket Bonding Agents (수종의 교정용 브라켓 접착 레진의 전단 강도 평가)

  • Youngjun, Ham;Miran, Han
    • Journal of the korean academy of Pediatric Dentistry
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    • v.49 no.3
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    • pp.264-273
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    • 2022
  • Due to the development of properties of adhesive materials currently used in dentistry, the bonding ability between the brackets and the tooth enamel has been greatly improved. In general, in situations where cooperation can be obtained, adhesion of the orthodontic bracket through the conventional three-step process can show excellent bonding strength. However, if it is difficult to expect patient cooperation, as in the pediatric dentistry area, or if moisture isolation is not properly performed, the binding strength that does not reach the expected effect. As a result, various products that simplify the process for adhesion are being developed. The aim of this study was to evaluate and compare the shear bonding strength between the conventional 3-step adhesion system, self-etching primer system and one-step adhesion system that reduces the priming process. A total of 60 human maxillary, mandibular premolars were prepared. Group I (control group) were followed conventional 3-step bonding process. Group II were conditioned with self-etching primer. Group III were etched with 37% phosphoric acid and brackets were bonded with self-priming adhesive. The resultant shear bond strength of each group was measured and an adhesive remnant index (ARI) was recorded. The mean shear bond strength of group I, II, III were 14.69 MPa, 11.21 MPa and 12.21 MPa respectively. Significant differences could only be found between group I, II and group I, III (p < 0.05). The ARI indicated no significant difference among all groups.

Microshear bond strength of a self-etching primer adhesive to enamel according to the type of bur (삭제기구의 종류에 따른 자가부식 프라이머 접착제의 법랑질에 대한 미세전단 결합강도)

  • Jeong, Jin-Ho;Cho, Young-Gon;Lee, Myung-Seon
    • Restorative Dentistry and Endodontics
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    • v.36 no.6
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    • pp.477-482
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    • 2011
  • Objectives: The purpose of this study was to compare the microshear bond strength (uSBS) to enamel prepared with different burs and to determine what type of bur were chosen when a self-etching primer adhesive was used. Materials and Methods: Enamel of forty-two human molars were used. They were divided into one of six groups (n = 7), Group 1, coarse (125 - 150 ${\mu}m$) diamond bur; Group 2, standard (106 - 125 ${\mu}m$) diamond bur; Group 3, fine (53 - 63 ${\mu}m$) diamond bur; Group 4, extrafine (20 - 30 ${\mu}m$) diamond bur; Group 5, plaincut carbide bur (no. 245); Group 6, cross-cut carbide bur (no. 557). Clearfil SE Bond and Clearfil AP-X (Kuraray Medical Inc.) was bonded to enamel surface. The bonded specimens were subjected to uSBS testing. Results: The uSBS of Group 4 was the highest among groups and it was significantly higher than that of Groups 1, 2, 3, and 6 (p < 0.05), but it was not significantly different from that of Group 5. Conclusions: Different burs used on enamel surface affected the microshear bond strengths of a self-etching primer adhesive to the enamel surface. In the case of Clearfil SE Bond, extrafine diamond and plain-cut carbide bur are recommended for bonding to enamel.

AGING EFFECT ON THE MICROTENSILE BOND STRENGTH OF SELF-ETCHING ADHESIVES (자가부식 접착제의 미세인장접착강도에 대한 시효처리 효과)

  • Park, Jin-Seong;Kim, Jong-Sun;Kim, Min-Su;Son, Ho-Hyeon;Gwon, Hyeok-Chun;Cho, Byeong-Hoon
    • Restorative Dentistry and Endodontics
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    • v.31 no.6
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    • pp.415-426
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    • 2006
  • In this study, the changes in the degree of conversion (DC) and the microtensile bond strength (MTBS) of self-etching adhesives to dentin was investigated according to the time after curing. The MTBS of Single Bond (SB, 3M ESPE, USA), Clearfil SE Bond (SE, Kuraray, Japan), Xeno-III (XIII, Dentsply, Germany), and Adper Prompt (AP, 3M ESPE, USA) were measured at 48h, at 1 week and after thermocycling for 5,000 cycles between 5$^{\circ}$C and 55$^{\circ}$C. The DC of the adhesives were measured immediately, at 48h and at 7 days after curing using a Fourier Transform Infra-red Spectrometer. The fractured surfaces were also evaluated with scanning electron microscope. The MTBS and DC were significantly increased with time and there was an interaction between the variables of time and material (MTBS, 2-way ANOVA, p = 0.018; DC, Repeated Measures ANOVA, p < 0.001). The low DC was suggested as a cause of the low MTBS of self-etching adhesives, XIII and AP, but the increase in the MTBS of SE and AP after 48h could not be related with the changes in the DC. The microscopic maturation of the adhesive layer might be considered as the cause of increasing bond strength.

SHEAR BOND STRENGTH OF SELF-ETCHING PRIMER SYSTEMS TO CONTAMINATED DENTIN IN PRIMARY TEETH (오염된 유치 상아질에 대한 자가 부식 프라이머의 결합강도에 관한 연구)

  • Seo, Ju-Hee;Lee, Kwang-Hee;Kim, Dae-Eup
    • Journal of the korean academy of Pediatric Dentistry
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    • v.29 no.1
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    • pp.107-114
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    • 2002
  • The purpose of this study was to determine and compare the shear bond strength of two self-etching primer systems to primary teeth contaminated with saliva and blood. Clearfil SE Bond and AQ Bond were evaluated. One hundred specimens were made by seventy-five deciduous teeth(fifty anterior and twenty-five posterior teeth) and divided randomly into ten groups. Small flat dentinal surfaces were prepared by grinding the buccal, lingual and labial areas. Specific surface treatments were applied to each group: (1) a self-etching primer application(control group), (2) saliva contamination followed by primer(Group I), (3) primer curing followed by saliva contamination (Group II), (4) blood contamination followed by primer(Group III), (5) primer curing followed by blood contamination(Group IV). After bonding of composite resin(Z100, 3M, USA) to contaminated sample surfaces and thermocycling(1,000 cycles), shear bond strengths were measured using Universal Testing Machine(Zwick Z020, Zwick Co., Germany). The results were as follows; 1. Group I showed lower shear bond strength than control group but no statistically significant difference was found(P>0.05). 2. Group II and blood contamination group(Group III & IV) showed significantly lower shear bond strength than control group(P<0.01). 3. The shear bond strength of Clearfil SE Bond was significantly higher than that of AQ Bond(P<0.05).

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COMPATIBILITY OF SELF-ETCHING DENTIN ADHESIVES WITH RESIN LUTING CEMENTS (자가부식형 상아질접착제와 레진시멘트와의 적합성에 관한 연구)

  • Kim, Do-Wan;Park, Sang-Jin;Choi, Kyoung-Kyu
    • Restorative Dentistry and Endodontics
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    • v.30 no.6
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    • pp.493-504
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    • 2005
  • This study was performed to investigate the compatibility between 4 dentin adhesives and 4 resin luting cements. Dentin adhesives used in this study were All-Bond 2 (Bisco Inc., Schaumbrug, IL, USA), Clearfil SE-Bond (Kuraray Medical Inc, Osaka, Japan), Prompt L-Pop (3M Dental Products, St. Paul, MN, USA), One-Up Bond F (Tokuyama corp., Tokyo, Japan) Resin luting cements used in this study were Choice (Bisco Inc., Schaumbrug, IL, USA), Panavia F (Kuraray Medical Inc, Osaka, Japan), RelyX ARC (3M Dental Products, St. Paul, MN, USA) Bistite II DC (Tokuyama corp., Tokyo, Japan). Combination of each dentin adhesive and corresponding resin cement was made to 16 experimental groups. Flat dentin surfaces was created on mid-coronal dentin of extracted mandibular third molars, then dentin surface was polished with 320-grit silicon carbide abrasive papers. Indirect resin composite block (Tescera, Bisco) was fabricated. Its surface for bonding to tooth was polished with silicon carbide abrasive papers Each dentin adhesive was treated on tooth surface and resin composite overlay were luted with each resin cement. Each bonded specimen was poured in epoxy resin and sectioned occluso-gingivally into 1.0mm thick slab, then further sectioned into $1.0{\times}1.0mm^2$ composite-dentin beams. Microtensile bond strength was tested at a crosshead speed of 1.0mm/min. The data were analysed by one-way ANOVA and Duncan's multiple comparison tests The results of this study were as follows, 2-step self-etching dentin adhesive which has additional bonding resin is more comparison than tests. self-etching dentin adhesive.

Effect of Saliva Decontamination on Bond Strength of 1-step Self-etching Adhesives to Dentin of Primary Posterior Teeth (한 단계 자가부식 접착제를 이용한 복합레진 수복 시 타액오염 후 처치 방법에 따른 미세인장강도 비교)

  • Lee, Junhee;Kim, Shin;Jeong, Taesung;Shin, Jonghyun;Lee, Eungyung;Kim, Jiyeon
    • Journal of the korean academy of Pediatric Dentistry
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    • v.46 no.3
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    • pp.274-282
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    • 2019
  • The purpose of this study was to evaluate effect of saliva decontamination procedures on microtensile bond strength (MTBS) of 1-step self-etching adhesives to dentin of primary posterior teeth. 63 sound primary-posterior teeth were randomly divided into 3 groups according to different kinds of 1-step self-etching adhesives: $Scotchbond^{TM}$ Universal Adhesive (SBU), All-Bond $Universal^{(R)}$ (ABU), and $Tetric^{(R)}$ N Bond Universal (TBU). Each group was randomly categorized into 7 subgroups: (I) application of adhesive without saliva contamination (control); (II - IV) contamination by saliva before photopolymerization; (V - VII) contamination by saliva after photopolymerization; (II, V) decontamination by drying; (III, VI) decontamination by washing and drying; (IV, VII) decontamination by washing, drying, and reapplication of adhesive. All samples were cut into the blocks. At least 15 blocks were tested for each subgroup. For SBU and ABU, the MTBS values of subgroups (I, IV, VII) were significantly higher than those of subgroups (II, III, V, VI). For TBU, the MTBS values of subgroups (I, IV) was significantly higher than those of subgroup (II, III, V, VI). The MTBS of 3 adhesives was reduced by saliva contamination. The adhesive strength on dentin of primary posterior teeth was restored by reapplication of the adhesives after washing and drying.

The study of shear bond strength of a self-adhesive resin luting cement to dentin (상아질에 대한 자가 접착 레진 시멘트의 전단결합강도에 관한 연구)

  • In, Hee-Sun;Park, Jong-Il;Choi, Jong-In;Cho, Hye-Won;Dong, Jin-Keun
    • The Journal of Korean Academy of Prosthodontics
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    • v.46 no.5
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    • pp.535-543
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    • 2008
  • Purpose: The objective of this study was to compare the bonding characteristics of a new self-adhesive resin cement to dentin, which does not require bonding and conditioning procedure of the tooth surface, and conventional resin cement. The effect of phosphoric acid etching prior to application of self-adhesive resin cement on the shear bond strength was also evaluated. Material and methods: Fortyfive non-carious human adult molars extracted within 6 months were embedded in chemically cured acrylic resin. The teeth were ground with a series of SiC-papers ending with 800 grit until the flat dentin surfaces of the teeth were exposed. The teeth were randomly divided into 3 experimental groups. In group 1, self-adhesive resin cement, RelyX Unicem (3M ESPE, Seefeld, Germany) was bonded without any conditioning of teeth. In group 2, RelyX Unicem was bonded to teeth after phosphoric acid etching. For group 3, Syntac Primer (Ivoclar Vivadent AG, Schaan, Liechtenstein) was applied to the teeth before Syntac adhesive (Ivoclar Vivadent AG, Schaan, Liechtenstein) and Helibond (Ivoclar Vivadent AG, Schaan, Liechtenstein) followed by conventional resin cement, Variolink II (Ivoclar Vivadent AG, Schaan, Liechtenstein). To make a shear bond strength test model, a plastic tuble (3 mm diameter, 3 mm height) was applied to the dentin surfaces at a right angle and filled it with respective resin cement, and light-polymerized for 40 seconds. All the specimens were stored in distilled water at $37^{\circ}C$ for 24 hours before test. Universal Testing Machine (Z020, Zwick, Ulm, Germany) at a cross head speed of 1 mm/min was used to evaluate the shear bond strength. The failure sites were inspected under a magnifier and Scanning Electron Microscope. The data was analyzed with One way ANOVA and Scheffe test at ${\alpha}$= 0.05. Results: (1) The shear bond strengths to dentin of RelyX Unicem was not significantly different from those of Variolink II/Syntac. (2) Phosphoric acid etching lowered the shear bond strength of RelyX Unicem significantly. (3) Most of RelyX Unicem and Variolink II showed mixed fractures, while all the specimens of RelyX Unicem with phosphoric acid etching demonstrated adhesive failure between dentin and resin cement. Conclusion: Shear bond strength to dentin of self-adhesive resin cement is not significantly different from conventional resin cement, and phosphoric acid etching decrease the shear bond strength to dentin of self-adhesive resin cement.

Capacitively Coupled Plasma Simulation for Low-k Materials Etching Process Using $H_2/N_2$ gas (저 유전 재료의 에칭 공정을 위한 $H_2/N_2$ 가스를 이용한 Capacitively Coupled Plasma 시뮬레이션)

  • Shon, Chae-Hwa
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.55 no.12
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    • pp.601-605
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    • 2006
  • The resistance-capacitance (RC) delay of signals through interconnection materials becomes a big hurdle for high speed operation of semiconductors which contain multi-layer interconnections in smaller scales with higher integration density. Low-k materials are applied to the inter-metal dielectric (IMD) materials in order to overcome the RC delay. Relaxation continuum (RCT) model that includes neutral-species transport model have developed to model the etching process in a capacitively coupled plasma (CCP) device. We present the parametric study of the modeling results of a two-frequency capacitively coupled plasma (2f-CCP) with $N_2/H_2$ gas mixture that is known as promising one for organic low-k materials etching. For the etching of low-k materials by $N_2/H_2$ plasma, N and H atoms have a big influence on the materials. Moreover the distributions of excited neutral species influence the plasma density and profile. We include the neutral transport model as well as plasma one in the calculation. The plasma and neutrals are calculated self-consistently by iterating the simulation of both species till a spatio-temporal steady state profile could be obtained.