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The Tribological Behaviors of Mesoporous $SiO_2$ Thin Film Formed by Sol-Gel and Self-Assembly Method

졸겔법과 자가조립법을 통해 제조된 메조포러스 $SiO_2$ 박막의 트라이볼로지 특성

  • Lee, Young-Ze (Dept. of Mechanical Engineering, Sungkyunkwan University) ;
  • Shin, Yun-Ha (Dept. of Mechanical Engineering, Sungkyunkwan University) ;
  • Kim, Ji-Hoon (Dept. of Mechanical Engineering, Sungkyunkwan University) ;
  • Kim, Ji-Man (Department of Chemistry, Sungkyunkwan University) ;
  • Kim, Tae-Sung (Dept. of Mechanical Engineering, Sungkyunkwan University)
  • 이영제 (성균관대학교 기계공학부) ;
  • 신윤하 (성균관대학교 기계공학부) ;
  • 김지훈 (성균관대학교 기계공학부) ;
  • 김지만 (성균관대학교 화학과) ;
  • 김태성 (성균관대학교 기계공학부)
  • Published : 2007.12.31

Abstract

Frictional characteristics of mesoporous $SiO_2$ thin films were evaluated with different pore sizes. The films were manufactured by sol-gel and self-assembly methods to have a porous structure. The pores on the surface may play as the outlet of wear particle and the storage of lubricant so that the surface interactions could be improved. The pores were exposed on the surface by chemical mechanical polishing (CMP) or plasma-etching after forming the porous films. The ball-on-disk tests with mesoporous $SiO_2$ thin films on glass specimen were conducted at sliding speed of 15 rpm and a load of 0.26 N. The results show considerable dependency of friction on pore size of mesoporous $SiO_2$ thin films. The friction coefficient decreased as increasing the pore size. CMP process was very useful to expose the pores on the surface.

Keywords

References

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