• 대한전자공학회논문지TE
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• 제37권3호
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• pp.1-5
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• 2000

A waveguide of coupled optical modulator was fabricated on LiNbO$_3$ based on proton exchange with self-aligned thin film electrode method. The electrode pattern was designed using a self-aligned method. After proton exchange process, the waveguide was prepared by annealing process. The initial crossover state of the fabricated 2$\times$2 coupled optical modulator was observed with controlling the annealing process variables and the structure of self-aligned thin film electrodes. It was shown form the present work that the measured crosstalk is -29.5[dB] and 8.0[V] of detected modulating voltage.

• 한국표면공학회지
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• 제51권4호
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• pp.191-196
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• 2018

The self-annealing which leads evolution of microstructure in copper electroplating layers at room temperature occurs after forming deposition layer. During the process, crystal orientation, size and sheet resistance of plating layer change. Lastly, it causes the change of physical and mechanical characteristics such as a tensile strength of plating layer. In this study, the variation of incorporated impurities, microstructure and sheet resistance of copper plating layer formed by electroplating are measured with and without inorganic additives during the self-annealing. In case of absence of inorganic additives, the copper layer presents strong total intensity of incorporated impurities. During the self-annealing, such width of reduction was significant. Moreover, microstructure and crystal size are increased while the tensile strength is decreased noticeably. On the other hand, in the presence of inorganic additives, there is no observable distinction in the copper plating layer. According to the observation on movements of the incorporated impurities in electrodeposition copper layer, within 12 hours the impurities are continuously shifted from inside of the plating layer to its surface after as-deposited electroplating. Within 24 hours, except for the small portion of surface layer, it is considered that most of the microstructure is transformed.

• 한국재료학회지
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• 제16권3호
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• pp.183-187
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• 2006

We present the effects of rapid thermal annealing (RTA) temperature on the structural and optical properties of self-assembled InAs quantum dot (QD) structures grown on GaAs substrates by molecular beam epitaxy (MBE). The photoluminescence (PL) measurements are performed in a closed-cycle refrigerator as a function of temperature for the unannealed and annealed samples. RTA at higher temperature results in the increase in island size, the corresponding decrease in the density of islands, and the redshift in the PL emission from the islands. The temperature dependence of the PL peak energy for the InAs QDs is well expressed by the Varshni equation. The thermal quenching activation energies for the samples unannealed and annealed at $600^{\circ}C$ are found to be $25{\pm}5meV$ and $47{\pm}5$ meV, respectively.

• 전기학회논문지P
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• 제66권4호
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• pp.263-266
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• 2017

In this study, the characteristics of anti-pollution coatings on glass substrates through annealing treatment were investigated. To investigate the change of properties by coating method and number of annealing treatment, after the anti-pollution coating was performed on the surface of glass substrate in three ways, the annealing treatment was performed by setting three kinds of annealing treatment conditions. The annealing treatment method is a torch using gas, which is advantage in that it can be installed directly on the site in an easy way compared with a annealing treatment process which is generally difficult. The anti-pollution properties, contact angle, transmittance, hardness, and adhesion of films on glass substrate were measured under 9 conditions of combination of coating methods and annealing treatment conditions. It was confirmed that as the number of annealing treatment increases, the anti-pollution property of the film synthesized on glass substrate becomes better.

• Bulletin of the Korean Chemical Society
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• 제28권12호
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• pp.2445-2448
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• 2007

Self-assembled monolayers (SAMs) were formed by adsorption of thioacetyl-terminated tolanethioacetate (TTA) on Au(111) in a 0.5-mM ethanol solution after one day immersion at room temperature. Molecular-scale STM imaging revealed that the TTA SAMs were composed of two mixed phases; an ordered phase with small domains describing a ( × 2 )R30° structure and a disordered phase. Interestingly, after annealing the precovered TTA SAMs on Au(111) at 90 °C for 1 h, the small ordered domains grew unidirectionally, resulting in the formation of unique rod-like domains, which were assigned a ( × 2 )R7° structure. These results will be very useful in understanding the formation and thermal behavior of TTA SAMs on gold surfaces.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2011년도 춘계학술대회 및 Fine pattern PCB 표면 처리 기술 워크샵
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• pp.108-109
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• 2011

유기태양전지를 제작 시에 요구되는 것 중 하나는 active layer의 thermal annealing이다. Thermal thermal annealing 없이는 P3HT의 self-organization이 잘 이뤄지지 않아 비정질의 모습을 보인다. 또한 low band-gap이나 열에 취약한 물질을 사용 시에 태양전지 효율이 낮아지게 된다. 이 점을 착안하여 Active layer에 사용되는 유기용매의 solvent vapor pressure 차이를 이용하여 co-solvent가 되도록 mixing하여, co-solvent로 poly(3-hexylthiopene)(P3HT):[6,6] - phenyl $C_{61}$-butyric acid methyl ester (PCBM)를 blending 하여 active layer로 사용하였으며, 유기태양전지 디바이스 제작 결과 thermal thermal annealing 없이 2.8%까지 도달하였다. X-Ray Diffraction(XRD)과 Atomic Force Microscopy(AFM)를 통하여 P3HT의 결정화가 이루어 졌음을 확인하고 이를 통해 active layer의 thermal annealing이 없이도 P3HT의 self-organization이 이뤄짐을 알 수 있었다.

• E2M - 전기 전자와 첨단 소재
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• 제8권4호
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• pp.443-450
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• 1995

A directional coupler which on the X-cut $LiNbO_3$ substrate is fabricated by using proton exchange method and self-aligned method. After proton exchange process, the waveguide is formed by annealing process. The relation ship between refractive index change of waveguide and maximum output was studied along with the annealing time. A self-aligned method was used to simplify the fabrication process of the waveguide and to maximize the efficiency of electric field. The on-off state of modulator has been observered with the switching of the directional coupler by the electric field effect and also the switching voltage of the directional coupler has been measured with 8.0 [V].

• 한국전기전자재료학회논문지
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• 제16권10호
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• pp.853-858
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• 2003

In this study, a new simplified technology for fabricating high density trench gate DMOSFETs using only three mask layers and TEOS/nitride spacer is proposed. Due to the reduced masking steps and self-aligned process, this technique can afford to fabricate DMOSFETs with high cell density up to 100 Mcell/inch$^2$ and cost-effective production. The resulting unit cell pitch was 2.3∼2.4${\mu}$m. The fabricated device exhibited a excellent specific on-resistance characteristic of 0.36m$\Omega$. cm$^2$ with a breakdown voltage of 42V. Moreover, time to breakdown of gate oxide was remarkably increased by the hydrogen annealing after trench etching.

• Journal of Korean Vacuum Science & Technology
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• 제6권2호
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• pp.79-83
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• 2002

As Ag does not form my silicide on Si surfaces, Ag wire is a candidate for self-assembled nanowire on the reconstructed and single-domain Si(5 5 12)-2 $\times$ 1. In the present study, various Ag coverages and post-annealing temperatures had been tested to fabricate a Ag nanowire with high aspect ratio. When Ag coverage was less than 0.03 ML and the post-annealing temperature was 500(C, Ag atoms preferentially adsorbed on the tetramer sites resulting in Ag wires with an inter-row spacing of ~5 nm. However, its aspect ratio is relatively small and its height is also not even. On the other hand, the Ag-posited surface completely loses its reconstruction even with the same annealing at 500 $\^{C}$ if the initial coverage exceeds 0.05 ML. But the additional subsequent annealing at 700$\^{C}$ and slow-cooling process recovers the well-ordered Ag chain with relatively high aspect ratio on the same tetramer sites. It can be understood that, in the double step annealing process, the lower temperature annealing is required for cohesion of adsorbed Ag atoms and the higher temperature annealing is for providing Ag atoms to the tetramer sites.

• 한국진공학회지
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• 제22권1호
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• pp.31-36
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• 2013

마이크로플라즈마 화학기상증착법(microwave plasma enhanced chemical vapor deposition, MPCVD)에 의하여 형성된 비정질 탄소 박막의 효율적인 도핑 공정을 위하여, 비정질 탄소 박막의 성장 직전 nucleated seed 상태의 기판 혹은 일부 성장된 박막 위에 비소(As) 이온을 이온 주입하였고 그 직후 다시 MPCVD에 의하여 박막을 성장시켰다. MPCVD에 의한 성장 자체가 약 $500{\sim}600^{\circ}C$ 온도에서의 어닐링 공정을 대체할 수 있으므로, 기존의 이온 주입 후 별도의 어닐링 공정과 비교 시 간략화된 공정으로도 어닐링 효과가 있다고 할 수 있다. 이온 주입 후 박막 성장으로 어닐링 효과를 얻은 비정질 탄소 박막의 경우, $2.5V/{\mu}m$의 전계에서 약 $0.1mA/cm^2$의 전계 방출 특성을 관찰할 수 있었고 또한 라만 스펙트럼 특성에서도 다이아몬드 특성 및 그래파이트 특성 모두 뚜렷이 관찰되었다. 전기적, 구조적 특성 관찰로부터 이온 주입된 As 이온이 자동 어닐링 효과에 의해 충분히 비정질 탄소 박막에 도핑되었다고 할 수 있다.