• Title/Summary/Keyword: Self-Contact

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High Quality Nickel Atomic Layer Deposition for Nanoscale Contact Applications

  • Kim, Woo-Hee;Lee, Han-Bo-Ram;Heo, Kwang;Hong, Seung-Hun;Kim, Hyung-Jun
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2009.05a
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    • pp.22.2-22.2
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    • 2009
  • Currently, metal silicides become increasingly more essential part as a contact material in complimentary metal-oxide-semiconductor (CMOS). Among various silicides, NiSi has several advantages such as low resistivity against narrow line width and low Si consumption. Generally, metal silicides are formed through physical vapor deposition (PVD) of metal film, followed by annealing. Nanoscale devices require formation of contact in the inside of deep contact holes, especially for memory device. However, PVD may suffer from poor conformality in deep contact holes. Therefore, Atomic layer deposition (ALD) can be a promising method since it can produce thin films with excellent conformality and atomic scale thickness controllability through the self-saturated surface reaction. In this study, Ni thin films were deposited by thermal ALD using bis(dimethylamino-2-methyl-2-butoxo)nickel [Ni(dmamb)2] as a precursor and NH3 gas as a reactant. The Ni ALD produced pure metallic Ni films with low resistivity of 25 $\mu{\Omega}cm$. In addition, it showed the excellent conformality in nanoscale contact holes as well as on Si nanowires. Meanwhile, the Ni ALD was applied to area-selective ALD using octadecyltrichlorosilane (OTS) self-assembled monolayer as a blocking layer. Due to the differences of the nucleation on OTS modified surfaces toward ALD reaction, ALD Ni films were selectively deposited on un-coated OTS region, producing 3 ${\mu}m$-width Ni line patterns without expensive patterning process.

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Self Assembled Patterns of Ag Using Hydrophobic and Hydrophilic Surface Characteristics of Glass (유리기판의 친수.소수 상태 변화를 이용한 자기정렬 Ag Pattern 형성 연구)

  • Choo Byoung-Kwon;Choi Jung-Su;Kim Gun-Jeong;Lee Sun-Hee;Park Kyu-Cang;Jang Jin
    • Journal of the Korean Vacuum Society
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    • v.15 no.4
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    • pp.354-359
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    • 2006
  • Recently, the interest in lithography without photo exposure has been increased compare to the conventional photolithography in nano meter and micrometer size patterning area. We studied a self aligned dipping of Ag solution through micro contact printing (${\mu}-CP$) with octadecyltrichlorosilane (OTS) treated polydimethylsiloxane (PDMS) soft mold. The OTS monolayer on the patterned PDMS was formed by dipping it into OTS solution. We transferred the OTS monolayer from PDMS mold to the glass. The OTS monolayer changed the surface energy from hydrophilic surface to hydrophobic surface, And then we made self aligned Ag solution patterns just after dipping the substrate, using adhesion difference of Ag solution between OTS treated hydrophobic area and non-OTS treated hydrophilic area. We finally get the Ag patterns through only dip-coating after the ${\mu}-CP$ process. And we observed surface energies on the glass substrate through the contact angle measurements as time goes on.

Simulation of Vehicle-Track-Bridge Dynamic Interaction by Nonlinear Hertzian Contact Spring and Displacement Constraint Equations (비선형 헤르쯔 접촉스프링과 변위제한조건식의 적용에 의한 차량-궤도-교량 동적상호작용 수치해석기법)

  • Chung Keun-Young;Lee Sung-Uk;Min Kyung-Ju
    • Proceedings of the KSR Conference
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    • 2005.11a
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    • pp.191-196
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    • 2005
  • In this study, to describe vehicle-track-bridge dynamic interaction phenomena with 1/4 vehicle model, nonlinear Hertzian contact spring and nonlinear contact damper are introduced. In this approach external loads acting on 1/4 vehicle model are self weight of vehicle and geometry information of running surface. The constraint equation on contact surface is implemented by Penalty method. Also, to improve the numerical stability and to maintain accuracy of solution, the artificial damper and the reaction from constraint violation are introduced. A nonlinear time integration method, in this study, Newmark method is adopted for both equations of vehicles and structure. And to reduce the error caused by inadequate time step size, adaptive time-stepping technique is partially introduced. As the nonlinear Hertzian contact spring has no resistance to tensile force, the bouncing phenomena of wheelset can be described. Thus, it is expected that more versatile dynamic interaction phenomena can be described by this approach and it can be applied to various railway dynamic problems.

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A Study on the Formulation of the Interaction Problem between Upper Structure and the Ground under Consolidation (上部 構造와 下部 壓密地盤 間 상호작용 문제의 정식화에 대한 연구)

  • Lee, Oe-Duck
    • Journal of Ocean Engineering and Technology
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    • v.13 no.1 s.31
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    • pp.51-61
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    • 1999
  • When a structure is built on the ground under consolidation, the instant corresponding contact pressure which the upper structure exerts on the ground is established. But, as the consolidation of the ground proceeds, the contact pressure is changed because of the flexural rigidity of the upper structure. This varied contact pressure exerts influence on the consolidation behavior of the ground. And, this varied consolidation behavior exerts on the contact pressure in retum. This kind of interaction between the upper struture and the olwer ground under consolidation contimues till all the consolidation process in finished. So this problem cannot be defined as a linear problem. In this paper an approximation method which can analyse this non-linear interaction problem is proposed by the FEM.

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3차원 소자를 위한 개선된 소오스/드레인 접촉기술

  • An, Si-Hyeon;Gong, Dae-Yeong;Park, Seung-Man;Lee, Jun-Sin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.248-248
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    • 2010
  • CMOS 축소화가 32nm node를 넘어서 지속적으로 진행되기 위하여 FinFET, Surround Gate and Tri-Gate와 같은 Fully Depleted 3-Dimensional 소자들이 SCE를 다루기 위해서 많이 제안되어 왔다. 하지만 소자의 축소화를 진행함에 있어서 좁고 균일한 patterning을 형성하는 것과 동시에 낮은 Extension Region과 Contact Region에서의 Series Resistance을 제공하여야 하고 Source/Drain Contact Formation을 확보하여야 한다. 그리고 소자의 축소화가 진행됨으로써 Silicide의 응집현상과 Source/Drain Junction의 누설전류에 대한 허용범위가 점점 엄격해지고 있다. ITRS 2005에 따르면 32nm CMOS에서는 Contact Resistivity가 대략 $2{\times}10-8{\Omega}cm2$이 요구되고 있다. 또한 Three Dimensional 소자에서는 Fin Corner Effect가 Channel Region뿐만 아니라 S/D Region에서도 중대한 영향을 미치게 된다. 따라서 본 논문에서 제시하는 Novel S/D Contact Formation 기술을 이용하여 Self-Aligned Dual/Single Metal Contact을 이루어Patterning에 대한 문제점 해결과 축소화에 따라 증가하는 Contact Resistivity 문제점을 해결책을 제시하고자 한다. 이를 검증하기3D MOSFET제작하고 본 기술을 적용하고 검증한다. 또한 Normal Doping 구조를 가진3D MOSFET뿐만 아니라 SCE를 해결하기 위해서 대안으로 제시되고 있는 SB-MOSFET을 3D 구조로 제작하고, 이 기술을 적용하여 검증한다. 그리고 Silvaco simulation tool을 이용하여 S/D에 Metal이 Contact을 이루는 구조가 Double type과 Triple type에 따라 Contact Resistivity에 미치는 영향을 미리 확인하였고 이를 실험으로 검증하여 소자의 축소화에 따라 대두되는 문제점들의 해결책을 제시하고자 한다.

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Analysis of Surface Forces in Micro Contacts between Rough Surfaces (거친 표면간의 미세 접촉에서의 표면력 해석)

  • Kim, Doo-In;Ahn, Hyo-Sok;Choi, Dong-Hoon
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.26 no.10
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    • pp.2180-2186
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    • 2002
  • In a micro-scale contact, capillary force and van der Waals interaction significantly influence the contact between asperities of rough surfaces. Little is, however, known about the variation of these surface forces as a function of chemical property of the surface (wet angle), relative humidity and deformation of asperities in the real area of contact. A better understanding of these surface forces is of great necessity in order to find a solution for reducing friction and adhesion of micro surfaces. The objective of this study is to investigate the surface forces in micro-scale rough surface contact. We proposed an effective method to analyze capillary and van der Waals forces in micro-scale contact. In this method, Winkler spring model was employed to analyze the contact of rough surfaces that were obtained from atomic force microscopy (AFM) height images. Self-mated contact of DLC(diamond like carbon) coatings was analyzed, as an example, by the proposed model. It was shown that the capillary force was significantly influenced by relative humidity and wet angle of the DLC surface. The deformation of asperities to a critical magnitude by external loading led to a considerable increase of both capillary and van der Waals forces.

Histologic and biomechanical characteristics of orthodontic self-drilling and self-tapping microscrew implants (Self drilling과 Self-tapping microscrew implants의 조직학적 및 생역학적인 비교)

  • Park, Hyo-Sang;Yen, Shue;Jeoung, Seong-Hwa
    • The korean journal of orthodontics
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    • v.36 no.4
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    • pp.295-307
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    • 2006
  • Objective: The purpose of this study was to compare the histological and biomechanical characteristics of self-tapping and self-drilling microscrew implants. Methods: 112 microscrew implants (56 self-drilling and 56 self-tapping) were placed into the tibia of 28 rabbits. The implants were loaded immediately with no force, light (100 gm), or heavy force (200 gm) with nickel-titanium coil springs. The animals were sacrificed at 3- and 5-weeks after placement and histologic and histomorphometric analysis were performed under a microscope. Results: All microscrew implants stayed firm throughout the experiment. There was no significant difference between self-drilling and self-tapping microscrew implants both in peak insertion and removal torques. Histologic examinations showed there were more defects in the self-tapping than the self-drilling microscrew implants, and newly formed immature bone was increased at the interface in the self-tapping 5-week group. There was proliferation of bone towards the outer surface of the implant and/or toward the marrow space in the self-drilling group. Histologically, self-drilling microscrew implants provided more bone contact initially but the two methods became similar at 5 weeks. Conclusion: These results indicate the two methods can be used for microscrew implant placement, but when using self-tapping microscrew implants, it seems better to use light force in the early stages.

Development of Highly Conductive Poly(3,4-ethylenedioxythiophene) Thin Film using High Quality 3-Aminopropyltriethoxysilane Self-Assembled Monolayer (고품질 3-Aminopropyltriethoxysilane 자기조립단분자막을 이용한 고전도도 Poly(3,4-ethylenedioxythiophene) 전극박막의 개발)

  • Choi, Sangil;Kim, Wondae;Kim, Sungsoo
    • Journal of Integrative Natural Science
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    • v.4 no.4
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    • pp.294-297
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    • 2011
  • Quality of PEDOT electrode thin film vapor phase-polymerized on 3-aminopropyltriethoxysilane (APS) self-assembled monolayer (SAM) is very crucial for making an ohmic contact between electrode and semiconductor layer of an organic transistor. In order to improve the quality of PEDOT film, the quality of APS-SAM laying underneath the film must be in the best condition. In this study, in order to improve the quality of APS-SAM, the monolayer was self-assembled on $SiO_2$ surface by a dip-coating method under strictly controlled relative humidity (< 18%RH). The quality of APS-SAM and PEDOT thin film were investigated with a contact angle analyzer, AFM, FE-SEM, and four-point probe. The investigation showed that a PEDOT film grown on the humidity-controlled SAM is very smooth and compact (sheet resistivity = 20.2 Ohm/sq) while a film grown under the uncontrolled condition is nearly amorphous and contains quite many pores (sheet resistivity = 200 Ohm/sq). Therefore, this study clearly proves that a highly improved quality of APSSAM can offer a highly conductive PEDOT electrode thin film on it.

Preparation of Self-Cleaning Coating Films with Nano- and Microstructure (나노마이크로 구조의 자기세정 기능성 코팅막의 제조)

  • Jeong, A-Rong;Kim, Jun-Su;Yun, Jon-Do
    • Korean Journal of Materials Research
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    • v.22 no.8
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    • pp.416-420
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    • 2012
  • Recently nanoscience and nanotechnology have been studied intensively, and many plants, insects, and animals in nature have been found to have nanostructures in their bodies. Among them, lotus leaves have a unique nanostructure and microstructure in combination and show superhydrophobicity and a self-cleaning function to wipe and clean impurities on their surfaces. Coating films with combined nanostructures and microstructures resembling those of lotus leaves may also have superhydrophobicity and self-cleaning functions; as a result, they could be used in various applications, such as in outfits, tents, building walls, or exterior surfaces of transportation vehicles like cars, ships, or airplanes. In this study, coating films were prepared by dip coating method using polypropylene polymers dissolved in a mixture of solvent, xylene and non-solvent, methylethylketon, and ethanol. Additionally, attempts were made to prepare nanostructures on top of microstructures by coating with the same coating solution with an addition of carbon nanotubes, or by applying a carbon nanotube over-coat on polymer coating films. Coating films prepared without carbon nanotubes were found to have superhydrophobicity, with a water contact angle of $152^{\circ}$ and sliding angle less than $2^{\circ}$. Coating films prepared with carbon nanotubes were also found to have a similar degree of superhydrophobicity, with a water contact angle of 150 degrees and a sliding angle of 3 degrees.