• Proceedings of the Korean Society of Precision Engineering Conference
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• 2002.05a
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• pp.512-515
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• 2002

The lubrication characteristics of SAM(self-assembled monolayer) have been investigated according to the change of surface group and surface temperature treatment with FDTS(1H, 1H, 2H, 2H-Perflurodecyltrichlorosilane) SAM and OTS(octadecyltrichlorosilane) SAM in micro scale. From the experimental results, it was found that OTS SAM gets destroyed at $200^{\circ}C$ and stiction and fiction coefficient increased, but FDTS SAM was stable up to $400^{\circ}C$. Also, it was found that the friction coefficient of normal OTS SAM is lower than that of FDTS SAM, but stiction is vice versa. This work shows the importance of surface group of self-assembled monolayer to control the lubrication characteristics and thermal stability.

• Journal of the Korean Society for Precision Engineering
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• v.20 no.1
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• pp.240-247
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• 2003

The tribological characteristics of FDTS (1H, 1H, 2H, 2H-Perflurodecyltrichlorosilane) SAM (self-assembled monolayer) and OTS (octadecyltrichlorosilane) SAM treated by high temperature annealing have been investigated from the viewpoint of stiction, adhesion and friction in micro/nano scale. From the experimental results, it was found that OTS SAM gets destroyed at 20$0^{\circ}C$ and stiction, adhesion and friction coefficient increased, but FDTS SAM was stable up to 40$0^{\circ}C$. Also, it was found that the friction coefficient of normal OTS SAM below 20$0^{\circ}C$ is lower than that of FDTS SAM in micro/nano scale, but stiction and adhesion is vice versa. This work shows the importance of surface group of self-assembled monolayer in dictating the tribological characteristics and thermal stability.

• Journal of Ceramic Processing Research
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• v.19 no.6
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• pp.525-529
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• 2018

The antireflective (AR) coated poly methyl methacrylate (PMMA) substrate was deposited by atomic layer deposition (ALD) on a self-assembled monolayer (SAM) to improve hydrophobicity and mechano-chemical properties of organic thin films. The water contact angles (WCA) were tested to characterize the surface wettability of SAM octadecyltrichlorosilane (OTS) films. Results showed that a contact angle of $105.9^{\circ}$ was obtained for the SAM films with an annealing process, and the highest WCA of $120^{\circ}$ was achieved for the films prepared by the SAM and ALD multi-process. The surface morphology of the SAM films with different assembly times and varying number of ALD cycles was obtained by atomic force microscopy (AFM). The maximum light transmittance for the SAM films on the PMMA substrate reached 99.9% at a wavelength of 450 nm. It was found that the SAM surfaces were not affected at all by the ALD process.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.6
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• pp.563-567
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• 2006

Indium tin oxide (ITO) used as an electrode in organic light emitting diodes (OLEDs) and organic thin film transistors (OTFTs) was modified by a self-assembled monolayer (SAM). For device fabrication, surface of the ITO was modified by immersion in a solution including various phosphonic acid at room temperature in order to increase work function of an electrode. The work function of ITO with SAM was measured by Kelvin probe. Work function increase of 0.88 eV was observed in ITO with various SAM. Therefore, ohmic contact is achieved in an interface between ITO and organic semiconductors (pentacene). We analyzed the origin of work function increase of ITO with SAM by X-ray photoelectron spectroscopy. We confirmed that increase of oxygen bonding energy attributed to increase the work function of ITO. These results suggested that ITO with the SAM gives a high possibility for high performance of OLEDS and OTFTs.

• Journal of Integrative Natural Science
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• v.4 no.4
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• pp.294-297
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• 2011

Quality of PEDOT electrode thin film vapor phase-polymerized on 3-aminopropyltriethoxysilane (APS) self-assembled monolayer (SAM) is very crucial for making an ohmic contact between electrode and semiconductor layer of an organic transistor. In order to improve the quality of PEDOT film, the quality of APS-SAM laying underneath the film must be in the best condition. In this study, in order to improve the quality of APS-SAM, the monolayer was self-assembled on $SiO_2$ surface by a dip-coating method under strictly controlled relative humidity (< 18%RH). The quality of APS-SAM and PEDOT thin film were investigated with a contact angle analyzer, AFM, FE-SEM, and four-point probe. The investigation showed that a PEDOT film grown on the humidity-controlled SAM is very smooth and compact (sheet resistivity = 20.2 Ohm/sq) while a film grown under the uncontrolled condition is nearly amorphous and contains quite many pores (sheet resistivity = 200 Ohm/sq). Therefore, this study clearly proves that a highly improved quality of APSSAM can offer a highly conductive PEDOT electrode thin film on it.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2003.10a
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• pp.367-370
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• 2003

In this study, application of SAM (self-assembled monolayer) to nano replication process as an anti-adhesion layer was presented to reduce the surface energy between the nano mold and the replicated polymeric nano patterns. The electron beam lithography was used for master nano patterns and the electorforming process was used to fabricate the nickel nano stamper. Alkanethiol SAM as an anti-adhesion layer was deposited on metallic nano stamper using solution deposition method. To analyze wettability and adhesion force of SAM, contact angle and LFM (Lateral Force Microscopy) were measured at the actual processing temperature and pressure for the case of nano compression molding and at the actual UV dose for the case of nano UV molding. It was found that the surface energy due to SAM deposition on the nickel nano stamper markedly decreased and the quality of SAM on the nickel stamper maintained under the actual molding environments.

• Journal of Surface Science and Engineering
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• v.53 no.5
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• pp.265-270
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• 2020

We investigated mechanochemical radical, which is concomitant with chemical lift-off lithography(CLL), on the self-assembled monolayer(SAM)/electrodes and a polydimethylsiloxane(PDMS) using a colorimetric and a spectroscopic method. The 11-mercaptoundecanol(MUO)/Au or the 11-hydroxyundecylphosphonic acid (HUPA)/ITO were contacted with bare or activated PDMS. After contact, the each of SAM/substrates and the PDMS were immersed in a 2,2 Diphenyl-1-picrylhydrazyl(DPPH) radical scavenger. The color of the DPPH exposed to the PDMS was changed from purple to yellow and the absorbance decreased definitely at 515 nm wavelength. The SAM/substrates, however, have caused small changes in spectroscopic property, indicating no existence of radical species. We concluded that mechanochemical radicals were formed by homolytic cleavage of PDMS molecules upon external force and hardly transferred on the SAM/substrates.

• Bulletin of the Korean Chemical Society
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• v.34 no.1
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• pp.164-166
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• 2013

Using a simple random walk model, this study simulated the growth of a self-assembled monolayer (SAM) pattern generated by dip-pen nanolithography (DPN). In this model, the SAM pattern grew mainly via the serial pushing of molecules deposited from the tip. This study examined various SAM patterns, such as lines, crosses and letters, by changing the tip scan speed.

• Bulletin of the Korean Chemical Society
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• v.34 no.12
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• pp.3790-3794
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• 2013

Molecular dynamics simulations were performed to study the structure and stability of a nanoscale self-assembled monolayer (SAM) of alkanethiol on a gold (111) surface. The tilt angle and orientational order of the alkyl chains in the SAM island were examined by systematically varying the size of the island. The chain length dependence of the SAM island was examined by considering alkanethiols containing 12, 16, 20, and 24 carbon atoms. The minimum diameter of SAM islands made from 1-tetracosanethiol, 1-ecosanethiol, 1-hexadecanethiol and 1-dodecanethiol were 2.29, 1.9, 4.7 and 4.76 nm, respectively. These set the ultimate resolution that can be patterned by soft nanolithography. As the length of alkanethiol increases, the SAM islands became more ordered in both orientation and conformation of the alkyl chains.

• International Journal of Precision Engineering and Manufacturing
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• v.7 no.3
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• pp.35-38
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• 2006

A study of electrowetting using an Octadecyltrichlorosilane (OTS) self-assembled monolayer (SAM) and Z- Tetraol 2000 perfluoropolyether lubricant as hydrophobic layers on Si and $SiO_2$ wafer was performed. The $SiO_2$ layer used as insulating layer was thermally grown on the silicon wafer to a thickness of 220-230 nm. The results demonstrated that the contact angle decreased from $100^{\circ}$ to $80^{\circ}$ at 28 V applied potential on $SiO_2$ wafer coated with OTS and the contact angle appeared to be reversible. However, the contact angle on the $SiO_2$ wafer coated with Z- Tetraol 2000 was not observable at 28 V applied potential. Furthermore, the contact angle on the Si wafer coated with OTS or Z- Tetraol 2000 appeared to be irreversible due to the generation of electrolysis in the droplet. It is concluded that it is feasible to use SAM as a hydrophobic layer in electrowetting applications.