[KSCI] Korea Science Citation Index Service

http://dx.doi.org/10.5012/bkcs.2013.34.1.164

Random Walk Simulation for the Growth of Monolayer in Dip Pen Nanolithography

Kim, Hyojeong (Department of Nanomaterials Engineering, Pusan National University)
Ha, Soojung (Department of Nanomaterials Engineering, Pusan National University)
Jang, Joonkyung (Department of Nanomaterials Engineering, Pusan National University)

Publication Information

Bulletin of the Korean Chemical Society / v.34, no.1, 2013 , pp. 164-166 More about this Journal

Abstract

Using a simple random walk model, this study simulated the growth of a self-assembled monolayer (SAM) pattern generated by dip-pen nanolithography (DPN). In this model, the SAM pattern grew mainly via the serial pushing of molecules deposited from the tip. This study examined various SAM patterns, such as lines, crosses and letters, by changing the tip scan speed.

Keywords

Random walk; Self-assembled monolayer; Dip-pen nanolithography; Dendrite; Diffusion;

Citations & Related Records

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