• Journal of Nutrition and Health
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• v.15 no.1
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• pp.30-38
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• 1982

Experiments were carried out in order to compare the natural antioxidants in the acetonitril extracts of raw and baked seeds of Korean sesame and perilla by thin layer and gas chromatography. The sample was dissolved in n-pentane and extracted with acetonitril and the acetonitril extract was separated by thin layer chromatography using silica gel. The spots were detected by spraying with 2, 6 -dichloroquinone -4-chlorimide, phosphomolybdic acid and dimethylamine as chromogenic reagents. Natural antioxidant, such as ${\delta}-tocopherol$ detected in raw and baked sesame and perilla seed oil by TLC and sesamol was detected only in raw and baked sesame seed oil by GC.

• Proceedings of the Korean Geotechical Society Conference
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• 2005.03a
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• pp.1512-1519
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• 2005

In this study, the potential for liquefaction in the Incheon international airport was calculated by appling the standard penetration test data and laboratory test data to the modified Seed & Idriss(2001) method. The analysis was performed on the non-plastic silty layer and silty sand layer which within the depth of 20m, below 20 of the standard penetration value(N), and the ground water level. Also, each set of data was mapped by using GIS(geographic information systems) and the factor of safety for the potential for liquefaction was obtained by overlapping those layers. As a result, it was found that there exist potential hazard zone for the liquefaction partially. So, the additional detailed assessments for those are thought to be necessary.

• 한국정보디스플레이학회:학술대회논문집
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• 2000.01a
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• pp.65-66
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• 2000

Various fluoride films on a glass substrate were prepared and characterized to provide a seed layer for crystalline Si film growth. The XRD analysis on $CaF_2/glass$ illustrated (220) preferential orientation and showed lattice mismatch less than 5 % with Si. We achieved a fluoride film with breakdown electric field of 1.27 MV/cm, leakage current density about $10^{-6}$ $A/cm^2$, and relative dielectric constant less than 5.6. This paper demonstrates microcrystalline silicon $({\mu}c-Si)$ film growth by using a $CaF_2/glass$ substrate. The ${\mu}c-Si$ films exhibited crystallization in (111) and (220) planes, grain size of $700\;{\AA}$, crystalline volume fraction over 65 %, dark- and photo-conductivity ratio of 124, activation energy of 0.49 eV, and dark conductivity less than $4{\times}10^{-7}$ S/cm.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2013.05a
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• pp.68-69
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• 2013

금속 씨드 층(seed layer)을 직경 $10{\mu}m$, 깊이 $100{\mu}m$, 고종횡비 10:1 비아에 스퍼터링하였다. 금속 씨드 층의 두께는 스퍼터링 시간, 압력, 및 타겟파워를 변화하여 조절하였다. 금속 씨드층 스퍼터링 후 전기도금에 의해 구리 충전을 시도하였다. 비아의 고종횡비가 증가하면 비아 폭이 좁아져 비아의 하부층과 하단 측면 두께는 비아 상부 측면 두께만큼 충분하지 않아 문제가 될 수 있다. 스퍼터링 조건을 최적화 함으로써 씨드층의 특성을 높이고, 비아 홀 지름의 감소 속도를 줄일 수 있었다. 종래의 스퍼터링 방식을 이용하여 비아 입구의 opening percentage를 약 64%로 하고, 하부 씨드층 두께가 46.7 nm 인 금속 씨드층을 형성할 수 있었다. 이 씨드층 상에 전기도금으로 Cu filling을 성공적으로 할 수 있었다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.34 no.5
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• pp.333-336
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• 2021

Oxide YBCO bulk superconductors are manufactured using the melt process. Because seed crystal growth method utilizes a slow-spreading layer-by-layer reaction, a long-term heat treatment is required to manufacture a single-crystal specimen of several cm. In this study, the melt process method was applied to compensate for the shortcomings of the seed crystal growth method. The thickness of the upper and lower pellets of the YBCO bulk was molded to 40 mm, and YBCO superconductor was produced by heat treatment. The measurement results of capture magnetism was in line with the literature. This results in a relationship that the higher the growth of Y211 particle in the YBCO, the higher the superconducting properties. We analyzed the YBCO superconductor, focusing on the Y₂BaCuO₅ particle distribution.

• Proceedings of the Korean Magnestics Society Conference
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• 1998.05a
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• pp.26-27
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• 1998

• Proceedings of the Korean Magnestics Society Conference
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• 1999.10a
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• pp.138-139
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• 1999

• Proceedings of the KSME Conference
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• 2004.04a
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• pp.978-982
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• 2004

We present high aspect ratio 100nm-scale nickel stamper using e-beam lithography process and Cr/Qz mask for the injection molding process of nano grating patterns. Conventional photolithography blank mask (CrON/Cr/Qz) consists of quartz substrate, Cr layer of UV protection and CrON of anti-reflection layer. We have used Cr/Qz blank mask without anti-reflection layer of CrON which is non-conductive material and ebeam lithography process in order to simplify the nickel electroplating process. In nickel electroplating process, we have used Cr layer of UV protection as seed layer of nickel electroplating. Fabrication conditions of photolithography mask using e-beam lithography are optimized with respect to CrON/Cr/Qz blank mask. In this paper, we have optimized e-beam lithography process using Cr/Qz blank mask and fabricated nickel stamper using Cr seed layer. CrON/Cr/Qz blank mask and Cr/Qz blank mask require optimal e-beam dosage of $10.0{\mu}C/cm^2$ and $8.5{\mu}C/cm^2$, respectively. Finally, we have fabricated $116nm{\pm}6nm-width$ and $240nm{\pm}20nm-height$ nickel grating stamper for the injection molding pattern.

• Proceedings of the Materials Research Society of Korea Conference
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• 2010.05a
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• pp.58.1-58.1
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• 2010

We have developed a novel crystallization process, where the crystallization temperature is lowered compared to the conventional RTA process and the metal contamination is lowered compared to the conventional VIC process. A very-thin a-Si film was deposited and crystallized at $550^{\circ}C$ for 3 h by the VIC process and then a thick a-Si film was deposited and crystallized by the RTA process at $680^{\circ}C$ for 5 min using the VIC poly-Si layer as a crystallization seed layer. The RTA crystallized temperature could be lowered up to $50^{\circ}C$, compared to RTA process alone. The poly-Si film appeared a needle-like growth front and relatively well-arranged (111) orientation. In addition, the Ni concentration in the poly-Si film was lowered to $3{\times}10^{17}\;cm^{-3}$ and that at the poly-Si/$SiO_2$ interface was lowered to $5{\times}10^{19}\;cm^{-3}$. The reduction in metal contamination could be greatly helpful to achieve a low leakage current in poly-Si TFT, which is the critical parameter for commercialization of AMOLED.

• Proceedings of the KIEE Conference
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• 1993.11a
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• pp.204-206
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• 1993

In this paper we represented electroplating process without seed layers for making metal micro structures needed for applying terminal voltage for one-to-one cell fusion system. In this system, we need thick insulator and metal structures because the diameter of a cell is approximately $40{\mu}m$. So, we adopted the photo-sensitive polyimide as electroplating molds and structural material. Generally, the processes utilizing the photo-sensitive polyimide as molds have metal seed layers on the substrate as electroplating electrodes and requires wiring tasks to these seed layers. We proposed electroplating process without any seed layer on the Si-substrate and simulated P-N-P (electrode - Si substrate - electrode) junction on N-type silicon substrate. Leakage current from one metal structure to another which arise when terminal voltage is applied can be remarkably decreased by doping Boron in the region to be electroplated.