한국정보디스플레이학회:학술대회논문집
- 2000.01a
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- Pages.65-66
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- 2000
Characteristics of fluoride/glass as a seed layer for microcrystalline silicon film growth
- Choi, Seok-Won (School of Electrical and Computer Engineering, Sungkyunkwan University) ;
- Kim, Do-Young (School of Electrical and Computer Engineering, Sungkyunkwan University) ;
- Ahn, Byeong-Jae (School of Electrical and Computer Engineering, Sungkyunkwan University) ;
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Yi, Jun-Sin
(School of Electrical and Computer Engineering, Sungkyunkwan University)
- Published : 2000.01.13
Abstract
Various fluoride films on a glass substrate were prepared and characterized to provide a seed layer for crystalline Si film growth. The XRD analysis on
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